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31. 发明授权

US07067222B2 Pellicle for lithography 有权
标题翻译：光刻胶片
公开(公告)号：US07067222B2
公开(公告)日：2006-06-27
申请号：US10695871
申请日：2003-10-30
申请人： Yoshihiko Nagata
发明人： Yoshihiko Nagata
IPC分类号： G01F9/00
CPC分类号： G03F1/64 , G03F1/62 , G03F7/70983 , Y10T156/10
摘要： There is provided a pellicle for lithography which has at least, a pellicle film for dustproof protection, a pellicle frame to which the pellicle film is adhered, an adhesive layer provided on one end face of the pellicle frame in order to adhere the pellicle film, and a sticking layer formed on another end face of the pellicle frame, wherein the pellicle film is formed by a die coating machine and a method for producing it. There can be provided a relatively large-sized pellicle for lithography which has a pellicle film with little unevenness of film thickness and with a uniform and high light transmission can be produced easily and at low cost, compared with those using the conventional spin coater.
摘要翻译：提供了一种用于光刻的防护薄膜组件，其至少具有用于防尘防护的防护薄膜组件，附着防护膜的防护薄膜组件框架，设置在防护薄膜组件框架的一个端面上的粘合剂层以粘附防护薄膜，以及形成在防护薄膜组件框架的另一个端面上的粘合层，其中所述防护薄膜由模涂机及其制造方法形成。可以提供一种用于光刻的相对大尺寸的防护薄膜，其具有薄膜厚度很小的薄膜，并且与使用常规旋涂机的薄膜相比，可以容易且低成本地制造均匀且高透光性的薄膜。

32. 发明申请

US20050281954A1 Method for producing a pellicle for lithography 有权
标题翻译：光刻用薄膜的制造方法
公开(公告)号：US20050281954A1
公开(公告)日：2005-12-22
申请号：US11209828
申请日：2005-08-24
申请人： Yoshihiko Nagata
发明人： Yoshihiko Nagata
IPC分类号： G03F1/62 , G03F7/20 , H01L21/027 , B05D3/12 , B05D3/02
CPC分类号： G03F1/64 , G03F1/62 , G03F7/70983 , Y10T156/10
摘要： There is provided a pellicle for lithography which has at least, a pellicle film for dustproof protection, a pellicle frame to which the pellicle film is adhered, an adhesive layer provided on one end face of the pellicle frame in order to adhere the pellicle film, and a sticking layer formed on another end face of the pellicle frame, wherein the pellicle film is formed by a die coating machine and a method for producing it. There can be provided a relatively large-sized pellicle for lithography which has a pellicle film with little unevenness of film thickness and with a uniform and high light transmission can be produced easily and at low cost, compared with those using the conventional spin coater.
摘要翻译：提供了一种用于光刻的防护薄膜组件，其至少具有用于防尘防护的防护薄膜组件，附着防护膜的防护薄膜组件框架，设置在防护薄膜组件框架的一个端面上的粘合剂层以粘附防护薄膜，以及形成在防护薄膜组件框架的另一个端面上的粘合层，其中所述防护薄膜由模涂机及其制造方法形成。可以提供一种用于光刻的相对大尺寸的防护薄膜，其具有薄膜厚度很小的薄膜，并且与使用常规旋涂机的薄膜相比，可以容易且低成本地制造均匀且高透光性的薄膜。

33. 发明申请

US20050048380A1 Pellicle for lithography 有权
标题翻译：光刻胶片
公开(公告)号：US20050048380A1
公开(公告)日：2005-03-03
申请号：US10925040
申请日：2004-08-25
申请人： Yoshihiko Nagata
发明人： Yoshihiko Nagata
IPC分类号： A47G1/12 , B44F1/00 , G03F1/62 , G03F1/64 , G03F9/00 , H01L21/027
CPC分类号： G03F1/62
摘要： There is disclosed a pellicle for lithography comprising a pellicle film, a pellicle frame to which the pellicle film is adhered, and a sticking layer placed on another end face of the pellicle frame, wherein the pellicle film consists of multi-layer structure of fluorine-doped silica and fluorocarbon resin. Thereby, there is provided a pellicle for lithography which has high transmittance and high light stability against light of short wavelength such as far-ultraviolet light in a range of 200-300 nm and especially vacuum ultraviolet light of 200 nm or less, and is sufficiently practicable.
摘要翻译：公开了一种用于光刻的防护薄膜组件，其中包括防护薄膜，防护薄膜组件所附着的防护薄膜组件框架和放置在防护薄膜组件框架的另一个端面上的粘贴层，其中防护薄膜由氟 - 掺杂二氧化硅和氟碳树脂。因此，提供了一种用于光刻的防护薄膜组件，其对于200nm至300nm范围内的远紫外光，特别是200nm或更小的真空紫外光等短波长的光具有高透射率和高的光稳定性，并且足够切实可行

