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31. 发明授权

US07879410B2 Method of fabricating an electrochemical device using ultrafast pulsed laser deposition 有权
标题翻译：使用超快脉冲激光沉积制造电化学装置的方法
公开(公告)号：US07879410B2
公开(公告)日：2011-02-01
申请号：US10863362
申请日：2004-06-09
申请人： Yong Che , Zhendong Hu
发明人： Yong Che , Zhendong Hu
IPC分类号： H05H1/24
CPC分类号： C23C14/28 , C23C14/086 , H01M4/0426 , H01M6/40 , H01M10/0472 , H01M10/058
摘要： A method of fabricating a multi-layered thin film electrochemical device is provided. The method comprises: providing a first target material in a chamber; providing a substrate in the chamber; emitting a first intermittent laser beam directed at the first target material to generate a first plasma, wherein each pulse of the first intermittent laser beam has a pulse duration of about 20 fs to about 500 ps; depositing the first plasma on the substrate to form a first thin film; providing a second target material in the chamber; emitting a second intermittent laser beam directed at the second target material to generate a second plasma, wherein each pulse of the second intermittent laser beam has a pulse duration of about 20 fs to about 500 ps; and depositing the second plasma on or above the first thin film to form a second thin film.
摘要翻译：提供一种制造多层薄膜电化学装置的方法。该方法包括：在室中提供第一目标材料; 在所述腔室中提供衬底; 发射指向第一目标材料的第一间歇激光束以产生第一等离子体，其中第一间歇激光束的每个脉冲具有约20fs至约500ps的脉冲持续时间; 将第一等离子体沉积在衬底上以形成第一薄膜; 在腔室中提供第二靶材料; 发射指向所述第二目标材料的第二间歇激光束以产生第二等离子体，其中所述第二间歇激光束的每个脉冲具有约20fs至约500ps的脉冲持续时间; 以及将第二等离子体沉积在第一薄膜上或上方以形成第二薄膜。

32. 发明申请

US20100000466A1 P-Type Semiconductor Zinc Oxide Films Process for Preparation Thereof, and Pulsed Laser Deposition Method Using Transparent Substrates 审中-公开
标题翻译： P型半导体氧化锌薄膜及其制备方法及使用透明基板的脉冲激光沉积方法
公开(公告)号：US20100000466A1
公开(公告)日：2010-01-07
申请号：US12558038
申请日：2009-09-11
申请人： Bing LIU , Zhendong Hu , Yong Che , Yuzuru Uehara
发明人： Bing LIU , Zhendong Hu , Yong Che , Yuzuru Uehara
IPC分类号： H01L21/465
CPC分类号： C23C14/22 , C23C14/083 , C23C14/28
摘要： A p-type semiconductor zinc oxide (ZnO) film and a process for preparing the film are disclosed. The film is co-doped with phosphorous (P) and lithium (Li). A pulsed laser deposition scheme is described for use in growing the film. Further described is a process of pulsed laser deposition using transparent substrates which includes a pulsed laser source, a substrate that is transparent at the wavelength of the pulsed laser, and a multi-target system. The optical path of the pulsed laser is arranged in such a way that the pulsed laser is incident from the back of the substrate, passes through the substrate, and then focuses on the target. By translating the substrate towards the target, this geometric arrangement enables deposition of small features utilizing the root of the ablation plume, which can exist in a one-dimensional transition stage along the target surface normal, before the angular width of the plume is broadened by three-dimensional adiabatic expansion. This can provide small deposition feature sizes, which can be similar in size to the laser focal spot, and provides a novel method for direct deposition of patterned materials.
摘要翻译：公开了一种p型半导体氧化锌（ZnO）膜及其制备方法。该膜与磷（P）和锂（Li）共掺杂。描述脉冲激光沉积方案用于生长膜。进一步描述的是使用透明衬底的脉冲激光沉积过程，其包括脉冲激光源，在脉冲激光的波长处是透明的衬底和多目标系统。脉冲激光器的光路布置成使得脉冲激光从衬底的背面入射，穿过衬底，然后聚焦在靶上。通过将基板朝向目标平移，这种几何布置可以在羽流的角宽度扩大之前利用消融羽流的根部沉积小特征，其可以沿着目标表面法线存在于一维过渡阶段中三维绝热膨胀。这可以提供小的沉积特征尺寸，其尺寸可以与激光焦点类似，并且提供用于直接沉积图案化材料的新颖方法。

