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31. 发明授权

US06538731B2 System and method for characterizing macro-grating test patterns in advanced lithography and etch processes 有权
标题翻译：在高级光刻和蚀刻工艺中表征宏观光栅测试图案的系统和方法
公开(公告)号：US06538731B2
公开(公告)日：2003-03-25
申请号：US10068311
申请日：2002-02-05
申请人： Xinhui Niu , Nickhil Jakatdar
发明人： Xinhui Niu , Nickhil Jakatdar
IPC分类号： G01N2100
CPC分类号： G03F7/70483 , G01N21/4788 , G01N21/9501 , G01N21/956
摘要： The invention teaches a method and system for an accurate profile characterization of test patterns that may be implemented for real time use in a fabrication line. One embodiment is a non-destructive method for acquiring file data of the test pattern lines through the use of spectrum data measured with an optical metrology device and a profile library. The profile data comprise critical dimensions of all the test pattern lines included in the set of parameters to create the profile library. The test pattern lines may be designed to evaluate the effectiveness of measures to correct optical proximity, micro-loading or other process effects.
摘要翻译：本发明教导了一种用于对制造线中实时使用的测试图案的准确轮廓表征的方法和系统。一个实施例是通过使用由光学测量装置和简档库测量的频谱数据来获取测试图案线的文件数据的非破坏性方法。简档数据包括创建简档库的参数集中包含的所有测试图案行的关键维度。测试图案线可以被设计为评估校正光学接近度，微载荷或其他过程效应的措施的有效性。

32. 发明申请

US20080249754A1 GENERATION OF A LIBRARY OF PERIODIC GRATING DIFFRACTION SIGNALS 有权
标题翻译：定期衍射信号图像的生成
公开(公告)号：US20080249754A1
公开(公告)日：2008-10-09
申请号：US11866408
申请日：2007-10-02
申请人： Xinhui Niu , Nickhil Jakatdar
发明人： Xinhui Niu , Nickhil Jakatdar
IPC分类号： G06G7/48
CPC分类号： G03F7/70625 , G01N23/20 , G02B5/18 , G03F7/705
摘要： A method of generating a library of simulated-diffraction signals (simulated signals) of a periodic grating includes obtaining a measured-diffraction signal (measured signal). Hypothetical parameters are associated with a hypothetical profile. The hypothetical parameters are varied within a range to generate a set of hypothetical profiles. The range to vary the hypothetical parameters is adjusted based on the measured signal. A set of simulated signals is generated from the set of hypothetical profiles.
摘要翻译：产生周期性光栅的模拟衍射信号（模拟信号）的库的方法包括获得测得的衍射信号（测量信号）。假设参数与假设轮廓相关联。假设参数在一个范围内变化以产生一组假设曲线。根据测量的信号调整改变假设参数的范围。从一组假设轮廓生成一组模拟信号。

33. 发明申请

US20050068545A1 Caching of intra-layer calculations for rapid rigorous coupled-wave analyses 失效
标题翻译：快速严格耦合波分析的层内计算缓存
公开(公告)号：US20050068545A1
公开(公告)日：2005-03-31
申请号：US10964353
申请日：2004-10-12
申请人： Xinhui Niu , Nickhil Jakatdar
发明人： Xinhui Niu , Nickhil Jakatdar
IPC分类号： G02B5/18 , G01B11/06 , G01B11/14 , G01B11/24
CPC分类号： G02B5/18 , G01B11/0675 , G01B11/14 , G01B11/2441
摘要： The diffraction of electromagnetic radiation from periodic grating profiles is determined using rigorous coupled-wave analysis, with intermediate calculations cached to reduce computation time. To implement the calculation, the periodic grating is divided into layers, cross-sections of the ridges of the grating are discretized into rectangular sections, and the permittivity, electric fields and magnetic fields are written as harmonic expansions along the direction of periodicity of the grating. Application of Maxwell's equations to each intermediate layer, i.e., each layer except the atmospheric layer and the substrate layer, provides a matrix wave equation with a wave-vector matrix A coupling the harmonic amplitudes of the electric field to their partial second derivatives in the direction perpendicular to the plane of the grating, where the wave-vector matrix A is a function of intra-layer parameters and incident-radiation parameters. W is the eigenvector matrix obtained from wave-vector matrix A, and Q is a diagonal matrix of square roots of the eigenvalues of the wave-vector matrix A. The requirement of continuity of the fields at boundaries between layers provides a matrix equation in terms of Wand Q for each layer boundary, and the solution of the series of matrix equations provides the diffraction reflectivity. Look-up of W and Q, which are precalculated and cached for a useful range of intra-layer parameters (i.e., permittivity harmonics, periodicity lengths, ridge widths, ridge offsets) and incident-radiation parameters (i.e., wavelengths and angles of incidence), provides a substantial reduction in computation time for calculating the diffraction reflectivity.
摘要翻译：使用严格的耦合波分析确定来自周期性光栅轮廓的电磁辐射的衍射，缓冲中间计算以减少计算时间。为了实现该计算，将周期光栅分成多个层，将光栅的脊的横截面离散成矩形截面，并将介电常数，电场和磁场沿着光栅的周期方向写为谐波扩展。将麦克斯韦方程应用于每个中间层，即除了大气层和基底层之外的每一层，提供了一个矩阵波方程，其中波矢矩阵A将电场的谐波幅度与其部分二次导数方向耦合垂直于光栅的平面，其中波矢量矩阵A是层内参数和入射辐射参数的函数。 W是从波矢矩阵A获得的特征向量矩阵，Q是波矢矩阵A的特征值的平方根的对角矩阵。层间边界处的场的连续性要求提供了矩阵方程的每个层边界的Wand Q，并且该系列矩阵方程的解提供了衍射反射率。 W和Q的查找是预先计算和缓存的，用于有用范围的内层参数（即介电常数谐波，周期长度，脊宽度，脊偏移）和入射辐射参数（即波长和入射角）），大大减少了计算衍射反射率的计算时间。

