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31. 发明授权

US07443511B2 Integrated plane mirror and differential plane mirror interferometer system 有权
标题翻译：集成平面镜和差分平面镜干涉仪系统
公开(公告)号：US07443511B2
公开(公告)日：2008-10-28
申请号：US10720752
申请日：2003-11-25
申请人： Emiel Jozef Melanie Eussen , Marcel Hendrikus Maria Beems , Engelbertus Antonius Fransiscus Van Der Pasch
发明人： Emiel Jozef Melanie Eussen , Marcel Hendrikus Maria Beems , Engelbertus Antonius Fransiscus Van Der Pasch
IPC分类号： G01B11/02
CPC分类号： G03F7/70775 , G01B9/02018 , G01B9/02019 , G01B9/02021 , G01B9/02027 , G01B2290/70
摘要： A lithographic interferometer system includes a beam generating mechanism, mirrors which reflect those beams, and detection devices configured to detect an interference pattern of overlapping reflected beams. The beam generating mechanism includes a beam-splitter, which splits the beams into reference beams and measuring beams, a reference mirror that provides a plane mirror interferometer, and a reflective surface that emits at least one reference beam used in a differential plane mirror interferometer.
摘要翻译：光刻干涉仪系统包括光束产生机构，反射这些光束的反射镜和被配置为检测重叠的反射光束的干涉图案的检测装置。光束产生机构包括分束器，其将光束分成参考光束和测量光束，提供平面镜干涉仪的参考镜，以及发射在差分平面镜干涉仪中使用的至少一个参考光束的反射表面。

32. 发明授权

US07283249B2 Lithographic apparatus and a method of calibrating such an apparatus 有权
标题翻译：光刻设备和校准这种设备的方法
公开(公告)号：US07283249B2
公开(公告)日：2007-10-16
申请号：US11101629
申请日：2005-04-08
申请人： Emiel Jozef Melanie Eussen , Johannes Mathias Theodorus Antonius Adriaens
发明人： Emiel Jozef Melanie Eussen , Johannes Mathias Theodorus Antonius Adriaens
IPC分类号： G01B11/02
CPC分类号： G03F7/70775
摘要： A lithographic apparatus includes an object support configured to support an object. The apparatus further includes X, Y and Z interferometer measurement systems, and an object support positioning system configured to position the object support in a number of degrees of freedom on the basis of measurements of the interferometer measurement systems. A calibration device is configured to measure Ry of the object support with the X interferometer measurement system in at least two different Z positions, measure Ry of the object support with the Z interferometer measurement system in at least two different Z positions, calibrate a linear Z dependency of Ry on the basis of the measurements, and calibrating a linear X dependency of Z on the basis of the previous calibration. Similarly, a linear Y dependency of Z is calibrated.
摘要翻译：光刻设备包括被配置为支撑物体的物体支撑件。该装置还包括X，Y和Z干涉仪测量系统，以及被配置为基于干涉仪测量系统的测量将物体支撑件定位在多个自由度的对象支撑定位系统。校准装置被配置为利用X干涉仪测量系统在至少两个不同的Z位置中测量对象支撑的Ry，在至少两个不同的Z位置中用Z干涉仪测量系统测量对象支撑的Ry，校准线性Z 基于测量的Ry的依赖性，并且基于先前的校准来校准Z的线性X依赖性。类似地，Z的线性Y依赖性被校准。

33. 发明授权

US07978339B2 Lithographic apparatus temperature compensation 有权
标题翻译：平版印刷设备温度补偿
公开(公告)号：US07978339B2
公开(公告)日：2011-07-12
申请号：US11242130
申请日：2005-10-04
申请人： Tjarko Adriaan Rudolf Van Empel , Marcel Hendrikus Maria Beems , Emiel Jozef Melanie Eussen
发明人： Tjarko Adriaan Rudolf Van Empel , Marcel Hendrikus Maria Beems , Emiel Jozef Melanie Eussen
IPC分类号： G01B9/02
CPC分类号： G03F7/70891
摘要： A lithographic apparatus includes a position measurement system to determine along a measurement path a position of a first part of the lithographic apparatus with respect to a position of a second part of the lithographic apparatus. The position determination system comprises a plurality of temperature sensors to measure a temperature of a medium along the measurement path. The position measurement system corrects the determined position making use of the temperature as measured by the temperature sensors.
摘要翻译：光刻设备包括位置测量系统，用于沿着测量路径确定光刻设备的第一部分相对于光刻设备的第二部分的位置的位置。位置确定系统包括多个温度传感器，用于测量沿着测量路径的介质的温度。位置测量系统使用由温度传感器测量的温度校正确定的位置。

