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    • 35. 发明授权
    • High aspect ratio probes with self-aligned control electrodes
    • 具有自对准控制电极的高纵横比探针
    • US5844251A
    • 1998-12-01
    • US573308
    • 1995-12-15
    • Noel C. MacDonaldZ. Lisa Zhang
    • Noel C. MacDonaldZ. Lisa Zhang
    • B81B1/00H01L21/00H01L29/06
    • G01Q60/04B82Y35/00G01Q60/16G01Q60/38G01Q70/10Y10S977/878
    • A high aspect ratio field emission or tunnelling probe is fabricated utilizing a single crystal reactive etching and metallization process. The resulting field emission probes have self-aligned single crystal silicon sharp tips, high aspect ratio supporting posts for the tips, and integrated, self-aligned gate electrodes surrounding an electrically isolated from the tips. The gate electrodes are spaced from the tips by between 200 and 800 nm and metal silicide or metal can be applied on the tips to achieve emitter turn on at low operational gate voltages. The resulting tips have a high aspect ratio for use in probing various surface phenomena, and for this purpose, the probes can be mounted on or integrated in a three-dimensional translator for mechanical scanning across the surface and for focusing by adjusting the height of the emitter above the surface.
    • 使用单晶反应蚀刻和金属化工艺制造高纵横比场致发射或隧道探针。 所产生的场致发射探针具有自对准单晶硅尖尖,用于尖端的高纵横比支撑柱,以及围绕与尖端电隔离的集成的自对准栅电极。 栅电极与尖端间隔200至800nm,并且金属硅化物或金属可以施加在尖端上,以在低操作栅极电压下实现发射极导通。 所得到的尖端具有高的纵横比用于探测各种表面现象,并且为此目的,探针可以安装在三维平移机上或集成在三维平移机中,用于穿过表面进行机械扫描,并通过调整高度来进行聚焦 发射体在表面以上。