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31. 发明申请

US20130022924A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN 有权
标题翻译：耐蚀组合物及其制造方法
公开(公告)号：US20130022924A1
公开(公告)日：2013-01-24
申请号：US13552281
申请日：2012-07-18
申请人： Koji ICHIKAWA , Takahiro YASUE
发明人： Koji ICHIKAWA , Takahiro YASUE
IPC分类号： G03F7/027 , G03F7/20
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041
摘要： A resist composition having a resin having a structural unit represented by the formula (I), a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and not including the structural unit represented by the formula (I), and an acid generator, wherein R1, A1, A13, A14, X12, R3, R4, m′ and n′ are defined in the specification.
摘要翻译：一种抗蚀剂组合物，其具有由式（I）表示的结构单元的树脂，树脂在碱性水溶液中不溶或难溶，但通过酸而不溶于碱性水溶液，不包括结构单元由式（I）表示的酸产生剂，其中R1，A1，A13，A14，X12，R3，R4，m'和n'在说明书中定义。

32. 发明申请

US20130022921A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN 有权
标题翻译：耐蚀组合物及其制造方法
公开(公告)号：US20130022921A1
公开(公告)日：2013-01-24
申请号：US13552242
申请日：2012-07-18
申请人： Koji ICHIKAWA , Tatsuro MASUYAMA , Satoshi YAMAGUCHI
发明人： Koji ICHIKAWA , Tatsuro MASUYAMA , Satoshi YAMAGUCHI
IPC分类号： G03F7/027 , G03F7/20
CPC分类号： G03F7/0046 , G03F7/0045 , G03F7/0397 , G03F7/2041
摘要： A resist composition having; a resin having a structural unit represented by the formula (I), a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and not including the structural unit represented by the formula (I), an acid generator, and a salt having an anion represented by the formula (IA). wherein R1, A1, A13, X12, A14, R1A and R2A are defined in the specification.
摘要翻译：一种抗蚀剂组合物，具有：具有由式（I）表示的结构单元的树脂，树脂在碱性水溶液中不溶或难溶，但是通过酸的作用而溶解在碱性水溶液中，不包括由式（I），酸产生剂和具有由式（IA）表示的阴离子的盐。其中R1，A1，A13，X12，A14，R1A和R2A在说明书中定义。

33. 发明申请

US20130022916A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN 有权
标题翻译：耐蚀组合物及其制造方法
公开(公告)号：US20130022916A1
公开(公告)日：2013-01-24
申请号：US13551724
申请日：2012-07-18
申请人： Koji ICHIKAWA , Takashi HIRAOKA , Mitsuyoshi OCHIAI
发明人： Koji ICHIKAWA , Takashi HIRAOKA , Mitsuyoshi OCHIAI
IPC分类号： G03F7/027 , G03F7/20
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041
摘要： A resist composition having a resin having a structural unit represented by the formula (I), a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and not including the structural unit represented by the formula (I), and an acid generator represented by the formula (II), wherein R1, A1, A13, A14, X12, Q1, Q2, L1, ring W, Rf1 and Rf2, n and Z+ are defined in the specification.
摘要翻译：一种抗蚀剂组合物，其具有由式（I）表示的结构单元的树脂，树脂在碱性水溶液中不溶或难溶，但通过酸而不溶于碱性水溶液，不包括结构单元由式（I）表示的酸产生剂和由式（II）表示的酸产生剂，其中R1，A1，A13，A14，X12，Q1，Q2，L1，环W，Rf1和Rf2，n和Z +定义在规格。

