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31. 发明授权

US08124240B2 Protective film structure of metal member, metal component employing protective film structure, and equipment for producing semiconductor or flat-plate display employing protective film structure 有权
标题翻译：金属构件的保护膜结构，采用保护膜结构的金属成分，以及使用保护膜结构制造半导体或平板显示器的设备
公开(公告)号：US08124240B2
公开(公告)日：2012-02-28
申请号：US11917633
申请日：2006-06-16
申请人： Tadahiro Ohmi , Yasuyuki Shirai , Hitoshi Morinaga , Yasuhiro Kawase , Masafumi Kitano , Fumikazu Mizutani , Makoto Ishikawa , Yukio Kishi
发明人： Tadahiro Ohmi , Yasuyuki Shirai , Hitoshi Morinaga , Yasuhiro Kawase , Masafumi Kitano , Fumikazu Mizutani , Makoto Ishikawa , Yukio Kishi
IPC分类号： B32B9/00
CPC分类号： C23C4/02 , C23C8/80 , C23C28/00 , C23C28/042 , C25D11/02 , C25D11/04 , C25D11/08 , C25D11/10 , C25D11/16 , C25D11/18 , Y10T428/26 , Y10T428/265 , Y10T428/31678
摘要： A protective film structure of a metal member for use in an apparatus for manufacturing a semiconductor or the like, the protective film structure including a first coating layer of faultless aluminum oxide formed by direct anodic oxidation of a base-material metal of an aluminum alloy; and a second coating layer formed on the first coating layer and made of yttrium oxide by a plasma spraying method.
摘要翻译：一种用于半导体制造装置的金属构件的保护膜结构，所述保护膜结构包括由铝合金的基材金属的直接阳极氧化形成的无缺陷氧化铝的第一涂层; 以及通过等离子喷涂法形成在第一涂层上并由氧化钇制成的第二涂层。

32. 发明申请

US20090142588A1 Protective Film Structure of Metal Member, Metal Component Employing Protective Film Structure, and Equipment for Producing Semiconductor or Flat-Plate Display Employing Protective Film Structure 有权
标题翻译：金属部件的保护膜结构，使用保护膜结构的金属部件以及使用保护膜结构的半导体或平板显示器的生产设备
公开(公告)号：US20090142588A1
公开(公告)日：2009-06-04
申请号：US11917633
申请日：2006-06-16
申请人： Tadahiro Ohmi , Yasuyuki Shirai , Hitoshi Morinaga , Yasuhiro Kawase , Masafumi Kitano , Fumikazu Mizutani , Makoto Ishikawa , Yukio Kishi
发明人： Tadahiro Ohmi , Yasuyuki Shirai , Hitoshi Morinaga , Yasuhiro Kawase , Masafumi Kitano , Fumikazu Mizutani , Makoto Ishikawa , Yukio Kishi
IPC分类号： B32B15/00
CPC分类号： C23C4/02 , C23C8/80 , C23C28/00 , C23C28/042 , C25D11/02 , C25D11/04 , C25D11/08 , C25D11/10 , C25D11/16 , C25D11/18 , Y10T428/26 , Y10T428/265 , Y10T428/31678
摘要： Multifunction production equipment enabling a plurality of processes in which deposition of reaction products on the inner wall of the processing chamber of equipment for producing a semiconductor or a flat-plate display, metal contamination due to corrosion of the inner wall, or the like, and fluctuation of the process due to discharged gas are suppressed, and a protective film structure for use therein. On the surface of a metal material, a first coating layer having an oxide coating of 1μ thick or less formed as an underlying layer by direct oxidation of a parent material, and a second coating layer of about 200 μm thick are formed. With such an arrangement, corrosion resistance against irradiation with ions or radicals can be imparted to a second layer protective film, and the effect of a protective layer for preventing corrosion of the surface of parent metal caused by diffusing molecules or ions into the second layer protective film can be imparted to the first layer oxide film. Consequently, contamination of the substrate with metals generated from each metal member and the inner surface of the process chamber is reduced, and stripping of the second layer protective film due to lowering in adhesion of the second layer protective film due to corrosion of the interface between the parent material and the second layer protective film can be suppressed.
摘要翻译：多功能生产设备能够实现多个工艺，其中在用于制造半导体或平板显示器的设备的处理室的内壁上沉积反应产物，由于内壁的腐蚀而引起的金属污染等，以及排出气体的处理的波动被抑制，以及用于其中的保护膜结构。在金属材料的表面上，形成通过母材直接氧化形成作为下层的1μm厚以下的氧化物被膜的第1被覆层和200μm厚的第2被覆层。通过这样的布置，可以对第二层保护膜赋予对离子或自由基的照射的耐腐蚀性，以及用于防止母体金属表面由于扩散分子或离子而导致的第二层保护层的腐蚀的保护层的效果可以将膜施加到第一层氧化物膜。因此，由金属构件和处理室的内表面产生的金属对衬底的污染减少，并且由于第二层保护膜的粘附性的降低而导致的第二层保护膜的剥离可以抑制母材和第二层保护膜。

