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31. 发明申请

US20100197201A1 POLISHING LIQUID FOR METAL AND METHOD OF POLISHING 失效
标题翻译：金属抛光液和抛光方法
公开(公告)号：US20100197201A1
公开(公告)日：2010-08-05
申请号：US12670292
申请日：2008-07-28
申请人： Yutaka Nomura , Masato Fukasawa , Hiroshi Nakagawa
发明人： Yutaka Nomura , Masato Fukasawa , Hiroshi Nakagawa
IPC分类号： B24B1/00 , C09K13/00 , C09K13/06
CPC分类号： H01L21/3212 , C09G1/02 , C09K3/1463
摘要： Disclosed is a metal-polishing liquid comprising: a metal-oxide-dissolving agent; a metal-oxidizing agent; a metal anticorrosive; a water-soluble polymer having a weight-average molecular weight of 8,000 or higher and having an anionic functional group and a nonionic functional group; and water, and having a pH within the range of 2.5 or higher but 5.0 or less. The metal-polishing liquid is effective in reducing the frictional force in polishing which generates during CMP. And is highly effective in flattening the surface of a work to be polished.
摘要翻译：公开了一种金属抛光液，其包含：金属氧化物溶解剂; 金属氧化剂; 金属防腐; 重均分子量为8000以上且具有阴离子官能团和非离子官能团的水溶性聚合物; 和水，并且pH在2.5以上至5.0以下的范围内。金属抛光液有效减少在CMP期间产生的抛光摩擦力。并且对于要抛光的工件的表面变平，是非常有效的。

32. 发明授权

US07369120B2 Input pointer and input device 失效
标题翻译：输入指针和输入设备
公开(公告)号：US07369120B2
公开(公告)日：2008-05-06
申请号：US10874689
申请日：2004-06-24
申请人： Yutaka Nomura
发明人： Yutaka Nomura
IPC分类号： G09G5/08
CPC分类号： G06F3/03543
摘要： An input pointer includes two top-surface switches and a rotary switch on the top surface of the main body, a protrusion on an imaginary center line on the bottom surface of the main body, and two bottom-surface switches at the sides of the protrusion. The two top-surface switches and the rotary switch are turned ON when pressed by a user's finger, whereas the bottom-surface switches are turned ON when the main body is tilted about the protrusion.
摘要翻译：输入指针包括两个顶表面开关和主体顶表面上的旋转开关，在主体底表面上的假想中心线上的突起，以及突出部分两侧的两个底面开关。当用户的手指按压时，两个顶表面开关和旋转开关被打开，而当主体围绕突起倾斜时，底面开关被接通。

33. 发明申请

US20070147551A1 Abrasive-free polishing slurry and CMP process 审中-公开
标题翻译：无磨料抛光浆和CMP工艺
公开(公告)号：US20070147551A1
公开(公告)日：2007-06-28
申请号：US11643691
申请日：2006-12-22
申请人： Katsumi Mabuchi , Haruo Akahoshi , Masanobu Habiro , Takafumi Sakurada , Yutaka Nomura
发明人： Katsumi Mabuchi , Haruo Akahoshi , Masanobu Habiro , Takafumi Sakurada , Yutaka Nomura
IPC分类号： H03D1/00
CPC分类号： C09G1/04
摘要： A CMP slurry is mixed with an oxidant in polishing and contains a copper rust inhibitor, a water-soluble polymer, a pH controller capable of forming a complex with copper, and water, and is substantially free from abrasive. The CMP slurry effectively reduces dishing in chemical polishing of copper and forms reliable wiring. Preferably, the contents of the rust inhibitor, the water-soluble polymer, and the oxidant are 0.1 to 5 wt %, 0.05 to 5 wt %, and 0.01 to 5M relative to 1 liter of the CMP slurry, respectively, and the amount of the pH controller is a necessary amount for adjusting pH of the CMP slurry to 1.5 to 2.5.
摘要翻译：将CMP浆料与抛光中的氧化剂混合，并含有铜锈病抑制剂，水溶性聚合物，能够与铜形成络合物的pH控制剂和水，并且基本上不含研磨剂。 CMP浆料有效减少了铜化学抛光中的凹陷，形成了可靠的布线。防锈剂，水溶性聚合物和氧化剂的含量优选分别相对于1升CMP浆料为0.1〜5重量％，0.05〜5重量％，0.01〜5微米， pH控制器是将CMP浆料的pH调节至1.5至2.5的必需量。