34. 发明申请

US20090128791A1 Stage system, lithographic apparatus including such stage system, and correction method 有权
标题翻译：舞台系统，包括这种舞台系统的光刻设备和校正方法
公开(公告)号：US20090128791A1
公开(公告)日：2009-05-21
申请号：US12268659
申请日：2008-11-11
申请人： Willem Herman Gertruda Anna Koenen , Emiel Jozef Melanie Eussen , Engelbertus Antonius Fransiscu Van Der Pasch
发明人： Willem Herman Gertruda Anna Koenen , Emiel Jozef Melanie Eussen , Engelbertus Antonius Fransiscu Van Der Pasch
IPC分类号： G03B27/42 , G03B27/32
CPC分类号： G03F7/70775 , G03F7/70508 , G03F7/7085
摘要： A position measurement system to measure a position of a movable stage includes a reference plate; a plurality of sensors arranged such that, depending on a position of the movable stage relative to the reference plate, at least a subset of the plurality of sensors is configured to cooperate with the reference plate to provide for each of the sensors in the subset respective sensor signals representative of a position of the respective sensor relative to the reference plate; and a processor arranged to determine from the sensor signals a stage position, the processing device configured so as to, when the stage is in a position where an over-determined number of sensor signals is provided by at least the subset of the sensors that are in operational cooperation with the reference plate, (a) determine the stage position from a subset of the over-determined number of sensor signals, and (b) correct a sensor signal of one or more of the sensors from a discrepancy between the determined stage position and a remainder of the sensors signals.
摘要翻译：用于测量可移动台的位置的位置测量系统包括：参考板; 多个传感器布置成使得根据可移动台相对于参考板的位置，多个传感器中的至少一个子集被配置为与参考板协作以提供子集中的每个传感器代表相应传感器相对于参考板的位置的传感器信号; 以及处理器，被布置成从传感器信号确定载物台位置，所述处理装置被配置为当所述载物台处于至少所述传感器的子集中提供超过数量的传感器信号的位置时在与参考板的操作协作中，（a）从传感器信号的超过数量的子集中确定舞台位置，以及（b）从所确定的舞台之间的差异校正一个或多个传感器的传感器信号位置和其余的传感器信号。

35. 发明授权

US07505113B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07505113B2
公开(公告)日：2009-03-17
申请号：US11236864
申请日：2005-09-28
申请人： Emiel Jozef Melanie Eussen
发明人： Emiel Jozef Melanie Eussen
IPC分类号： G03B27/42 , G03B27/58 , G03B27/62
CPC分类号： G03F7/70775
摘要： A lithographic apparatus including a projection system configured to project a patterned radiation beam onto a target portion of a substrate includes a position measuring system configured to determine the position of a movable object in at least one direction. The measuring system includes at least a first sensor arranged spaced from one side of the object and at least a second sensor arranged spaced from an opposite side of the movable object, and a calculation device configured to calculate the position of the object on the basis of distances measured by the first sensor and the second sensor between the first and the object and the second sensor and the object, respectively. By using the (weighted) difference between measured signals for calculation of the position of the object, the errors in the sensor signals caused by disturbances, such as global and/or local changes of the refractive index and expansion can be substantially reduced.
摘要翻译：包括配置成将图案化的辐射束投影到基板的目标部分上的投影系统的光刻设备包括位置测量系统，其配置成确定可移动物体在至少一个方向上的位置。所述测量系统包括至少一个第一传感器，所述第一传感器与所述物体的一侧隔开布置，并且至少一个第二传感器与所述可移动物体的相对侧隔开设置;以及计算装置，被配置为基于分别由第一传感器和第二传感器在第一和对象与第二传感器和物体之间测量的距离。通过使用用于计算物体的位置的测量信号之间的（加权）差异，可以显着地减少由干扰引起的传感器信号中的误差，例如折射率和膨胀的全局和/或局部变化。