33. 发明申请

US20090038946A1 METAL OXIDE FILM, LAMINATE, METAL MEMBER AND PROCESS FOR PRODUCING THE SAME 有权
标题翻译：金属氧化物膜，层压板，金属构件及其制造方法
公开(公告)号：US20090038946A1
公开(公告)日：2009-02-12
申请号：US11917614
申请日：2006-05-09
申请人： Tadahiro Ohmi , Yasuyuki Shirai , Hitoshi Morinaga , Yasuhiro Kawase , Masafumi Kitano , Fumikazu Mizutani , Makoto Ishikawa
发明人： Tadahiro Ohmi , Yasuyuki Shirai , Hitoshi Morinaga , Yasuhiro Kawase , Masafumi Kitano , Fumikazu Mizutani , Makoto Ishikawa
IPC分类号： C25D7/12 , B32B15/04 , C23F13/00
CPC分类号： C25D11/06 , C25D11/18 , Y10T428/265
摘要： A metal oxide film suitable for protection of metals, composed mainly of aluminum. A metal oxide film includes a film of an oxide of a metal composed mainly of aluminum, having a thickness of 10 nm or greater, and exhibiting a moisture release rate from the film of 1E18 mol./cm2 or less. Further, there is provided a process for producing a metal oxide film, wherein a metal composed mainly of aluminum is subjected to anodic oxidation in a chemical solution of 4 to 10 pH value so as to obtain a metal oxide film.
摘要翻译：适用于主要由铝组成的金属保护金属氧化物膜。金属氧化物膜包括厚度为10nm以上的主要由铝构成的金属的氧化物的膜，并且具有1E18mol / cm 2以下的膜的水分释放率。此外，提供了一种制造金属氧化物膜的方法，其中主要由铝组成的金属在pH值为4至10的化学溶液中进行阳极氧化，以获得金属氧化物膜。

34. 发明申请

US20050011935A1 Welding method for fluorine-passivated memberfor welding, fluorine-passivated method after being weld, and welded parts priority data 失效
标题翻译：用于焊接的氟钝化件的焊接方法，焊接后的氟钝化方法以及焊接部件优先数据
公开(公告)号：US20050011935A1
公开(公告)日：2005-01-20
申请号：US10805555
申请日：2004-03-19
申请人： Tadahiro Ohmi , Takahisa Nitta , Yasuyuki Shirai , Osamu Nakamura
发明人： Tadahiro Ohmi , Takahisa Nitta , Yasuyuki Shirai , Osamu Nakamura
IPC分类号： B23K9/16 , B23K1/20 , B23K9/23 , B23K35/38
CPC分类号： B23K35/383 , B23K1/20 , Y10T428/12535 , Y10T428/12979 , Y10T428/31678
摘要： The present invention provides a welding method for materials to be welded which are subjected to fluoride passivation treatment, and a fluoride passivation retreatment method, wherein, when fluoride passivation retreatment was conducted after welding, there is no generation of particles or dust, and superior resistance is provided to fluorine system gases. In the present invention, when materials to be welded comprising stainless steel subjected to fluoride passivation treatment are welded, hydrogen is added to the gas (the back shield gas) flowing through the materials to be welded. Furthermore, in the welding method for materials to be welded which are subjected to fluoride passivation treatment in accordance with the present invention, the thickness of the fluoride passivated film in a predetermined range from the butt end surfaces of the materials to be welded, comprising stainless steel subjected to a fluoride passivation treatment, is set to 10 nm or less, and welding is conducted. Furthermore, in the fluoride passivation retreatment method in accordance with the present invention, after conducting the welding method described above, at least the welded parts are heated, and a gas containing fluorine gas is caused to flow in the interior part.
摘要翻译：本发明提供一种待进行氟化物钝化处理的待焊接材料的焊接方法，以及氟化物钝化再处理方法，其中，在焊接后进行氟化物钝化再处理时，不产生颗粒或灰尘，且具有优异的电阻被提供给氟系气体。在本发明中，当焊接包含不锈钢的待焊接材料进行氟化物钝化处理时，向流过待焊接材料的气体（背面保护气体）添加氢。此外，在根据本发明的被氟化物钝化处理的待焊接材料的焊接方法中，氟化钝化膜的厚度在待焊接材料的对接端面的预定范围内，包括不锈钢进行氟化物钝化处理的钢被设定为10nm以下，进行焊接。此外，在本发明的氟化物钝化再处理方法中，在进行了上述的焊接方法之后，至少加热了焊接部，并且使含有氟气的气体在内部流动。