34. 发明授权

US5773437A Alkylenediamine derivatives 失效
标题翻译：烷二胺衍生物
公开(公告)号：US5773437A
公开(公告)日：1998-06-30
申请号：US722112
申请日：1996-09-30
申请人： Mitsuo Masaki , Norihisa Miyake , Atsushi Tendo , Michiko Ishida , Haruhiko Shinozaki , Yutaka Nomura , Yasunori Goto
发明人： Mitsuo Masaki , Norihisa Miyake , Atsushi Tendo , Michiko Ishida , Haruhiko Shinozaki , Yutaka Nomura , Yasunori Goto
IPC分类号： C07D275/06 , C07D279/02 , C07D417/06 , A61K31/54
CPC分类号： C07D275/06 , C07D279/02 , C07D279/08 , C07D417/06
摘要： The present invention relates to alkylenediamine derivatives which relieve urinating contraction and therefore are of value as active ingredients of therapeutic agents for treating dysuria.
摘要翻译： PCT No.PCT / JP95 / 00632 Sec。 371日期1996年9月30日 102（e）日期1996年9月30日PCT提交1995年3月31日PCT公布。第WO95 / 26959号公报日期1995年10月12日本发明涉及缓解小便收缩的亚烷基二胺衍生物，因此具有治疗排尿困难的治疗剂的有效成分的价值。

35. 发明授权

US5576341A 2-[[2-(N-isobutyl-N-methyl)amino]benzylsulfinyl]-benzimidazole as antimicrobial agent 失效
标题翻译： 2 - [[2-（N-异丁基-N-甲基）氨基]苄基亚磺酰基] - 苯并咪唑作为抗微生物剂
公开(公告)号：US5576341A
公开(公告)日：1996-11-19
申请号：US228750
申请日：1994-04-18
申请人： Mitsuo Masaki , Tomio Yamakawa , Yutaka Nomura , Hitoshi Matsukura
发明人： Mitsuo Masaki , Tomio Yamakawa , Yutaka Nomura , Hitoshi Matsukura
IPC分类号： A01N43/50 , A01N43/52 , A61K31/415
CPC分类号： A61K31/415
摘要： 2-[[2-(N-Isobutyl-N-methyl)amino]benzylsulfinyl]benzimidazole is effective for treating or preventing Helicobacter infections by administration to patients suffering from the infection.
摘要翻译： 2 - [[2-（N-异丁基-N-甲基）氨基]苄基亚磺酰基]苯并咪唑通过给患者感染而治疗或预防幽门螺杆菌感染是有效的。

36. 发明授权

US5382689A Process for preparation of bevantolol hydrochloride 失效
标题翻译：盐酸比卡洛尔的制备方法
公开(公告)号：US5382689A
公开(公告)日：1995-01-17
申请号：US955328
申请日：1992-10-01
申请人： Yutaka Nomura
发明人： Yutaka Nomura
IPC分类号： C07C213/04 , C07C213/10 , C07C217/60 , C07C209/16
CPC分类号： C07C217/60 , C07C213/04
摘要： Disclosed is a new process for preparing bevantolol hydrochloride suitable for industrial production in which bevantolol hydrochloride can be obtained in a high yield and HVA of an expensive material can be recovered. The process for the preparation of bevantolol hydrochloride comprises the steps of: causing 3-(m-tolyloxy)-1,2-epoxypropane (TOEP) to react with .beta.-(3,4-dimethoxyphenyl)ethylamine (HVA) of excess mole per mole of said TOEP; dissolving the reaction mixture in a halogenated hydrocarbon to give a solution; mixing the solution with hydrochloric acid; separating an organic layer from the resulting mixture; and obtaining 1-[(3,4-dimethoxyphenethyl)amino]-3-(m-tolyloxy)-2-propanol hydrochloride from the organic layer.
摘要翻译：公开了一种适用于工业生产的盐酸替卡洛尔的新方法，其中可以以高产率获得盐酸别卡托洛尔，并且可以回收昂贵材料的HVA。制备盐酸替卡洛尔的方法包括以下步骤：使3-（间甲酰氧基）-1,2-环氧丙烷（TOEP）与过量摩尔的β-（3,4-二甲氧基苯基）乙胺（HVA）反应所述TOEP的摩尔数; 将反应混合物溶解在卤代烃中得到溶液; 将溶液与盐酸混合; 从所得混合物中分离有机层; 从有机层中得到1 - [（3,4-二甲氧基苯乙基）氨基] -3-（间甲氧基）-2-丙醇盐酸盐。

