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31. 发明授权

US06899990B2 Epoxy compound having alicyclic structure, polymer, resist composition and patterning process 失效
标题翻译：具有脂环结构的环氧化合物，聚合物，抗蚀剂组合物和图案化工艺
公开(公告)号：US06899990B2
公开(公告)日：2005-05-31
申请号：US10167393
申请日：2002-06-13
申请人： Koji Hasegawa , Takeshi Kinsho , Takeru Watanabe , Tsunehiro Nishi
发明人： Koji Hasegawa , Takeshi Kinsho , Takeru Watanabe , Tsunehiro Nishi
IPC分类号： C07D493/00 , C07D493/20 , C07D493/22 , C07D495/22 , C08F34/02 , C08F34/04 , C08G61/06 , C08G61/12 , C08G65/14 , C08G65/22 , G03F7/004 , G03F7/039 , H01L21/027 , G03F7/00 , C08F8/00
CPC分类号： C07D493/00 , C08G61/06 , C08G65/14 , C08G65/22 , G03F7/0045 , G03F7/0395
摘要： Epoxy compounds of formula (1) are provided wherein W is CH2, O or S, X and Y are —CR1R2— or —C(═O)—, k is 0 or 1, R1 and R2 are H or alkyl, or R1 and R2, taken together, may form an aliphatic hydrocarbon ring with the carbon atom to which they are connected. A resist composition comprising a polymer having recurring units of the epoxy compound as a base resin is sensitive to high-energy radiation, has excellent sensitivity, resolution, etching resistance, and minimized swell and lends itself to micropatterning with electron beams or deep-UV.
摘要翻译：提供式（1）的环氧化合物，其中W是CH 2，O或S，X和Y是-CR 1，R 2 - 或-C（-O） - ，k为0或1，R 1和R 2为H或烷基，或R 1和 R 2可以一起形成与它们连接的碳原子的脂族烃环。包含具有作为基础树脂的环氧化合物的重复单元的聚合物的抗蚀剂组合物对高能量辐射敏感，具有优异的灵敏度，分辨率，耐腐蚀性和最小化的溶胀，并且使其自身具有电子束或深UV的微图形化。

32. 发明授权

US06743566B2 Cyclic acetal compound, polymer, resist composition and patterning process 有权
标题翻译：环状缩醛化合物，聚合物，抗蚀剂组合物和图案化工艺
公开(公告)号：US06743566B2
公开(公告)日：2004-06-01
申请号：US10219139
申请日：2002-08-16
申请人： Mutsuo Nakashima , Seiichiro Tachibana , Takeru Watanabe , Takeshi Kinsho , Koji Hasegawa , Tsunehiro Nishi , Jun Hatakeyama
发明人： Mutsuo Nakashima , Seiichiro Tachibana , Takeru Watanabe , Takeshi Kinsho , Koji Hasegawa , Tsunehiro Nishi , Jun Hatakeyama
IPC分类号： G03C500
CPC分类号： C07D317/24 , C08F232/08 , G03F7/0395 , G03F7/0397 , Y10S430/106 , Y10S430/111
摘要： Cyclic acetal compounds of formula (1) wherein k=0 or 1 and n is an integer of 0 to 6 are novel. Using the cyclic acetal compounds as a monomer, polymers are obtained. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation and has excellent sensitivity, resolution, and etching resistance.
摘要翻译：其中k = 0或1，n为0至6的整数的式（1）的环状缩醛化合物是新颖的。使用环状缩醛化合物作为单体，得到聚合物。包含作为基础树脂的聚合物的抗蚀剂组合物对高能辐射敏感，并且具有优异的灵敏度，分辨率和耐蚀刻性。

33. 发明授权

US06673515B2 Polymer, resist composition and patterning process 有权
标题翻译：聚合物，抗蚀剂组合物和图案化工艺
公开(公告)号：US06673515B2
公开(公告)日：2004-01-06
申请号：US09951523
申请日：2001-09-14
申请人： Tsunehiro Nishi , Mutsuo Nakashima , Seiichiro Tachibana , Takeshi Kinsho , Koji Hasegawa , Takeru Watanabe , Jun Hatakeyama
发明人： Tsunehiro Nishi , Mutsuo Nakashima , Seiichiro Tachibana , Takeshi Kinsho , Koji Hasegawa , Takeru Watanabe , Jun Hatakeyama
IPC分类号： G03F7038
CPC分类号： G03F7/039 , C08G61/08 , G03F7/0045
摘要： The invention provides a polymer comprising recurring units of formula (1—1) or (1-2) wherein k is 0 or 1, m is 0, 1, 2, 3 or 4, and n is 1 or 2 and having a weight average molecular weight of 1,000 to 500,000. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation, has excellent sensitivity, resolution, and etching resistance, and lends itself to micropatterning with electron beams or deep-UV.
摘要翻译：本发明提供了包含式（1-1）或（1-2）的重复单元的聚合物，其中k为0或1，m为0,1,2,3或4，n为1或2，并且具有重量平均分子量为1,000〜500,000。包含作为基础树脂的聚合物的抗蚀剂组合物对高能辐射敏感，具有优异的灵敏度，分辨率和耐蚀刻性，并且适用于电子束或深紫外线的微图案化。

