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31. 发明授权

US4602865A Method for sorting out slide films in a magazine system 失效
标题翻译：在杂志系统中整理幻灯片的方法
公开(公告)号：US4602865A
公开(公告)日：1986-07-29
申请号：US624965
申请日：1984-06-26
申请人： Kiyoshi Yamaguchi , Seiichi Yamazaki , Koji Ichikawa
发明人： Kiyoshi Yamaguchi , Seiichi Yamazaki , Koji Ichikawa
IPC分类号： G03B23/02 , G03B23/00 , G06K17/00 , G03B27/52
CPC分类号： G03B23/00 , G06K17/0016
摘要： A method for sorting slide films stored in a magazine. One slide film has a mount made of a rigid material such as thick paper, and an exposed film or a picture image is mounted on the mount. In a sequence of operations to take out a film slide from a magazine storing a plurality of slides, transport the same for a predetermined treatment and transport again to another place for storing the same in a different magazine or a bucket, a dummy slide which can be easily discerned is inserted for every group of slides sorted according to an arbitrary classification, for example by clients or by subjects, to thereby facilitate a sorting operation.
摘要翻译：一种用于分类储存在杂志中的幻灯片的方法。一个滑动膜具有由诸如厚纸的刚性材料制成的支架，并且暴露的胶片或图像被安装在支架上。在从存储多个幻灯片的杂志中取出胶片幻灯片的操作的顺序中，将其输送到预定的处理并再次传送到另一个位置以将其存储在不同的盒或桶中，对于根据任意分类排序的每个幻灯片组，例如由客户或受试者插入容易识别，从而便于分类操作。

32. 发明授权

US4557425A Problem-cartridge film processing method 失效
标题翻译：问题墨盒胶片处理方法
公开(公告)号：US4557425A
公开(公告)日：1985-12-10
申请号：US623296
申请日：1984-06-22
申请人： Koji Ichikawa
发明人： Koji Ichikawa
IPC分类号： G03D13/00
CPC分类号： G03D13/001
摘要： A method for processing film cartridges, especially for processing cartridges for which it is not possible to extract the leader of the film from the cartridge by an ordinary automatic method. The spool of the cartridge is first turned in the forward direction so as to attempt to extract the leader from the cartridge. If the leader has not been extracted within a designated period of time, the spool of the cartridge is rotated in the rewinding direction and a retaining clip is placed around the cartridge. The cartridge is then dropped into a troubled-cartridge collecting box having an identification number corresponding to the cartridge and to its respective development/processing envelope.
摘要翻译：一种用于处理胶片暗盒的方法，特别是用于处理不能从普通自动方法从暗盒提取胶片的前端的处理盒的方法。墨盒的卷轴首先向前转动，以试图从墨盒中取出导片。如果在指定的时间段内没有提取领导者，则墨盒的卷轴沿着倒卷方向旋转，并且保持夹被放置在墨盒周围。然后，将墨盒落入具有对应于墨盒的识别号码的故障盒收集盒及其各自的显影/处理信封。

33. 发明授权

US09507258B2 Resin and photoresist composition comprising the same 有权
标题翻译：树脂和包含其的光致抗蚀剂组合物
公开(公告)号：US09507258B2
公开(公告)日：2016-11-29
申请号：US13290558
申请日：2011-11-07
申请人： Koji Ichikawa , Masahiko Shimada , Takashi Nishimura
发明人： Koji Ichikawa , Masahiko Shimada , Takashi Nishimura
IPC分类号： G03F7/004 , C08F220/38 , G03F7/039 , G03F7/20 , C08F220/28
CPC分类号： G03F7/004 , C08F220/28 , C08F220/38 , G03F7/0045 , G03F7/0392 , G03F7/0397 , G03F7/2041
摘要： The present invention provides a resin comprising a structural unit represented by the formula (aa): wherein T1 represents a C4-C34 sultone ring group optionally having one or more substituents, X1 represents —O— or —N(Rc)—, Rc represents a hydrogen atom or a C1-C6 alkyl group, Z1 represents *-X2—, *-X2—X4—CO—X3—, or *-X2—CO—X4—X3—, X2 and X3 independently each represent a C1-C6 alkanediyl group, X4 represents —O— or —N(Rc)—, * represents a binding position to X1, and R1 represents a C1-C6 alkyl group optionally having one or more halogen atoms, a hydrogen atom or a halogen atom.