34. 发明申请

US20130022909A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN 有权
标题翻译：耐蚀组合物及其制造方法
公开(公告)号：US20130022909A1
公开(公告)日：2013-01-24
申请号：US13551860
申请日：2012-07-18
申请人： Koji ICHIKAWA , Satoshi YAMAGUCHI
发明人： Koji ICHIKAWA , Satoshi YAMAGUCHI
IPC分类号： G03F7/004 , G03F7/20
CPC分类号： G03F7/0045 , G03F7/0397 , G03F7/2041
摘要： A resist composition having a resin having a structural unit represented by the formula (I), a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and not including the structural unit represented by the formula (I), an acid generator, and a compound represented by the formula (II), wherein R1, A1, A13, A14, X12, R23 and ring W21 are defined in the specification.
摘要翻译：一种抗蚀剂组合物，其具有由式（I）表示的结构单元的树脂，树脂在碱性水溶液中不溶或难溶，但通过酸而不溶于碱性水溶液，不包括结构单元由式（I）表示的酸产生剂和由式（II）表示的化合物，其中R1，A1，A13，A14，X12，R23和环W21在说明书中定义。

35. 发明申请

US20120264055A1 PHOTORESIST COMPOSITION 有权
标题翻译：光电组合物
公开(公告)号：US20120264055A1
公开(公告)日：2012-10-18
申请号：US13443155
申请日：2012-04-10
申请人： Koji ICHIKAWA , Hiromu SAKAMOTO , Yuichi MUKAI
发明人： Koji ICHIKAWA , Hiromu SAKAMOTO , Yuichi MUKAI
IPC分类号： G03F7/027 , G03F7/20
CPC分类号： G03F7/0046 , G03F7/0045 , G03F7/0397 , G03F7/2041
摘要： The present invention provides a photoresist composition comprising a salt represented by the formula (I): wherein R1 and R2 independently each represent a fluorine atom or a C1-C6 perfluoroalkyl group, X1 represents a C1-C17 divalent saturated hydrocarbon group, etc., s1 represents 1 or 2, and t1 represents 0 or 1, with proviso that sum of s1 and t1 is 1 or 2, R3 represents a C1-C12 saturated hydrocarbon group, etc., u1 represents an integer of 0 to 8, and (z1)+ represents an organic cation,a salt represented by the formula (II-0): wherein R4 represents a C1-C24 hydrocarbon group etc., X2 represents a C1-C6 alkanediyl group etc., and (Z2)+ represents an organic cation, anda resin being insoluble or poorly soluble in an aqueous alkali solution but becoming soluble in an aqueous alkali solution by the action of an acid.
摘要翻译：本发明提供了包含式（I）表示的盐的光致抗蚀剂组合物：其中R1和R2各自独立地表示氟原子或C1-C6全氟烷基，X1表示C1-C17二价饱和烃基等， s1表示1或2，t1表示0或1，条件是s1和t1之和为1或2，R3表示C1-C12饱和烃基等，u1表示0〜8的整数，（ z1）+表示有机阳离子，式（II-0）表示的盐：其中，R4表示C1-C24烃基等，X2表示C1-C6烷二基等，（Z2）+表示有机阳离子和在碱性水溶液中不溶或难溶的树脂，但通过酸的作用变得可溶于碱性水溶液。

36. 发明申请

US20120258405A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN 有权
标题翻译：耐蚀组合物及其制造方法
公开(公告)号：US20120258405A1
公开(公告)日：2012-10-11
申请号：US13441035
申请日：2012-04-06
申请人： Koji ICHIKAWA , Takahiro YASUE , Satoshi YAMAGUCHI
发明人： Koji ICHIKAWA , Takahiro YASUE , Satoshi YAMAGUCHI
IPC分类号： G03F7/027 , G03F7/20
CPC分类号： G03F7/0046 , G03F7/0045 , G03F7/0397 , G03F7/2041
摘要： A resist composition includes; (A) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid, (B) an acid generator having an acid-labile group; and (D) a compound represented by the formula (I), wherein R1 and R2 in each occurrence independently represent a C1 to C12 hydrocarbon group, a C1 to C6 alkoxyl group, a C2 to C7 acyl group, a C2 to C7 acyloxy group, a C2 to C7 alkoxycarbonyl group, a nitro group or a halogen atom; m and n independently represent an integer of 0 to 4.
摘要翻译：抗蚀剂组合物包括：（A）在碱性水溶液中不溶或难溶的树脂，但是通过酸的作用变得可溶于碱性水溶液，（B）具有酸不稳定基团的酸发生剂; 和（D）式（I）表示的化合物，其中R 1和R 2各自独立地表示C1〜C12烃基，C1〜C6烷氧基，C2〜C7酰基，C2〜C7酰氧基 C2-C7烷氧基羰基，硝基或卤素原子; m和n独立地表示0〜4的整数。

