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31. 发明申请

US20070075917A1 Image display device and simulation device 审中-公开
标题翻译：图像显示装置及仿真装置
公开(公告)号：US20070075917A1
公开(公告)日：2007-04-05
申请号：US10580123
申请日：2004-10-18
申请人： Kenji Nishi
发明人： Kenji Nishi
IPC分类号： G09G5/00
CPC分类号： G02B27/0172 , A63F13/08 , A63F13/28 , A63F2300/302 , A63F2300/8082 , G02B27/0176 , G02B2027/0132 , G02B2027/0178
摘要： Gravity center position GRA of image display device 15 is, in a human state of standing, located in a more backward position compared with eyeball 9 and in a more downward position compared with eyeball 9. In this case, assuming that the rotation axes of the head are the X-axis, the Y-axis, and the Z-axis, the intersection point of these axes is the head's rotational movement center CNT. By this, GRA comes close to CNT, and thus, even when rotational movement of the head occurs around CNT, inertia forces other than moment of inertia are successfully made small. Therefore, the image display device can smoothly follow the movements of human head even if the device is heavy in weight.
摘要翻译：与眼球9相比，图像显示装置15的重力中心位置GRA处于人的状态，位于比眼球9更向后的位置，并且与眼球9相比位于更向下的位置。在这种情况下，假设头部的旋转轴为X轴，Y轴和Z轴，则这些轴的交点为头的旋转中心CNT。由此，GRA接近于CNT，因此即使在CNT的周围发生旋转运动，也能够成功地使除惯性矩以外的惯性力小。因此，即使装置重量轻，图像显示装置也可以顺利地跟随人头部的动作。

32. 发明授权

US07068350B2 Exposure apparatus and stage device, and device manufacturing method 失效
标题翻译：曝光装置及舞台装置及装置的制造方法
公开(公告)号：US07068350B2
公开(公告)日：2006-06-27
申请号：US10456485
申请日：2003-06-09
申请人： Kenji Nishi , Masahiko Okumura , Hiroki Okuno
发明人： Kenji Nishi , Masahiko Okumura , Hiroki Okuno
IPC分类号： G03B27/42 , G03B27/62
CPC分类号： G03F7/70425 , G03F7/70725 , G03F7/70733
摘要： After exposure of a divided area on a wafer is completed, for exposure of the next divided area, a control unit sends configuration information on control parameters necessary to expose the next divided area to a stage control system, sometime before the stage control system begins deceleration of a reticle stage and a wafer stage in a scanning direction. Therefore, both stages do not have to be suspended before acceleration for the stage control system to receive the configuration information on control parameters necessary to expose the next divided area, and since suspension time is not required, throughput can be improved. In this case, no serious problems occur, so the performance of other devices is not disturbed.
摘要翻译：在晶片上的分割区域的曝光完成之后，为了下一个分割区域的曝光，控制单元将阶段控制系统开始减速之前的某个时刻向控制系统发送关于将下一个分割区域暴露出来的控制参数的配置信息的标线片台和扫描方向的晶片台。因此，在阶段控制系统的加速之前，不需要暂停两个阶段，以接收关于暴露下一个分割区域所需的控制参数的配置信息，并且由于不需要暂停时间，因此可以提高生产率。在这种情况下，不会出现严重的问题，所以其他设备的性能不会受到干扰。

33. 再颁专利

USRE38798E1 Projection exposure apparatus 有权
标题翻译：投影曝光装置
公开(公告)号：USRE38798E1
公开(公告)日：2005-09-20
申请号：US09779686
申请日：2001-02-09
申请人： Kenji Nishi
发明人： Kenji Nishi
IPC分类号： G03B27/42 , G03B27/48 , G03B27/50 , G03F7/20 , G03F7/23
CPC分类号： G03F7/70358 , G03F7/70725
摘要： Constant speed drive of a reticle and a wafer in a relative scanning direction and positioning of the reticle and the wafer are simultaneously performed with high precision by a slit scanning exposure scheme. A reticle side scanning stage for scanning a reticle relative to a slit-like illumination area in the relative scanning direction is placed on a reticle side base. A reticle side fine adjustment stage for moving and rotating the reticle within a two-dimensional plane is placed on the reticle side scanning stage. The reticle is placed on the reticle side fine adjustment stage. Constant speed drive and positioning of the reticle and a wafer are performed by independently controlling the reticle side scanning stage and the reticle side fine adjustment stage.
摘要翻译：通过狭缝扫描曝光方案，以高精度同时进行标线片和晶片相对扫描方向的恒速驱动和标线片和晶片的定位。在相对扫描方向上相对于狭缝状照明区域扫描掩模版的掩模版侧扫描台被放置在掩模版侧基板上。用于在二维平面内移动和旋转掩模版的掩模版侧微调台放置在标线片侧扫描台上。将掩模版放置在标线片侧精调阶段。通过独立地控制标线片侧扫描台和标线片侧精调阶段来进行标线片和晶片的恒速驱动和定位。