34. 发明授权

US06699624B2 Grating test patterns and methods for overlay metrology 有权
标题翻译：光栅测试图案和覆盖计量方法
公开(公告)号：US06699624B2
公开(公告)日：2004-03-02
申请号：US09794686
申请日：2001-02-27
申请人： Xinhui Niu , Nickhil Jakatdar
发明人： Xinhui Niu , Nickhil Jakatdar
IPC分类号： G03F900
CPC分类号： G03F7/70633 , G02B5/1819 , G02B27/4255
摘要： A metrology for determining bias or overlay error in lithographic processes. This metrology includes a set of diffraction test patterns, optical inspection techniques by using spectroscopic ellipsometer or reflectometer and a method of test pattern profile extraction. The invention uses a set of diffraction gratings as the test patterns, and thin film metrology equipment, such as spectroscopic ellipsometer or spectroscopic reflectometer. The profiles of the test patterns in the two successive layers are analyzed. Overlay information is obtained after processing the profile data. In a first aspect of the invention, a line-on-line overlay grating test patterns structure is disclosed in which a second layer mask is placed in the center of a clear line in a first layer mask. In a second aspect of the invention, a line-in-line overlay grating test patterns structure is disclosed in which a second layer mask is placed in the center of a dark line in the first mask.
摘要翻译：用于确定平版印刷过程中偏差或重叠误差的计量。该测量包括一组衍射测试图案，使用光谱椭偏仪或反射计的光学检测技术以及测试图案剖面提取的方法。本发明使用一组衍射光栅作为测试图案，以及薄膜计量设备，如光谱椭偏仪或光谱反射计。分析两个连续层中的测试图案的轮廓。处理简档数据后获得叠加信息。在本发明的第一方面中，公开了一种在线覆盖光栅测试图案结构，其中第二层掩模被放置在第一层掩模中的清晰线的中心。在本发明的第二方面中，公开了一种在线叠加光栅测试图案结构，其中第二层掩模被放置在第一掩模中暗线的中心。

35. 发明授权

US06608686B1 Measurement of metal electroplating and seed layer thickness and profile 有权
标题翻译：金属电镀和种子层厚度和型材的测量
公开(公告)号：US06608686B1
公开(公告)日：2003-08-19
申请号：US10022035
申请日：2001-12-13
申请人： Lawrence Lane , Nickhil Jakatdar , Xinhui Niu
发明人： Lawrence Lane , Nickhil Jakatdar , Xinhui Niu
IPC分类号： G01B1100
CPC分类号： G01B11/0616
摘要： A method and system for measuring metal electroplating barrier and seed layer thickness and profile. Using optical metrology, profiles of post-barrier deposition grating and post-seed deposition grating can be measured non-destructively. In turn, the thickness and profile of the barrier layer can be determined by subtracting the profile of the post-barrier deposition grating from the profile of the substrate damascene grating. Similarly, the thickness and profile of the seed layer can be determined by subtracting the profile of the post-seed deposition gratin from the profile of the post-barrier deposition grating.
摘要翻译：用于测量金属电镀屏障和种子层厚度和型材的方法和系统。使用光学测量，可以非破坏性地测量后阻挡沉积光栅和种子后沉积光栅的轮廓。反过来，阻挡层的厚度和轮廓可以通过从衬底镶嵌光栅的轮廓中减去后阻挡沉积光栅的轮廓来确定。类似地，种子层的厚度和轮廓可以通过从后阻挡沉积光栅的轮廓中减去后种子沉积格拉丁的轮廓来确定。