35. 发明授权

US06818320B2 Welding method for welded members subjected to fluoride passivation treatment, fluoride passivation retreatment method, and welded parts 失效
标题翻译：氟化物钝化处理焊接件的焊接方法，氟化物钝化再处理方法和焊接部件
公开(公告)号：US06818320B2
公开(公告)日：2004-11-16
申请号：US09748883
申请日：2000-12-27
申请人： Tadahiro Ohmi , Takahisa Nitta , Yasuyuki Shirai , Osamu Nakamura
发明人： Tadahiro Ohmi , Takahisa Nitta , Yasuyuki Shirai , Osamu Nakamura
IPC分类号： B21D3900
CPC分类号： B23K35/383 , B23K1/20 , Y10T428/12535 , Y10T428/12979 , Y10T428/31678
摘要： A welding method for materials to be welded which are subjected to fluoride passivation treatment, and a fluoride passivation retreatment method, wherein, when fluoride passivation retreatment is conducted after welding, there is no generation of particles or dust. The method provides superior resistance to fluorine system gases. During fluoride passivation treatment, hydrogen is added to the gas (the back shield gas) flowing through the materials to be welded. In one embodiment of the welding method, the thickness of the fluoride passivated film in a predetermined range from the butt end surfaces of the materials to be welded is set to 10 nm or less, followed by subsequent welding. Furthermore, the fluoride passivation retreatment method, includes the steps of heating at least the welded parts following welding and flowing a gas containing fluorine gas in the interior portion of the parts.
摘要翻译：对经过氟化物钝化处理的待焊接材料的焊接方法以及氟化物钝化再处理方法，其中，在焊接后进行氟化物钝化再处理时，不产生颗粒或灰尘。该方法提供了优异的耐氟体系气体阻力。在氟化物钝化处理期间，将氢气流入待焊接材料的气体（背面保护气体）。在焊接方法的一个实施例中，氟化钝化膜在待焊接材料的对接端面的预定范围内的厚度设定为10nm以下，随后进行焊接。此外，氟化物钝化再处理方法包括以下步骤：至少在焊接之后加热焊接部分，并且在部件的内部部分使含有氟气的气体流动。

