专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

31. 发明授权

US08629395B2 Charged particle beam apparatus 失效
标题翻译：带电粒子束装置
公开(公告)号：US08629395B2
公开(公告)日：2014-01-14
申请号：US13521273
申请日：2011-01-12
申请人： Hideo Morishita , Michio Hatano , Takashi Ohshima , Mitsugu Sato , Tetsuya Sawahata , Sukehiro Ito , Yasuko Aoki
发明人： Hideo Morishita , Michio Hatano , Takashi Ohshima , Mitsugu Sato , Tetsuya Sawahata , Sukehiro Ito , Yasuko Aoki
IPC分类号： H01J37/28 , H01J37/244 , G01N23/22
CPC分类号： H01J49/067 , H01J37/244 , H01J2237/2441 , H01J2237/24465 , H01J2237/2448 , H01J2237/28
摘要： In order to provide a charged particle beam apparatus that can detect charged particle beam signals in discrimination into a plurality of energy bands, and obtain high-resolution images for each of the energy bands using the signals, the charged particle beam apparatus has a charged particle source (12-1); an aperture (16) that limits the diameter of the charged particle beam (4); optics (14, 17, 19) for the charged particle beam; a specimen holder (21); a charged particle detector (40) that detects secondary charged particles and reflected charged particles from a specimen; and signal calculation unit that processes the output signal from the charged particle detector. The charged particle detector (40) is provided with a first small detector (51) having a first detection sensitivity and a second small detector (52) having a second detection sensitivity, and makes the detection solid angle viewed from a position on the specimen, to which the charged particle beam (4) is to be radiated, to be the same for the first small detector (51) and the second small detector (52).
摘要翻译：为了提供一种带电粒子束装置，其能够将鉴别中的带电粒子束信号检测为多个能带，并且使用该信号获得每个能带的高分辨率图像，带电粒子束装置具有带电粒子来源（12-1）; 限制带电粒子束（4）的直径的孔（16）; 用于带电粒子束的光学器件（14,17,19）样品架（21）; 检测来自试样的二次带电粒子和反射带电粒子的带电粒子检测器（40）以及处理来自带电粒子检测器的输出信号的信号计算单元。带电粒子检测器（40）具有第一检测灵敏度的第一小检测器（51）和具有第二检测灵敏度的第二小检测器（52），并从检体上的位置观察检测立体角，对于第一小型检测器（51）和第二小型检测器（52），带电粒子束（4）将被照射到其上。

32. 发明申请

US20130313429A1 METHOD AND APPARATUS FOR INSPECTING SAMPLE SURFACE 有权
公开(公告)号：US20130313429A1
公开(公告)日：2013-11-28
申请号：US13954425
申请日：2013-07-30
申请人： Nobuharu Noji , Yoshihiko Naito , Hirosi Sobukawa , Kenji Terao , Masahiro Hatakeyama , Katsuya Okumura
发明人： Nobuharu Noji , Yoshihiko Naito , Hirosi Sobukawa , Kenji Terao , Masahiro Hatakeyama , Katsuya Okumura
IPC分类号： H01J37/26
CPC分类号： H01J37/265 , G01R31/307 , H01J37/04 , H01J2237/2441 , H01J2237/2446 , H01J2237/2594 , H01J2237/2817
摘要： Provided is a method and an apparatus for inspecting a sample surface with high accuracy. Provided is a method for inspecting a sample surface by using an electron beam method sample surface inspection apparatus, in which an electron beam generated by an electron gun of the electron beam method sample surface inspection apparatus is irradiated onto the sample surface, and secondary electrons emanating from the sample surface are formed into an image toward an electron detection plane of a detector for inspecting the sample surface, the method characterized in that a condition for forming the secondary electrons into an image on a detection plane of the detector is controlled such that a potential in the sample surface varies in dependence on an amount of the electron beam irradiated onto the sample surface.

