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    • 32. 发明授权
    • Method for manufacturing a perpendicular write head
    • 用于制造垂直写头的方法
    • US07159302B2
    • 2007-01-09
    • US10813836
    • 2004-03-31
    • Michael FeldbaumQuang Le
    • Michael FeldbaumQuang Le
    • G11B5/127G11B5/147C23C14/00
    • G11B5/1278G11B5/1475Y10T29/49041Y10T29/49043Y10T29/49044Y10T29/49046Y10T29/49052
    • A method for manufacturing a write head having a small write pole tip that emits magnetic flux sufficient for effective perpendicular recording. The method creates a leading edge taper (LET) between the write pole tip and a magnetic flux guide to create a sufficient magnetic flux in the write pole. The LET is fabricated by ion milling away a sacrificial striated material whose layers have different rates of ion milling. The top layer of material thus mills away faster than lower layers, creating the required tapering of a negative mold. An endpoint material stops the milling. The LET magnetic material is then spattered into the negative mold, resulting in a well defined taper of magnetic flux shaping material extending the magnetic flux guide to the write pole tip, such that the write pole tip is able to emit sufficient magnetic flux for perpendicular recording.
    • 一种用于制造写头的方法,所述写头具有发射足以有效垂直记录的磁通量的小写尖端。 该方法在写极尖和磁通引导之间产生前缘锥形(LET),以在写入极中产生足够的磁通量。 LET通过离子铣削除去具有不同离子铣削速率的牺牲条纹材料来制造。 因此,顶层材料的磨料速度比较低,从而产生了负模具所需的锥形化。 端点材料停止铣削。 然后将LET磁性材料溅入阴模中,产生明确限定的磁通量成形材料的锥形,该磁通量成形材料将磁通引导件延伸到写入磁极尖端,使得写入磁极尖端能够发射足够的磁通量用于垂直记录 。
    • 34. 发明申请
    • Method for manufacturing a perpendicular write head
    • 用于制造垂直写头的方法
    • US20050219744A1
    • 2005-10-06
    • US10813836
    • 2004-03-31
    • Michael FeldbaumQuang Le
    • Michael FeldbaumQuang Le
    • G11B5/127G11B5/147
    • G11B5/1278G11B5/1475Y10T29/49041Y10T29/49043Y10T29/49044Y10T29/49046Y10T29/49052
    • A method for manufacturing a write head having a small write pole tip that emits magnetic flux sufficient for effective perpendicular recording. The method creates a leading edge taper (LET) between the write pole tip and a magnetic flux guide to create a sufficient magnetic flux in the write pole. The LET is fabricated by ion milling away a sacrificial striated material whose layers have different rates of ion milling. The top layer of material thus mills away faster than lower layers, creating the required tapering of a negative mold. An endpoint material stops the milling. The LET magnetic material is then spattered into the negative mold, resulting in a well defined taper of magnetic flux shaping material extending the magnetic flux guide to the write pole tip, such that the write pole tip is able to emit sufficient magnetic flux for perpendicular recording.
    • 一种用于制造写头的方法,所述写头具有发射足以有效垂直记录的磁通量的小写尖端。 该方法在写极尖和磁通引导之间产生前缘锥形(LET),以在写入极中产生足够的磁通量。 LET通过离子铣削除去具有不同离子铣削速率的牺牲条纹材料来制造。 因此,顶层材料的磨料速度比较低,从而产生了负模具所需的锥形化。 端点材料停止铣削。 然后将LET磁性材料溅入阴模中,产生明确限定的磁通量成形材料的锥形,该磁通量成形材料将磁通引导件延伸到写入磁极尖端,使得写入磁极尖端能够发射足够的磁通量用于垂直记录 。
    • 39. 发明授权
    • Manufacturing a narrow track read head
    • 制造窄轨读头
    • US08252516B2
    • 2012-08-28
    • US12261241
    • 2008-10-30
    • Quang LeJui-Lung Li
    • Quang LeJui-Lung Li
    • G11B5/127
    • G01R33/093B82Y25/00G11B5/3116G11B5/398Y10T29/49032Y10T29/49043
    • Embodiments of the invention operate to narrow the track width of a read head used in a disk drive. In one embodiment, a magnetic read head has a track width of about 40 nm or less. The read head is fabricated by a method that includes fabricating a film stack from a substrate, a sensor material, a stop material, a first release material, a mask material, and a photo resist material. The mask material may include a masking substrate material and a second release material. The film stack is processed by forming a read head image in the photo resist material, removing portions of the film stack that lie outside the read head image of the photo resist material, stripping the film stack to remove the photo resist, mask and first release materials, and milling the sensor material according to the read head image.
    • 本发明的实施例用于缩小磁盘驱动器中使用的读取头的磁道宽度。 在一个实施例中,磁读头具有约40nm或更小的轨道宽度。 读取头通过包括从基底,传感器材料,止挡材料,第一释放材料,掩模材料和光致抗蚀剂材料制造薄膜叠层的方法制造。 掩模材料可以包括掩蔽衬底材料和第二释放材料。 通过在光致抗蚀剂材料中形成读头图像来处理胶片堆叠,去除位于光致抗蚀剂材料的读取头图像之外的膜堆叠的部分,剥离胶片堆叠以除去光致抗蚀剂,掩模和第一释放 材料,并根据读头图像铣削传感器材料。