33. 发明申请

US20090246413A1 METHOD FOR FABRICATING THIN FILMS 审中-公开
标题翻译：薄膜制作方法
公开(公告)号：US20090246413A1
公开(公告)日：2009-10-01
申请号：US12254076
申请日：2008-10-20
申请人： Makoto Murakami , Zhendong Hu , Yong Che , Bing Liu
发明人： Makoto Murakami , Zhendong Hu , Yong Che , Bing Liu
IPC分类号： C23C14/30 , C23C16/54
CPC分类号： C23C14/28 , C23C14/08 , C23C14/564 , H01S3/0057 , H01S3/0085 , H01S3/2308
摘要： A method of ultrashort pulsed laser deposition (PLD) capable of continuously tuning formed-film morphology from that of a nanoparticle aggregate to a smooth thin film completely free of particles and droplets. The materials that can be synthesized using various embodiments of the invention include, but are not limited to, metals, alloys, metal oxides, and semiconductors. A ‘burst’ mode of ultrashort pulsed laser ablation and deposition is provided, where each ‘burst’ contains a train of laser pulses. Tuning of the film morphology is achieved by controlling the burst-mode parameters such as the number of pulses and the time-spacing between the pulses within each burst, the burst repetition rate, and the laser fluence. The system includes an ultrashort pulsed laser, an optical setup for delivering the laser beam such that the beam is focused onto the target surface with an appropriate average energy density (fluence), and a vacuum chamber in which the target and the substrate are installed and background gases and their pressures are appropriately adjusted.
摘要翻译：一种超短脉冲激光沉积（PLD）的方法，其能够将形成膜的形态从纳米颗粒聚集体的形态连续调节到完全没有颗粒和液滴的光滑薄膜。可以使用本发明的各种实施方案合成的材料包括但不限于金属，合金，金属氧化物和半导体。提供了超短脉冲激光烧蚀和沉积的“突发”模式，其中每个“脉冲串”包含一系列激光脉冲。通过控制脉冲串模式参数，例如脉冲数和每个脉冲之间的脉冲之间的时间间隔，脉冲串重复频率和激光能量密度来实现电影形态的调整。该系统包括超短脉冲激光器，用于传送激光束的光学装置，使得光束以适当的平均能量密度（能量密度）聚焦到目标表面上;以及真空室，其中安装有靶和基底; 背景气体及其压力得到适当调整。

34. 发明申请

US20080292808A1 METHOD OF PRODUCING COMPOUND NANORODS AND THIN FILMS 有权
标题翻译：生产化合物和薄膜的方法
公开(公告)号：US20080292808A1
公开(公告)日：2008-11-27
申请号：US11754031
申请日：2007-05-25
申请人： Bing Liu , Zhendong Hu , Yong Che
发明人： Bing Liu , Zhendong Hu , Yong Che
IPC分类号： B05D3/12
CPC分类号： C23C14/086 , C23C14/28 , C30B23/00 , C30B29/16 , C30B29/60 , Y10T428/25
摘要： A method of producing compound nanorods and thin films under a controlled growth mode is described. The method involves ablating compound targets using an ultrafast pulsed laser and depositing the ablated materials onto a substrate. When producing compound nanorods, external catalysts such as pre-deposited metal nanoparticles are not involved. Instead, at the beginning of deposition, simply by varying the fluence at the focal spot on the target, a self-formed seed layer can be introduced for nanorods growth. This provides a simple method of producing high purity nanorods and controlling the growth mode. Three growth modes are covered by the present invention, including nanorod growth, thin film growth, and nano-porous film growth.
摘要翻译：描述了在受控生长模式下制备复合纳米棒和薄膜的方法。该方法包括使用超快速脉冲激光烧蚀化合物靶，并将消融材料沉积在基底上。当制备复合纳米棒时，不涉及外部催化剂如预沉积的金属纳米颗粒。相反，在沉积开始时，简单地通过改变目标上焦点处的注量，可以引入自形晶种层用于纳米棒生长。这提供了生产高纯度纳米棒并控制生长模式的简单方法。本发明涵盖三种生长方式，包括纳米棒生长，薄膜生长和纳米多孔膜生长。