33. 发明授权

US08492715B2 Method of protecting a radiation detector in a charged particle instrument 有权
标题翻译：保护带电粒子仪器中的辐射探测器的方法
公开(公告)号：US08492715B2
公开(公告)日：2013-07-23
申请号：US13441344
申请日：2012-04-06
申请人： Maximus Theodorus Otten , Gerrit Cornelis Van Hoften , Joeri Lof
发明人： Maximus Theodorus Otten , Gerrit Cornelis Van Hoften , Joeri Lof
IPC分类号： G01N23/00 , G21K7/00
CPC分类号： H01J37/26 , H01J37/244 , H01J37/302 , H01J2237/0203 , H01J2237/043 , H01J2237/065 , H01J2237/22 , H01J2237/2441 , H01J2237/24455 , H01J2237/24507 , H01J2237/26 , H01J2237/262 , H01J2237/2802
摘要： The invention relates to a Method of protecting a direct electron detector (151) in a TEM. The invention involves predicting the current density on the detector before setting new beam parameters, such as changes to the excitation of condenser lenses (104), projector lenses (106) and/or beam energy. The prediction is made using an optical model or a Look-Up-Table. When the predicted exposure of the detector is less than a predetermined value, the desired changes are made, otherwise a warning message is generated and changes to the settings are postponed.
摘要翻译：本发明涉及一种在TEM中保护直接电子检测器（151）的方法。本发明涉及在设置新的光束参数之前预测检测器上的电流密度，例如对聚光透镜（104），投影透镜（106）和/或光束能量的激发的改变。使用光学模型或查找表进行预测。当检测器的预测曝光小于预定值时，进行所需的改变，否则产生警告消息并延迟对设置的改变。

34. 发明申请

US20120256085A1 Method of protecting a radiation detector in a charged particle instrument 有权
标题翻译：保护带电粒子仪器中的辐射探测器的方法
公开(公告)号：US20120256085A1
公开(公告)日：2012-10-11
申请号：US13441344
申请日：2012-04-06
申请人： Maximus Theodorus Otten , Gerrit Cornelis van Hoften , Joeri Lof
发明人： Maximus Theodorus Otten , Gerrit Cornelis van Hoften , Joeri Lof
IPC分类号： H01J37/26
CPC分类号： H01J37/26 , H01J37/244 , H01J37/302 , H01J2237/0203 , H01J2237/043 , H01J2237/065 , H01J2237/22 , H01J2237/2441 , H01J2237/24455 , H01J2237/24507 , H01J2237/26 , H01J2237/262 , H01J2237/2802
摘要： The invention relates to a Method of protecting a direct electron detector (151) in a TEM. The invention involves predicting the current density on the detector before setting new beam parameters, such as changes to the excitation of condenser lenses (104), projector lenses (106) and/or beam energy. The prediction is made using an optical model or a Look-Up-Table. When the predicted exposure of the detector is less than a predetermined value, the desired changes are made, otherwise a warning message is generated and changes to the settings are postponed.
摘要翻译：本发明涉及一种在TEM中保护直接电子检测器（151）的方法。本发明涉及在设置新的光束参数之前预测检测器上的电流密度，例如对聚光透镜（104），投影透镜（106）和/或光束能量的激发的改变。使用光学模型或查找表进行预测。当检测器的预测曝光小于预定值时，进行所需的改变，否则产生警告消息并延迟对设置的改变。

35. 发明授权

US08129679B2 Method for discrimination of backscattered from incoming electrons in imaging electron detectors with a thin electron-sensitive layer 有权
标题翻译：在具有薄电子敏感层的成像电子检测器中鉴别背散射与入射电子的方法
公开(公告)号：US08129679B2
公开(公告)日：2012-03-06
申请号：US12823375
申请日：2010-06-25
申请人： Paul Mooney
发明人： Paul Mooney
IPC分类号： H01J37/22
CPC分类号： H01J37/05 , H01J37/244 , H01J37/26 , H01J2237/05 , H01J2237/2441 , H01J2237/24455 , H01J2237/24485 , H01J2237/26 , H01J2237/2802
摘要： Methods are disclosed for operating a device having a high energy particle detector wherein the particles create first incoming traversal events, outgoing backscatter events, higher-order in and out events and incoming events caused by particles which backscatter out of the device, hit nearby mechanical structures and are scattered back into the device. Exemplary method steps include discriminating incoming traversal events from outgoing backscatter events, higher-order in and out events and incoming events by limiting dose rate to a level at ensures that separate events do not overlap and discriminating events from background and from other events based on total energy in each event; discriminating backscatter events from incoming traversal events based on electron path shape; or determining that a first event and a second event are coincident with each other and separating incoming form backscatter events based on electron path shape and energy level.
摘要翻译：公开了用于操作具有高能量粒子检测器的装置的方法，其中颗粒产生第一进入的穿越事件，出射的后向散射事件，高阶进入和离开事件以及由反向散射出装置的颗粒引起的进入事件，撞击附近的机械结构并分散回设备。示例性方法步骤包括通过将剂量率限制到一个水平来区分进入的遍历事件与输出的后向散射事件，高阶进入和离开事件以及进入的事件，以确保单独的事件不会与基于总计的背景和来自其他事件的事件重叠和区分事件每个事件的能量; 基于电子路径形状鉴别反向散射事件与进入的穿越事件; 或者确定第一事件和第二事件彼此重合，并基于电子路径形状和能级分离入射形式的反向散射事件。

