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31. 发明授权

US09221785B2 Salt and photoresist composition containing the same 有权
标题翻译：含有其的盐和光致抗蚀剂组合物
公开(公告)号：US09221785B2
公开(公告)日：2015-12-29
申请号：US12797459
申请日：2010-06-09
申请人： Koji Ichikawa , Masako Sugihara , Masahiko Shimada
发明人： Koji Ichikawa , Masako Sugihara , Masahiko Shimada
IPC分类号： G03F7/004 , G03F7/38 , C07D317/12 , C07D317/16 , C07D317/24 , C07D319/02 , C07D319/12 , C07D321/02 , C07D327/04 , C07D327/06 , C07D339/02 , C07D339/06 , C07D339/08 , C07C381/12 , C07C309/17 , G03F7/039
CPC分类号： C07D327/06 , C07C309/17 , C07C381/12 , C07C2603/74 , C07D317/12 , C07D317/16 , C07D317/24 , C07D319/12 , C07D321/02 , C07D327/04 , C07D339/02 , C07D339/06 , C07D339/08 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/38
摘要： A salt having a group represented by the formula (I): -T (I) wherein T represents a C3-C36 alicyclic hydrocarbon group in which at least two methylene groups are replaced by —O— or —S— and which can have one or more substituents.
摘要翻译：具有由式（I）表示的基团的盐：-T（I）其中T表示其中至少两个亚甲基被-O-或-S-代替的C 3 -C 36脂环族烃基，并且可以具有一个或更多取代基。

32. 发明授权

US09176379B2 Resist composition and method for producing resist pattern 有权
标题翻译：抗蚀剂组合物和抗蚀剂图案的制造方法
公开(公告)号：US09176379B2
公开(公告)日：2015-11-03
申请号：US13441205
申请日：2012-04-06
申请人： Koji Ichikawa , Takahiro Yasue , Tatsuro Masuyama
发明人： Koji Ichikawa , Takahiro Yasue , Tatsuro Masuyama
IPC分类号： G03F7/004 , G03F7/027 , G03F7/20 , G03F7/039
CPC分类号： G03F7/0046 , G03F7/0045 , G03F7/027 , G03F7/0397 , G03F7/20 , G03F7/2041
摘要： A resist composition includes (A) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid, (B) an acid generator having a structure to be cleaved by the action of an alkaline developer, and (C) a compound represented by the formula (I), wherein R1 and R2 in each occurrence independently represent a C1 to C12 hydrocarbon group, a C1 to C6 alkoxyl group, a C2 to C7 acyl group, a C2 to C7 acyloxy group, a C2 to C7 alkoxycarbonyl group, a nitro group or a halogen atom; m and n independently represent an integer of 0 to 4.
摘要翻译：抗蚀剂组合物包括（A）在碱性水溶液中不溶或难溶的树脂，但是通过酸的作用可溶于碱性水溶液中，（B）具有要通过碱性显影剂，和（C）由式（I）表示的化合物，其中R1和R2各自独立地表示C1〜C12烃基，C1〜C6烷氧基，C2〜C7酰基，C2 C7酰氧基，C2〜C7烷氧基羰基，硝基或卤素原子; m和n独立地表示0〜4的整数。

33. 发明授权

US09176378B2 Resist composition and method for producing resist pattern 有权
标题翻译：抗蚀剂组合物和抗蚀剂图案的制造方法
公开(公告)号：US09176378B2
公开(公告)日：2015-11-03
申请号：US13441185
申请日：2012-04-06
申请人： Koji Ichikawa , Takahiro Yasue , Satoshi Yamaguchi
发明人： Koji Ichikawa , Takahiro Yasue , Satoshi Yamaguchi
IPC分类号： G03F7/004 , G03F7/039 , G03F7/20
CPC分类号： G03F7/0046 , G03F7/0045 , G03F7/0397 , G03F7/2041
摘要： A resist composition of the invention includes: (A) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid, (B) an acid generator represented by the formula (II), and (D) a compound represented by the formula (I), wherein R1, R2, m, n, Q1, Q2, L1, ring W1 and Z+ are defined in the specification.
摘要翻译：本发明的抗蚀剂组合物包括：（A）在碱性水溶液中不溶或难溶的树脂，但是通过酸作用而溶于碱性水溶液中的树脂，（B）由式（II）表示的酸发生剂）和（D）由式（I）表示的化合物，其中R1，R2，m，n，Q1，Q2，L1，环W1和Z +在说明书中定义。