37. 发明申请

US20120251946A1 PHOTORESIST COMPOSITION 有权
标题翻译：光电组合物
公开(公告)号：US20120251946A1
公开(公告)日：2012-10-04
申请号：US13434251
申请日：2012-03-29
申请人： Koji ICHIKAWA , Yukako ANRYU , Satoshi YAMAGUCHI
发明人： Koji ICHIKAWA , Yukako ANRYU , Satoshi YAMAGUCHI
IPC分类号： G03F7/027 , G03F7/20 , G03F7/004
CPC分类号： G03F7/0045 , G03F7/0392 , G03F7/0397 , G03F7/2041 , G03F7/38 , Y10S430/111
摘要： The present invention provides a photoresist composition comprising the following components (A), (B) and (X): (A) a resin being insoluble or poorly soluble in an aqueous alkali solution but becoming soluble in an aqueous alkali solution by the action of an acid, (B) an acid generator, (X) at least one compound selected from the group consisting of a compound represented by the formula (I-a): wherein Z1 represent a C1-C20 divalent saturated aliphatic hydrocarbon group in which one or more —CH2— may be replaced by —O— or —CO—, and a compound represented by the formula (I-b): wherein R1 represents a C1-C20 monovalent saturated aliphatic hydrocarbon group in which one or more hydrogen atoms may be substituted with a hydroxyl group and one or more —CH2— may be replaced by —O— or —CO—, and n represents 0 or 1.
摘要翻译：本发明提供了包含以下组分（A），（B）和（X））的光致抗蚀剂组合物：（A）在碱性水溶液中不溶或难溶的树脂，但是通过酸，（B）酸产生剂，（X）至少一种选自由式（Ia）表示的化合物的化合物：其中Z1表示C1-C20二价饱和脂族烃基，其中一个或多个 -CH 2 - 可以被-O-或-CO-代替，和由式（Ib）表示的化合物：其中R1表示其中一个或多个氢原子可被一个或多个氢原子取代的C1-C20一价饱和脂族烃基羟基和一个或多个-CH 2 - 可以被-O-或-CO-代替，并且n表示0或1。

38. 发明申请

US20120225385A1 SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME 有权
标题翻译：含有它的盐和光催化剂组合物
公开(公告)号：US20120225385A1
公开(公告)日：2012-09-06
申请号：US13406634
申请日：2012-02-28
申请人： Koji ICHIKAWA , Hiromu SAKAMOTO , Takahiro YASUE
发明人： Koji ICHIKAWA , Hiromu SAKAMOTO , Takahiro YASUE
IPC分类号： G03F7/20 , C07D327/04 , C07D305/06 , C07D303/40 , G03F7/027 , C07C69/96
CPC分类号： C07C309/17 , C07C25/18 , C07C309/12 , C07C381/12 , C07C2603/74 , C07D303/16 , C07D305/06 , C07D307/33 , C07D307/77 , C07D327/04 , C07D333/46 , C07D497/18 , G03F7/0045 , G03F7/0046 , G03F7/0397
摘要： The present invention provides a salt represented by the formula (I): wherein Q1 and Q2 independently each represent a fluorine atom or a C1-C6 perfluoroalkyl group, L1 represents a C1-C17 divalent saturated hydrocarbon group in which one or more —CH2— can be replaced by —O— or —CO—, L2 represents a single bond or a C1-C6 alkanediyl group in which one or more —CH2— can be replaced by —O— or —CO—, Y represents a C3-C18 alicyclic hydrocarbon group which can have one or more substituents, and one or more —CH2— in the alicyclic hydrocarbon group can be replaced by —O—, —CO— or —SO2—, and Z+ represents an organic counter ion.
摘要翻译：本发明提供由式（I）表示的盐：其中Q1和Q2独立地表示氟原子或C1-C6全氟烷基，L1表示C1-C17二价饱和烃基，其中一个或多个-CH 2 - 可以被-O-或-CO-代替，L 2表示单键或C 1 -C 6烷二基，其中一个或多个-CH 2 - 可以被-O-或-CO-代替，Y代表C3-C18 可以具有一个或多个取代基的脂环族烃基，脂环族烃基中的一个或多个-CH 2 - 可以被-O - ， - CO-或-SO 2 - 代替，Z +代表有机抗衡离子。

