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31. 发明授权

US08740209B2 Method and apparatus for ex-situ lift-out specimen preparation 有权
标题翻译：用于非原位提取样品制备的方法和装置
公开(公告)号：US08740209B2
公开(公告)日：2014-06-03
申请号：US13402708
申请日：2012-02-22
申请人： Lucille A. Giannuzzi
发明人： Lucille A. Giannuzzi
IPC分类号： B23Q3/00 , B23Q7/00 , B29C65/00 , B31B1/60 , B32B37/00
CPC分类号： H01J37/3002 , G01N1/00 , G01N1/32 , H01J37/20 , H01J2237/201 , H01J2237/31745
摘要： A specimen carrier for use with an ex-situ lift-out (EXLO) milling process includes a carrier top surface having at least one specimen support area and at least one aperture formed through the specimen carrier top surface. The aperture includes a first opening having an open wider upper end and a narrower lower end. The first opening is bounded by opposed sidewalls in spaced-apart orientation that are inwardly inclined from the wider upper end to the narrower lower end. The aperture is configured to enable a specimen to sit over the opening and can be wedged between the first opening opposed sidewalls so that a region of interest to be milled is centered about the open end of the opening. Specimens so mounted can then be re-thinned via charged particle instruments such as focused ion beam (FIB) milling, broad beam ion milling, or via laser ablation.
摘要翻译：用于非原位提取（EXLO）铣削工艺的样品载体包括具有至少一个样品支撑区域的载体顶表面和穿过样品载体顶表面形成的至少一个孔。孔包括具有敞开的较宽上端和较窄下端的第一开口。第一开口由相对侧壁限定，其间隔开的方向从较宽的上端向较窄的下端向内倾斜。孔被构造成使得样本能够坐在开口上方并且可以楔入第一开口相对的侧壁之间，使得待研磨的感兴趣区域围绕开口的开口端居中。然后可以通过带电粒子仪器（如聚焦离子束（FIB）铣削，宽束离子铣削或经由激光烧蚀）将如此安装的样品重新稀释。

32. 发明申请

US20140078639A1 ION GENERATION DEVICE 有权
标题翻译：离子发生装置
公开(公告)号：US20140078639A1
公开(公告)日：2014-03-20
申请号：US14021507
申请日：2013-09-09
申请人： Charles Houston WADDELL , Joseph Anton CHRISTIANSEN
发明人： Charles Houston WADDELL , Joseph Anton CHRISTIANSEN
IPC分类号： H01T23/00
CPC分类号： A61L9/22 , A61L2209/16 , B01D46/0032 , B01D46/521 , B03C3/011 , B03C3/04 , B03C3/155 , B03C3/41 , B03C3/82 , F01N3/0892 , F02M27/04 , F02M27/042 , F02M35/0205 , F02M35/0217 , F16M13/02 , F24F3/166 , F24F2003/1682 , H01J27/022 , H01J27/028 , H01J37/08 , H01J37/16 , H01J37/3002 , H01T23/00
摘要： The present invention provides methods and systems for an ion generator device that includes a base, a first and second pair of spaced-apart, opposed sidewalls projecting from the base to collectively form an interior storage compartment and to define an upper edge, a top portion engaged to the upper edge, at least one high voltage wire extending from the device, and a power supply for providing a voltage to the high voltage wire for producing ions.
摘要翻译：本发明提供了一种用于离子发生器装置的方法和系统，其包括底座，从基座突出的第一和第二对间隔开的相对侧壁，以共同形成内部储存室并限定上边缘，顶部接合到上边缘，从装置延伸的至少一个高压电线和用于向高压线提供电压以产生离子的电源。

