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    • 34. 发明授权
    • Profiles for precursors to polymeric materials
    • 聚合材料前体型材
    • US09333675B2
    • 2016-05-10
    • US14621216
    • 2015-02-12
    • HZO, Inc.
    • James Dempster
    • C23C16/00B29B13/00B29D22/00B05D1/00C23C16/30B29K23/00
    • C23C14/06B05D1/60B29B13/00B29D22/003B29K2023/38C23C16/30Y10T428/1352
    • Methods for obtaining a profile for a batch, or lot, of a precursor material and using the profile while processing the precursor material to form a polymer are disclosed. In such a method, a process profile that corresponds to the characteristics of a particular precursor material (e.g., the batch, etc.) may be generated. That process profile may then be used to cause a material processing system to process the precursor material in a manner that accounts for differences between that precursor material and a “standard” precursor material, while providing a polymer and, optionally, a film of “standard” quality. Apparatuses and systems that are configured to obtain profile data for a batch of precursor material, generate or modify a process profile based on the profile data and use the process profile to form a polymer are also disclosed.
    • 公开了用于获得前体材料的批次或批次的轮廓以及在处理前体材料以形成聚合物时使用轮廓的方法。 在这种方法中,可以产生对应于特定前体材料(例如,批次等)的特性的工艺曲线。 然后可以使用该工艺简档来使材料处理系统以考虑到该前体材料与“标准”前体材料之间的差异的方式来处理前体材料,同时提供聚合物和任选的“标准 “质量。 还公开了被配置为获得一批前体材料的轮廓数据的设备和系统,基于轮廓数据生成或修改过程轮廓并使用该过程轮廓以形成聚合物。
    • 35. 发明授权
    • Precursor supplies, material processing systems with which precursor supplies are configured to be used and associated methods
    • 前体供应品,材料处理系统,其前体供应被配置为使用和相关方法
    • US09156055B2
    • 2015-10-13
    • US13737737
    • 2013-01-09
    • HZO, Inc.
    • Blake StevensMax SorensonLiulei Cao
    • B05C11/00B65B1/04B05C11/10B05D1/00
    • B05C11/10B05D1/60B65B1/04G05B19/4155G05B2219/40361Y10T428/1352
    • In various aspects and embodiments, the present disclosure relates to the manner in which precursor materials are provided to processing equipment and, more specifically, to the manner in which precursor materials of organic polymers are delivered to systems for forming and, in some embodiments, depositing the organic polymers. In one aspect, the disclosure relates to precursor supplies, which comprise vehicles, such as binders, supports and cartridges, for delivering a precursor material to a material processing system, such as a deposition system or other processing equipment. In another aspect, the disclosure relates to material processing systems with which the precursor supplies are configured to be used. Methods for preparing precursor supplies, using precursor supplies, providing process control, and recycling precursor supplies are also disclosed.
    • 在各方面和实施方案中,本公开涉及将前体材料提供给加工设备的方式,更具体地,涉及将有机聚合物的前体材料递送到用于成型的系统的方式,并且在一些实施方案中,沉积 有机聚合物。 在一个方面,本公开涉及前体供应,其包括用于将前体材料输送到诸如沉积系统或其它加工设备的材料处理系统的载体,例如粘合剂,支撑体和筒。 在另一方面,本公开涉及前体供应被配置为使用的材料处理系统。 还公开了用于制备前体供应品,使用前体供应品,提供过程控制和再循环前体供应品的方法。
    • 37. 发明申请
    • PROGRESSIVE MOISTURE DETECTION
    • 进行水分检测
    • US20140260571A1
    • 2014-09-18
    • US14213175
    • 2014-03-14
    • HzO, Inc.
    • Blake Stevens
    • G01D7/00
    • G01N19/10G01D7/005G01N21/81G01N31/222
    • A progressive, or graded, passive moisture detector is configured to provide an indication of the amount of moisture to which a moisture-sensitive substrate has been exposed, a duration of time that a moisture-sensitive substrate has been exposed to moisture or the effectiveness of one or more protective coatings at preventing moisture-sensitive components from being exposed to moisture. A progressive passive moisture detector includes a plurality of different passive moisture detectors with different properties. The passive moisture detectors may be arranged in a manner (e.g., a sequence, etc.) that correlates to information the progressive passive moisture detector is intended to provide.
    • 渐进式或分级的被动湿度检测器被配置为提供湿气基底暴露于的水分量的指示,湿气感受性基底暴露于水分的持续时间或有效性 一种或多种保护性涂层,以防止湿度敏感组分暴露于水分。 渐进的被动湿度检测器包括具有不同性质的多个不同的被动湿度检测器。 被动湿度检测器可以以与逐渐被动湿度检测器旨在提供的信息相关联的方式(例如,序列等)来布置。
    • 39. 发明申请
    • VAPOR PORTS FOR ELECTRONIC DEVICES
    • 电子设备蒸汽口
    • US20140160680A1
    • 2014-06-12
    • US14103768
    • 2013-12-11
    • HzO, Inc.
    • Blake Stevens
    • H05K7/20H05K5/02
    • H05K5/0213G06F1/203H04M1/18H05K5/068H05K7/20009
    • An electronic device that has components is provided with a housing that defines an exterior and an interior of the electronic device. The housing includes a vapor port that prevents ingress of liquid through the vapor port from the exterior of the electronic device to the interior of the electronic device. The vapor port also permits egress of vapor through the vapor port from the interior of the electronic device to the exterior of the electronic device. The vapor port may include a breathable, but water-resistant or waterproof barrier to prevent water from entering through barrier while enabling water vapor to exit through the barrier and, thus, the vapor port.
    • 具有部件的电子设备设置有限定电子设备的外部和内部的壳体。 外壳包括一个蒸气端口,其防止液体通过蒸汽端口从电子设备的外部进入电子设备的内部。 蒸气端口也允许蒸汽从电子设备的内部到电子设备的外部通过蒸汽端口排出。 蒸气端口可以包括透气但是防水或防水的屏障,以防止水通过屏障进入,同时使水蒸气能够通过隔离物从而从蒸气端口排出。
    • 40. 发明申请
    • APPARATUSES, SYSTEMS AND METHODS FOR APPLYING PROTECTIVE COATINGS TO ELECTRONIC DEVICE ASSEMBLIES
    • 将保护涂层应用于电子设备组件的设备,系统和方法
    • US20130251889A1
    • 2013-09-26
    • US13849790
    • 2013-03-25
    • HZO, INC.
    • Dana CoxMax SorensonJames Kent Naylor
    • C23C16/02
    • C23C16/02B05D1/60H01L21/6715H01L21/6776
    • A coating apparatus may be configured to concurrently receive and waterproof a large number of electronic device assemblies. The coating apparatus may include a track for transporting the electronic device assemblies into an application station. The application station may have a cubic shape, and include an entry door and an opposite exit door. The entry and exit doors may enable the introduction of substrates into the application station, as well as their removal from the application station. In addition, the entry and exit doors may enable isolation of the application station from an exterior environment and, thus, provide control over the conditions under which a moisture resistant material is applied to the substrates. Methods for making electronic devices and other substrates resistant to moisture are also disclosed.
    • 涂覆设备可以被配置为同时接收和防水大量的电子设备组件。 涂覆设备可以包括用于将电子设备组件运送到应用站中的轨道。 应用站可以具有立方体形状,并且包括入口门和相对的出口门。 入口和出口门可以使基材引入到应用站以及从应用站移除。 此外,入口和出口门可以使得应用站与外部环境隔离,并且因此提供对防潮材料施加到基板的条件的控制。 还公开了制造电子器件和其它耐水分的基片的方法。