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31. 发明授权

US07423721B2 Lithographic apparatus 有权
标题翻译：平版印刷设备
公开(公告)号：US07423721B2
公开(公告)日：2008-09-09
申请号：US11012062
申请日：2004-12-15
申请人： Antonius Johannes Josephus Van Dijsseldonk , Mustafa Amhaouch , Wilhelmus Josephus Box , Johannes Henricus Wilhelmus Jacobs , Hernes Jacobs , Marius Ravensbergen , Martinus Arnoldus Henricus Terken , Robert Gordon Livesey , Franciscus Catharina Bernardus Marinus Van Vroonhoven
发明人： Antonius Johannes Josephus Van Dijsseldonk , Mustafa Amhaouch , Wilhelmus Josephus Box , Johannes Henricus Wilhelmus Jacobs , Hernes Jacobs , Marius Ravensbergen , Martinus Arnoldus Henricus Terken , Robert Gordon Livesey , Franciscus Catharina Bernardus Marinus Van Vroonhoven
IPC分类号： G03B27/42
CPC分类号： G03F7/70841 , G03F7/70991
摘要： A vacuum operated lithographic apparatus includes a vacuum housing for providing a vacuum environment to a support constructed to support a patterning device, or a substrate table, or a projection system, or any combination thereof. An interior of the vacuum housing includes a plurality of transport circuits for transporting fluids and/or electrical signals for use in a first process mode for lithographic processing. At least one of the transport circuits is adapted to transport energy towards the interior of the vacuum housing to stimulate outgassing in the vacuum housing for use in a second process mode for bringing the lithographic apparatus into a vacuum operating condition.
摘要翻译：真空操作的光刻设备包括真空壳体，用于为构造成支撑图案形成装置的支撑件，或衬底台，投影系统或其任何组合提供真空环境。真空壳体的内部包括用于输送用于光刻处理的第一工艺模式的流体和/或电信号的多个输送电路。传送电路中的至少一个适于将能量传送到真空壳体的内部，以刺激真空壳体中的除气，以用于使光刻设备进入真空操作状态的第二工艺模式。

32. 发明授权

US07391502B2 Lithographic apparatus, device manufacturing method, and method of manufacturing a component 有权
标题翻译：平版印刷设备，器件制造方法和组件的制造方法
公开(公告)号：US07391502B2
公开(公告)日：2008-06-24
申请号：US10785046
申请日：2004-02-25
申请人： Wilhelmus Josephus Box
发明人： Wilhelmus Josephus Box
IPC分类号： G03B27/32 , G03B27/42 , H01L21/00
CPC分类号： G03F7/70058 , G03F7/70216 , G03F7/70891 , G03F7/70958
摘要： A method of manufacturing a component that will, in use, experience a thermal load and will be operated at a mean temperature, includes selecting a material having a coefficient of thermal expansion having a zero-crossing at a first temperature and manufacturing the component using the selected material at a second temperature. The first temperature is between the second temperature and the mean operating temperature. Deformation of the component at the mean operating temperature are thus minimized. A lithographic apparatus includes a radiation system configured to provide a beam of radiation and a projection system configured to project a patterned beam of radiation onto a target portion of a substrate. At least one component of the apparatus that in use experiences a thermal load is made of the selected material. A device manufacturing method includes providing a beam of radiation using a radiation system, patterning the beam, and projecting the patterned beam onto a target portion of the layer of radiation-sensitive material using a projection system. At least one component of the radiation system and/or projection system that experiences a thermal load in use is made of the selected material.
摘要翻译：一种在使用中将经历热负荷并将在平均温度下操作的部件的制造方法包括在第一温度下选择具有过零点的热膨胀系数的材料，并使用在第二温度下选择材料。第一温度在第二温度和平均工作温度之间。因此，在平均工作温度下的组分变形最小化。光刻设备包括被配置为提供辐射束的辐射系统和被配置为将图案化的辐射束投射到基板的目标部分上的投影系统。在使用中经受热负荷的装置的至少一个部件由所选择的材料制成。一种器件制造方法包括使用辐射系统提供辐射束，图案化该束，并且使用投影系统将图案化的光束投影到辐射敏感材料层的目标部分上。辐射系统和/或投影系统中经受使用中的热负荷的至少一个部件由所选择的材料制成。