35. 发明授权

US06824923B2 Secondary power source having a lithium titanate 失效
标题翻译：具有钛酸锂的二次电源
公开(公告)号：US06824923B2
公开(公告)日：2004-11-30
申请号：US10092988
申请日：2002-03-08
申请人： Yong Che , Manabu Tsushima , Takeshi Morimoto
发明人： Yong Che , Manabu Tsushima , Takeshi Morimoto
IPC分类号： H01M458
CPC分类号： H01G11/06 , H01G11/62 , H01M4/13 , H01M4/131 , H01M4/133 , H01M4/139 , H01M4/1393 , H01M4/364 , H01M4/485 , H01M4/587 , H01M10/0525 , Y02E60/13
摘要： A secondary power source, which comprises a positive electrode containing activated carbon, a negative electrode containing Li4Ti5O12, and an organic electrolyte containing a lithium salt.
摘要翻译：二次电源，其包含含有活性炭的正极，含有Li 4 Ti 5 O 12的负极和含有锂盐的有机电解质。

36. 发明授权

US08409906B2 Non-vacuum method for fabrication of a photovoltaic absorber layer 失效
标题翻译：用于制造光伏吸收层的非真空方法
公开(公告)号：US08409906B2
公开(公告)日：2013-04-02
申请号：US12910929
申请日：2010-10-25
申请人： Wei Guo , Yu Jin , Bing Liu , Yong Che
发明人： Wei Guo , Yu Jin , Bing Liu , Yong Che
IPC分类号： H01L21/00
CPC分类号： H01L31/0322 , B82Y30/00 , C25D13/02 , H01L31/0749 , Y02E10/541
摘要： The present invention provides a non-vacuum method of depositing a photovoltaic absorber layer based on electrophoretic deposition of a mixture of nanoparticles with a controlled atomic ratio between the elements. The nanoparticles are first dispersed in a liquid medium to form a colloidal suspension and then electrophoretically deposited onto a substrate to form a thin film photovoltaic absorber layer. The absorber layer may be subjected to optional post-deposition treatments for photovoltaic absorption.
摘要翻译：本发明提供了一种非真空方法，其基于在元件之间具有受控原子比的纳米颗粒的混合物的电泳沉积来沉积光伏吸收层。首先将纳米颗粒分散在液体介质中以形成胶体悬浮液，然后电泳沉积到基底上以形成薄膜光伏吸收层。可以对吸收层进行用于光伏吸收的任选的后沉积处理。