37. 发明授权

US5091403A Sulfinyl imidazole derivatives and antiulcer agents containing the same 失效
标题翻译：磺酰胺咪唑衍生物和含有其的抗体药剂
公开(公告)号：US5091403A
公开(公告)日：1992-02-25
申请号：US565975
申请日：1990-08-10
申请人： Susumu Okabe , Mitsuo Masaki , Tomio Yamakawa , Hitoshi Matsukura , Yutaka Nomura
发明人： Susumu Okabe , Mitsuo Masaki , Tomio Yamakawa , Hitoshi Matsukura , Yutaka Nomura
IPC分类号： F16J15/32 , A61K31/415 , A61K31/4164 , A61P1/04 , A61P35/00 , C07D233/84 , F16C33/78
CPC分类号： C07D233/84
摘要： Disclosed are novel imidazole derivatives having the formula: ##STR1## wherein R.sup.1 is hydrogen or an alkyl group having 1-6 carbon atoms, R.sup.2 is an alkyl group having 2-6 carbon atoms substituted with an alkoxy group having 1-4 carbon atoms, each of R.sup.3, R.sup.4, R.sup.5 and R.sup.6 independently is hydrogen, a halogen, an alkyl group having 1-6 carbon atoms, an alkoxy group having 1-6 carbon atoms, a fluorine-substituted alkyl group having 1-6 carbon atoms, or a fluorine-substituted alkoxy group having 1-6 carbon atoms. The new imidazole derivatives are effective particularly as anti-ulcer agents.

38. 发明授权

US09096962B2 Sewing machine, embroidery unit, and non-transitory computer-readable medium storing sewing machine control program 有权
标题翻译：缝纫机，绣花机和非暂时性计算机可读介质存储缝纫机控制程序
公开(公告)号：US09096962B2
公开(公告)日：2015-08-04
申请号：US13788893
申请日：2013-03-07
申请人： Akie Shimizu , Satoru Makino , Yuki Ihira , Daisuke Abe , Yoshinori Nakamura , Satoru Ichiyanagi , Yutaka Nomura
发明人： Akie Shimizu , Satoru Makino , Yuki Ihira , Daisuke Abe , Yoshinori Nakamura , Satoru Ichiyanagi , Yutaka Nomura
IPC分类号： D05B19/12 , D05C5/02
CPC分类号： D05B19/12 , D05C5/02
摘要： A sewing machine includes at least one detecting portion, a processor, and a memory. The at least one detecting portion is configured to detect an ultrasonic wave that has been transmitted from a transmission source. The memory is configured to store computer-readable instructions that instruct the sewing machine to execute steps including identifying a position of the transmission source of the ultrasonic wave based on information pertaining to the ultrasonic wave that has been detected by the at least one detecting portion, and controlling sewing based on the position of the transmission source that has been identified.
摘要翻译：缝纫机包括至少一个检测部分，处理器和存储器。所述至少一个检测部被配置为检测从发送源发送的超声波。存储器被配置为存储指示缝纫机执行包括基于由至少一个检测部分检测到的超声波的信息来识别超声波的发送源的位置的计算机可读指令，并且基于已识别的发送源的位置来控制缝制。