33. 发明申请

US20130102029A1 Processing Biomass 有权
标题翻译：加工生物质
公开(公告)号：US20130102029A1
公开(公告)日：2013-04-25
申请号：US13656892
申请日：2012-10-22
申请人： Xyleco, Inc.
发明人： Marshall Medoff
IPC分类号： C08B1/00
CPC分类号： B01J19/085 , B01J19/081 , B01J19/121 , B01J19/123 , B01J19/126 , B01J2219/00006 , B01J2219/08 , B01J2219/0869 , B01J2219/0871 , B01J2219/0879 , B01J2219/089 , B02C23/18 , C07C27/00 , C07C27/04 , C07C27/24 , C08B1/00 , C12M45/00 , C12P7/10 , C12P19/00 , C12P19/02 , C12P19/14 , C12P2201/00 , C13K1/02 , D21B1/02 , D21B1/063 , G21K5/00 , H01J37/3002 , Y02E50/16 , Y02E50/17
摘要： Biomass (e.g., plant biomass, animal biomass, and municipal waste biomass) is processed to produce useful products, such as fuels. For example, systems can use feedstock materials, such as cellulosic and/or lignocellulosic materials and/or starchy or sugary materials, to produce ethanol and/or butanol, e.g., by fermentation.
摘要翻译：加工生物质（例如，植物生物量，动物生物质和城市废物生物质）以产生有用的产物，例如燃料。例如，系统可以使用诸如纤维素和/或木质纤维素材料和/或淀粉或糖类材料的原料来生产乙醇和/或丁醇，例如通过发酵。

34. 发明申请

US20120286170A1 DUAL PASS SCANNING 有权
标题翻译：双通扫描
公开(公告)号：US20120286170A1
公开(公告)日：2012-11-15
申请号：US13293393
申请日：2011-11-10
申请人： Teunis VAN DE PEUT , Marco Jan-Jaco WIELAND
发明人： Teunis VAN DE PEUT , Marco Jan-Jaco WIELAND
IPC分类号： G21K5/10
CPC分类号： H01J37/3026 , B82Y10/00 , B82Y40/00 , G03F7/70475 , G06T1/20 , G06T1/60 , H01J37/045 , H01J37/3002 , H01J37/3174 , H01J37/3175 , H01J37/3177 , H01J2237/3175 , H01J2237/31761 , H01J2237/31764 , H04N1/405
摘要： A method for exposing a wafer using a plurality of charged particle beamlets. The method comprises identifying non-functional beamlets among the beamlets, allocating a first subset of the beamlets for exposing a first portion of the wafer, the first subset excluding the identified non-functional beamlets, performing a first scan for exposing the first portion of the wafer using the first subset of the beamlets, allocating a second subset of the beamlets for exposing a second portion of the wafer, the second subset also excluding the identified non-functional beamlets, and performing a second scan for exposing the second portion of the wafer using the second subset of the beamlets, wherein the first and second portions of the wafer do not overlap and together comprise the complete area of the wafer to be exposed.
摘要翻译：一种使用多个带电粒子束曝光晶片的方法。该方法包括识别子束中的非功能子束，分配用于暴露晶片的第一部分的子束的第一子集，排除所识别的非功能子束的第一子集，执行第一扫描以暴露第一部分晶片，使用子束的第一子集，分配用于暴露晶片的第二部分的子束的第二子集，第二子集还排除所识别的非功能子束，以及执行用于暴露晶片的第二部分的第二扫描使用子束的第二子集，其中晶片的第一和第二部分不重叠并且一起包括要暴露的晶片的完整区域。

35. 发明申请

US20110210263A1 Particle Beam Transport Apparatus And Method Of Transporting A Particle Beam With Small Beam Spot Size 有权
标题翻译：粒子束输送装置和运输具有小光束尺寸的粒子束的方法
公开(公告)号：US20110210263A1
公开(公告)日：2011-09-01
申请号：US12680158
申请日：2008-09-26
申请人： Michel Abs , Szymon Zaremba , Willem Kleeven
发明人： Michel Abs , Szymon Zaremba , Willem Kleeven
IPC分类号： G21K1/093
CPC分类号： H01J37/10 , A61L2/087 , A61L2202/122 , A61N5/1043 , A61N2005/1087 , G21K1/08 , G21K5/04 , G21K5/10 , H01J37/147 , H01J37/1474 , H01J37/3002 , H01J37/3005 , H01J37/304 , H01J37/3045 , H01J37/317 , H01J2237/103 , H01J2237/12 , H01J2237/14 , H01J2237/2602 , H01J2237/30 , H01J2237/31701 , H05G2/00
摘要： An apparatus for transporting a charged particle beam is provided. The apparatus may include: means for scanning the charged particle beam on a target, a dipole magnet arranged upstream of the means for scanning, at least three quadrupole lenses arranged between the dipole magnet and the means for scanning, and means for adjusting the field strength of at least three quadrupole lenses in function of the scanning angle of the charged particle beam. The apparatus can be made at least single achromatic.
摘要翻译：提供了一种用于运送带电粒子束的装置。该装置可以包括：用于扫描目标上的带电粒子束的装置，布置在扫描装置上游的偶极子磁体，布置在偶极子磁体和扫描装置之间的至少三个四极透镜，以及用于调整场强的装置的至少三个四极透镜，其功能是带电粒子束的扫描角度。该装置可以制成至少单个消色差。

