会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 31. 发明申请
    • ONE TIME PROGRAMMABLE MEMORY CELL AND METHOD FOR PROGRAMING AND READING A MEMORY ARRAY COMPRISING THE SAME
    • 一个可编程存储器单元和用于编程和读取包含该存储器单元的存储器阵列的方法
    • US20150243366A1
    • 2015-08-27
    • US14697652
    • 2015-04-28
    • eMemory Technology Inc.
    • Meng-Yi WuChih-Hao HuangHsin-Ming Chen
    • G11C17/16H01L27/112H01L29/78G11C17/18
    • G11C17/16G11C17/18H01L23/5252H01L27/101H01L27/11206H01L27/11286H01L29/7833H01L2924/0002H01L2924/00
    • The present invention provides a one time programmable (OTP) memory cell including a select gate transistor, a following gate transistor, and an antifuse varactor. The select gate transistor has a first gate terminal, a first drain terminal, a first source terminal, and two first source/drain extension areas respectively coupled to the first drain terminal and the first source terminal. The following gate transistor has a second gate terminal, a second drain terminal, a second source terminal coupled to the first drain terminal, and two second source/drain extension areas respectively coupled to the second drain terminal and the second source terminal. The antifuse varactor has a third gate terminal, a third drain terminal, a third source terminal coupled to the second drain terminal, and a third source/drain extension area coupled with the third drain terminal and the third source terminal for shorting the third drain terminal and the third source terminal.
    • 本发明提供一种包括选择栅极晶体管,随后的栅极晶体管和反熔丝变容二极管的一次性可编程(OTP)存储单元。 选择栅极晶体管具有分别耦合到第一漏极端子和第一源极端子的第一栅极端子,第一漏极端子,第一源极端子和两个第一源极/漏极扩展区域。 以下栅极晶体管具有分别耦合到第二漏极端子和第二源极端子的两个第二源极/漏极延伸区域的第二栅极端子,第二漏极端子,耦合到第一漏极端子的第二源极端子。 反熔丝变容二极管具有第三栅极端子,第三漏极端子,耦合到第二漏极端子的第三源极端子和与第三漏极端子和第三源极端子耦合的第三源极/漏极扩展区域,用于短路第三漏极端子 和第三源终端。
    • 40. 发明授权
    • Method of fabricating erasable programmable single-poly nonvolatile memory
    • 制造可擦除可编程单一多晶硅非易失性存储器的方法
    • US09099392B2
    • 2015-08-04
    • US13941814
    • 2013-07-15
    • eMemory Technology Inc.
    • Te-Hsun HsuHsin-Ming ChenWen-Hao ChingWei-Ren Chen
    • H01L21/28H01L29/40H01L27/115
    • H01L21/28H01L27/11558H01L27/1156H01L29/401
    • The present invention provides a method of fabricating an erasable programmable single-poly nonvolatile memory, comprising the steps of: defining a first area and a second area in a first type substrate; forming a second type well region in the first area; forming a first gate oxide layer and a second gate oxide layer covering a surface of the first area, wherein the second gate oxide layer extends to and is adjacent to the second area; forming a DDD region in the second area; etching a portion of the second gate oxide layer above the second area; forming two polysilicon gates covering the first and the second gate oxide layers; and defining a second type doped region in the DDD region and defining first type doped regions in the second type well region.
    • 本发明提供一种制造可擦除可编程单多晶非易失性存储器的方法,包括以下步骤:在第一类型衬底中限定第一区域和第二区域; 在所述第一区域中形成第二类型井区域; 形成覆盖所述第一区域的表面的第一栅极氧化物层和第二栅极氧化物层,其中所述第二栅极氧化物层延伸到所述第二区域并邻近所述第二区域; 在第二区域中形成DDD区域; 在所述第二区域上方蚀刻所述第二栅极氧化物层的一部分; 形成覆盖所述第一和第二栅极氧化物层的两个多晶硅栅极; 以及限定所述DDD区域中的第二类型掺杂区域并限定所述第二类型阱区域中的第一类型掺杂区域。