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    • 38. 发明授权
    • Semiconductor laser element produced by aligning a photomask to pattern an electrode portion superposed on inner portions of upper surfaces of window regions at opposite end faces
    • 半导体激光元件,其通过对准光掩模来制作,以在相对端面上叠置在窗口区域的上表面的内部上的电极部分
    • US07016387B2
    • 2006-03-21
    • US10302392
    • 2002-11-22
    • Masayuki Ohta
    • Masayuki Ohta
    • H01S5/042H01S5/10H03F1/00H03F9/00H03F7/20
    • G03F9/00H01S5/0201H01S5/0202H01S5/0425H01S5/16
    • A semiconductor laser element that has window regions at its opposite end faces and an electrode portion superposed on an inner portion of the upper surface thereof to include covering an inner portion of the upper surfaces of the window regions without covering the entire upper surfaces of the window regions, by aligning a photomask for forming electrode pattern segments at a predetermined position over a laser substrate, which includes a plurality of element regions in a matrix pattern and a plurality of window region pattern stripes corresponding to the window regions of the element regions, the electrode pattern segments being used for forming electrodes at predetermined positions between the adjacent window region pattern stripes, wherein the photomask includes: an electrode pattern region for forming the electrode pattern segments; and an auxiliary mask having a scale section for measuring the amount of alignment deviation of the electrode pattern segments with respect to the window region pattern.
    • 一种在其相对端面上具有窗口区域的半导体激光元件和叠置在其上表面的内部的电极部分,以覆盖窗口区域的上表面的内部而不覆盖窗口的整个上表面 区域,通过对准用于在激光基板上的预定位置处形成电极图案段的光掩模,所述激光基板包括矩阵图案中的多个元件区域和对应于元件区域的窗口区域的多个窗口区域图案条纹, 电极图形区段用于在相邻的窗口区域图案条纹之间的预定位置形成电极,其中光掩模包括:用于形成电极图案区段的电极图案区域; 以及辅助掩模,其具有用于测量电极图案片段相对于窗口区域图案的对准偏差量的刻度部分。