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    • 41. 发明授权
    • Graded dielectric layer
    • 梯度介电层
    • US07638811B2
    • 2009-12-29
    • US11685761
    • 2007-03-13
    • David B. Slater, Jr.
    • David B. Slater, Jr.
    • H01L33/00
    • H01L33/44
    • An optoelectronic device includes a passivation layer of a dielectric material having a graded composition that varies with depth, whether continuous or stepwise, to provide a first index of refraction proximate to a semiconductor or conductor material and provide a second index of refraction adjacent to a surrounding material, such as an encapsulant. The resulting graded dielectric layer reduces Fresnel losses by reducing index of refraction mismatches between the adjacent semiconductor or conductor layer and the surrounding medium. Methods for forming graded dielectric layers include supplying a nitrogen-containing source gas at a declining flow rate or concentration, while supplying an oxygen-containing source gas an rising flow rate or concentration, to a deposition chamber.
    • 光电器件包括具有渐变组分的电介质材料的钝化层,随着深度而变化,无论是连续的还是逐步的,以提供靠近半导体或导体材料的第一折射率,并提供邻近周围的第二折射率 材料,如密封剂。 通过减少相邻的半导体层或导体层与周围介质之间的折射失配指数,得到的梯度介电层减少菲涅耳损耗。 形成渐变电介质层的方法包括以下降的流速或浓度供给含氮源气体,同时向沉积室供给上升的流量或浓度的含氧源气体。