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    • 39. 发明授权
    • Methods for forming backside alignment markers useable in semiconductor lithography
    • 形成用于半导体光刻的背面对准标记的方法
    • US07223674B2
    • 2007-05-29
    • US10840733
    • 2004-05-06
    • Pary BaluswamyPeter Benson
    • Pary BaluswamyPeter Benson
    • H01L21/301
    • H01L21/67282B23K26/364G03F9/708G03F9/7084H01L21/3065H01L23/544H01L2223/5442H01L2223/54453H01L2223/5446H01L2924/0002H01L2924/00
    • Disclosed herein are methods for forming photolithography alignment markers on the back side of a substrate, such as a crystalline silicon substrate used in the manufacture of semiconductor integrated circuits. According to the disclosed techniques, laser radiation is used to remove the material (e.g., silicon) from the back side of a substrate to form the back side alignment markers at specified areas. Such removal can comprise the use of laser ablation or laser-assisted etching. The substrate is placed on a motor-controlled substrate holding mechanism in a laser removal chamber, and the areas are automatically moved underneath the laser radiation to removal the material. The substrate holding mechanism can comprise a standard chuck (in which case use of a protective layer on the front side of the substrate is preferred), or a substrate clamping assembly which suspends the substrate at its edges (in which case the protective layer is not necessary). Alternatively, a stencil having holes corresponding to the shape of the back side alignment markers can be placed over the back side of the substrate to mitigate the need to move the substrate to the areas with precision.
    • 这里公开了在衬底的背面上形成光刻对准标记的方法,例如用于制造半导体集成电路的晶体硅衬底。 根据所公开的技术,使用激光辐射从衬底的背面去除材料(例如硅),以在特定区域形成背面对准标记。 这种去除可以包括使用激光烧蚀或激光辅助蚀刻。 将基板放置在激光去除室中的电动机控制的基板保持机构上,并且这些区域在激光辐射下自动移动以去除材料。 基板保持机构可以包括标准卡盘(在这种情况下优选使用基板的正面上的保护层)或将基板悬挂在其边缘处的基板夹持组件(在这种情况下保护层不是保护层) 必要)。 或者,具有与背面对准标记的形状对应的孔的模板可以放置在衬底的背面上,以减轻将衬底精确地移动到区域的需要。
    • 40. 发明申请
    • Methods for forming backside alignment markers useable in semiconductor lithography
    • 形成用于半导体光刻的背面对准标记的方法
    • US20060226118A1
    • 2006-10-12
    • US11449532
    • 2006-06-07
    • Pary BaluswamyPeter Benson
    • Pary BaluswamyPeter Benson
    • B44C1/22C23F1/00
    • H01L21/67282B23K26/364G03F9/708G03F9/7084H01L21/3065H01L23/544H01L2223/5442H01L2223/54453H01L2223/5446H01L2924/0002H01L2924/00
    • Disclosed herein are methods for forming photolithography alignment markers on the back side of a substrate, such as a crystalline silicon substrate used in the manufacture of semiconductor integrated circuits. According to the disclosed techniques, laser radiation is used to remove the material (e.g., silicon) from the back side of a substrate to form the back side alignment markers at specified areas. Such removal can comprise the use of laser ablation or laser-assisted etching. The substrate is placed on a motor-controlled substrate holding mechanism in a laser removal chamber, and the areas are automatically moved underneath the laser radiation to removal the material. The substrate holding mechanism can comprise a standard chuck (in which case use of a protective layer on the front side of the substrate is preferred), or a substrate clamping assembly which suspends the substrate at its edges (in which case the protective layer is not necessary). Alternatively, a stencil having holes corresponding to the shape of the back side alignment markers can be placed over the back side of the substrate to mitigate the need to move the substrate to the areas with precision.
    • 这里公开了在衬底的背面上形成光刻对准标记的方法,例如用于制造半导体集成电路的晶体硅衬底。 根据所公开的技术,使用激光辐射从衬底的背面去除材料(例如硅),以在特定区域形成背面对准标记。 这种去除可以包括使用激光烧蚀或激光辅助蚀刻。 将基板放置在激光去除室中的电动机控制的基板保持机构上,并且这些区域在激光辐射下自动移动以去除材料。 基板保持机构可以包括标准卡盘(在这种情况下优选使用基板的正面上的保护层)或将基板悬挂在其边缘处的基板夹持组件(在这种情况下保护层不是保护层) 必要)。 或者,具有与背面对准标记的形状对应的孔的模板可以放置在衬底的背面上,以减轻将衬底精确地移动到区域的需要。