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31. 发明申请

US20050259235A1 Exposure apparatus, maintenance method therefor, semiconductor device manufacturing method, and semiconductor manufacturing factory 失效
标题翻译：曝光装置，其维护方法，半导体装置制造方法和半导体制造工厂
公开(公告)号：US20050259235A1
公开(公告)日：2005-11-24
申请号：US11193400
申请日：2005-08-01
申请人： Hiroshi Kurosawa
发明人： Hiroshi Kurosawa
IPC分类号： G01B11/00 , G01B11/26 , G03B27/52 , G03F7/20 , G03F7/207 , G03F9/00 , G21K5/04 , H01L21/027
CPC分类号： G03F9/7026 , G03F7/70358 , G03F7/70533 , G03F7/70725 , G03F9/7003 , G03F9/7034 , G21K5/04
摘要： A scanning exposure apparatus for exposing a substrate to a pattern of a reticle. The apparatus includes an exposure system which exposes the substrate to the pattern with respect to a unit region, to which the pattern is transferred, of the substrate, by relatively moving the reticle and the substrate, a control system which controls an operation of the exposure system, the control system determining whether a condition of an exposure performed by the exposure system is within a tolerance during the exposure, and causing the exposure system to continue exposing a remaining region in the unit region of the substrate to the pattern, even after the control system determines that the condition is out of the tolerance for the unit region, and a user interface system which indicates information for identifying the unit region, for which the control system determines that the condition is out of the tolerance, of the substrate.
摘要翻译：一种用于将基板暴露于掩模版图案的扫描曝光装置。该装置包括曝光系统，通过相对移动掩模版和基板，将衬底相对于衬底的图案转移到单元区域的图案曝光，控制曝光操作的控制系统系统，所述控制系统确定所述曝光系统执行的曝光的条件是否在曝光期间的公差内，并且使得所述曝光系统继续将所述基板的单位区域中的剩余区域暴露于所述图案，即使在控制系统确定条件超出了单位区域的容差，以及用户界面系统，其指示用于识别基板的控制系统确定条件超出公差的单位区域的信息。

32. 发明申请

US20050088636A1 Scanning exposure technique 失效
标题翻译：扫描曝光技术
公开(公告)号：US20050088636A1
公开(公告)日：2005-04-28
申请号：US10969075
申请日：2004-10-21
申请人： Hiroshi Kurosawa
发明人： Hiroshi Kurosawa
IPC分类号： G03F7/22 , G03F7/20 , G03F9/00 , G03F9/02 , H01L21/027 , G03B27/42
CPC分类号： G03F9/7026 , G03F7/70725 , G03F9/7003
摘要： A scanning exposure apparatus includes an optical system which projects a pattern of an original onto a substrate, a stage which holds the substrate and moves in a scanning direction perpendicular to an optical axis of said optical system, a measurement system which measures a position, in a direction of the optical axis, of a surface region of the substrate, and a control system which performs feedback control of a position of said stage by generating data of a target position, in the direction of the optical axis, of said stage based on data of the position of the surface region measured by said measurement system, and performs feedforward control of the position of said stage by adding data of a surface shape of the substrate obtained in advance to the data of the target position, while moving said stage in the scanning direction.
摘要翻译：扫描曝光装置包括将原稿的图案投影到基板上的光学系统，保持基板并沿垂直于所述光学系统的光轴的扫描方向移动的台，测量位置的测量系统，基板的表面区域的光轴方向和基板的表面区域的控制系统，以及控制系统，其通过在所述载物台的光轴方向上生成目标位置的数据来进行所述载物台的位置的反馈控制由所述测量系统测量的表面区域的位置的数据，并且通过将预先获得的基板的表面形状的数据加到目标位置的数据上，同时使所述平台的位置移动，来执行所述平台的位置的前馈控制扫描方向。