34. 发明授权

US06566038B2 Polymers, resist compositions and patterning process 有权
标题翻译：聚合物，抗蚀剂组合物和图案化工艺
公开(公告)号：US06566038B2
公开(公告)日：2003-05-20
申请号：US09842396
申请日：2001-04-26
申请人： Tsunehiro Nishi , Mutsuo Nakashima , Seiichiro Tachibana , Takeshi Kinsho , Koji Hasegawa , Takeru Watanabe , Jun Hatakeyama
发明人： Tsunehiro Nishi , Mutsuo Nakashima , Seiichiro Tachibana , Takeshi Kinsho , Koji Hasegawa , Takeru Watanabe , Jun Hatakeyama
IPC分类号： G03F7039
CPC分类号： C08F222/06 , C08F222/40 , C08F232/08 , G03F7/0045 , G03F7/039 , Y10S430/106 , Y10S430/111 , C08F232/04 , C08F2220/1866 , C08F232/00
摘要： A polymer comprising units of formulas (1) and (2) and having a Mw of 1,000-500,000 is provided. R1 is H, CH3 or CH2CO2R3, R2 is H, CH3 or CO2R3, R3 is alkyl, R4 is halogen or acyloxy, alkoxycarbonyloxy or alkylsulfonyloxy group which may be substituted with halogen, R5 is H or alkyl, R6 is an acid labile group, Z is a single bond or a divalent hydrocarbon group, k is 0 or 1, and W is —O— or —(NR)— wherein R is H or alkyl. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation, has excellent sensitivity, resolution, and etching resistance, and lends itself to micropatterning with electron beams or deep-UV rays.
摘要翻译：提供了包含式（1）和（2）单元并且Mw为1,000-500,000的聚合物。 R 1为H，CH 3或CH 2 CO 2 R 3，R 2为H，CH 3或CO 2 R 3，R 3为烷基，R 4为卤素或酰氧基，可被卤素取代的烷氧基羰氧基或烷基磺酰氧基，R 5为H或烷基，R 6为酸不稳定基团， Z为单键或二价烃基，k为0或1，W为-O-或 - （NR） - ，其中R为H或烷基。包含作为基础树脂的聚合物的抗蚀剂组合物对高能辐射敏感，具有优异的灵敏度，分辨率和耐蚀刻性，并且适用于电子束或深紫外线的微图案化。

35. 发明授权

US06566037B2 Polymer, resist composition and patterning process 有权
标题翻译：聚合物，抗蚀剂组合物和图案化工艺
公开(公告)号：US06566037B2
公开(公告)日：2003-05-20
申请号：US09797878
申请日：2001-03-05
申请人： Tsunehiro Nishi , Koji Hasegawa , Takeru Watanabe , Takeshi Kinsho , Jun Hatakeyama
发明人： Tsunehiro Nishi , Koji Hasegawa , Takeru Watanabe , Takeshi Kinsho , Jun Hatakeyama
IPC分类号： G03F7038
CPC分类号： C08F232/08 , G03F7/0045 , G03F7/039 , Y10S430/106 , Y10S430/111
摘要： A polymer comprising recurring units of formula (1) and having a Mw of 1,000-500,000 is provided. R1 is H, methyl or CH2CO2R3, R2 is H, methyl or CO2R3, R3 is alkyl, R4 is H, alkyl, alkoxyalkyl or acyl, R5 and R15 are acid labile groups, and at least one of R6 to R9 is a carboxyl or hydroxyl-containing monovalent hydrocarbon group, and the reminders are H or alkyl, at least one of R10 to R13 is a monovalent hydrocarbon group containing a —CO2— partial structure, and the reminders are H or alkyl, R14 is a polycyclic hydrocarbon group or polycyclic hydrocarbon-containing alkyl group, Z is a trivalent hydrocarbon group, k=0 or 1, x is>0, a, b, c and d are≧0, satisfying x+a+b+c+d=1. A resist composition comprising the polymer has significantly improved sensitivity, resolution and etching resistance and is very useful in microfabrication.
摘要翻译：提供了包含式（1）的重复单元并且具有1,000-500,000的Mw的聚合物.R1是H，甲基或CH2CO2R3，R2是H，甲基或CO2R3，R3是烷基，R4是H，烷基，烷氧基烷基或酰基 R 5和R 15为酸不稳定基团，R 6〜R 9中的至少一个为羧基或羟基的一价烃基，提醒为H或烷基，R 10〜R 13中的至少一个为含有 -CO 2部分结构，提醒为H或烷基，R 14为多环烃基或含多环烃基的烷基，Z为三价烃基，k = 0或1，x为> 0，a，b， c和d为> = 0，满足x + a + b + c + d = 1。包含聚合物的抗蚀剂组合物具有显着提高的灵敏度，分辨率和耐蚀刻性，并且在微细加工中非常有用。