34. 发明授权

US06937319B2 Exposure method and apparatus with vibration-preventative control 失效
标题翻译：具有防振控制的曝光方法和装置
公开(公告)号：US06937319B2
公开(公告)日：2005-08-30
申请号：US10756343
申请日：2004-01-14
申请人： Kenji Nishi
发明人： Kenji Nishi
IPC分类号： G03F7/20 , G03B27/42 , G03B27/58 , G03B27/62
CPC分类号： G03F7/70733 , G03F7/70358 , G03F7/70716 , G03F7/70816 , G03F7/70825 , G03F7/70833 , G03F7/709
摘要： A high exposure accuracy is obtained while mitigating the influence of vibration by using an exposure method and an exposure apparatus. Columns (59A, 59B) are installed on a base plate (12), a reticle base (62) is supported at the inside of the columns (59A, 59B) by the aid of variable mount sections (61A, 61B) having high rigidity, a finely movable stage (63) is movably placed on the reticle base (62) by the aid of air bearings, and a reticle (R1) as an exposure objective is placed on the finely movable stage (63). A coarsely movable stage (64) is hung on a bottom surface of a support plate (66) arranged over the reticle base (62) in a state capable of being driven in a scanning direction. The finely movable stage (63) is driven by the coarsely movable stage (64) in the scanning direction in a non-contact state with respect to the reticle base (62). The finely movable stage (63) is finely driven with respect to the coarsely movable stage (64) by an actuator arranged between the coarsely movable stage (64) and the finely movable stage (63).
摘要翻译：通过使用曝光方法和曝光装置减轻振动的影响，获得高曝光精度。列（59A，59B）安装在基板（12）上，标线架基座（62）借助于可变安装部分（61A，59B）支撑在列（59A，59B）的内部， 61B），通过空气轴承可移动地将精细移动的台（63）放置在分划板基座（62）上，并且将作为曝光目标的光罩（R 1）放置在可微动台（ 63）。在能够沿扫描方向驱动的状态下，将可移动平台（64）悬挂在设置在标线器基座（62）上方的支撑板（66）的底面上。可移动平台（63）由可移动平台（64）在扫描方向上以非接触状态相对于标线器基座（62）驱动。微动载台（63）通过布置在可粗移台（64）与可动载台（63）之间的致动器相对于可粗动平台（64）精细地驱动。

35. 发明授权

US06894449B2 Vibration control device, stage device and exposure apparatus 失效
标题翻译：振动控制装置，舞台装置和曝光装置
公开(公告)号：US06894449B2
公开(公告)日：2005-05-17
申请号：US10623507
申请日：2003-07-22
申请人： Kenji Nishi
发明人： Kenji Nishi
IPC分类号： G03F7/22 , F16F15/027 , F16F15/03 , G03F7/20 , H01L21/027 , H02K33/00
CPC分类号： G03F7/70833 , F16F15/0275 , F16F15/03 , G03F7/709
摘要： In order to remove vibration or improve a vibration control effect, and achieve device size reduction, an adjusting device is provided in which a weight of a support target object is supported by a pressure of an internal gas of a first chamber gas via a holding member and which adjusts a position in a gravity direction of the holding member by driving a movable member which changes an internal volume of the first gas chamber by changing an internal volume of a second gas chamber based on a state change of at least one of first and second gas chambers. Because of this, when the holding member is displaced in the gravity direction because of the vibration or the like, as the movable member is driven by the adjusting device, the holding member is maintained at an original position. Additionally, the movable member does not contact the support target object, so it does not directly deform the support target object, and the support target object is only driven by the change of the internal volume of the gas chambers; thus, even if the rigidity of the gas within the first gas chamber is high, there will be no problem regarding transmission of vibrations.
摘要翻译：为了去除振动或提高振动控制效果，并且实现装置尺寸的减小，提供了一种调节装置，其中支撑物体的重量通过第一室气体的内部气体的压力经由保持构件并且通过驱动通过基于第一和第二气室中的至少一个的状态变化改变第一气室的内部容积而改变第一气室的内部容积的可动构件来调节保持构件在重力方向上的位置第二气室。因此，当保持构件由于振动等而在重力方向上移位时，由于可动构件被调节装置驱动，所以保持构件保持在初始位置。另外，可动构件不与支撑对象物接触，所以不会使支撑体物体直接变形，只能通过气室的内部容积的变化来驱动支撑对象物。因此，即使第一气室内的气体的刚性高，对振动的传递也没有问题。