33. 发明授权

US06704093B2 Scanning exposure apparatus, scanning exposure method, and device manufacturing method 有权
标题翻译：扫描曝光装置，扫描曝光方法和装置制造方法
公开(公告)号：US06704093B2
公开(公告)日：2004-03-09
申请号：US10077860
申请日：2002-02-20
申请人： Hiroshi Kurosawa
发明人： Hiroshi Kurosawa
IPC分类号： G03B2742
CPC分类号： G03F7/70358 , G03B27/42
摘要： A scanning exposure apparatus transfers a pattern of a master to a substrate with slit-shaped exposure light while a master stage holding the master and a substrate stage holding the substrate are moved. The apparatus includes a measurement unit arranged to measure positional sync deviations between the master stage and the substrate stage with respect to each of a plurality of points in an exposure shot region on the substrate during scanning exposure of each of the plurality of points to the light, a first calculation unit arranged to calculate a standard deviation of the positional sync deviations measured by the measurement unit with respect to each of the plurality of points in the exposure shot region, and a second calculation unit arranged to calculate a variation of the standard deviations calculated by the first calculation unit with respect to the exposure shot region. In addition, a process unit is arranged to execute a process based on the vibration calculated by the second calculation unit.
摘要翻译：扫描曝光装置将具有狭缝状曝光光的母版图案转印到具有狭缝状曝光光的基板上，同时保持母版的母版台和保持基板的基板台移动。该装置包括测量单元，该测量单元布置成在多个点中的每一个的扫描曝光期间相对于基板上的曝光拍摄区域中的多个点中的每一个点测量主平台和基板台之间的位置同步偏差，第一计算单元，被配置为计算由所述测量单元相对于所述曝光拍摄区域中的所述多个点中的每一个测量的位置同步偏差的标准偏差;以及第二计算单元，被布置为计算所述标准偏差的变化由第一计算单元相对于曝光拍摄区域计算。此外，处理单元被布置为基于由第二计算单元计算的振动来执行处理。

34. 发明授权

US6057647A Light emitting device used for display device 有权
标题翻译：用于显示装置的发光装置
公开(公告)号：US6057647A
公开(公告)日：2000-05-02
申请号：US218278
申请日：1998-12-22
申请人： Hiroshi Kurosawa , Tomoyuki Shirasaki , Hiroyasu Jobetto
发明人： Hiroshi Kurosawa , Tomoyuki Shirasaki , Hiroyasu Jobetto
IPC分类号： H05B33/10 , G09G3/32 , H01L27/32 , H01L51/50 , H05B33/12 , H05B33/14 , H05B33/26 , G09G3/10
CPC分类号： G09G3/3233 , H01L27/3246 , H01L27/3283 , G09G2300/0809 , G09G2300/0842 , G09G3/3208 , H01L27/3244
摘要： In the present invention, a partition wall having a matrix shape is formed on anode electrodes so as to divide them further into dots of a small region, which are surrounded by the partition wall. With this structure, if a dark spot which is a non-light emitting region, is created in one dot, the growth of the spot can be stopped by the partition wall. Therefore, good display property can be maintained for a long time.
摘要翻译：在本发明中，在阳极电极上形成具有矩阵形状的分隔壁，以便将它们进一步分成被分隔壁包围的小区域的点。利用这种结构，如果在一个点中产生作为非发光区域的暗点，则可以通过分隔壁停止点的生长。因此，可以长时间保持良好的显示性能。

35. 发明授权

US07648833B2 Container for germ layer formation and method of forming germ layer 有权
标题翻译：用于胚层形成的容器和形成胚层的方法
公开(公告)号：US07648833B2
公开(公告)日：2010-01-19
申请号：US10562015
申请日：2004-06-25
申请人： Hiroshi Kurosawa , Shujiro Sakaki
发明人： Hiroshi Kurosawa , Shujiro Sakaki
IPC分类号： C12M1/00
CPC分类号： C12N5/0603 , C12M21/06 , C12M23/20 , C12N2533/20 , C12N2533/30
摘要： The invention relates to a vessel for embryoid formation used for forming embryoid bodies from ES cells easily without complicated technique, and to a method for forming embryoid bodies easily and efficiently using the vessel. The method includes the steps of (A) providing a vessel for embryoid formation having a coating layer formed from a compound having a particular PC-like group on a vessel surface defining a region for floating culture of ES cells, and (B) floating culturing ES cells in the vessel to form embryoid bodies.
摘要翻译：本发明涉及一种用于胚胎形成的容器，用于容易地从ES细胞形成胚状体而不需要复杂的技术，并且涉及一种容易且有效地使用血管形成胚状体的方法。该方法包括以下步骤：（A）提供用于胚状体形成的容器，其具有在容器表面上形成的具有特定PC样基团的化合物形成的涂层，其限定ES细胞的漂浮培养区域，和（B）漂浮培养 ES细胞在血管中形成胚状体。