39. 发明申请

US20120219909A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN 有权
标题翻译：耐蚀组合物及其制造方法
公开(公告)号：US20120219909A1
公开(公告)日：2012-08-30
申请号：US13404871
申请日：2012-02-24
申请人： Koji ICHIKAWA , Tatsuro MASUYAMA , Satoshi YAMAGUCHI
发明人： Koji ICHIKAWA , Tatsuro MASUYAMA , Satoshi YAMAGUCHI
IPC分类号： G03F7/20 , G03F7/027
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0392 , G03F7/0397 , G03F7/11 , G03F7/2041 , G03F7/30 , G03F7/38 , Y10S430/108 , Y10S430/111
摘要： A resist composition containing; (A1) a resin having a structural unit represented by the formula (I), (A2) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid, (B) an acid generator, and (D) a salt having an anion represented by the formula (IA), wherein R1, A1, R2, R1A and R2A are defined in the specification.
摘要翻译：含有抗蚀剂组合物（A1）具有由式（I）表示的结构单元的树脂，（A2）在碱性水溶液中不溶或难溶的树脂，但是通过酸作用而溶于碱性水溶液中的树脂，（B）酸衍生物，和（D）具有由式（IA）表示的阴离子的盐，其中R1，A1，R2，R1A和R2A在说明书中定义。

40. 发明申请

US20120219899A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN 有权
标题翻译：耐蚀组合物及其制造方法
公开(公告)号：US20120219899A1
公开(公告)日：2012-08-30
申请号：US13404140
申请日：2012-02-24
申请人： Koji ICHIKAWA , Satoshi YAMAGUCHI
发明人： Koji ICHIKAWA , Satoshi YAMAGUCHI
IPC分类号： G03F7/20 , G03F7/004
CPC分类号： G03F7/0397 , G03F7/0045 , G03F7/0046 , G03F7/11 , G03F7/2041 , G03F7/30 , G03F7/38 , Y10S430/111
摘要： A resist composition contains (A1) a resin having a structural unit represented by the formula (I), (A2) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid, (B) an acid generator, and (D) a compound represented by the formula (II), wherein R1 represents a hydrogen atom or a methyl group; A1 represents a C1 to C6 alkanediyl group; R2 represents a C1 to C10 hydrocarbon group having a fluorine atom; ring W1 represents a C2 to C36 substituted heterocyclic ring; R3 represents a C1 to C30 hydrocarbon group, and one or more —CH2— contained in the hydrocarbon group may be replaced by —O— or —CO—.
摘要翻译：抗蚀剂组合物含有（A1）具有由式（I）表示的结构单元的树脂，（A2）不溶于碱性水溶液或难溶于碱性水溶液的树脂，但通过酸的作用变得可溶于碱性水溶液，（B）酸产生剂和（D）由式（II）表示的化合物，其中R1表示氢原子或甲基; A1表示C1〜C6烷二基; R2表示具有氟原子的C1〜C10烃基; 环W1表示C2〜C36取代的杂环; R3表示C1〜C30烃基，烃基中所含的一个或多个-CH 2可以被-O-或-CO-代替。

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