39. 发明授权

US08904947B2 Sewing machine 有权
标题翻译：缝纫机
公开(公告)号：US08904947B2
公开(公告)日：2014-12-09
申请号：US13788903
申请日：2013-03-07
申请人： Yoshio Nishimura , Satoru Ichiyanagi , Yutaka Nomura , Yoshinori Nakamura , Yuki Ihira , Daisuke Abe , Akie Shimizu
发明人： Yoshio Nishimura , Satoru Ichiyanagi , Yutaka Nomura , Yoshinori Nakamura , Yuki Ihira , Daisuke Abe , Akie Shimizu
IPC分类号： D05B21/00 , D05B19/12 , D05C5/02
CPC分类号： D05B19/12
摘要： A sewing machine includes a sewing portion, a detector, a processor, and a memory. The sewing portion includes a needle bar and a transport portion. The needle bar is configured to have a sewing needle on a lower end. The transport portion is configured to move a work cloth. The detector is configured to detect ultrasonic waves. The memory stores computer-readable instructions that instruct the processor to perform specifying a position of a transmission source of the ultrasonic waves based on the ultrasonic waves that are detected by the detector, specifying sewing information based on the specified position of the transmission source, the sewing information being information that pertains to sewing, and controlling the sewing portion based on the specified sewing information.
摘要翻译：缝纫机包括缝制部分，检测器，处理器和存储器。缝制部包括针杆和输送部。针杆配置为在下端具有缝合针。运输部分构造成移动工作布。检测器被配置为检测超声波。存储器存储指示处理器基于由检测器检测到的超声波来指定超声波的发送源的位置的指定的计算机可读指令，基于发送源的指定位置来指定缝制信息，作为缝制的信息的缝制信息，以及基于指定的缝制信息来控制缝制部。

40. 发明授权

US08791019B2 Metal polishing slurry and method of polishing a film to be polished 有权
标题翻译：金属抛光浆料及抛光方法
公开(公告)号：US08791019B2
公开(公告)日：2014-07-29
申请号：US12159419
申请日：2006-12-27
申请人： Yutaka Nomura , Hiroshi Nakagawa , Sou Anzai , Ayako Tobita , Takafumi Sakurada , Katsumi Mabuchi
发明人： Yutaka Nomura , Hiroshi Nakagawa , Sou Anzai , Ayako Tobita , Takafumi Sakurada , Katsumi Mabuchi
IPC分类号： H01L21/306 , C11D11/00 , H01L21/321 , C09G1/02
CPC分类号： C11D11/0047 , C09G1/02 , C09K3/1463 , H01L21/3212
摘要： The present invention provides a metal polishing liquid capable of CMP at a high Cu polishing rate and solving the problems: (a) generation of scratches attributable to solid particles, (b) generation of deteriorations in flatness such as dishing and erosion, (c) complexity in a washing process for removing abrasive particles remaining on the surface of a substrate after polishing, and (d) higher costs attributable to the cost of a solid abrasive itself and to waste liquid treatment, as well as a method of polishing a film to be polished by using the same. Disclosed are a metal polishing liquid which comprises a metal oxidizer, a metal oxide solubilizer, a metal anticorrosive, and a water-soluble polymer having an anionic functional group with a weight-average molecular weight of 8,000 or more and has pH 1 or more to 3 or less, and a method of polishing a film to be polished, which comprises supplying the above metal polishing liquid onto a polishing cloth of a polishing platen and simultaneously relatively moving the polishing platen and a substrate having a metallic film to be polished while the substrate is pressed against the polishing cloth.
摘要翻译：本发明提供一种能够以高Cu抛光速率进行CMP处理的金属抛光液，并且解决了以下问题：（a）产生由固体颗粒引起的划痕，（b）产生诸如凹陷和腐蚀的平坦度的劣化，（c）用于去除抛光后残留在基材表面上的磨料颗粒的洗涤过程中的复杂性，以及（d）由于固体磨料本身的成本和废液处理造成的更高成本，以及抛光膜的方法通过使用它来抛光。公开了一种金属抛光液，其包含金属氧化剂，金属氧化物增溶剂，金属防腐蚀剂和具有重均分子量为8000以上的阴离子官能团的水溶性聚合物，其pH为1以上至 3以下，以及抛光被研磨膜的方法，该方法包括将上述金属抛光液供给到研磨台板的研磨布上，同时相对移动研磨台板和具有待研磨金属膜的基板，同时基板被压在抛光布上。

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