36. 发明授权

US07542141B2 Stage controller and exposure method in which position of the stage is controlled based on position measurements of first and second laser interferometers 失效
标题翻译：基于第一和第二激光干涉仪的位置测量来控制舞台的位置的舞台控制器和曝光方法
公开(公告)号：US07542141B2
公开(公告)日：2009-06-02
申请号：US12179734
申请日：2008-07-25
申请人： Hiroshi Kurosawa
发明人： Hiroshi Kurosawa
IPC分类号： G01B11/00 , G01B11/02 , G03B27/32 , G03C5/00
CPC分类号： H01L21/682 , G03F7/70725 , G03F7/70775 , H01L21/681
摘要： An apparatus including a stage configured to be moved. A first laser interferometer measures a position of the stage in a first direction. A second laser interferometer measures a position of the stage in the first direction. A control unit (i) obtains a position of the stage based on an output of one of the first and second laser interferometers, (ii) controls a position of the stage based on the obtained position of the stage, (iii) performs switching of one of the first and second laser interferometers to the other of the first and second laser interferometers while the stage is moved at a constant velocity in the first direction, (iv) calculates a distance by which the stage is to be moved during a time interval, and (v) sets an initial value of the other of the first and second laser interferometers after the switching, based on a position measured by the one of the first and second laser interferometers at a start time of the time interval and the calculated distance.
摘要翻译：一种包括被配置为移动的台的装置。第一激光干涉仪测量舞台在第一方向的位置。第二激光干涉仪测量舞台在第一方向的位置。控制单元（i）基于第一和第二激光干涉仪之一的输出获得舞台的位置，（ii）基于获得的舞台位置来控制舞台的位置，（iii）执行当第一和第二激光干涉仪中的另一个激光干涉仪中的第一和第二激光干涉仪中的一个在阶段以第一方向以恒定的速度移动时，（iv）计算在时间间隔期间移动台的距离，并且（v）基于在所述时间间隔的开始时间由所述第一和第二激光干涉仪中的一个测量的位置和所计算的距离来设置切换之后的第一和第二激光干涉仪中的另一个的初始值。

37. 发明授权

US07292311B2 Scanning exposure technique 失效
标题翻译：扫描曝光技术
公开(公告)号：US07292311B2
公开(公告)日：2007-11-06
申请号：US10969075
申请日：2004-10-21
申请人： Hiroshi Kurosawa
发明人： Hiroshi Kurosawa
IPC分类号： G03B27/42 , G03B27/52 , G03B27/58
CPC分类号： G03F9/7026 , G03F7/70725 , G03F9/7003
摘要： A scanning exposure apparatus for performing exposure of a substrate to light via an original while the substrate and the original are scanned. The apparatus includes a projection optical system to project light from the original onto the substrate, a stage to hold the substrate and to move in a scanning direction perpendicular to an optical axis of the projection optical system, and a focus detector to detect a position of a surface region of the substrate in a direction of the optical axis. The apparatus is configured (i) to detect the position of the surface region with respect to each of a plurality of measurement points and with respect to each of a plurality of shot regions of the substrate, (ii) to average the detected positions over the plurality of shot regions with respect to each of the plurality of measurement points, (iii) to obtain a function which approximates the averaged positions respectively obtained, (iv) to calculate a difference between each of the averaged positions and a value of the obtained function with respect to each of the plurality of measurement points, (v) to offset a position detected by the focus detector with respect to each of the plurality of measurement points with a corresponding one of the calculated differences, and (vi) to control a position of the stage based on each of the offset positions during the exposure.
摘要翻译：一种扫描曝光装置，用于在扫描基板和原件时，经由原稿进行基板的曝光。该装置包括：投影光学系统，用于将来自原稿的光投射到基板上;保持基板并沿垂直于投影光学系统的光轴的扫描方向移动的台;以及焦点检测器，基板的光轴方向的表面区域。该装置被配置为：（i）检测表面区域相对于多个测量点中的每一个以及相对于基板的多个射出区域中的每一个的位置，（ii）使检测到的位置在多个拍摄区域相对于多个测量点中的每一个，（iii）以获得近似分别获得的平均位置的函数，（iv）计算每个平均位置之间的差和所获得的函数的值对于所述多个测量点中的每一个，（v）相对于所述多个测量点中的每一个利用所计算出的差异中的相应一个偏移由所述焦点检测器检测到的位置，以及（vi）控制位置基于曝光期间的每个偏移位置的舞台。