33. 发明授权

US07247866B2 Contamination barrier with expandable lamellas 有权
标题翻译：可扩展薄片的污染屏障
公开(公告)号：US07247866B2
公开(公告)日：2007-07-24
申请号：US10743265
申请日：2003-12-23
申请人： Levinus Pieter Bakker , Marcel Mathijs Theodore Marie Dierichs , Johannes Maria Freriks , Frank Jeroen Pieter Schuurmans , Jakob Vijfvinkel , Wilhelmus Josephus Box
发明人： Levinus Pieter Bakker , Marcel Mathijs Theodore Marie Dierichs , Johannes Maria Freriks , Frank Jeroen Pieter Schuurmans , Jakob Vijfvinkel , Wilhelmus Josephus Box
IPC分类号： G21G5/00
CPC分类号： B82Y10/00 , G03F7/70166 , G03F7/70916
摘要： A contamination barrier that passes through radiation from a radiation source and captures debris coming from the radiation source is disclosed. The contamination barrier includes an inner ring, an outer ring, and a plurality of lamellas. The lamellas extend in a radial direction from a main axis, and each of the lamellas is positioned in a respective plane that include the main axis. At least one outer end of each of the lamellas is slidably connected to at least one of the inner and outer ring.
摘要翻译：公开了一种通过来自辐射源的辐射并捕获来自辐射源的碎片的污染屏障。污染屏障包括内环，外环和多个薄片。薄片从主轴沿径向方向延伸，并且每个薄片位于包括主轴线的相应平面中。每个薄片的至少一个外端可滑动地连接到内圈和外圈中的至少一个。

34. 发明授权

US07151588B2 Lithographic apparatus and a method of compensating for thermal deformation in a lithographic apparatus 有权
标题翻译：光刻设备和补偿光刻设备中的热变形的方法
公开(公告)号：US07151588B2
公开(公告)日：2006-12-19
申请号：US10932303
申请日：2004-09-02
申请人： Dominicus Jacobus Petrus Adrianus Franken , Wilhelmus Josephus Box
发明人： Dominicus Jacobus Petrus Adrianus Franken , Wilhelmus Josephus Box
IPC分类号： G03B27/52
CPC分类号： G03F7/70258 , G02B7/008 , G03F7/70825 , G03F7/70891
摘要： A lithographic apparatus is disclosed. The apparatus includes an illumination system for providing a beam of radiation, a support structure for supporting a patterning device, a substrate support for supporting a substrate, a projection system for projecting the patterned beam of radiation onto a target portion of the substrate, and a thermal compensation deformation unit for compensating for a deformation of an element caused by a thermal load. The thermal compensation deformation unit includes at least one temperature sensor for sensing a temperature in at least one location on the element, and a processing unit for calculating the deformation of the element caused by the thermal load as a function of the temperature sensed at the location. The deformation is calculated using data from a computer-generated model of the element so that an appropriate correction for the deformation can be made or taken into account.
摘要翻译：公开了一种光刻设备。该装置包括用于提供辐射束的照明系统，用于支撑图案形成装置的支撑结构，用于支撑衬底的衬底支撑件，用于将图案化的辐射束投影到衬底的目标部分上的投影系统，以及热补偿变形单元，用于补偿由热负荷引起的元件的变形。热补偿变形单元包括至少一个温度传感器，用于感测元件上的至少一个位置的温度，以及处理单元，用于计算由热负荷引起的元件的变形作为在该位置处感测到的温度的函数。使用来自计算机生成的元件模型的数据计算变形，使得可以进行或考虑变形的适当校正。

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