37. 发明授权

US08246714B2 Production of metal and metal-alloy nanoparticles with high repetition rate ultrafast pulsed laser ablation in liquids 有权
标题翻译：在液体中生产金属和金属合金纳米粒子，具有高重复率超快脉冲激光烧蚀
公开(公告)号：US08246714B2
公开(公告)日：2012-08-21
申请号：US12320617
申请日：2009-01-30
申请人： Bing Liu , Zhendong Hu , Makoto Murakami , Yong Che
发明人： Bing Liu , Zhendong Hu , Makoto Murakami , Yong Che
IPC分类号： B22F9/02 , B22F9/04
CPC分类号： B02C19/18 , B01J13/0043 , B01J19/121 , B22F1/0022 , B22F9/04 , B22F2999/00 , B82Y30/00 , B22F2202/11
摘要： Various embodiments include a method of producing chemically pure and stably dispersed metal and metal-alloy nanoparticle colloids with ultrafast pulsed laser ablation. A method comprises irradiating a metal or metal alloy target submerged in a liquid with ultrashort laser pulses at a high repetition rate, cooling a portion of the liquid that includes an irradiated region, and collecting nanoparticles produced with the laser irradiation and liquid cooling. The method may be implemented with a high repetition rate ultrafast pulsed laser source, an optical system for focusing and moving the pulsed laser beams, a metal or metal alloy target submerged in a liquid, and a liquid circulating system to cool the laser focal volume and collect the nanoparticle products. By controlling various laser parameters, and with optional liquid flow movement, the method provides stable colloids of dispersed metal and metal-alloy nanoparticles. In various embodiments additional stabilizing chemical agents are not required.
摘要翻译：各种实施方案包括用超快速脉冲激光烧蚀制备化学纯的和稳定分散的金属和金属合金纳米颗粒胶体的方法。一种方法包括以高重复率以超短激光脉冲辐射淹没在液体中的金属或金属合金靶，冷却包括辐射区域的液体的一部分，以及收集通过激光照射和液体冷却产生的纳米颗粒。该方法可以用高重复率超快脉冲激光源，用于聚焦和移动脉冲激光束的光学系统，浸没在液体中的金属或金属合金靶和液体循环系统来实现，以冷却激光聚焦体积，收集纳米颗粒产品。通过控制各种激光参数，并具有可选的液流运动，该方法提供分散金属和金属合金纳米粒子的稳定胶体。在各种实施方案中，不需要另外的稳定化学试剂。

38. 发明申请

US20100196192A1 Production of metal and metal-alloy nanoparticles with high repetition rate ultrafast pulsed laser ablation in liquids 有权
标题翻译：在液体中生产金属和金属合金纳米粒子，具有高重复率超快脉冲激光烧蚀
公开(公告)号：US20100196192A1
公开(公告)日：2010-08-05
申请号：US12320617
申请日：2009-01-30
申请人： Bing Liu , Zhendong Hu , Makoto Murakami , Yong Che
发明人： Bing Liu , Zhendong Hu , Makoto Murakami , Yong Che
IPC分类号： C22C5/04 , B22F9/04 , B23K26/08 , C22C5/02 , C22C5/06 , C22C9/00 , B01F3/12
CPC分类号： B02C19/18 , B01J13/0043 , B01J19/121 , B22F1/0022 , B22F9/04 , B22F2999/00 , B82Y30/00 , B22F2202/11
摘要： Various embodiments include a method of producing chemically pure and stably dispersed metal and metal-alloy nanoparticle colloids with ultrafast pulsed laser ablation. A method comprises irradiating a metal or metal alloy target submerged in a liquid with ultrashort laser pulses at a high repetition rate, cooling a portion of the liquid that includes an irradiated region, and collecting nanoparticles produced with the laser irradiation and liquid cooling. The method may be implemented with a high repetition rate ultrafast pulsed laser source, an optical system for focusing and moving the pulsed laser beams, a metal or metal alloy target submerged in a liquid, and a liquid circulating system to cool the laser focal volume and collect the nanoparticle products. By controlling various laser parameters, and with optional liquid flow movement, the method provides stable colloids of dispersed metal and metal-alloy nanoparticles. In various embodiments additional stabilizing chemical agents are not required.
摘要翻译：各种实施方案包括用超快速脉冲激光烧蚀制备化学纯的和稳定分散的金属和金属合金纳米颗粒胶体的方法。一种方法包括以高重复率以超短激光脉冲辐射淹没在液体中的金属或金属合金靶，冷却包括辐射区域的液体的一部分，以及收集通过激光照射和液体冷却产生的纳米颗粒。该方法可以用高重复率超快脉冲激光源，用于聚焦和移动脉冲激光束的光学系统，浸没在液体中的金属或金属合金靶和液体循环系统来实现，以冷却激光聚焦体积，收集纳米颗粒产品。通过控制各种激光参数，并具有可选的液流运动，该方法提供分散金属和金属合金纳米粒子的稳定胶体。在各种实施方案中，不需要另外的稳定化学试剂。