38. 发明申请

US20060252148A1 Container for germ layer formation and method of forming germ layer 有权
标题翻译：用于胚层形成的容器和形成胚层的方法
公开(公告)号：US20060252148A1
公开(公告)日：2006-11-09
申请号：US10562015
申请日：2004-06-25
申请人： Hiroshi Kurosawa , Shujiro Sakaki
发明人： Hiroshi Kurosawa , Shujiro Sakaki
IPC分类号： C12N5/08 , C12M3/00
CPC分类号： C12N5/0603 , C12M21/06 , C12M23/20 , C12N2533/20 , C12N2533/30
摘要： The invention relates to a vessel for embryoid formation used for forming embryoid bodies from ES cells easily without complicated technique, and to a method for forming embryoid bodies easily and efficiently using the vessel. The method includes the steps of (A) providing a vessel for embryoid formation having a coating layer formed from a compound having a particular PC-like group on a vessel surface defining a region for floating culture of ES cells, and (B) floating culturing ES cells in the vessel to form embryoid bodies.
摘要翻译：本发明涉及一种用于胚胎形成的容器，用于容易地从ES细胞形成胚状体而不需要复杂的技术，并且涉及一种容易且有效地使用血管形成胚状体的方法。该方法包括以下步骤：（A）提供用于胚状体形成的容器，其具有在容器表面上形成的具有特定PC样基团的化合物形成的涂层，其限定ES细胞的漂浮培养区域，和（B）漂浮培养 ES细胞在血管中形成胚状体。

39. 发明授权

US06940584B2 Exposure apparatus, maintenance method therefor, semiconductor device manufacturing method, and semiconductor manufacturing factory 有权
标题翻译：曝光装置，其维护方法，半导体装置制造方法和半导体制造工厂
公开(公告)号：US06940584B2
公开(公告)日：2005-09-06
申请号：US10676156
申请日：2003-10-02
申请人： Hiroshi Kurosawa
发明人： Hiroshi Kurosawa
IPC分类号： G01B11/00 , G01B11/26 , G03B27/52 , G03F7/20 , G03F7/207 , G03F9/00 , G21K5/04 , H01L21/027 , G03B27/42
CPC分类号： G03F9/7026 , G03F7/70358 , G03F7/70533 , G03F7/70725 , G03F9/7003 , G03F9/7034 , G21K5/04
摘要： A scanning exposure apparatus for exposing a substrate to a pattern includes an exposure system which exposes the substrate to the pattern with respect to a unit region of the substrate to which the pattern is transferred, a determination system which determines whether a condition of an exposure performed by the exposure system is allowable during the exposure, and a control system which causes the exposure system to continue exposing a remaining region in the unit region of the substrate to the pattern, even after the determination system makes a negative determination for the unit region.
摘要翻译：用于将衬底暴露于图案的扫描曝光设备包括曝光系统，其将衬底相对于衬底的单元区域相对于图案曝光于该图案，曝光系统确定是否进行曝光的条件在曝光期间允许曝光系统，以及即使在确定系统对单位区域进行否定确定之后，使曝光系统继续将基板的单位区域中的剩余区域暴露于图案的控制系统。

40. 发明授权

US5898477A Exposure apparatus and method of manufacturing a device using the same 失效
标题翻译：曝光装置及其制造方法
公开(公告)号：US5898477A
公开(公告)日：1999-04-27
申请号：US782297
申请日：1997-01-15
申请人： Keiji Yoshimura , Kunitaka Ozawa , Hiroshi Kurosawa , Noriyasu Hasegawa
发明人： Keiji Yoshimura , Kunitaka Ozawa , Hiroshi Kurosawa , Noriyasu Hasegawa
IPC分类号： G03F7/20 , H01L21/027 , G03B27/42 , G03B27/32
CPC分类号： G03F7/70358 , G03F7/70058 , G03F7/70558
摘要： An exposure apparatus includes a mask scanning device for scanning a mask on which a pattern is formed, a projection optical system for projecting the pattern on the mask onto a wafer, a wafer scanning device for scanning the wafer, onto which the pattern is projected by the projection optical system, an illuminating device for illuminating the mask in an illumination area narrower than the pattern by synchronously scanning the mask and the wafer relative to each other, using the mask scanning device and the wafer scanning device, so as to expose and transfer the pattern on the wafer, a detection device for detecting information regarding exposure before exposing and transferring the pattern onto the wafer by the illuminating device and for producing detection results, and a display for displaying exposure information obtained from the detection results. Also disclosed are methods of manufacturing semiconductor devices, for example, using such an exposure apparatus.
摘要翻译：曝光装置包括用于扫描其上形成有图案的掩模的掩模扫描装置，用于将掩模上的图案投影到晶片上的投影光学系统，用于扫描晶片的晶片扫描装置，其上突出有图案的晶片扫描装置投影光学系统，使用掩模扫描装置和晶片扫描装置通过使掩模和晶片相对于彼此同步扫描而在比图案窄的照明区域中照亮掩模的照明装置，以便曝光和转印晶片上的图案，用于检测关于在通过照明装置曝光并将图案转印到晶片上并且用于产生检测结果之前的曝光的信息的检测装置，以及用于显示从检测结果获得的曝光信息的显示器。还公开了制造半导体器件的方法，例如使用这种曝光装置。

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