36. 发明授权

US06775015B2 Optical metrology of single features 有权
标题翻译：光学计量单功能
公开(公告)号：US06775015B2
公开(公告)日：2004-08-10
申请号：US10175207
申请日：2002-06-18
申请人： Joerg Bischoff , Xinhui Niu , Junwei Bao
发明人： Joerg Bischoff , Xinhui Niu , Junwei Bao
IPC分类号： G01B1102
CPC分类号： G01B11/24 , G01N21/4788
摘要： The profile of a single feature formed on a wafer can be determined by obtaining an optical signature of the single feature using a beam of light focused on the single feature. The obtained optical signature can then be compared to a set of simulated optical signatures, where each simulated optical signature corresponds to a hypothetical profile of the single feature and is modeled based on the hypothetical profile.
摘要翻译：可以通过使用聚焦在单个特征上的光束获得单个特征的光学特征来确定形成在晶片上的单个特征的轮廓。所获得的光学特征随后可以与一组模拟的光学特征进行比较，其中每个模拟的光学特征对应于单个特征的假设轮廓，并且基于假设轮廓进行建模。

37. 发明申请

US20080259357A1 OPTICAL METROLOGY OF SINGLE FEATURES 失效
标题翻译：单一特征的光学计量学
公开(公告)号：US20080259357A1
公开(公告)日：2008-10-23
申请号：US12127640
申请日：2008-05-27
申请人： Joerg BISCHOFF , Xinhui Niu , Junwei Bao
发明人： Joerg BISCHOFF , Xinhui Niu , Junwei Bao
IPC分类号： G01B11/24
CPC分类号： G01B11/24 , G01N21/4788
摘要： The profile of a single feature formed on a wafer can be determined by obtaining an optical signature of the single feature using a beam of light focused on the single feature. The obtained optical signature can then be compared to a set of simulated optical signatures, where each simulated optical signature corresponds to a hypothetical profile of the single feature and is modeled based on the hypothetical profile.
摘要翻译：可以通过使用聚焦在单个特征上的光束获得单个特征的光学特征来确定形成在晶片上的单个特征的轮廓。所获得的光学特征随后可以与一组模拟的光学特征进行比较，其中每个模拟的光学特征对应于单个特征的假设轮廓，并且基于假设轮廓进行建模。

38. 发明授权

US07379192B2 Optical metrology of single features 有权
标题翻译：光学计量单功能
公开(公告)号：US07379192B2
公开(公告)日：2008-05-27
申请号：US11404645
申请日：2006-04-14
申请人： Joerg Bischoff , Xinhui Niu , Junwei Bao
发明人： Joerg Bischoff , Xinhui Niu , Junwei Bao
IPC分类号： G01B11/24
CPC分类号： G01B11/24 , G01N21/4788
摘要： The profile of a single feature formed on a wafer can be determined by obtaining an optical signature of the single feature using a beam of light focused on the single feature. The obtained optical signature can then be compared to a set of simulated optical signatures, where each simulated optical signature corresponds to a hypothetical profile of the single feature and is modeled based on the hypothetical profile.
摘要翻译：可以通过使用聚焦在单个特征上的光束获得单个特征的光学特征来确定形成在晶片上的单个特征的轮廓。所获得的光学特征随后可以与一组模拟的光学特征进行比较，其中每个模拟的光学特征对应于单个特征的假设轮廓，并且基于假设轮廓进行建模。

39. 发明授权

US07586623B2 Optical metrology of single features 失效
标题翻译：光学计量单功能
公开(公告)号：US07586623B2
公开(公告)日：2009-09-08
申请号：US12127640
申请日：2008-05-27
申请人： Joerg Bischoff , Xinhui Niu , Junwei Bao
发明人： Joerg Bischoff , Xinhui Niu , Junwei Bao
IPC分类号： G01B11/24
CPC分类号： G01B11/24 , G01N21/4788
摘要： The profile of a single feature formed on a wafer can be determined by obtaining an optical signature of the single feature using a beam of light focused on the single feature. The obtained optical signature can then be compared to a set of simulated optical signatures, where each simulated optical signature corresponds to a hypothetical profile of the single feature and is modeled based on the hypothetical profile.
摘要翻译：可以通过使用聚焦在单个特征上的光束获得单个特征的光学特征来确定形成在晶片上的单个特征的轮廓。所获得的光学特征随后可以与一组模拟的光学特征进行比较，其中每个模拟的光学特征对应于单个特征的假设轮廓，并且基于假设轮廓进行建模。

40. 发明申请

US20060187468A1 Optical metrology of single features 有权
公开(公告)号：US20060187468A1
公开(公告)日：2006-08-24
申请号：US11404645
申请日：2006-04-14
申请人： Joerg Bischoff , Xinhui Niu , Junwei Bao
发明人： Joerg Bischoff , Xinhui Niu , Junwei Bao
IPC分类号： G01B11/24
CPC分类号： G01B11/24 , G01N21/4788
摘要： The profile of a single feature formed on a wafer can be determined by obtaining an optical signature of the single feature using a beam of light focused on the single feature. The obtained optical signature can then be compared to a set of simulated optical signatures, where each simulated optical signature corresponds to a hypothetical profile of the single feature and is modeled based on the hypothetical profile.

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