36. 发明授权

US08124933B2 Mapping-projection-type electron beam apparatus for inspecting sample by using electrons emitted from the sample 有权
标题翻译：用于通过使用从样品发射的电子来检查样品的映射投影型电子束装置
公开(公告)号：US08124933B2
公开(公告)日：2012-02-28
申请号：US12538416
申请日：2009-08-10
申请人： Kenji Watanabe , Takeshi Murakami , Masahiro Hatakeyama , Yoshinao Hirabayashi , Tohru Satake , Nobuhara Noji , Yuichiro Yamazaki , Ichirota Nagahama
发明人： Kenji Watanabe , Takeshi Murakami , Masahiro Hatakeyama , Yoshinao Hirabayashi , Tohru Satake , Nobuhara Noji , Yuichiro Yamazaki , Ichirota Nagahama
IPC分类号： H01J37/26
CPC分类号： H01J37/32211 , G01N23/225 , H01J37/32357 , H01J2237/2441 , H01J2237/2446
摘要： An apparatus capable of detecting defects of a pattern on a sample with high accuracy and reliability and at a high throughput, and a semiconductor manufacturing method using the same are provided. The electron beam apparatus is a mapping-projection-type electron beam apparatus for observing or evaluating a surface of the sample by irradiating the sample with a primary electron beam and forming on a detector an image of reflected electrons emitted from the sample. An electron impact-type detector such as an electron impact-type CCD or an electron impact-type TDI is used as the detector for detecting the reflected electrons. The reflected electrons are selectively detected from an energy difference between the reflected electrons and secondary electrons emitted from the sample. To eliminate charge-up caused on the sample surface by irradiation with the primary electron beam, the surface of the sample is covered with a cover placed above the sample and a gas is supplied to the space above the sample covered with the cover. The gas is brought into contact with the sample surface to reduce charge-up on the sample surface.
摘要翻译：提供了能够以高精度和可靠性以高产量检测样品上的图案的缺陷的装置，以及使用该缺陷的半导体制造方法。电子束装置是用于通过用一次电子束照射样品来观察或评价样品的表面的映射投影型电子束装置，并在检测器上形成从样品发射的反射电子的图像。作为检测反射电子的检测器，使用电子碰撞型CCD或电子碰撞型TDI等电子轰击型检测器。从反射电子和从样品发射的二次电子之间的能量差选择性地检测反射电子。为了通过照射一次电子束来消除样品表面上产生的电荷，样品的表面被放置在样品上方的盖子覆盖，并将气体供应到覆盖有覆盖物的样品上方。气体与样品表面接触以减少样品表面的充电。

37. 发明申请

US20110121176A1 SAMPLE INSPECTION METHODS, SYSTEMS AND COMPONENTS 有权
标题翻译：样本检查方法，系统和组件
公开(公告)号：US20110121176A1
公开(公告)日：2011-05-26
申请号：US12997686
申请日：2009-05-26
申请人： Sybren Sijbrandij , John A. Notte, IV , William B. Thompson
发明人： Sybren Sijbrandij , John A. Notte, IV , William B. Thompson
IPC分类号： G01N23/225
CPC分类号： G01N23/2251 , G01N23/2208 , G01N23/2258 , H01J37/244 , H01J37/28 , H01J2237/0807 , H01J2237/2441 , H01J2237/2444 , H01J2237/2445 , H01J2237/24475 , H01J2237/24485 , H01J2237/2449 , H01J2237/24585 , H01J2237/24592 , H01J2237/2803 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： The disclosure relates to sample inspection using an ion-beam microscope. In some embodiments, the disclosure involves the use of multiple detectors, each of which provides different information about a sample.
摘要翻译：本公开涉及使用离子束显微镜的样品检查。在一些实施例中，本公开涉及多个检测器的使用，每个检测器提供关于样品的不同信息。