36. 发明授权

US06515150B2 Cyclic acetal compound, polymer, resist composition and patterning process 有权
公开(公告)号：US06515150B2
公开(公告)日：2003-02-04
申请号：US09967946
申请日：2001-10-02
申请人： Mutsuo Nakashima , Seiichiro Tachibana , Takeru Watanabe , Takeshi Kinsho , Koji Hasegawa , Tsunehiro Nishi , Jun Hatakeyama
发明人： Mutsuo Nakashima , Seiichiro Tachibana , Takeru Watanabe , Takeshi Kinsho , Koji Hasegawa , Tsunehiro Nishi , Jun Hatakeyama
IPC分类号： C07D31726
CPC分类号： C07D317/24 , C08F232/08 , G03F7/0395 , G03F7/0397 , Y10S430/106 , Y10S430/111
摘要： Cyclic acetal compounds of formula (1) wherein k=0 or 1 and n is an integer of 0 to 6 are novel. Using the cyclic acetal compounds as a monomer, polymers are obtained. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation and has excellent sensitivity, resolution, and etching resistance.

37. 发明授权

US06515149B2 Acetal compound, polymer, resist composition and patterning response 有权
公开(公告)号：US06515149B2
公开(公告)日：2003-02-04
申请号：US09922635
申请日：2001-08-07
申请人： Takeru Watanabe , Takeshi Kinsho , Koji Hasegawa , Tsunehiro Nishi , Mutsuo Nakashima , Seiichiro Tachibana , Jun Hatakeyama
发明人： Takeru Watanabe , Takeshi Kinsho , Koji Hasegawa , Tsunehiro Nishi , Mutsuo Nakashima , Seiichiro Tachibana , Jun Hatakeyama
IPC分类号： C07D31712
CPC分类号： C08G61/08 , C08G61/02 , Y10S430/106 , Y10S430/111
摘要： Acetal compounds in which a 5- or 6-membered ring acetal structure is connected to a norbornene structure through a linker represented by —(CH2)m— in which one hydrogen atom may be substituted with a hydroxyl or acetoxy group, and m is from 1 to 8 are novel. Using the acetal compounds as a monomer, polymers are obtained. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation and has excellent sensitivity, resolution, and etching resistance.

38. 发明授权

US06284429B1 Ester compounds, polymers, resist compositions and patterning process 有权
标题翻译：酯化合物，聚合物，抗蚀剂组合物和图案化工艺
公开(公告)号：US06284429B1
公开(公告)日：2001-09-04
申请号：US09512108
申请日：2000-02-24
申请人： Takeshi Kinsho , Tsunehiro Nishi , Hideshi Kurihara , Mutsuo Nakashima , Koji Hasegawa , Takeru Watanabe
发明人： Takeshi Kinsho , Tsunehiro Nishi , Hideshi Kurihara , Mutsuo Nakashima , Koji Hasegawa , Takeru Watanabe
IPC分类号： G03F7004
CPC分类号： G03F7/039 , C07C69/753 , C07C2602/42 , C07C2603/68 , C08F32/08 , G03F7/0045 , Y02P20/55
摘要： A novel ester compound having an exo-form 2-alkylbicyclo[2.2.1]heptan-2-yl group as the protective group is provided as well as a polymer comprising units of the ester compound. The polymer is used as a base resin to formulate a resist composition having a higher sensitivity, resolution and etching resistance than conventional resist compositions.
摘要翻译：提供具有外型2-烷基双环[2.2.1]庚-2-基作为保护基的新型酯化合物以及包含酯化合物单元的聚合物。聚合物用作基础树脂以配制具有比常规抗蚀剂组合物更高的灵敏度，分辨率和耐蚀刻性的抗蚀剂组合物。

