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31. 发明申请

US20150286151A1 EXPOSURE APPARATUS, EXPOSURE METHOD, METHOD FOR PRODUCING DEVICE, AND OPTICAL PART 审中-公开
标题翻译：曝光装置，曝光方法，制造装置的方法和光学部件
公开(公告)号：US20150286151A1
公开(公告)日：2015-10-08
申请号：US14697374
申请日：2015-04-27
申请人： NIKON CORPORATION
发明人： Hiroyuki NAGASAKA , Hiroaki TAKAIWA , Shigeru HIRUKAWA , Ryuichi HOSHIKA , Hitoshi ISHIZAWA
IPC分类号： G03F7/20
CPC分类号： G03F7/7085 , G03F7/70341 , G03F7/707 , G03F7/7075
摘要： An exposure apparatus (EX) is an apparatus which exposes a substrate (P) by irradiating exposure light (EL) onto the substrate (P) via a projection optical system (PL) and a liquid (1). The exposure apparatus (EX) has a substrate table (PT) for holding the substrate (P), and a plate member (30) having a liquid repellent flat surface (30A) is replaceably provided to the substrate table (PT) to prevent the liquid from remaining, maintaining excellent exposure accuracy.
摘要翻译：曝光装置（EX）是通过投影光学系统（PL）和液体（1）将曝光光（EL）照射到基板（P）上来曝光基板（P）的装置。曝光装置（EX）具有用于保持基板（P）的基板台（PT），并且具有疏液平面（30A）的板构件（30）可更换地设置在基板台（PT）上，以防止剩余液体，保持良好的曝光精度。

32. 发明申请

US20150029476A1 PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND EXPOSURE METHOD 审中-公开
标题翻译：投影光学系统，曝光装置和曝光方法
公开(公告)号：US20150029476A1
公开(公告)日：2015-01-29
申请号：US14486305
申请日：2014-09-15
申请人： NIKON CORPORATION
发明人： Yasuhiro OMURA , Takaya OKADA , Hiroyuki NAGASAKA
IPC分类号： G03F7/20
CPC分类号： G03F7/70725 , G02B1/06 , G02B17/08 , G02B17/0892 , G02B21/33 , G03F7/702 , G03F7/70225 , G03F7/70341
摘要： An immersion projection optical system having, for example, a catadioptric and off-axis structure, reduces the portion of an image space filled with liquid (immersion liquid). The projection optical system, which projects a reduced image of a first plane onto a second plane through the liquid, includes a refractive optical element (Lp) arranged nearest to the second plane. The refractive optical element includes a light emitting surface (Lpb) shaped to be substantially symmetric with respect to two axial directions (XY-axes) perpendicular to each other on the second plane. The light emitting surface has a central axis (Lpba) that substantially coincides with a central axis (40a) of a circle (40) corresponding to a circumference of a light entering surface (Lpa) of the refractive optical element. The central axis of the light emitting surface is decentered in one of the two axial directions (Y-axis) from an optical axis (AX).
摘要翻译：具有例如反射折射和离轴结构的浸没投影光学系统减少了填充有液体（浸没液体）的图像空间的部分。通过液体将第一平面的缩小图像投影到第二平面上的投影光学系统包括最靠近第二平面布置的折射光学元件（Lp）。折射光学元件包括成形为在第二平面上相对于彼此垂直的两个轴向（XY轴）基本对称的发光表面（Lpb）。发光表面具有与对应于折射光学元件的光入射表面（Lpa）的圆周的圆（40）的中心轴线（40a）基本重合的中心轴线（Lpba）。发光面的中心轴线从光轴（AX）的两个轴向（Y轴）的一方偏心。

33. 发明申请

US20140300878A1 EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：曝光装置和装置制造方法
公开(公告)号：US20140300878A1
公开(公告)日：2014-10-09
申请号：US14311918
申请日：2014-06-23
申请人： NIKON CORPORATION , NIKON ENGINEERING CO., LTD.
发明人： Hiroyuki NAGASAKA , Takeshi OKUYAMA
IPC分类号： G03F7/20
CPC分类号： G03F7/70883 , G03F7/70341
摘要： In an immersion exposure apparatus, a projection system includes an optical element having a light emitting surface that contacts immersion liquid and an outer surface above the light emitting surface. A holding member holds the optical element, and a liquid confinement member surrounds the optical element to form a gap between the optical element and the liquid confinement member. The outer surface of the optical element includes a first part extending upwardly with respect to the light emitting surface, and a second part above the gap and extending radially outwardly with respect to the first part. The gap is between the first part and an inner surface of the liquid confinement member, which has an upper surface extending radially outwardly with respect to the inner surface. The holding member holds the optical element over a portion of the upper surface of the liquid confinement member.
摘要翻译：在浸渍曝光装置中，投影系统包括具有与浸没液接触的发光面和发光面上方的外表面的光学元件。保持构件保持光学元件，并且液体限制构件围绕光学元件以在光学元件和液体限制构件之间形成间隙。光学元件的外表面包括相对于发光表面向上延伸的第一部分和在间隙上方的第二部分，并相对于第一部分径向向外延伸。间隙位于液体限制构件的第一部分和内表面之间，其具有相对于内表面径向向外延伸的上表面。保持构件将光学元件保持在液体限制构件的上表面的一部分上。