36. 发明授权

US07136148B2 Lithographic apparatus and device manufacturing method 失效
公开(公告)号：US07136148B2
公开(公告)日：2006-11-14
申请号：US11019522
申请日：2004-12-23
申请人： Emiel Jozef Melanie Eussen
发明人： Emiel Jozef Melanie Eussen
IPC分类号： G03B27/42
CPC分类号： G03F7/709 , G03F7/70725 , G03F7/70775
摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam, and a support structure constructed to support a patterning device. The patterning device imparts the radiation beam with a pattern in its cross-section to form a patterned radiation beam. A substrate table is constructed to hold a substrate, and a projection system projects the patterned radiation beam onto a target portion of the substrate. An interferometer system measures a position of the substrate table, and generates a disturbance frequency by optical feedback. A position control system controls the position of the support structure and the substrate table on the basis of the position measurement of the interferometer system. The position control system selects a substrate table speed to prevent a positioning error due to the disturbance frequency.

37. 发明授权

US07310130B2 Lithographic apparatus and position measuring method 有权
标题翻译：平版印刷设备和位置测量方法
公开(公告)号：US07310130B2
公开(公告)日：2007-12-18
申请号：US10957755
申请日：2004-10-05
申请人： Emiel Jozef Melanie Eussen , Tjarko Adriaan Rudolf Van-Empel , Wouter Onno Pril
发明人： Emiel Jozef Melanie Eussen , Tjarko Adriaan Rudolf Van-Empel , Wouter Onno Pril
IPC分类号： G03B27/42 , G01B11/00
CPC分类号： G03F7/70775 , G03F7/70858
摘要： In a lithographic apparatus, a measurement of the position of an object in an ambient space by an object position measuring system which is influenced by pressure variations in the ambient space, is corrected by an accurate measurement of the pressure in the ambient space. A pressure difference is measured between a pressure in a reference pressure volume and an ambient pressure in an ambient space. An absolute pressure in the reference pressure volume is added to the pressure difference to determine a change of pressure in the ambient space. Alternatively, the pressure difference is integrated over time and a determined change of pressure in the reference pressure volume is added to the pressure difference to determine a change of pressure in the ambient space.
摘要翻译：在光刻设备中，通过对环境空间中的压力变化影响的物体位置测量系统对环境空间中的物体的位置的测量通过对环境空间中的压力的精确测量来校正。在参考压力体积中的压力和环境空间中的环境压力之间测量压力差。将参考压力体积中的绝对压力加到压差上以确定环境空间中的压力变化。或者，压力差随时间积分，并且将参考压力体积中的确定的压力变化加到压差上以确定环境空间中的压力变化。

38. 发明授权

US07242454B1 Lithographic apparatus, and apparatus and method for measuring an object position in a medium 有权
标题翻译：光刻设备，以及用于测量介质中的物体位置的装置和方法
公开(公告)号：US07242454B1
公开(公告)日：2007-07-10
申请号：US11319194
申请日：2005-12-28
申请人： Emiel Jozef Melanie Eussen
发明人： Emiel Jozef Melanie Eussen
IPC分类号： G03B27/52 , G03B27/42
CPC分类号： G03F7/70858 , G03F7/70516 , G03F7/70775
摘要： A lithographic apparatus has a position measuring apparatus configured to measure a position of a substrate support or a patterning support in a medium. The position measuring apparatus has a barometer to measure a pressure of the medium, thereby providing a pressure signal. The position measuring apparatus has a distance measuring device measuring a reference distance, thereby providing a reference distance signal. The position measuring apparatus has a processor that converts the reference distance signal into a pressure-change signal; processes the pressure-change signal in a similar way as the pressure signal, thereby providing a processed pressure-change signal; determines a difference between the processed pressure-change signal and the pressure signal, thereby providing a drift signal; determines a difference between the pressure-change signal and the drift signal, thereby providing an absolute pressure signal; and corrects a position measurement on the basis of the absolute pressure signal.
摘要翻译：光刻设备具有位置测量装置，其被配置为测量介质中的基板支撑件或图案形成支撑件的位置。位置测量装置具有用于测量介质压力的气压计，从而提供压力信号。位置测量装置具有测量参考距离的距离测量装置，从而提供参考距离信号。位置测量装置具有将参考距离信号转换为压力变化信号的处理器; 以与压力信号相似的方式处理压力变化信号，从而提供经处理的压力变化信号; 确定经处理的压力变化信号和压力信号之间的差异，从而提供漂移信号; 确定压力变化信号和漂移信号之间的差，从而提供绝对压力信号; 并且基于绝对压力信号校正位置测量。

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