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    • 45. 发明授权
    • Method of producing polishing pad
    • 抛光垫的生产方法
    • US07972396B2
    • 2011-07-05
    • US11859928
    • 2007-09-24
    • Chung-Chih FengI-Peng YaoYung-Chang Hung
    • Chung-Chih FengI-Peng YaoYung-Chang Hung
    • B24D3/34
    • B24D13/147B24B37/30B24D11/001
    • The present invention relates to a method of producing a polishing pad, comprising steps of: (a) providing a base material comprising a plurality of fibers; said base material having a surface for polishing a substrate, wherein the fibers comprise a core and a cladding surrounding the core, and the cladding comprises a hydrophobic polymer; (b) impregnating the surface of the base material with an elastomer solution; (c) coagulating the elastomer impregnated in the surface of the base material to mold the elastomer and to form a plurality of first continuous pores between the elastomer, and between the elastomer and the fibers; (d) planarizing the surface of the base material; (e) impregnating the surface of the base material and elastomer obtained in the step (d) with a condition polymer solution; and (e) curing the condition polymer impregnated in the surface of the base material and elastomer and partially filling the condition polymer into the first continuous pores to form a plurality of second continuous pores.
    • 本发明涉及一种制造抛光垫的方法,包括以下步骤:(a)提供包含多根纤维的基材; 所述基材具有用于抛光基底的表面,其中所述纤维包括芯和围绕所述芯的包层,并且所述包层包含疏水性聚合物; (b)用弹性体溶液浸渍基材的表面; (c)凝固浸渍在基材表面的弹性体以模制弹性体并在弹性体之间以及弹性体和纤维之间形成多个第一连续孔; (d)使基材的表面平坦化; (e)用条件聚合物溶液浸渍在步骤(d)中获得的基材和弹性体的表面; 和(e)固化浸渍在基材表面和弹性体表面的状态聚合物,并将状态聚合物部分地填充到第一连续孔中以形成多个第二连续孔。
    • 49. 发明申请
    • POLISHING PAD AND METHOD FOR MAKING THE SAME
    • 抛光垫及其制造方法
    • US20090258578A1
    • 2009-10-15
    • US12208520
    • 2008-09-11
    • Chung-Chih FengChun-Ta WangYung-Chang HungI-Peng Yao
    • Chung-Chih FengChun-Ta WangYung-Chang HungI-Peng Yao
    • B24D11/00
    • B24B37/24B24B37/22B24D18/00
    • The present invention relates to a polishing pad and method for making the same. In the invention, a liquid-state polymer material is directly formed on the surface of a base material, and then the liquid-state polymer material is solidified to form a flat grinding layer. Whereby, the polishing pad has high unity and flatness. The grinding layer has attenuated structures and a plurality of holes, thus increasing the storage ability of polishing particles distributed in a polishing liquid. In addition, the polishing pad has high compression ratio, so the polishing pad can compactly contact a polishing workpiece, and will not scratch the surface of the polishing workpiece scratched. Therefore, the polishing effect and quality will be improved.
    • 抛光垫及其制造方法技术领域本发明涉及抛光垫及其制造方法。 在本发明中,在基材的表面上直接形成液态聚合物材料,然后使液态聚合物材料固化,形成平坦的研磨层。 因此,抛光垫具有高的一体性和平坦度。 研磨层具有衰减结构和多个孔,从而增加了分布在抛光液中的抛光颗粒的储存能力。 此外,抛光垫具有高压缩比,因此抛光垫可以紧密接触抛光工件,并且不会刮擦抛光工件的表面划伤。 因此,抛光效果和质量将得到提高。