36. 发明申请

US20020171050A1 Gas injector in which one of a plurality of nozzles can be selectively driven for elevation 失效
标题翻译：可以选择性地驱动多个喷嘴中的一个以提升的气体喷射器
公开(公告)号：US20020171050A1
公开(公告)日：2002-11-21
申请号：US10140710
申请日：2002-05-08
发明人： Yoshihiro Koyama
IPC分类号： H01J037/08
CPC分类号： H01J37/3056 , H01J37/3002 , H01J2237/31713
摘要： In a gas injector according to the invention, a forward section of the same is formed by a cylindrical portion which collectively contains and holds a plurality of nozzles and gas supply pipes and a nozzle guide portion which has an opening of a size to allow only one of the nozzles to protrude outwardly at an end thereof and which is formed like a taper extending from said cylindrical portion to said opening, and a rear section of the gas injector has a mechanism capable of selectively driving said plurality of nozzles for elevation through said gas supply pipes.
摘要翻译：在根据本发明的气体注射器中，其前部由圆筒部形成，该圆筒部共同地容纳并保持多个喷嘴和气体供给管以及喷嘴引导部，该喷嘴引导部的开口尺寸仅允许一个的喷嘴在其端部向外突出并且形成为从所述圆柱形部分延伸到所述开口的锥形，并且气体喷射器的后部具有能够选择性地驱动所述多个喷嘴以通过所述气体升高的机构供应管道。

37. 发明授权

US06329650B1 Space charge neutralization of an ion beam 失效
标题翻译：离子束的空间电荷中和
公开(公告)号：US06329650B1
公开(公告)日：2001-12-11
申请号：US09083706
申请日：1998-05-22
申请人： Vadim G. Dudnikov
发明人： Vadim G. Dudnikov
IPC分类号： H05H300
CPC分类号： G21K1/14 , H01J37/3002 , H01J2237/0041 , H01J2237/31701
摘要： A device is provided for treating a workpiece with positively charged ions. The device includes an apparatus including an ion source for producing a positive ion beam and directing the positive ion beam toward a surface of a work piece. The device further includes a source for introducing negative ions into the beam path in at least one selected region downstream of the ion source.
摘要翻译：提供一种用于用带正电荷的离子处理工件的装置。该装置包括一种包括用于产生正离子束并将正离子束朝向工件表面引导的离子源的装置。该装置还包括用于在离子源下游的至少一个选定区域中将负离子引入光束路径的源。

38. 发明授权

US5981960A Charged particle beam exposure method and apparatus therefor 失效
标题翻译：带电粒子束曝光方法及其装置
公开(公告)号：US5981960A
公开(公告)日：1999-11-09
申请号：US724954
申请日：1996-10-02
申请人： Yoshihisa Ooaeh , Akio Yamada , Hiroshi Yasuda , Hitoshi Tanaka
发明人： Yoshihisa Ooaeh , Akio Yamada , Hiroshi Yasuda , Hitoshi Tanaka
IPC分类号： H01J37/06 , H01J37/30 , H01J37/305 , H01J37/317 , H01L21/027
CPC分类号： B82Y10/00 , B82Y40/00 , G03F7/70925 , H01J37/3002 , H01J37/3174 , H01J2237/022 , H01J2237/188 , H01J2237/31776
摘要： A charged particle beam exposure method and apparatus, in which a charged particle beam is shaped based on pattern data and the shaped charged particle beam is irradiated to a desired location on a sample. The method and apparatus includes introducing ozone gas into a chamber through which the charged particle beam is passed, shaped and deflected, to be irradiated to the desired location while the charged particle beam is irradiated through the chamber. The ozone gas concentration in the chamber is maintained so that the concentration downstream along the beam is higher than the concentration upstream along the beam. A charge-up drift due to a contamination material from a resist on a wafer can be avoided by the ozone self cleaning. The ozone oxidation does not occur at the upstream chamber where there is a lower ozone concentration and lower contamination.
摘要翻译：带电粒子束曝光方法和装置，其中基于图案数据对带电粒子束进行成形，并将成形的带电粒子束照射到样品上的期望位置。所述方法和装置包括将臭氧气体引入室中，带电粒子束通过该腔通过，成形和偏转，以照射到期望位置，同时通过室照射带电粒子束。保持室中的臭氧气体浓度，使得沿着光束的下游的浓度高于沿着光束的上游的浓度。通过臭氧自清洁可以避免由于晶片上的抗蚀剂引起的污染物质的充电漂移。臭氧氧化不会发生在臭氧浓度较低和污染较低的上游室。

