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    • 37. 发明授权
    • Tunneling emitters and method of making
    • 隧道发射器和制作方法
    • US06806488B2
    • 2004-10-19
    • US10389556
    • 2003-03-13
    • Sriram RamamoorthiZhizhang Chen
    • Sriram RamamoorthiZhizhang Chen
    • H01L2906
    • B82Y10/00G11C11/23H01J1/312H01J9/025
    • An emitter has an electron supply layer and a tunneling layer formed on the electron supply layer. Optionally, an insulator layer is formed on the electron supply layer and has openings defined within in which the tunneling layer is formed. A cathode layer is formed on the tunneling layer. A conductive layer is partially disposed on the cathode layer and partially on the insulator layer if present. The conductive layer defines an opening to provide a surface for energy emissions of electrons and/or photons. Preferably but optionally, the emitter is subjected to an annealing process thereby increasing the supply of electrons tunneled from the electron supply layer to the cathode layer.
    • 发射体具有形成在电子供给层上的电子供给层和隧道层。 可选地,在电子供给层上形成绝缘体层,并且在其内形成有形成有隧道层的开口。 在隧道层上形成阴极层。 导电层部分地设置在阴极层上,部分地设置在绝缘体层上,如果存在的话。 导电层限定一个开口以提供用于电子和/或光子的能量发射的表面。 优选但是可选地,对发射极进行退火处理,从而增加从电子供给层向阴极层隧穿的电子的供应。
    • 38. 发明授权
    • Method for low temperature plasma enhanced chemical vapor deposition
(PECVD) of an oxide and nitride antireflection coating on silicon
    • 硅上氧化物和氮化物抗反射涂层的低温等离子体增强化学气相沉积(PECVD)方法
    • US5418019A
    • 1995-05-23
    • US248473
    • 1994-05-25
    • Zhizhang ChenAjeet Rohatgi
    • Zhizhang ChenAjeet Rohatgi
    • C23C16/34C23C16/40C23C16/56G02B1/11B05D3/06G02B5/26
    • H01L31/02168C23C16/345C23C16/402C23C16/56G02B1/115Y02E10/50
    • A sequential plasma-enhanced chemical vapor deposition (PECVD) of SiN and SiO.sub.x produces a very effective double-layer antireflection coating. This antireflection coating is compared with the frequently used and highly efficient double-layer MgF.sub.2 /ZnS coating. It is shown that the double-layer SiO.sub.x /SiN coating improves the short-circuited current (J.sub.sc) by 47%, open-circuit voltage (V.sub.oc) by 3.7%, and efficiency (Eff) by 55% for silicon cells with oxide surface passivation. The counterpart MgF.sub.2 /ZnS coating gives smaller improvement in V.sub.oc and Eff. However, if silicon cells do not have the oxide passivation, the PECVD SiO.sub.x /SiN gives much greater improvement in the cell parameters, 57% in J.sub.sc, 8% in V.sub.oc, and 66% in efficiency, compared to the MgF.sub.2 /ZnS coating which improves J.sub.sc by 50%, V.sub.oc by 2%, and cell efficiency by 54%. This significant additional improvement results from the PECVD deposition-induced surface/defect passivation. The internal quantum efficiency (IQE) measurements showed that the PECVD SiO.sub.x /SiN coating absorbs fair amount of photons in the short-wavelength range (
    • SiN和SiOx的顺序等离子体增强化学气相沉积(PECVD)产生非常有效的双层抗反射涂层。 将该抗反射涂层与经常使用且高效的双层MgF2 / ZnS涂层进行比较。 显示双层SiOx / SiN涂层将氧化物表面的硅电池的短路电流(Jsc)提高了47%,开路电压(Voc)提高了3.7%,效率(Eff)提高了55% 钝化。 对应的MgF2 / ZnS涂层在Voc和Eff方面提供较小的改进。 然而,如果硅电池不具有氧化物钝化,则与MgF 2 / ZnS涂层相比,PECVD SiO x / SiN在电池参数方面提供了更大的改进,在Jsc中为57%,Voc为8%,效率为66% 将Jsc提高50%,Voc提高2%,电池效率提高54%。 这种显着的附加改进来自于PECVD沉积诱导的表面/缺陷钝化。 内部量子效率(IQE)测量表明,PECVD SiOx / SiN涂层在短波长范围(<500 nm)吸收了相当数量的光子,然而,改进的表面/缺陷钝化比补偿Jsc和 与MgF2 / ZnS涂层相比,电池效率提高了很多。
    • 40. 发明授权
    • Impulse ultra-wideband radio communication system
    • 脉冲超宽带无线电通信系统
    • US08023571B2
    • 2011-09-20
    • US12103117
    • 2008-04-15
    • Hong NieZhizhang Chen
    • Hong NieZhizhang Chen
    • H04L27/00
    • H04B1/719H04B1/71637
    • A method and apparatus are provided for implementing an impulse ultra-wideband communications system which combines the technique of transmitted reference (TR) with a code-sifted reference scheme that separates the reference and the data pulses with a sequence of codes such as a subset of Walsh codes. The combination of the two techniques in ultra-wideband (UWB) radio systems removes the wideband delay elements required by conventional TR UWB systems. The invention provides a system with no analog carriers and lower complexities than other UWB systems, and which has better performances, higher tolerance to nonlinearity, and larger capacities.
    • 提供了一种用于实现脉冲超宽带通信系统的方法和装置,该脉冲超宽带通信系统将传输参考(TR)的技术与使用诸如子集的子序列分离参考和数据脉冲的代码筛选参考方案进行组合 沃尔什码 超宽带(UWB)无线电系统中的两种技术的组合消除了传统TR UWB系统所需的宽带延迟元件。 本发明提供了一种没有模拟载波和比其他UWB系统更低复杂度的系统,其具有更好的性能,更高的对非线性的容忍性和更大的容量。