34. 发明授权

US09128373B2 Resist composition and method for producing resist pattern 有权
标题翻译：抗蚀剂组合物和抗蚀剂图案的制造方法
公开(公告)号：US09128373B2
公开(公告)日：2015-09-08
申请号：US13441035
申请日：2012-04-06
申请人： Koji Ichikawa , Takahiro Yasue , Satoshi Yamaguchi
发明人： Koji Ichikawa , Takahiro Yasue , Satoshi Yamaguchi
IPC分类号： G03F7/004 , G03F7/039 , G03F7/20
CPC分类号： G03F7/0046 , G03F7/0045 , G03F7/0397 , G03F7/2041
摘要： A resist composition includes; (A) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid, (B) an acid generator having an acid-labile group; and (D) a compound represented by the formula (I), wherein R1 and R2 in each occurrence independently represent a C1 to C12 hydrocarbon group, a C1 to C6 alkoxyl group, a C2 to C7 acyl group, a C2 to C7 acyloxy group, a C2 to C7 alkoxycarbonyl group, a nitro group or a halogen atom; m and n independently represent an integer of 0 to 4.
摘要翻译：抗蚀剂组合物包括：（A）在碱性水溶液中不溶或难溶的树脂，但是通过酸的作用变得可溶于碱性水溶液，（B）具有酸不稳定基团的酸发生剂; 和（D）式（I）表示的化合物，其中R 1和R 2各自独立地表示C1〜C12烃基，C1〜C6烷氧基，C2〜C7酰基，C2〜C7酰氧基 C2-C7烷氧基羰基，硝基或卤素原子; m和n独立地表示0〜4的整数。

35. 发明授权

US09052591B2 Resist composition and method for producing resist pattern 有权
标题翻译：抗蚀剂组合物和抗蚀剂图案的制造方法
公开(公告)号：US09052591B2
公开(公告)日：2015-06-09
申请号：US13552281
申请日：2012-07-18
申请人： Koji Ichikawa , Takahiro Yasue
发明人： Koji Ichikawa , Takahiro Yasue
IPC分类号： G03F7/039 , G03F7/004 , G03F7/20
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041
摘要： A resist composition having a resin having a structural unit represented by the formula (I), a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and not including the structural unit represented by the formula (I), and an acid generator, wherein R1, A1, A13, A14, X12, R3, R4, m′ and n′ are defined in the specification.
摘要翻译：一种抗蚀剂组合物，其具有由式（I）表示的结构单元的树脂，树脂在碱性水溶液中不溶或难溶，但通过酸而不溶于碱性水溶液，不包括结构单元由式（I）表示的酸产生剂，其中R1，A1，A13，A14，X12，R3，R4，m'和n'在说明书中定义。

36. 发明授权

US08852846B2 Salt and photoresist composition comprising the same 有权
标题翻译：包含其的盐和光致抗蚀剂组合物
公开(公告)号：US08852846B2
公开(公告)日：2014-10-07
申请号：US13439478
申请日：2012-04-04
申请人： Yukako Anryu , Koji Ichikawa
发明人： Yukako Anryu , Koji Ichikawa
IPC分类号： G03F7/004 , G03F7/38 , C07C303/32 , C07D277/06 , C07D279/06 , C07D281/06 , C07D295/06 , C07D279/12 , C07D303/32 , G03F7/039 , G03F7/20
CPC分类号： C07D279/12 , C07C303/32 , C07D277/06 , C07D279/06 , C07D281/06 , C07D295/06 , C07D303/32 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041 , Y10S430/121 , Y10S430/123
摘要： The present invention provides a salt represented by the formula (I): wherein Q1 and Q2 independently each represent a fluorine atom or a C1-C6 perfluoroalkyl group, L1 represents a C1-C20 divalent saturated hydrocarbon group in which one or more —CH2— can be replaced by —O— or —CO—, W represents a group represented by the formula (W1), (W2), (W3), (W4) or (W5): and Z+ represents an organic counter ion.
摘要翻译：本发明提供由式（I）表示的盐：其中Q1和Q2独立地表示氟原子或C1-C6全氟烷基，L1表示C1-C20二价饱和烃基，其中一个或多个-CH 2 - 可以被-O-或-CO-代替，W表示由式（W1），（W2），（W3），（W4）或（W5）表示的基团：Z +表示有机抗衡离子。

37. 发明授权

US08741543B2 Resist composition and method for producing resist pattern 有权
标题翻译：抗蚀剂组合物和抗蚀剂图案的制造方法
公开(公告)号：US08741543B2
公开(公告)日：2014-06-03
申请号：US13551874
申请日：2012-07-18
申请人： Koji Ichikawa , Satoshi Yamaguchi , Yuki Suzuki
发明人： Koji Ichikawa , Satoshi Yamaguchi , Yuki Suzuki
IPC分类号： G03F7/039 , G03F7/20 , G03F7/30 , G03F7/38
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041
摘要： A resist composition having a resin having a structural unit represented by the formula (I), a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and not including the structural unit represented by the formula (I), and an acid generator having an acid labile group, wherein R1, A1, A13, A14, X12 are defined in the specification.
摘要翻译：一种抗蚀剂组合物，其具有由式（I）表示的结构单元的树脂，树脂在碱性水溶液中不溶或难溶，但通过酸而不溶于碱性水溶液，不包括结构单元由式（I）表示的酸产生剂和具有酸不稳定基团的酸产生剂，其中R1，A1，A13，A14，X12在说明书中定义。