34. 发明授权

US09346750B2 Salt and photoresist composition containing the same 有权
标题翻译：含有其的盐和光致抗蚀剂组合物
公开(公告)号：US09346750B2
公开(公告)日：2016-05-24
申请号：US12947349
申请日：2010-11-16
申请人： Koji Ichikawa , Mitsuyoshi Ochiai , Masako Sugihara
发明人： Koji Ichikawa , Mitsuyoshi Ochiai , Masako Sugihara
IPC分类号： C07C309/19 , C07C309/17 , C07C381/12 , C07D307/33 , C07D307/93 , C07D327/06 , C07D333/08 , G03F7/004 , G03F7/039 , G03F7/20
CPC分类号： C07C309/17 , C07C381/12 , C07C2603/74 , C07D307/33 , C07D307/93 , C07D327/06 , C07D333/08 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041
摘要： A salt represented by the formula (X): wherein Q1 and Q2 each independently represent a fluorine atom etc., L1 and L2 independently each represent a C1-C17 divalent saturated hydrocarbon group, ring W1 represents a C3-C36 saturated hydrocarbon ring, R2 is independently in each occurrence a hydroxyl group etc., s represents an integer of 0 to 2, Z+ represents an organic counter ion, and W10 represents a group represented by the formula (X-1): wherein ring W2 represents a C4-C36 saturated hydrocarbon ring in which one or more —CH2— can be replaced by —O— or —CO—, with the proviso that at least one —CH2— in the C4-C36 saturated hydrocarbon ring is replaced by —CO—, R3 is independently in each occurrence a C1-C6 alkyl group etc., and t represents an integer of 0 to 2, or a group represented by the formula (X-2): wherein ring W3 represents a C3-C36 saturated hydrocarbon ring, R4 is independently in each occurrence a hydroxyl group etc., R5 is independently in each occurrence a C1-C6 alkyl group etc., v represents an integer of 1 to 3, and w represents an integer of 0 to 2.
摘要翻译：由式（X）表示的盐：其中Q1和Q2各自独立地表示氟原子等，L1和L2各自独立地表示C1-C17二价饱和烃基，环W1表示C3-C36饱和烃环，R2 每次出现羟基等，s表示0〜2的整数，Z +表示有机抗衡离子，W10表示由式（X-1）表示的基团：其中，环W2表示C4-C36 饱和烃环，其中一个或多个-CH 2 - 可以被-O-或-CO-代替，条件是C4-C36饱和烃环中的至少一个-CH2-被-CO-代替，R3是在每次出现时独立地为C1-C6烷基等，t表示0〜2的整数，或式（X-2）表示的基团：其中，环W3表示C3-C36饱和烃环，R4表示在每次出现时都独立地是羟基等，R5各自独立地出现含有C 1 -C 6烷基等，v表示1〜3的整数，w表示0〜2的整数。

35. 发明授权

US09291893B2 Resist composition and method for producing resist pattern 有权
标题翻译：抗蚀剂组合物和抗蚀剂图案的制造方法
公开(公告)号：US09291893B2
公开(公告)日：2016-03-22
申请号：US13281145
申请日：2011-10-25
申请人： Tatsuro Masuyama , Satoshi Yamamoto , Koji Ichikawa
发明人： Tatsuro Masuyama , Satoshi Yamamoto , Koji Ichikawa
IPC分类号： G03F7/004 , G03F7/039 , G03F7/20
CPC分类号： G03F7/0046 , G03F7/0045 , G03F7/0397 , G03F7/2041
摘要： A resist composition contains; a resin having a structural unit represented by the formula (aa) and a structural unit represented by the formula (ab); and an acid generator, wherein Raa1 represents a hydrogen atom and a methyl group; Aaa1 represents an optionally substituted C1 to C6 alkanediyl group etc.; Raa2 represents an optionally substituted C1 to C18 aliphatic hydrocarbon group; Rab1 represents a hydrogen atom and a methyl group; Aab1 represents a single bond, an optionally substituted C1 to C6 alkanediyl group etc.; W1 represents an optionally substituted C4 to C24 alicyclic hydrocarbon group; n represents 1 or 2; Aab2 in each occurrence independently represents an optionally substituted C1 to C6 aliphatic hydrocarbon group; Rab2 in each occurrence independently represents a C1 to C12 fluorinated alkyl group.
摘要翻译：抗蚀剂组合物含有具有由式（aa）表示的结构单元的树脂和由式（ab）表示的结构单元; 和酸产生剂，其中Raa1表示氢原子和甲基; Aaa1表示可以具有取代基的C1〜C6烷二基等。 Raa2表示任选取代的C1至C18脂族烃基; Rab1表示氢原子和甲基; Aab1表示单键，任选取代的C 1至C 6烷二基等; W1表示任选取代的C4至C24脂环族烃基; n表示1或2; Aab2各自独立地表示任选取代的C 1至C 6脂族烃基; Rab2各自独立地表示C1〜C12氟化烷基。