36. 发明授权

US06803992B2 Projection exposure apparatus 失效
标题翻译：投影曝光装置
公开(公告)号：US06803992B2
公开(公告)日：2004-10-12
申请号：US10098377
申请日：2002-03-18
申请人： Noriaki Tokuda , Kenji Nishi
发明人： Noriaki Tokuda , Kenji Nishi
IPC分类号： G03B2742
CPC分类号： G03F7/70241 , G02B27/0025 , G03F7/70358 , G03F7/70875 , G03F7/70891
摘要： A scan type projection exposure apparatus which includes an illumination optical system for forming a slit-shaped illumination area on a pattern on a mask by using illuminating light, and a projection optical system for forming an image of a portion of the pattern in the illumination area on a substrate, includes: a mask stage which moves at least in one direction while holding the mask; a substrate stage which moves two-dimensionally while holding the substrate; a control system for synchronously scanning the mask stage and the substrate stage; and an image forming performance adjusting system for adjusting image forming performance of the projection optical system and having a component placed in an area through which the illuminating light incident from the illumination area on the mask to the projection optical system does not pass.
摘要翻译：一种扫描型投影曝光装置，包括：照明光学系统，用于通过使用照明光在掩模上的图案上形成狭缝状照明区域;以及投影光学系统，用于在照明区域中形成图案的一部分的图像在基板上包括：掩模台，其在保持所述掩模的同时至少沿一个方向移动; 在保持基板的同时二维移动的基板台; 用于同步扫描掩模台和基板台的控制系统; 以及用于调整投影光学系统的图像形成性能并且具有放置在从掩模上的照明区域入射到投影光学系统的照明光不能通过的区域中的分量的图像形成性能调整系统。

37. 发明授权

US06624433B2 Method and apparatus for positioning substrate and the like 失效
标题翻译：用于定位基板等的方法和装置
公开(公告)号：US06624433B2
公开(公告)日：2003-09-23
申请号：US09290867
申请日：1999-04-14
申请人： Masahiko Okumura , Kenji Nishi
发明人： Masahiko Okumura , Kenji Nishi
IPC分类号： G01N2186
CPC分类号： G03F7/70691 , G03F9/7011 , G03F9/7046
摘要： A positioning method and apparatus for positioning a substrate on a substrate stage which is movable in a predetermined direction (Y direction). In the positioning method, a relationship between a longitudinal direction (X′ direction) of a band-shaped light beam irradiated onto the substrate and the predetermined direction (Y direction) for determining the position of the substrate and the predetermined direction is measured and the substrate is positioned on the substrate stage based on the relationship between said longitudinal direction of the band-shaped light beam and the predetermined direction.
摘要翻译：一种定位方法和装置，用于将衬底定位在可沿预定方向（Y方向）移动的衬底台上。在定位方法中，测量照射到基板上的带状光束的纵向方向（X'方向）与用于确定基板的位置和预定方向的预定方向（Y方向）之间的关系，并且基于所述带状光束的所述纵向与所述预定方向之间的关系，将所述基板定位在所述基板台上。

