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    • 32. 发明申请
    • METHOD FOR MANUFACTURING GRAPHENE FILM, GRAPHENE FILM MANUFACTURED BY SAME, ELECTRONIC DEVICE COMPRISING THE GRAPHENE FILM
    • 制造石墨膜的方法,由其制造的石墨膜,包含石墨膜的电子器件
    • US20150098891A1
    • 2015-04-09
    • US14456550
    • 2014-08-11
    • KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY
    • Yong Won SONGJae Hyun PARK
    • C01B31/04C23C16/46C23C16/26
    • C01B31/0453C01B32/186C01B32/194
    • A method for manufacturing graphene is provided, comprising (1) introducing a supporting substrate in a reactor; (2) preparing (nano) crystalline alumina catalyst having catalytic activity on the supporting substrate to prepare an insulating substrate; (3) growing nano graphenes on the insulating substrate to manufacture graphene film comprising graphene layer of the nano graphenes, which are grown without use of metal catalyst substantially. The graphene layer composed of the nano graphene has spatially homogeneous structural and electrical properties even in synthesis as large area and can be applied to flexible electronic devices.In addition, as it has easy detachment of the substrate and the graphene film and can detach the graphene film without damage of the substrate, leaving no residual graphene on the substrate, it is possible to grow the nano graphene by reusing the substrate.
    • 提供了一种制造石墨烯的方法,包括(1)在反应器中引入支撑基底; (2)制备在支撑基板上具有催化活性的(纳米)结晶氧化铝催化剂以制备绝缘基板; (3)在绝缘基板上生长纳米石墨烯以制造包含纳米石墨烯的石墨烯层的石墨烯膜,其基本上不使用金属催化剂而生长。 由纳米石墨烯组成的石墨烯层即使在大面积的合成中也具有空间均匀的结构和电性能,并且可以应用于柔性电子器件。 此外,由于基板和石墨烯膜易于脱离,并且可以在不损坏基板的情况下分离石墨烯膜,在基板上不留下剩余的石墨烯,因此可以通过重新使用基板来生长纳米石墨烯。
    • 38. 发明申请
    • GRAPHENE DEFECT ALTERATION
    • 石墨缺陷修正
    • US20130071564A1
    • 2013-03-21
    • US13377971
    • 2011-09-16
    • Seth Miller
    • Seth Miller
    • C23C16/30C23C16/56B82Y40/00
    • C01B31/0453B82Y30/00B82Y40/00C01B32/186C01B32/194C23C16/00
    • Technologies are generally described for a method and system configured effective to alter a defect area in a layer on a substrate including graphene. An example method may include receiving and heating the layer to produce a heated layer and exposing the heated layer to a first gas to produce a first exposed layer, where the first gas may include an amine. The method may further include exposing the first exposed layer to a first inert gas to produce a second exposed layer and exposing the second exposed layer to a second gas to produce a third exposed layer where the second gas may include an alane or a borane. Exposure of the second exposed layer to the second gas may at least partially alter the defect area.
    • 一般描述了一种方法和系统的技术,该方法和系统被配置为有效地改变包括石墨烯在内的衬底上的层中的缺陷区域。 示例性方法可以包括接收和加热层以产生加热层并将加热层暴露于第一气体以产生第一暴露层,其中第一气体可以包括胺。 该方法还可以包括将第一暴露层暴露于第一惰性气体以产生第二暴露层,并将第二暴露层暴露于第二气体以产生第三暴露层,其中第二气体可包括丙烷或硼烷。 第二暴露层暴露于第二气体可以至少部分地改变缺陷区域。