39. 发明授权

US08062831B2 Carboxyl-containing lactone compound, polymer, resist composition, and patterning process 有权
标题翻译：含羧基的内酯化合物，聚合物，抗蚀剂组合物和图案化工艺
公开(公告)号：US08062831B2
公开(公告)日：2011-11-22
申请号：US12434365
申请日：2009-05-01
申请人： Satoshi Shinachi , Tsunehiro Nishi , Koji Hasegawa , Takeshi Kinsho , Seiichiro Tachibana , Takeru Watanabe
发明人： Satoshi Shinachi , Tsunehiro Nishi , Koji Hasegawa , Takeshi Kinsho , Seiichiro Tachibana , Takeru Watanabe
IPC分类号： G03F7/004 , G03F7/30 , C08F32/04
CPC分类号： G03F7/0397 , C07D307/77 , C08F220/28 , G03F7/0045 , G03F7/2041 , Y10S430/106 , Y10S430/111
摘要： Carboxyl-containing lactone compounds having formula (1) are novel wherein R1 is H, F, methyl or trifluoromethyl, R2 and R3 are H or monovalent hydrocarbon groups, or R2 and R3 may together form an aliphatic ring, W is CH2, O or S, k1 is an integer of 0 to 4, and k2 is 0 or 1. They are useful as monomers to produce polymers which are transparent to radiation≦500 nm. Radiation-sensitive resist compositions comprising the polymers as base resin exhibit excellent properties including resolution, LER, pattern density dependency and exposure margin.
摘要翻译：具有式（1）的含羧基的内酯化合物是新的，其中R 1是H，F，甲基或三氟甲基，R 2和R 3是H或一价烃基，或者R 2和R 3可以一起形成脂族环，W是CH 2，O或 S，k1为0〜4的整数，k2为0或1.它们可用作单体，以生成对辐射透明的聚合物; 500nm。包含作为基础树脂的聚合物的辐射敏感性抗蚀剂组合物表现出优异的性能，包括分辨率，LER，图案密度依赖性和曝光余量。

40. 发明授权

US07868199B2 Fluoroalcohol preparation method, fluorinated monomer, polymer, resist composition and patterning process 有权
标题翻译：氟醇制备方法，氟化单体，聚合物，抗蚀剂组合物和图案化工艺
公开(公告)号：US07868199B2
公开(公告)日：2011-01-11
申请号：US11699390
申请日：2007-01-30
申请人： Koji Hasegawa , Takeshi Kinsho , Tsunehiro Nishi , Masaki Ohashi , Takeru Watanabe
发明人： Koji Hasegawa , Takeshi Kinsho , Tsunehiro Nishi , Masaki Ohashi , Takeru Watanabe
IPC分类号： C07C69/74
CPC分类号： G03F7/0395 , C07C29/147 , C07C69/54 , C07C69/653 , C07C69/753 , C07C2601/08 , C07C2601/14 , C07C2602/42 , C08F220/24 , C08F220/28 , C08F232/08 , G03F7/0046 , G03F7/0397 , C07C31/44 , C07C31/42 , C07C35/48
摘要： Fluoroalcohol compounds of formula (4) are prepared by reacting a fluorine compound of formula (1) with reducing agents or organometallic reagents of formulas (2) and (3) wherein R1 is H or a monovalent C1-C20 hydrocarbon group in which any —CH2— moiety may be replaced by —O— or —C(═O)—, R2 is H or a monovalent C1-C6 hydrocarbon group, R3 and R4 are H or a monovalent C1-C8 hydrocarbon group, and M1 is Li, Na, K, Mg, Zn, Al, B, or Si. From the fluoroalcohol compounds, fluorinated monomers can be produced in a simple and economic way, which are useful in producing polymers for the formulation of radiation-sensitive resist compositions.
摘要翻译：通式（1）的氟化合物与式（2）和（3）的还原剂或式（2）和（3）的有机金属试剂反应制备式（4）的氟化醇，其中R1是H或一价C1-C20烃基， CH2-部分可以被-O-或-C（= O） - ，R2是H或一价C1-C6烃基，R3和R4是H或一价C1-C8烃基，M1是Li， Na，K，Mg，Zn，Al，B或Si。从氟代醇化合物可以以简单且经济的方式制备氟化单体，其可用于制备用于制备辐射敏感抗蚀剂组合物的聚合物。

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