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    • 31. 发明授权
    • Acrylate polymers based on tert-butyl acrylate and/or tert-butyl methacrylate
    • 基于丙烯酸叔丁酯和/或甲基丙烯酸叔丁酯的丙烯酸酯聚合物
    • US07015294B2
    • 2006-03-21
    • US10399498
    • 2001-11-09
    • Wilma M. DauschKatrin ZeitzTanja SchneiderMaximilian AngelBernd de PotzolliClaudia Wood
    • Wilma M. DauschKatrin ZeitzTanja SchneiderMaximilian AngelBernd de PotzolliClaudia Wood
    • C08F116/14
    • A61Q5/06A61K8/8188C08F220/18
    • The invention relates to acrylate polymers comprising a K-value ranging from 10 to 60, which can be obtained by the radical polymerization of: 30 to 99 wt. % of tert-butyl acrylate and/or tert-butyl methacrylate designated as monomer A; 1 to 28 wt. % of acrylic acid and/or methacrylic acid designated as monomer B, and; 0 to 60 wt. % of a radically copolymerizable monomer or of a radically copolymerizable monomer mixture designated as monomer C, whereby at least one of monomers C yields a homopolymer with a glass-transition temperature lower than 30° C., with the provision that the wt. %'s total 100. The radical polymerization is carried out in the presence of alkane thiols with a C chain length of C 14 to C 22. The invention also relates to acrylate polymers comprising a K-value ranging from 10 to 60, which can be obtained by the radical polymerization of: 30 to 99 wt. % of tert-butyl acrylate and/or tert-butyl methacrylate designated as monomer A; 1 to 28 wt. % of acrylic acid and/or methacrylic acid designated as monomer B, and; 0 to 60 wt. % of a radically copolymerizable monomer or of a radically copolymerizable monomer mixture designated as monomer C, whereby at least one of monomers C yields a homopolymer with a glass-transition temperature lower than 30° C., with the provision that the wt. %'s total 100. The radical polymerization is carried out in the presence of alkane thiols with a C chain length of C 10 to C 22 followed by a hydrogen peroxide treatment. The invention also relates to the use of these acrylate polymers as film formers as well as to their use in cosmetic preparations.
    • 本发明涉及包含K值范围为10至60的丙烯酸酯聚合物,其可通过自由基聚合获得:30至99重量% %的丙烯酸叔丁酯和/或称为单体A的甲基丙烯酸叔丁酯; 1至28wt。 %为指定为单体B的丙烯酸和/或甲基丙烯酸,以及; 0〜60重量% %的自由基共聚单体或称为单体C的自由基共聚单体混合物,其中至少一种单体C产生玻璃化转变温度低于30℃的均聚物,其条件是wt。 %的总量为100.自由基聚合在C链长度为C 14至C 22的烷烃硫醇的存在下进行。本发明还涉及包含K值为10至60的丙烯酸酯聚合物,其可以 通过自由基聚合得到:30〜99wt。 %的丙烯酸叔丁酯和/或称为单体A的甲基丙烯酸叔丁酯; 1至28wt。 %为指定为单体B的丙烯酸和/或甲基丙烯酸,以及; 0〜60重量% %的自由基共聚单体或称为单体C的自由基共聚单体混合物,其中至少一种单体C产生玻璃化转变温度低于30℃的均聚物,其条件是wt。 %的总量为100.自由基聚合在C链长为C 10〜C 22的烷烃硫醇存在下进行,然后进行过氧化氢处理。 本发明还涉及这些丙烯酸酯聚合物作为成膜剂的用途以及它们在化妆品制剂中的用途。
    • 33. 发明授权
    • Method for reducing the quantity of residual monomers in aqueous polymeric dispersions
    • 降低水性聚合物分散体中残余单体量的方法
    • US06433132B1
    • 2002-08-13
    • US09784452
    • 2001-08-17
    • Claudia WoodRoland BaumstarkJohannes Dobbelaar
    • Claudia WoodRoland BaumstarkJohannes Dobbelaar
    • C08F600
    • C08F6/006
    • A process for reducing the amount of residual monomer in aqueous polymer dispersions operates by aftertreatment with an initiator system essentially comprising a) from 0.001 to 5% by weight, based on the total monomer amount used to prepare the polymer dispersion, a1) of an oxidizing agent R1OOH,  where R1 is hydrogen or a C1-C8-alkyl or a C6-C12-aryl group, and/or a2) of a compound which in aqueous medium releases hydrogen peroxide, and b) from 0.005 to 5% by weight, based on the total monomer amount used to prepare the polymer dispersion, of a reducing agent prepared from b1) an aldehyde R2CH═O,  where R2 is a C1-C12-alkyl group which may contain functional groups and/or may be olefinically unsaturated, and b2) an inorganic dithionite, and c) catalytic amounts of a polyvalent metal ion which is able to exist in a plurality of valence states.
    • 用于降低聚合物水分散体中残余单体量的方法通过用引发剂体系进行后处理来操作,所述引发剂体系基本上包含a)0.001至5重量%,基于用于制备聚合物分散体的总单体量,a1)氧化剂 其中R1是氢或C1-C8烷基或C6-C12-芳基,和/或a2)在水性介质中释放过氧化氢的化合物,和b)0.005至5重量%,基于总单体 用于制备聚合物分散体的量,由b)醛,其中R2是可以含有官能团和/或可以是烯属不饱和的C1-C12-烷基,和b2)无机连二亚硫酸盐,和c)催化量 的能够以多个价态存在的多价金属离子。