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    • 35. 发明授权
    • Alignment process using serial detection of repetitively patterned
alignment marks
    • 使用重复图案化对准标记的串行检测的对准过程
    • US4431923A
    • 1984-02-14
    • US345284
    • 1982-02-03
    • Victor WangRobert L. Seliger
    • Victor WangRobert L. Seliger
    • G03F7/20G03F9/00H01J37/304G01N21/00G01N23/00
    • G03F7/70375G03F9/70H01J37/3045
    • The specification discloses a process for accurately aligning a chosen member with a focused beam of radiation or for aligning two chosen members with each other. A set of alignment marks having a predetermined spatial pattern is first provided on the surface of each member. Next, a detection signal is generated from the set of alignment marks, comprising a serial electronic signal as a function of time and containing serial information corresponding to the relative position of each mark in the set of alignment marks. Then, the detection signal is electronically processed to generate an alignment signal with a high signal-to-noise ratio. Next, the alignment signal is compared to a reference signal signifying a predetermined criterion of alignment, to generate an error signal which is indicative of the extent of misalignment. Finally, lateral movement of one chosen member is produced in response to the error signal until accurate alignment of the chosen member with the focused beam of radiation or of the two chosen members with each other is achieved.
    • 本说明书公开了一种用于将所选择的构件与聚焦辐射束精确对准或用于使两个所选构件彼此对准的方法。 首先在每个构件的表面上提供具有预定空间图案的一组对准标记。 接下来,从对准标记集合生成检测信号,其包括作为时间的函数的串行电子信号,并且包含与该对准标记组中的每个标记的相对位置相对应的串行信息。 然后,电子地处理检测信号以产生具有高信噪比的对准信号。 接下来,将对准信号与表示预定的对准方式的参考信号进行比较,以产生指示未对准程度的误差信号。 最后,响应于误差信号产生一个所选构件的横向运动,直到实现所选择的构件与聚焦的辐射束或两个所选构件彼此的精确对准。