39. 发明授权

US5811823A Control mechanisms for dosimetry control in ion implantation systems 失效
标题翻译：离子注入系统中剂量测定控制的控制机制
公开(公告)号：US5811823A
公开(公告)日：1998-09-22
申请号：US757726
申请日：1996-11-26
申请人： Julian G. Blake , Piero Sferlazzo , Peter H. Rose , Adam A. Brailove
发明人： Julian G. Blake , Piero Sferlazzo , Peter H. Rose , Adam A. Brailove
IPC分类号： H01J37/04 , C23C14/48 , H01J27/14 , H01J37/08 , H01J37/18 , H01J37/30 , H01J37/304 , H01J37/317 , H01L21/00 , H01L21/265 , H01L21/677 , H01L21/683
CPC分类号： H01L21/67109 , H01J27/14 , H01J37/08 , H01J37/18 , H01J37/3002 , H01J37/3007 , H01J37/304 , H01J37/3171 , H01L21/67069 , H01L21/67739 , H01L21/67748 , H01L21/67751 , H01L21/67778 , H01L21/6838 , H01J2237/022 , H01J2237/083 , H01J2237/184 , H01J2237/2001 , H01J2237/2007 , H01J2237/20228 , H01J2237/204 , H01J2237/31701 , H01J2237/31705
摘要： A high throughput ion implantation system that rapidly and efficiently processes large quantities of flat panel displays. The ion implantation system has an ion source, an electrode assembly, a platform mounting a workpiece, and a ion beam measuring structure. The ion source in conjunction with the electrode assembly forms an ion beam in the shape of a ribbon beam. The ion beam is formed and directed such that a first portion of the ion beam treats the workpiece while a second portion of the ion beam is contemporaneously measured by the beam measuring structure. A controller obtains data from the beam measuring structure on the ion beam's parameters, and then generates control signals to the ion implantation system in response to the data.
摘要翻译：快速有效地处理大量平板显示器的高通量离子注入系统。离子注入系统具有离子源，电极组件，安装工件的平台和离子束测量结构。与电极组件结合的离子源形成带状束形状的离子束。离子束的形成和定向使得离子束的第一部分处理工件，而离子束的第二部分由束测量结构同时测量。控制器从离子束参数获取束测量结构的数据，然后根据数据产生离子注入系统的控制信号。

40. 发明授权

US5637199A Sputtering shields and method of manufacture 失效
标题翻译：溅射屏蔽和制造方法
公开(公告)号：US5637199A
公开(公告)日：1997-06-10
申请号：US904835
申请日：1992-06-26
申请人： Robert D. Lorentz , Joseph H. Sexton
发明人： Robert D. Lorentz , Joseph H. Sexton
IPC分类号： C23C14/08 , C23C14/34 , C23C14/46 , H01J37/30
CPC分类号： H01J37/3002 , C23C14/087 , C23C14/3407 , C23C14/46 , H01J2237/022 , H01J2237/3146
摘要： Coated shields useful in a sputtering deposition chamber comprise a binder and particles of the same material as the target. Application of the coating material to interior surfaces and appliances of the sputtering chamber reduces contamination of the sputtered material.
摘要翻译：在溅射沉积室中有用的涂层屏蔽件包括与靶材相同材料的粘合剂和颗粒。涂覆材料在溅射室的内表面和器具上的应用减少了溅射材料的污染。

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