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    • 32. 发明授权
    • Method for manufacturing a semiconductor device
    • 半导体器件的制造方法
    • US07892973B2
    • 2011-02-22
    • US12605586
    • 2009-10-26
    • Masaya KawanoKoji SoejimaNobuaki Takahashi
    • Masaya KawanoKoji SoejimaNobuaki Takahashi
    • H01L21/44
    • H01L21/76898H01L23/481H01L2224/13H01L2224/13025H01L2224/14181
    • A falling off of a through electrode is inhibited without decreasing a reliability of a semiconductor device including a through electrode. A semiconductor device 100 includes: a silicon substrate 101; a through electrode 129 extending through the silicon substrate 101; and a first insulating ring 130 provided in a circumference of a side surface of the through electrode 129 and extending through the semiconductor substrate 101. In addition, the semiconductor device 100 also includes a protruding portion 146, being provided at least in the vicinity of a back surface of a device-forming surface of the semiconductor substrate 101 so as to contact with the through electrode 129, and protruding in a direction along the surface of the semiconductor substrate 101 toward an interior of the through electrode 129.
    • 在不降低包括通孔的半导体器件的可靠性的情况下,抑制穿通电极的脱落。 半导体器件100包括:硅衬底101; 穿过硅衬底101的通孔电极129; 以及设置在贯通电极129的侧面的周围并延伸穿过半导体基板101的第一绝缘环130.此外,半导体器件100还包括突出部分146,其设置在至少在 半导体衬底101的器件形成表面的背表面与通孔129接触,并沿着半导体衬底101的表面朝向通孔129的内部突出。
    • 37. 发明申请
    • Hot bend pipe and a process for its manufacture
    • 热弯管及其制造工艺
    • US20090199612A1
    • 2009-08-13
    • US12318882
    • 2009-01-12
    • Nobuaki TakahashiAkio YamamotoMasahiko Hamada
    • Nobuaki TakahashiAkio YamamotoMasahiko Hamada
    • B21D9/00B21D9/05
    • B21C37/08B23K33/006B23K2101/06B23K2103/04C21D9/08C21D9/50C22C38/02C22C38/04C22C38/06
    • A high-strength hot bend pipe which has a balance between an excellent strength of at least X70 grade and toughness and which has excellent tensile properties and a weld metal with excellent low temperature toughness is manufactured. A UOE steel pipe having a base metal with a composition of C: 0.03-0.12%, Si: 0.05-0.50%, Mn: 1.4-2.2%, S: at most 0.01%, Al: at most 0.06%, N: at most 0.008%, and a remainder of Fe and impurities, with the carbon equivalent (Ceq) being at most 0.36% and the weld cracking parameter (Pcm) being at most 0.22%, and having a weld metal with a weld cracking parameter (Pcm) of at most 0.28%, a B content of at most 5 ppm, and an O content of at most 280 ppm is heated to a temperature range of 900-1100° C. and subjected to bending, and then is immediately cooled to a temperature range of 300° C. or lower at a cooling rate of at least 3° C./sec, and then is tempered in a temperature range of 300-500° C.
    • 制造具有至少X70等级的优异强度和具有优异的拉伸性能的优异强度与具有优异的低温韧性的焊接金属之间的平衡的高强度热弯管。 具有组成为C:0.03〜0.12%,Si:0.05〜0.50%,Mn:1.4〜2.2%,S:0.01%以下,Al:0.06%以下的贱金属的UOE钢管,N: 最多0.008%,余量为Fe和杂质,碳当量(Ceq)最大为0.36%,焊接裂纹参数(Pcm)为0.22%以下,具有焊缝裂纹参数(Pcm )为0.28%以下,B含量为5ppm以下,O含量为280ppm以下,加热到900〜1100℃的温度范围,进行弯曲,然后立即冷却至 温度范围为300℃以下,冷却速度为3℃/秒以上,然后在300-500℃的温度范围内回火。