34. 发明申请

US20140240684A1 EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD FOR PRODUCING DEVICE 审中-公开
标题翻译：曝光装置，曝光方法和生产装置的方法
公开(公告)号：US20140240684A1
公开(公告)日：2014-08-28
申请号：US14268558
申请日：2014-05-02
申请人： NIKON CORPORATION
发明人： Hiroyuki NAGASAKA , Yasufumi NISHII
IPC分类号： G03F7/20
CPC分类号： G03F7/70733 , G03F7/70341 , G03F7/708 , G03F7/7095
摘要： An exposure apparatus having a projection system with a final element projects exposure light to an upper surface of a substrate through liquid between the final element and the substrate upper surface. A liquid confinement member has a recovery outlet via which the liquid is removed along with gas, the recovery outlet being arranged such that the substrate upper surface faces the recovery outlet, the recovery outlet surrounding a path of the exposure light and the liquid confinement member confining the liquid to an area that is smaller than an area of the substrate upper surface by removing the liquid from a gap between the confinement member and the substrate upper surface. A first support member supports the projection system, and a second support member supports the liquid confinement member. An anti-vibration system limits vibrations from being transmitted from the second support member to the projection system.
摘要翻译：具有最终元件的投影系统的曝光装置通过在最终元件和基板上表面之间的液体将曝光光投射到基板的上表面。液体限制构件具有回收出口，通过该出口，液体与气体一起被去除，回收出口布置成使得基底上表面面向回收出口，回收出口围绕暴露光的路径和液体限制构件限制通过从限制部件和基板上表面之间的间隙去除液体，将液体移动到比基板上表面的面积小的区域。第一支撑构件支撑投影系统，第二支撑构件支撑液体限制构件。防振系统限制振动从第二支撑构件传递到投影系统。

35. 发明申请

US20140204359A1 EXPOSURE METHOD, EXPOSURE APPARATUS, EXPOSURE SYSTEM AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：曝光方法，曝光装置，曝光系统和装置制造方法
公开(公告)号：US20140204359A1
公开(公告)日：2014-07-24
申请号：US14224547
申请日：2014-03-25
申请人： NIKON CORPORATION
发明人： Hiroyuki NAGASAKA
IPC分类号： G03F7/20
CPC分类号： G03F7/70 , G03F7/70341 , G03F7/70458
摘要： When exposing a same resist layer of a wafer a plurality of times, at least in one exposure of the plurality of exposures, by filling a space between a projection optical system, which projects an exposure light on the wafer, and the wafer with water by a liquid supply/drainage unit, a substantial wavelength of exposure light that reaches the wafer is made to differ from a substantial wavelength of exposure light in another exposure. Accordingly, exposure with high precision and high throughput can be achieved.
摘要翻译：通过填充在晶片上投影曝光的投影光学系统与晶片与水之间的空间，通过填充多个曝光中的至少一次曝光来曝光多个相同的晶片抗蚀剂层，液体供应/排出单元，使得到达晶片的基本波长的曝光光在另一曝光中与曝光光的实质波长不同。因此，可以实现高精度和高产量的曝光。

36. 发明申请

US20130250259A1 EXPOSURE METHOD, EXPOSURE APPARATUS, AND METHOD FOR PRODUCING DEVICE 审中-公开
公开(公告)号：US20130250259A1
公开(公告)日：2013-09-26
申请号：US13898011
申请日：2013-05-20
申请人： NIKON CORPORATION
发明人： Hiroyuki NAGASAKA
IPC分类号： G03F7/20
CPC分类号： G03F7/70341 , G03B27/42 , G03F7/2041 , G03F7/70325 , G03F7/70725 , G03F7/70775
摘要： A liquid immersion exposure apparatus in which a substrate is exposed with an exposure beam, includes a projection optical system by which the substrate is exposed to the exposure beam, a first inlet disposed at a first position, which is capable of supplying a first liquid to a space adjacent to a bottom surface of the projection optical system, and a second inlet disposed at a second position which is different from the first position, the second inlet being capable of supplying a second liquid that is different from the first liquid to the space.

37. 发明申请

US20190121244A1 EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD FOR PRODUCING DEVICE 审中-公开
公开(公告)号：US20190121244A1
公开(公告)日：2019-04-25
申请号：US16225306
申请日：2018-12-19
申请人： NIKON CORPORATION
发明人： Hiroyuki NAGASAKA
IPC分类号： G03F7/20
摘要： A liquid immersion exposure apparatus includes a projection system, an immersion area forming member having a liquid supply inlet, a liquid recovery outlet and an opening through which an exposure beam is projected, and a substrate stage having a substrate holding portion on which the substrate is held and a stage member having an upper surface provided adjacent to the upper surface of the held substrate with a gap therebetween. A portion of a liquid immersion area is formed by the immersion area forming member on the upper surface of the held substrate and another portion of the liquid immersion area is formed on the upper surface of the stage member when exposing an edge portion of the upper surface of the substrate with exposure light via liquid in the liquid immersion area.