36. 发明授权

US09476137B2 Metal oxide film, laminate, metal member and process for producing the same 有权
标题翻译：金属氧化物膜，层压体，金属构件及其制造方法
公开(公告)号：US09476137B2
公开(公告)日：2016-10-25
申请号：US13463315
申请日：2012-05-03
申请人： Tadahiro Ohmi , Yasuyuki Shirai , Hitoshi Morinaga , Yasuhiro Kawase , Masafumi Kitano , Fumikazu Mizutani , Makoto Ishikawa
发明人： Tadahiro Ohmi , Yasuyuki Shirai , Hitoshi Morinaga , Yasuhiro Kawase , Masafumi Kitano , Fumikazu Mizutani , Makoto Ishikawa
IPC分类号： C25D11/06 , C25D11/18
CPC分类号： C25D11/06 , C25D11/18 , Y10T428/265
摘要： A metal oxide film suitable for protection of metals, composed mainly of aluminum. A metal oxide film includes a film of an oxide of a metal composed mainly of aluminum, having a thickness of 10 nm or greater, and exhibiting a moisture release rate from the film of 1E18 mol./cm2 or less. Further, there is provided a process for producing a metal oxide film, wherein a metal composed mainly of aluminum is subjected to anodic oxidation in a chemical solution of 4 to 10 pH value so as to obtain a metal oxide film.
摘要翻译：适用于主要由铝组成的金属保护金属氧化物膜。金属氧化物膜包括厚度为10nm以上的主要由铝构成的金属的氧化物的膜，并且具有1E18mol / cm 2以下的膜的水分释放率。此外，提供了一种制造金属氧化物膜的方法，其中主要由铝组成的金属在pH值为4至10的化学溶液中进行阳极氧化，以获得金属氧化物膜。

37. 发明授权

US08420974B2 Long life welding electrode and its fixing structure, welding head, and welding method 有权
标题翻译：长寿命焊接电极及其固定结构，焊接头和焊接方法
公开(公告)号：US08420974B2
公开(公告)日：2013-04-16
申请号：US10266480
申请日：2002-10-08
申请人： Tadahiro Ohmi , Takahisa Nitta , Yasuyuki Shirai , Osamu Nakamura
发明人： Tadahiro Ohmi , Takahisa Nitta , Yasuyuki Shirai , Osamu Nakamura
IPC分类号： B23K9/16 , B23K9/24
CPC分类号： B23K9/28 , B23K9/24 , B23K35/0205 , B23K35/222 , B23K35/383
摘要： A fixing structure for a welding electrode and a welding head is shown which enable improvement of durability of a welding electrode, improvement of work efficiency in welding, and a reduction of time required for welding and also which make it possible to execute welding for an extended time with high reliability. In the fixing structure, a fixed section of a welding electrode is inserted via a thermally conductive material into an inserting section of a fixing base and a peripheral surface of the fixed section of the welding electrode is uniformly contacted to the fixing base to affix the welding electrode to the fixing base.
摘要翻译：示出了用于焊接电极和焊接头的固定结构，其能够提高焊接电极的耐久性，提高焊接中的工作效率，并且减少焊接所需的时间，并且还可以执行用于扩展的焊接时间高可靠性。在固定结构中，焊接电极的固定部分经由导热材料插入到固定基座的插入部分中，并且焊接电极的固定部分的周面与固定基座均匀接触以固定焊接电极到固定基座。

38. 发明授权

US08250966B2 Method of manufacturing bellows 有权
标题翻译：制造波纹管的方法
公开(公告)号：US08250966B2
公开(公告)日：2012-08-28
申请号：US12327261
申请日：2008-12-03
申请人： Tsutomu Yoshida , Tadahiro Ohmi , Yasuyuki Shirai , Masafumi Kitano
发明人： Tsutomu Yoshida , Tadahiro Ohmi , Yasuyuki Shirai , Masafumi Kitano
IPC分类号： F16J3/04
CPC分类号： C23C8/18
摘要： Method for producing at low cost bellows which show high durability even when used in a quite reactive atmosphere. The method for manufacturing bellows includes the steps of: I: forming an untreated bellows from a flat base plate, the base plate including 15 to 30 wt % of Cr, 5 to 40 wt % of Ni, 0.9 to 6 wt % of Al, less than 1 wt % of Mo, less than 0.1 wt % of Mn, less than 0.1 wt % of C, less than 0.1 wt % of S, less than 0.1 wt % of P and a balance of Fe and an unavoidable impurity (relative to 100 wt % of the base plate); and II: heating the untreated bellows at a temperature of 750 to 895° C. in an atmosphere which contains water and hydrogen and in which the volume ratio of hydrogen to water (H2/H2O) is in the range of 2×103 to 1×1012, thereby forming an Al2O3 passivation film on a surface of the untreated bellows.
摘要翻译：低成本波纹管的生产方法，即使在相当活跃的气氛中使用也显示出高耐用性。制造波纹管的方法包括以下步骤：I：从平的基板形成未处理的波纹管，基板包括15至30重量％的Cr，5至40重量％的Ni，0.9至6重量％的Al，小于1重量％的Mo，小于0.1重量％的Mn，小于0.1重量％的C，小于0.1重量％的S，小于0.1重量％的P和余量的Fe和不可避免的杂质（相对至100重量％）; 和II：在含有水和氢的气氛中，在750至895℃的温度下加热未处理的波纹管，其中氢与水的体积比（H 2 / H 2 O）在2×10 3至1的范围内 ×1012，由此在未处理的波纹管的表面上形成Al 2 O 3钝化膜。

