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    • 38. 发明申请
    • ELECTRON BEAM DRAWING METHOD
    • 电子束绘图方法
    • US20090166553A1
    • 2009-07-02
    • US12400254
    • 2009-03-09
    • Takeshi Okino
    • Takeshi Okino
    • H01J3/14
    • G11B5/855B82Y10/00B82Y40/00H01J37/3174H01J2237/20214H01J2237/30483
    • According to one embodiment, an electron beam drawing method includes placing a substrate, on which a photosensitive resin film is coated, on a stage, applying an electron beam to the photosensitive resin film while the substrate on the stage is rotated and moved to the horizontal direction, and drawing a pattern extending to a radial direction, in which the electron beam is deflected to a direction parallel with a rotational direction of the substrate such that a relative movement speed of an electron-beam applied position on the substrate in the direction parallel with the rotational direction of the substrate becomes slower than a linear velocity of the substrate, viewed from a drawing start position in a circulation for drawing the pattern.
    • 根据一个实施例,电子束拉制方法包括将其上涂覆有感光性树脂膜的基板放置在载置台上,同时在台架上的基板旋转并移动到水平面上的同时向感光性树脂膜施加电子束 方向,并且绘制延伸到径向的图案,其中电子束偏转到与基板的旋转方向平行的方向,使得电子束施加位置在基板上的方向平行的相对移动速度 从用于绘制图案的循环中的绘图开始位置观察,基板的旋转方向变得比基板的线速度慢。