38. 发明授权

US08741541B2 Compound, resin, photoresist composition, and method for producing photoresist pattern 有权
标题翻译：化合物，树脂，光致抗蚀剂组合物，以及光致抗蚀剂图案的制造方法
公开(公告)号：US08741541B2
公开(公告)日：2014-06-03
申请号：US13475594
申请日：2012-05-18
申请人： Koji Ichikawa , Isao Yoshida
发明人： Koji Ichikawa , Isao Yoshida
IPC分类号： G03F7/039 , G03F7/30
CPC分类号： C08F122/20 , C07C69/757 , C07C2603/74 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041
摘要： A compound represented by formula (I): wherein T1 represents a single bond or a C6-C14 aromatic hydrocarbon group, L1 represents a C1-C17 divalent saturated hydrocarbon group in which a methylene group may be replaced by an oxygen atom or a carbonyl group, L2 and L3 each independently represent a single bond or a C1-C6 divalent saturated hydrocarbon group in which a methylene group may be replaced by an oxygen atom or a carbonyl group, ring W1 and ring W2 each independently represent a C3-C36 hydrocarbon ring, R1 and R2 each independently represent a hydrogen atom, a hydroxyl group, or C1-C6 alkyl group, R3 and R4 each independently represent a hydroxyl group, or C1-C6 alkyl group, R5 represents a hydroxyl group or a methyl group, m represents 0 or 1, and t and u each independently represent an integer of 0 to 2.
摘要翻译：由式（I）表示的化合物：其中，T1表示单键或C6-C14芳香族烃基，L1表示可以被氧原子或羰基取代亚甲基的C1-C17二价饱和烃基，L2和L3各自独立地表示单键或C1-C6二价饱和烃基，其中亚甲基可被氧原子或羰基取代，环W1和环W2各自独立地表示C3-C36烃环，R 1和R 2各自独立地表示氢原子，羟基或C 1 -C 6烷基，R 3和R 4各自独立地表示羟基或C 1 -C 6烷基，R 5表示羟基或甲基，m 表示0或1，t和u各自独立地表示0〜2的整数。

39. 发明授权

US08663899B2 Resist composition and method for producing resist pattern 有权
标题翻译：抗蚀剂组合物和抗蚀剂图案的制造方法
公开(公告)号：US08663899B2
公开(公告)日：2014-03-04
申请号：US13551855
申请日：2012-07-18
申请人： Koji Ichikawa , Takashi Hiraoka , Hiromu Sakamoto
发明人： Koji Ichikawa , Takashi Hiraoka , Hiromu Sakamoto
IPC分类号： G03F7/039 , G03F7/20 , G03F7/30 , G03F7/38
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041
摘要： A resist composition having a resin having a structural unit represented by the formula (I), a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and not including the structural unit represented by the formula (I), and an acid generator, wherein R1, A1, R2, Rb1, Rb2, Lb1, ring Wb1, Rb3, Rb4, and Z1+ are defined in the specification.
摘要翻译：一种抗蚀剂组合物，其具有由式（I）表示的结构单元的树脂，树脂在碱性水溶液中不溶或难溶，但通过酸而不溶于碱性水溶液，不包括结构单元由式（I）表示的酸产生剂，其中R1，A1，R2，Rb1，Rb2，Lb1，环Wb1，Rb3，Rb4和Z1 +在本说明书中定义。

40. 发明授权

US08614046B2 Salt and photoresist composition containing the same 有权
标题翻译：含有其的盐和光致抗蚀剂组合物
公开(公告)号：US08614046B2
公开(公告)日：2013-12-24
申请号：US12833457
申请日：2010-07-09
申请人： Koji Ichikawa , Masako Sugihara , Yuko Yamashita
发明人： Koji Ichikawa , Masako Sugihara , Yuko Yamashita
IPC分类号： G03F7/004 , G03F7/30 , C07C22/02 , C07C57/28 , C07C61/35 , C07C63/64 , C07C63/66 , G03F7/039 , C08F22/02
CPC分类号： C08F22/02 , C07C25/18 , C07C57/03 , C07C57/28 , C07C63/64 , C07C63/66 , C07C69/54 , C07C309/17 , C07C381/12 , C07C2603/74 , C08F20/38 , C08F32/08 , G03F7/0045 , G03F7/0397 , G03F7/30 , Y10S430/122 , Y10S430/123
摘要： A salt represented by the formula (I-Pa): wherein Xpa represents a single bond or a C1-C4 alkylene group, Rpa represents a single bond, a C4-C36 divalent alicyclic hydrocarbon group or a C6-C36 divalent aromatic hydrocarbon group, and one or more methylene groups in the divalent alicyclic hydrocarbon group can be replaced by —O— or —CO—, Ypa represents a polymerizable group, and Zpa+ represents an organic cation.
摘要翻译：由式（I-Pa）表示的盐：其中Xpa表示单键或C1-C4亚烷基，Rpa表示单键，C4-C36二价脂环族烃基或C6-C36二价芳族烃基，二价脂环族烃基中的一个或多个亚甲基可以被-O-或-CO-代替，Ypa表示可聚合基团，Zpa +表示有机阳离子。

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