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31. 发明授权

US07543252B2 Migration of integrated circuit layout for alternating phase shift masks 失效
标题翻译：用于交替相移掩模的集成电路布局的迁移
公开(公告)号：US07543252B2
公开(公告)日：2009-06-02
申请号：US11692254
申请日：2007-03-28
申请人： Kevin W. McCullen
发明人： Kevin W. McCullen
IPC分类号： G06F17/50
CPC分类号： G06F17/5068 , G03F1/30
摘要： Method, system and program product for migrating an integrated circuit (IC) layout for, for example, alternating aperture phase shift masks (AltPSM), are disclosed. In order to migrate a layout to phase compliance, jogs are identified on a first (AltPSM) layer and shifted to another second layer. Isolated or clustered jogs are shifted into an open channel portions on the second layer where possible. Remaining clustered jogs are shifted into as few new channels as possible on the second layer. The jog removal process leaves unidirectional wires that can be trivially phase colored. Standard technology migration techniques are then used to legalize the results on the layers.
摘要翻译：公开了用于迁移例如交替孔径相移掩模（AltPSM）的集成电路（IC）布局的方法，系统和程序产品。为了将布局迁移到相位合规性，在第一（AltPSM）层上识别点动并移动到另一个第二层。隔离或聚集的点动可能在第二层上移入开放通道部分。剩余的集群点动在第二层上移入尽可能少的新通道。点动去除工艺留下可以平面相色的单向导线。然后使用标准技术迁移技术将层次结果合法化。

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