39. 发明申请

US20110124928A1 Gas production facility, gas supply container, and gas for manufacture of electronic devices 审中-公开
标题翻译：天然气生产设备，气体供应容器和用于制造电子设备的气体
公开(公告)号：US20110124928A1
公开(公告)日：2011-05-26
申请号：US12929271
申请日：2011-01-12
申请人： Tadahiro Ohmi , Yasuyuki Shirai , Takeyoshi Kato , Kimiaki Tanaka , Masahiro Nakamura , Katsutomo Tanaka
发明人： Tadahiro Ohmi , Yasuyuki Shirai , Takeyoshi Kato , Kimiaki Tanaka , Masahiro Nakamura , Katsutomo Tanaka
IPC分类号： C07C17/00 , C07C21/185 , C07C21/18 , C07C21/20 , C07C21/19 , B01J7/00
CPC分类号： C23C30/00 , C23C4/11 , C23C8/02
摘要： An apparatus for producing a gas using a raw material gas having high reactivity, in particular, a fluorinated hydrocarbon, or a vessel for supplying the gas, characterized in that the surface of a portion thereof contacting with the gas has an average roughness of 1 μm or less in terms of a center line average roughness Ra. It is preferred that an oxide-based passivated film such as a film based on chromium oxide, aluminum oxide, yttrium oxide, magnesium oxide or the like is formed on the surface having a roughness controlled as above. The above apparatus and vessel can be suitably used for preventing the contamination of a raw material gas originated from a gas production apparatus or a vessel for supplying the gas.
摘要翻译：使用反应性高的原料气体，特别是氟化烃或用于供给气体的容器来制造气体的装置，其特征在于，与气体接触的部分的表面的平均粗糙度为1μm 或更小的中心线平均粗糙度Ra。优选在具有如上控制的粗糙度的表面上形成氧化物基钝化膜，例如基于氧化铬，氧化铝，氧化钇，氧化镁等的膜。上述设备和容器可适用于防止源自气体生产设备或用于供应气体的容器的原料气体的污染。

40. 发明申请

US20110084456A1 Metal Gasket 有权
标题翻译：金属垫片
公开(公告)号：US20110084456A1
公开(公告)日：2011-04-14
申请号：US12993628
申请日：2009-05-07
申请人： Tadahiro Ohmi , Yasuyuki Shirai , Koji Sato , Masayuki Noguchi , Tsutomu Yoshida , Akira Muramatsu , Satoshi Kumaki , Yuki Kuwamura
发明人： Tadahiro Ohmi , Yasuyuki Shirai , Koji Sato , Masayuki Noguchi , Tsutomu Yoshida , Akira Muramatsu , Satoshi Kumaki , Yuki Kuwamura
IPC分类号： F16J15/02
CPC分类号： F16J15/0887 , F16J15/0893 , F16L23/20
摘要： A metal gasket includes an outer ring that is formed in a substantially C-shaped cross-section having an opening in a circumferential direction and an inner ring that is disposed inside the outer ring, wherein the inner ring is configured in a polygonal shape of a cross section, and a pair of corner portions opposing to each other in the inner ring are disposed on inner circumferential faces on the both sides of the opening in the outer ring.
摘要翻译：金属垫圈包括形成为具有沿圆周方向开口的大致C形横截面的外圈和设置在外圈内部的内圈，其中，内圈构造为多边形形状横截面和在内圈中彼此相对的一对角部设置在外圈的开口的两侧的内周面上。

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