36. 发明授权

US09229320B2 Resist composition and method for producing resist pattern 有权
标题翻译：抗蚀剂组合物和抗蚀剂图案的制造方法
公开(公告)号：US09229320B2
公开(公告)日：2016-01-05
申请号：US13196446
申请日：2011-08-02
申请人： Koji Ichikawa , Satoshi Yamamoto
发明人： Koji Ichikawa , Satoshi Yamamoto
IPC分类号： G03F7/004 , G03F7/039 , G03F7/20
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041 , G03F7/2059
摘要： A resist composition contains; a resin having a structural unit derived from a compound represented by the formula (a); and an acid generator represented by the formula (B1). wherein R1 represents a hydrogen atom or a methyl group; A10 represents a single bond, an optionally substituted C1 to C6 alkanediyl group or a group represented by formula (a-1) defined in the specification; W1 represents an optionally substituted C4 to C36 alicyclic hydrocarbon group; A20 in each occurrence independently represents an optionally substituted C1 to C6 aliphatic hydrocarbon group; R2 in each occurrence independently represents a C1 to C12 perfluoroalkyl group; n represents 1 or 2; Q1 and Q2 independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group; Lb1 represents an optionally substituted C1 to C17 divalent aliphatic hydrocarbon group; Y represents an optionally substituted C1 to C18 aliphatic hydrocarbon group; and Z+ represents an organic cation.
摘要翻译：抗蚀剂组合物含有具有衍生自由式（a）表示的化合物的结构单元的树脂; 和由式（B1）表示的酸发生剂。其中R1表示氢原子或甲基; A10表示单键，可以具有取代基的C1〜C6烷二基或由说明书中定义的式（a-1）表示的基团; W1表示任选取代的C4至C36脂环族烃基; A20每次独立地表示任选取代的C 1至C 6脂族烃基; R2各自独立地表示C1〜C12全氟烷基; n表示1或2; Q1和Q2独立地表示氟原子或C1〜C6全氟烷基; Lb1表示任选取代的C 1至C 17二价脂族烃基; Y表示任选取代的C 1至C 18脂族烃基; Z +表示有机阳离子。

37. 发明授权

US08916330B2 Chemically amplified photoresist composition and method for forming resist pattern 有权
标题翻译：化学扩增的光致抗蚀剂组合物和形成抗蚀剂图案的方法
公开(公告)号：US08916330B2
公开(公告)日：2014-12-23
申请号：US12821850
申请日：2010-06-23
申请人： Koji Ichikawa , Takashi Hiraoka
发明人： Koji Ichikawa , Takashi Hiraoka
IPC分类号： G03F7/004 , G03F7/40 , C07C321/00 , C07D407/00
CPC分类号： G03F7/0397 , C08F220/18 , C08F220/20 , C08F2220/303 , G03F7/0045 , G03F7/0046 , G03F7/2041
摘要： The present invention provides a resist composition giving a resist pattern excellent in CD uniformity and focus margin. A chemically amplified photoresist composition comprises a resin (A) and an acid generator (B), and the resin (A) contains, as a part or an entirety thereof, a copolymer (A1) which is obtained by polymerizing at least: a (meth)acrylic monomer (a1) having C5-20 alicyclic hydrocarbon group which becomes soluble in an aqueous alkali solution by the action of an acid; a (meth)acrylic monomer (a2) having a hydroxy group-containing adamantyl group; and a (meth)acrylic monomer (a3) having a lactone ring, and the copolymer (A1) has a weight-average molecular weight of 2500 or more and 5000 or less, and a content of the copolymer (A1) is not less than 50 parts by mass with respect to 100 parts by mass of the resin (A).
摘要翻译：本发明提供了具有优异的CD均匀性和聚焦余量的抗蚀剂图案的抗蚀剂组合物。化学放大型光致抗蚀剂组合物包含树脂（A）和酸产生剂（B），树脂（A）的一部分或全部含有共聚物（A1），其通过至少聚合得到：（甲基）丙烯酸单体（a1），其具有通过酸的作用变得可溶于碱性水溶液的C5-20脂环族烃基; 具有含羟基金刚烷基的（甲基）丙烯酸系单体（a2）和具有内酯环的（甲基）丙烯酸系单体（a3），共聚物（A1）的重均分子量为2500以上且5000以下，共聚物（A1）的含量为相对于100质量份树脂（A）为50质量份。

