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    • 36. 发明授权
    • Deposition method and method for manufacturing light-emitting device
    • 沉积方法和制造发光器件的方法
    • US08802185B2
    • 2014-08-12
    • US12472562
    • 2009-05-27
    • Shunpei YamazakiKoichiro TanakaHisao IkedaSatoshi Seo
    • Shunpei YamazakiKoichiro TanakaHisao IkedaSatoshi Seo
    • B05D5/12
    • H01L51/0005H01L27/3211H01L51/56
    • An object is to provide a deposition method for smoothly obtaining desired pattern shapes of material layers and a method for manufacturing a light-emitting device while throughput is improved when a plurality of different material layers is stacked on a substrate. A material layer is selectively formed in advance in a position overlapped with a light absorption layer over a first substrate by pump feeding. Three kinds of light-emitting layers are deposited on one deposition substrate. This first substrate and a second substrate that is to be a deposition target substrate are arranged to face each other, and the light absorption layer is heated by being irradiated with light, whereby a film is deposited on the second substrate. Three kinds of light-emitting layers can be deposited with positional accuracy by performing only one position alignment before light irradiation.
    • 本发明的目的是提供一种用于平滑地获得材料层的期望图案形状的沉积方法,以及当多个不同的材料层堆叠在基底上时,提高生产能力的方法。 预先在与第一基板上的光吸收层重叠的位置通过泵送来选择性地形成材料层。 在一个沉积衬底上沉积三种发光层。 该第一基板和作为沉积靶基板的第二基板被布置为彼此面对,并且通过照射光来加热光吸收层,由此在第二基板上沉积膜。 可以通过在光照射之前仅进行一个位置对准来以位置精度沉积三种发光层。