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31. 发明授权

US6108079A Method for measuring crystal defect and equipment using the same 有权
标题翻译：测量晶体缺陷的方法及使用其的设备
公开(公告)号：US6108079A
公开(公告)日：2000-08-22
申请号：US245195
申请日：1999-02-05
申请人： Muneo Maeshima , Kazuo Takeda , Isao Nemoto , Shigeru Matsui , Yoshitaka Kodama
发明人： Muneo Maeshima , Kazuo Takeda , Isao Nemoto , Shigeru Matsui , Yoshitaka Kodama
IPC分类号： G01N21/88 , G01N21/25 , G01N21/47 , G01N21/95 , G01N21/956 , H01L21/66 , G01N21/00 , G01N21/86
CPC分类号： G01N21/9501 , H01L22/12 , H01L2924/0002
摘要： In order to measure an inner defect of a sample with a certain high accuracy even if the sample surface of the moved up and down by flatness irregularity of the sample and problem on accuracy of the sample movement stage, incident light beams having two wavelength and respective different penetration depths for the sample are slantingly irradiated on the surface of the moving sample 15 from irradiation optical systems 4, 8, and the inner defect of the sample is measured by detecting the scattering light occurred from the interior of the sample with a detection optical system 9 arranged over the sample surface. A distance measurement means 14 is located in an upstream of a movement direction of said sample than said irradiation optical system 4, 8 and said detection optical system 9, thereby a surface height of said sample is measured. When a measured point on sample measured by the distance measurement means 14 is arrived at a lower part of the detection optical system 9, height positions of the irradiation optical system and the detection optical system are controlled by piezo electric elements 11,12,13 so that the irradiation optical system and the detection optical system are located at predetermined positions relating to the measured point.
摘要翻译：为了以一定的高精度测量样品的内部缺陷，即使样品的平坦度不均匀性上下移动的样品表面和样品移动台的精度问题，具有两个波长的入射光束和相应的样品的不同穿透深度从照射光学系统4,8倾斜地照射在移动样品15的表面上，并且通过用检测光学检测从样品内部发生的散射光来测量样品的内部缺陷系统9布置在样品表面上。距离测量装置14位于所述样品的移动方向的上游，比所述照射光学系统4,8和所述检测光学系统9，从而测量所述样品的表面高度。当通过距离测量装置14测量的样品上的测量点到达检测光学系统9的下部时，照射光学系统和检测光学系统的高度位置由压电元件11,12,13所控制照射光学系统和检测光学系统位于与测量点相关的预定位置处。

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