38. 发明授权

US08859182B2 Resist composition and method for producing resist pattern 有权
标题翻译：抗蚀剂组合物和抗蚀剂图案的制造方法
公开(公告)号：US08859182B2
公开(公告)日：2014-10-14
申请号：US13404064
申请日：2012-02-24
申请人： Koji Ichikawa , Takahiro Yasue , Akira Kamabuchi
发明人： Koji Ichikawa , Takahiro Yasue , Akira Kamabuchi
IPC分类号： G03F7/004 , G03F7/027 , C08F26/06 , G03F7/20 , G03F7/039
CPC分类号： G03F7/027 , G03F7/0045 , G03F7/0397 , G03F7/20 , G03F7/2041
摘要： A resist composition contains (A) a resin having a structural unit represented by the formula (I), (B) an acid generator and (D) a compound represented by the formula (II), wherein R1, ring X1, R3, R4, m, and n are defined in the specification.
摘要翻译：抗蚀剂组合物含有（A）具有由式（I）表示的结构单元，（B）酸产生剂和（D）由式（II）表示的化合物的树脂，其中R1，X1，R3，R4 ，m和n在说明书中定义。

39. 发明授权

US08753796B2 Photoresist composition 有权
标题翻译：光刻胶组成
公开(公告)号：US08753796B2
公开(公告)日：2014-06-17
申请号：US13443155
申请日：2012-04-10
申请人： Koji Ichikawa , Hiromu Sakamoto , Yuichi Mukai
发明人： Koji Ichikawa , Hiromu Sakamoto , Yuichi Mukai
IPC分类号： G03F7/039 , G03F7/38
CPC分类号： G03F7/0046 , G03F7/0045 , G03F7/0397 , G03F7/2041
摘要： The present invention provides a photoresist composition comprising a salt represented by the formula (I): wherein R1 and R2 independently each represent a fluorine atom or a C1-C6 perfluoroalkyl group, X1 represents a C1-C17 divalent saturated hydrocarbon group, etc., s1 represents 1 or 2, and t1 represents 0 or 1, with proviso that sum of s1 and t1 is 1 or 2, R3 represents a C1-C12 saturated hydrocarbon group, etc., u1 represents an integer of 0 to 8, and (Z1)+ represents an organic cation,a salt represented by the formula (II-0): wherein R4 represents a C1-C24 hydrocarbon group etc., X2 represents a C1-C6 alkanediyl group etc., and (Z2)+ represents an organic cation, anda resin being insoluble or poorly soluble in an aqueous alkali solution but becoming soluble in an aqueous alkali solution by the action of an acid.
摘要翻译：本发明提供了包含式（I）表示的盐的光致抗蚀剂组合物：其中R1和R2各自独立地表示氟原子或C1-C6全氟烷基，X1表示C1-C17二价饱和烃基等， s1表示1或2，t1表示0或1，条件是s1和t1之和为1或2，R3表示C1-C12饱和烃基等，u1表示0〜8的整数，（ Z1）+表示有机阳离子，式（II-0）表示的盐：其中，R4表示C1-C24烃基等，X2表示C1-C6烷二基等，（Z2）+表示有机阳离子和在碱性水溶液中不溶或难溶的树脂，但通过酸的作用变得可溶于碱性水溶液。

40. 发明授权

US08753795B2 Photoresist composition 有权
标题翻译：光刻胶组成
公开(公告)号：US08753795B2
公开(公告)日：2014-06-17
申请号：US13428555
申请日：2012-03-23
申请人： Koji Ichikawa , Hiromu Sakamoto , Yuichi Mukai
发明人： Koji Ichikawa , Hiromu Sakamoto , Yuichi Mukai
IPC分类号： G03F7/039 , G03F7/30
CPC分类号： C07D411/12 , C07D305/06 , C07D307/93 , G03F7/0045 , G03F7/0392 , G03F7/0397 , G03F7/2041
摘要： The present invention provides a photoresist composition containing: a resin which contains a structural unit derived from a compound having an acid-labile group and which is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid; an acid generator and a compound represented by the formula (I): wherein R1, X1, R2, u1, s1, t1 are each defined in the specification, with the proviso that sum of s1 and t1 is 1 or 2.
摘要翻译：本发明提供一种光致抗蚀剂组合物，其含有：含有来自具有酸不稳定基团的化合物的结构单元的树脂，其在碱性水溶液中不溶或难溶于碱性水溶液，但通过酸; 酸产生剂和由式（I）表示的化合物：其中R1，X1，R2，u1，s1，t1各自在说明书中定义，条件是s1和t1的和为1或2。

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