34. 发明授权

US08192899B2 Pellicle for photolithography 有权
标题翻译：光刻薄膜
公开(公告)号：US08192899B2
公开(公告)日：2012-06-05
申请号：US12656207
申请日：2010-01-21
申请人： Yoshihiko Nagata
发明人： Yoshihiko Nagata
IPC分类号： G03F1/64 , G03F1/62
CPC分类号： G03F1/64
摘要： There is provided a pellicle for photolithography having a plurality of air vents formed in a pellicle frame for photolithography and having the air vents covered with a dustproof filter in which the air vents in the frame are counterbored and a counterbored wall surface of the air vents is tapered.
摘要翻译：提供了一种用于光刻的防护薄膜组件，其具有形成在用于光刻的防护薄膜组件框架中的多个通风口，并且具有覆盖有框架中的通风口的通风孔被防尘过滤器覆盖，并且通风口的反射壁表面为锥。

35. 发明授权

US07604904B2 Pellicle for lithography 有权
标题翻译：光刻胶片
公开(公告)号：US07604904B2
公开(公告)日：2009-10-20
申请号：US10925040
申请日：2004-08-25
申请人： Yoshihiko Nagata
发明人： Yoshihiko Nagata
IPC分类号： G03F9/00
CPC分类号： G03F1/62
摘要： There is disclosed a pellicle for lithography comprising a pellicle film, a pellicle frame to which the pellicle film is adhered, and a sticking layer placed on another end face of the pellicle frame, wherein the pellicle film consists of multi-layer structure of fluorine-doped silica and fluorocarbon resin. Thereby, there is provided a pellicle for lithography which has high transmittance and high light stability against light of short wavelength such as far-ultraviolet light in a range of 200-300 nm and especially vacuum ultraviolet light of 200 nm or less, and is sufficiently practicable.
摘要翻译：公开了一种用于光刻的防护薄膜组件，其中包括防护薄膜，防护薄膜组件所附着的防护薄膜组件框架和放置在防护薄膜组件框架的另一个端面上的粘贴层，其中防护薄膜由氟 - 掺杂二氧化硅和氟碳树脂。因此，提供了一种用于光刻的防护薄膜组件，其对于200nm至300nm范围内的远紫外光，特别是200nm或更小的真空紫外光等短波长的光具有高透射率和高的光稳定性，并且足够切实可行

36. 发明授权

US07432023B2 Method for producing a pellicle for lithography 有权
标题翻译：光刻用薄膜的制造方法
公开(公告)号：US07432023B2
公开(公告)日：2008-10-07
申请号：US11209828
申请日：2005-08-24
申请人： Yoshihiko Nagata
发明人： Yoshihiko Nagata
IPC分类号： G03F1/14
CPC分类号： G03F1/64 , G03F1/62 , G03F7/70983 , Y10T156/10
摘要： There is provided a pellicle for lithography which has at least, a pellicle film for dustproof protection, a pellicle frame to which the pellicle film is adhered, an adhesive layer provided on one end face of the pellicle frame in order to adhere the pellicle film, and a sticking layer formed on another end face of the pellicle frame, wherein the pellicle film is formed by a die coating machine and a method for producing it. There can be provided a relatively large-sized pellicle for lithography which has a pellicle film with little unevenness of film thickness and with a uniform and high light transmission can be produced easily and at low cost, compared with those using the conventional spin coater.
摘要翻译：提供了一种用于光刻的防护薄膜组件，其至少具有用于防尘防护的防护薄膜组件，附着防护膜的防护薄膜组件框架，设置在防护薄膜组件框架的一个端面上的粘合剂层以粘附防护薄膜，以及形成在防护薄膜组件框架的另一个端面上的粘合层，其中所述防护薄膜由模涂机及其制造方法形成。可以提供一种用于光刻的相对大尺寸的防护薄膜，其具有薄膜厚度很小的薄膜，并且与使用常规旋涂机的薄膜相比，可以容易且低成本地制造均匀且高透光性的薄膜。