39. 发明申请

US20090311513A1 METHOD FOR DEPOSITING CRYSTALLINE TITANIA NANOPARTICLES AND FILMS 有权
标题翻译：沉积钛铁氧体纳米颗粒和膜的方法
公开(公告)号：US20090311513A1
公开(公告)日：2009-12-17
申请号：US12497205
申请日：2009-07-02
申请人： Zhendong Hu , Yong Che , Bing Liu
发明人： Zhendong Hu , Yong Che , Bing Liu
IPC分类号： B32B5/16 , C23C14/28
CPC分类号： C30B23/08 , C23C14/083 , C23C14/28 , C30B29/16
摘要： A one-step and room-temperature process for depositing nanoparticles or nanocomposite (nanoparticle-assembled) films of metal oxides such as crystalline titanium dioxide (TiO2) onto a substrate surface using ultrafast pulsed laser ablation of Titania or metal titanium target. The system includes a pulsed laser with a pulse duration ranging from a few femtoseconds to a few tens of picoseconds, an optical setup for processing the laser beam such that the beam is focused onto the target surface with an appropriate average energy density and an appropriate energy density distribution, and a vacuum chamber in which the target and the substrate are installed and background gases and their pressures are appropriately adjusted.
摘要翻译：使用二氧化钛或金属钛靶的超快速脉冲激光烧蚀将金属氧化物如结晶二氧化钛（TiO 2）的纳米颗粒或纳米复合材料（纳米颗粒组装的）膜沉积到基底表面上的一步和室温方法。该系统包括脉冲激光，其脉冲持续时间范围从几飞秒到几十皮秒，用于处理激光束的光学设置，使得光束以适当的平均能量密度和适当的能量聚焦到目标表面上密度分布，以及真空室，其中安装了目标物和基质，背景气体及其压力被适当调节。

40. 发明申请

US20090246530A1 Method For Fabricating Thin Films 审中-公开
标题翻译：薄膜制造方法
公开(公告)号：US20090246530A1
公开(公告)日：2009-10-01
申请号：US12401967
申请日：2009-03-11
申请人： Makoto Murakami , Zhendong Hu , Yong Che , Bing Liu , Yuzuru Uehara , Zhenlin Liu
发明人： Makoto Murakami , Zhendong Hu , Yong Che , Bing Liu , Yuzuru Uehara , Zhenlin Liu
IPC分类号： B32B9/04 , C23C14/28 , C23C14/30 , B05B5/025
CPC分类号： C23C14/08 , C23C14/083 , C23C14/086 , C23C14/14 , C23C14/28 , C23C14/54 , Y10T428/31504
摘要： A method of pulsed laser deposition (PLD) capable of continuously tuning formed-film morphology from that of a nanoparticle aggregate to a smooth thin film free of particles and droplets. The materials that can be synthesized using various embodiments of the invention include, but are not limited to, metals, alloys, metal oxides, and semiconductors. In various embodiments a ‘burst’ mode of ultrashort pulsed laser ablation and deposition is provided. Tuning of the film morphology is achieved by controlling the burst-mode parameters such as the number of pulses and the time-spacing between the pulses within each burst, the burst repetition rate, and the laser fluence. The system includes an ultrashort pulsed laser, an optical system for delivering a focused onto the target surface with an appropriate energy density, and a vacuum chamber in which the target and the substrate are installed and background gases and their pressures are appropriately adjusted.
摘要翻译：脉冲激光沉积（PLD）的方法，其能够将形成膜的形态从纳米颗粒聚集体的形态连续调节到没有颗粒和液滴的平滑薄膜。可以使用本发明的各种实施方案合成的材料包括但不限于金属，合金，金属氧化物和半导体。在各种实施例中，提供了超短脉冲激光烧蚀和沉积的“突发”模式。通过控制脉冲串模式参数，例如脉冲数和每个脉冲之间的脉冲之间的时间间隔，脉冲串重复频率和激光能量密度来实现电影形态的调整。该系统包括超短脉冲激光器，用于以适当的能量密度传递聚焦到目标表面上的光学系统，以及真空室，其中靶和基底被安装在其中，背景气体及其压力被适当地调整。

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