38. 发明授权

US06590636B2 Projection exposure method and apparatus 失效
标题翻译：投影曝光方法及装置
公开(公告)号：US06590636B2
公开(公告)日：2003-07-08
申请号：US09963541
申请日：2001-09-27
申请人： Kenji Nishi
发明人： Kenji Nishi
IPC分类号： G03B2742
CPC分类号： G03F7/701 , G03F7/2022 , G03F7/70358 , G03F7/70466 , G03F7/70716 , G03F7/70733 , G03F7/70741
摘要： A scanning exposure method moves a mask and a substrate synchronously. A first mask and a second mask are provided for a mask stage. The mask stage has a reflective surface extending in a scanning direction, and the first and second masks are arranged along the scanning direction. Surface curvature data is prepared on the reflective surface in relation to positions of the first and second masks. Positional information of the mask stage is detected by irradiating the reflective surface with a measuring beam. Then, the mask stage is moved based on the surface curvature data and the detected positional information in a direction other than the scanning direction.
摘要翻译：扫描曝光方法同步地移动掩模和基板。为掩模台提供第一掩模和第二掩模。掩模台具有沿扫描方向延伸的反射表面，并且第一和第二掩模沿着扫描方向布置。相对于第一和第二掩模的位置，在反射表面上制备表面曲率数据。通过用测量光束照射反射面来检测掩模台的位置信息。然后，基于表面曲率数据和检测到的位置信息沿扫描方向以外的方向移动掩模台。

39. 发明授权

US06563565B2 Apparatus and method for projection exposure 失效
标题翻译：用于投影曝光的装置和方法
公开(公告)号：US06563565B2
公开(公告)日：2003-05-13
申请号：US09784084
申请日：2001-02-16
申请人： Kenji Nishi
发明人： Kenji Nishi
IPC分类号： G03B2742
CPC分类号： G03F7/70358 , G03B27/00
摘要： A projection exposure apparatus is able to monitor changes in transmissivity of the projection optical system so as to provide a high degree of control over the exposure illuminance to produce precision printing of circuit patterns on a substrate. A referencing member, having reference marks and a window section for determining the illuminance of the transmitting exposure beam, is provided on the sample stage for the substrate. During scanning/exposure process, any positional deviation of projection optical system is checked by the alignment system by comparing reticle marks on the reticle with reference marks on the sample stage illuminated with alignment beams. Simultaneously, illuminance of exposure light passing through the projection optical system is checked to determine if there is any change in the transmission coefficient of the optical system, and illumination power is adjusted to provide near real-time compensation for any change in transmissivity in the optical system.
摘要翻译：投影曝光装置能够监视投影光学系统的透射率的变化，以提供对曝光照度的高度控制，以在基板上产生电路图案的精确打印。在用于基板的样品台上设置具有参考标记和用于确定发射曝光光束的照度的窗口部分的参考构件。在扫描/曝光过程中，通过对准系统检查投影光学系统的任何位置偏差，通过将掩模版上的标线标记与采用对准光束照射的样品台上的参考标记进行比较。同时，检查通过投影光学系统的曝光光的照度，以确定光学系统的透射系数是否有任何变化，并且调节照明功率以对光学中的透射率的任何变化提供接近实时的补偿系统。

40. 发明授权

US06522386B1 Exposure apparatus having projection optical system with aberration correction element 失效
标题翻译：曝光装置具有带有像差校正元件的投影光学系统
公开(公告)号：US06522386B1
公开(公告)日：2003-02-18
申请号：US09502042
申请日：2000-02-11
申请人： Kenji Nishi
发明人： Kenji Nishi
IPC分类号： G03B2768
CPC分类号： G03F7/706 , G03F7/70241 , G03F7/70308 , G03F7/70358
摘要： A static image distortion characteristic is averaged in the width of a projection area in a scanning direction and becomes a dynamic image distortion characteristic, when a mask pattern is scan-exposed onto a photosensitized substrate by a projection exposure apparatus. At least a random component included in the dynamic image distortion characteristic is corrected by a arranging an image correction plate obtained by locally polishing the surface of a transparent parallel plate. Correction plates which minimize other aberrations beforehand are manufactured and installed within a projection optical path, considering that also the other aberrations are averaged and become dynamic aberration characteristics at the time of scan-exposure.
摘要翻译：当通过投影曝光装置将掩模图案扫描曝光到光敏基板上时，静态图像失真特性在扫描方向上的投影区域的宽度上被平均化，并且变成动态图像失真特性。通过布置通过对透明平行板的表面进行局部抛光而获得的图像校正板来校正包含在动态图像失真特性中的至少一个随机分量。考虑到其他像差也被平均化并且在扫描曝光时成为动态像差特性，因此预先将其它像差最小化的校正板制造并安装在投影光路内。

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