38. 发明授权

US07851764B2 Method of high-energy particle imaging by computing a difference between sampled pixel voltages 有权
标题翻译：通过计算采样像素电压之间的差异来实现高能量粒子成像的方法
公开(公告)号：US07851764B2
公开(公告)日：2010-12-14
申请号：US12408586
申请日：2009-03-20
申请人： Liang Jin , Robert B. Bilhorn , Xuong Nguyen-Huu
发明人： Liang Jin , Robert B. Bilhorn , Xuong Nguyen-Huu
IPC分类号： G01T1/24
CPC分类号： H01J37/244 , H01J37/26 , H01J2237/2441 , H01J2237/24455 , H01J2237/24495 , H01L27/14659 , H04N5/32 , H04N5/3205
摘要： A method of high-energy particle imaging by individual particle counting with an active pixel direct bombardment detector. The method includes the step of providing an active pixel direct bombardment detector including an array of pixels. Each pixel is characterized by a reset time constant. The method further includes sampling the pixel voltage of each pixel at a first time. The method further includes applying a pixel reset voltage to each pixel for a reset time interval less than the reset time constant. The method further includes sampling the pixel voltage of each pixel at a second time. The method further includes computing a difference between the sampled pixel voltages at the first and second times. The sampling and the applying of the reset voltage may be periodic. A direct bombardment detector is also provided.
摘要翻译：用有源像素直接轰击检测器通过单个粒子计数的高能粒子成像的方法。该方法包括提供包括像素阵列的有源像素直接轰击检测器的步骤。每个像素的特征在于复位时间常数。该方法还包括在第一时间对每个像素的像素电压进行采样。该方法还包括在小于复位时间常数的复位时间间隔中对每个像素应用像素复位电压。该方法还包括在第二时间对每个像素的像素电压进行采样。该方法还包括计算第一次和第二次采样的像素电压之间的差异。复位电压的采样和施加可以是周期性的。还提供直接轰击检测器。

39. 发明申请

US20100224779A1 LAYERED SCANNING CHARGED PARTICLE MICROSCOPE PACKAGE FOR A CHARGED PARTICLE AND RADIATION DETECTOR 有权
标题翻译：用于带电粒子和辐射探测器的层状扫描粒子微粒包装
公开(公告)号：US20100224779A1
公开(公告)日：2010-09-09
申请号：US12718940
申请日：2010-03-05
申请人： Scott W. Indermuehle , Charles S. Silver , James P. Spallas , Lawrence P. Muray
发明人： Scott W. Indermuehle , Charles S. Silver , James P. Spallas , Lawrence P. Muray
IPC分类号： H01J37/28 , G01N23/22
CPC分类号： H01J37/28 , H01J37/244 , H01J2237/2441 , H01J2237/24435 , H01J2237/24465
摘要： A scanning charged particle microscope includes a layered charged particle beam column package; a sample holder; and a layered micro-channel plate detector package located between the column package and the sample holder.
摘要翻译：扫描带电粒子显微镜包括层状带电粒子束列封装; 样品架以及位于列封装和样品架之间的分层微通道板检测器封装。

40. 发明申请

US20100025579A1 APPARATUS AND METHOD INCLUDING A DIRECT BOMBARDMENT DETECTOR AND A SECONDARY DETECTOR FOR USE IN ELECTRON MICROSCOPY 有权
标题翻译：包括直接BOMBARDMENT检测器和用于电子显微镜的二次检测器的装置和方法
公开(公告)号：US20100025579A1
公开(公告)日：2010-02-04
申请号：US12184995
申请日：2008-08-01
申请人： Robert B. Bilhorn
发明人： Robert B. Bilhorn
IPC分类号： G01N23/00
CPC分类号： H01J37/244 , H01J37/26 , H01J2237/043 , H01J2237/15 , H01J2237/2441 , H01J2237/2443 , H01J2237/24455 , H01J2237/2447
摘要： An apparatus for use with an electron beam for imaging a sample. The apparatus has a down-conversion detector configured to detect an electron microscopy signal generated by the electron beam incident on the sample, a direct bombardment detector adjacent to the down-conversion detector and configured to detect the electron microscopy signal, and a mechanism selectively exposing the down-conversion detector and the direct bombardment detector to the electron microscopy signal. A method using the apparatus is also provided.
摘要翻译：一种用于电子束用于成像样品的装置。该装置具有下变换检测器，其被配置为检测由入射在样品上的电子束产生的电子显微镜信号，与下变频检测器相邻的直接轰击检测器，并且被配置为检测电子显微镜信号，以及选择性地暴露下转换检测器和直接轰击检测器到电子显微镜信号。还提供了使用该装置的方法。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式