37. 发明申请

US20070187871A1 Mold-supporting apparatus, molding machine, and molding method 审中-公开
标题翻译：模具支撑设备，成型机和成型方法
公开(公告)号：US20070187871A1
公开(公告)日：2007-08-16
申请号：US10591903
申请日：2005-03-09
申请人： Yoshihiko Nagata , Akihisa Kobayashi
发明人： Yoshihiko Nagata , Akihisa Kobayashi
IPC分类号： B29C45/17 , B29C45/00
CPC分类号： B29C45/1744
摘要： An object is to provide a mold-supporting apparatus whose mold-mounting surface does not deform, irrespective of whether a mold is large or small, so that a uniform surface pressure is produced, and which can be readily produced by means of casting. The mold-supporting apparatus includes a mold-mounting portion having a mold-mounting surface to which a mold is mounted; and a rear surface portion having reaction-force-receiving portions at corners thereof, the reaction-force-receiving portions receiving reaction force from a reaction force applying member, wherein a central region of the mold-mounting portion and a central region of the rear surface portion are connected together by means of a central connection member, and an outer peripheral portion of the mold-mounting portion and an outer peripheral portion of the rear surface portion are connected together by means of an outer peripheral portion connection member.
摘要翻译：本发明的目的是提供一种模具安装表面不变形的模具支撑装置，而不管模具是大还是小，从而产生均匀的表面压力，并且可以容易地通过铸造产生。模具支撑装置包括：模具安装部，具有安装有模具的模具安装面; 以及在其角部具有反作用力接收部分的后表面部分，反作用力接收部分接收来自反作用力施加构件的反作用力，其中模具安装部分的中心区域和后部的中心区域表面部分通过中心连接构件连接在一起，并且模具安装部分的外周部分和后表面部分的外周部分通过外周部分连接部件连接在一起。

38. 发明申请

US20060141209A1 Pellicle for photolithography and pellicle frame 有权
标题翻译：用于光刻和防护薄膜框架的防护薄膜
公开(公告)号：US20060141209A1
公开(公告)日：2006-06-29
申请号：US11311413
申请日：2005-12-20
申请人： Yoshihiko Nagata
发明人： Yoshihiko Nagata
IPC分类号： G03F1/00 , G03B27/62 , B32B3/10
CPC分类号： C22C21/06 , C22C21/10 , G03F7/70983 , Y10T428/13 , Y10T428/24273
摘要： There is disclosed a pellicle 1 for photolithography comprising, a pellicle frame 2 for constituting a pellicle for photolithography, wherein the frame is made of an aluminum alloy whose surface is anodized, and each content of sulfate ion, nitrate ion, chlorine ion, and organic acid (total of oxalic acid, formic acid, and acetic acid) is 1.1 ppm or less in elution concentration after immersed in 100 ml of pure water at 25° C. for 168 hours, per 100 cm2 of a surface area of the frame, and a pellicle film 3 that is adhered to one end face of the frame. Thereby, there can be provided a pellicle that can effectively prevent haze from being generated on a mask substrate even in a photolithography process with a wavelength being shorter.
摘要翻译：公开了一种用于光刻的防护薄膜1，其包括用于构成光刻用防护薄膜组件的防护薄膜组件框架2，其中所述框架由表面阳极氧化的铝合金制成，并且硫酸根离子，硝酸根离子，氯离子和有机物的含量酸（总计草酸，甲酸和乙酸）在浸入100毫升纯水中25℃后的洗脱浓度为1.1ppm或更少，为168小时，每100厘米2 的框架的表面区域，以及附着在框架的一个端面上的防护薄膜3。由此，即使在波长短的光刻工序中也能够提供能够有效地防止在掩模基板上产生雾度的防护薄膜组件。

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