38. 发明申请

US20170299966A1 EXPOSURE APPARATUS, EXPOSURE METHOD AND DEVICE MANUFACTURING METHOD 审中-公开
公开(公告)号：US20170299966A1
公开(公告)日：2017-10-19
申请号：US15641625
申请日：2017-07-05
申请人： NIKON CORPORATION
发明人： Hiroyuki NAGASAKA , Yuuki ISHII , Susumu MAKINOUCHI
IPC分类号： G03F7/20
CPC分类号： G03F7/70341 , G03F7/709
摘要： A liquid immersion exposure apparatus has: a projection system with an optical element; a substrate stage having a holder by which a substrate is held; an immersion area forming member having an opening through which exposure light is projected, a plurality of liquid recovery ports arranged facing downwardly and surrounding the opening, and a plurality of liquid supply ports arranged facing downwardly and between the opening and the liquid recovery ports; and a sensor having a transparent member and a light receiver, with the transparent member being provided at the substrate stage and the light receiver receiving light from the projection system through the transparent member and liquid between the end surface of the optical element and the transparent member.

39. 发明申请

US20160252825A1 PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND EXPOSURE METHOD 审中-公开
标题翻译：投影光学系统，曝光装置和曝光方法
公开(公告)号：US20160252825A1
公开(公告)日：2016-09-01
申请号：US15151123
申请日：2016-05-10
申请人： NIKON CORPORATION
发明人： Yasuhiro OMURA , Takaya OKADA , Hiroyuki NAGASAKA
IPC分类号： G03F7/20
CPC分类号： G03F7/70725 , G02B1/06 , G02B17/08 , G02B17/0892 , G02B21/33 , G03F7/702 , G03F7/70225 , G03F7/70341
摘要： An immersion projection optical system having, for example, a catadioptric and off-axis structure, reduces the portion of an image space filled with liquid (immersion 5 liquid), The projection optical system, which projects a reduced image of a first plane onto a second plane through the liquid, includes a refractive optical element (Lp) arranged nearest to the second plane. The refractive optical element includes a light emitting surface (Lpb) shaped to be substantially symmetric with respect to two axial directions (XY axes) perpendicular to each other on the second plane. The light emitting surface has a central axis (Lpba) that substantially coincides with a central axis (40a) of a circle (40) corresponding to a circumference of a light entering surface (Lpa) of the refractive optical element. The central axis of the light emitting surface is decentered in one of the two axial directions (Y˜axis) from an optical axis (AX).
摘要翻译：具有例如反射折射和离轴结构的浸没投影光学系统减少了充满液体（浸没液体）的图像空间的部分。投影光学系统将第一平面的缩小图像投影到通过液体的第二平面包括最靠近第二平面布置的折射光学元件（Lp）。折射光学元件包括成形为在第二平面上相对于彼此垂直的两个轴向（XY轴）大致对称的发光表面（Lpb）。发光表面具有与对应于折射光学元件的光入射表面（Lpa）的圆周的圆（40）的中心轴线（40a）基本重合的中心轴线（Lpba）。发光面的中心轴线从光轴（AX）的两个轴向（Y轴）的一方偏心。

40. 发明申请

US20160246188A1 EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD FOR PRODUCING DEVICE 审中-公开
标题翻译：曝光装置，曝光方法和生产装置的方法
公开(公告)号：US20160246188A1
公开(公告)日：2016-08-25
申请号：US15145467
申请日：2016-05-03
申请人： NIKON CORPORATION
发明人： Hiroyuki NAGASAKA , Yasufumi NISHII
IPC分类号： G03F7/20
CPC分类号： G03F7/70733 , G03F7/70341 , G03F7/708 , G03F7/7095
摘要： An exposure apparatus includes a projection system having a final element that projects exposure light to an upper surface of a substrate through liquid between the final element and the substrate. A liquid confinement member has a recovery outlet, via which the liquid is removed along with gas, arranged such that the upper surface of the substrate faces the recovery outlet, and the recovery outlet surrounds a path of the exposure light. The liquid confinement member confines the liquid to an area smaller than an area of the upper surface of the substrate by removing the liquid via the recovery outlet from a gap between the liquid confinement member and the upper surface of the substrate. An anti-vibration system is disposed such that transmission of vibrations between the liquid confinement member and the projection system is limited.
摘要翻译：曝光装置包括具有最终元件的投影系统，该最终元件通过最终元件和基板之间的液体将曝光光投射到基板的上表面。液体限制构件具有回收出口，液体与气体一起被除去，排列成使得衬底的上表面面向回收出口，并且回收出口围绕曝光光的路径。液体限制构件通过从液体限制构件和衬底的上表面之间的间隙经由回收口排出液体，将液体限制在小于衬底上表面区域的区域。防振系统被布置成使得液体限制构件和投影系统之间的振动传播受到限制。

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