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    • 37. 发明授权
    • Method of manufacturing a photomask for an optical memory
    • 制造光学存储器的光掩模的方法
    • US5286583A
    • 1994-02-15
    • US798616
    • 1991-11-26
    • Junji HirokaneTetsuya InuiMichinobu MiedaKenji Ohta
    • Junji HirokaneTetsuya InuiMichinobu MiedaKenji Ohta
    • G03F1/68G03F1/80G11B7/26H01L21/027H01L21/30G03F9/00
    • G11B7/261G03F1/00G03F1/26
    • A method of manufacturing a photomask for an optical memory, the photomask having two types of pattern where guide tracks and formatting pits are different in amount of optical transmissions, including the steps of (a) forming on a transparent substrate a thin film of which light transmission amount depends upon its thickness; (b) forming a photoresist film on the thin film; (c) exposing the photoresist film to light with different light intensities depending selectively on the guide tracks or formatting pits; (d) eliminating the photoresist film exposed to the more intense light by the development till the thin film becomes surface; (e) etching the thin film exposed to the more intense light and surfaced; (f) eliminating the photoresist film till the thin film exposed to the less intense light becomes surface; (g) etching away the thin film exposed to the more intense light and surfaced till the transparent substrate becomes surface; and (h) eliminating the remnant photoresist.
    • 一种制造光存储器的光掩模的方法,所述光掩模具有两种类型的图案,其中导轨和格栅凹坑的光传输量不同,包括以下步骤:(a)在透明基板上形成薄膜, 传输量取决于其厚度; (b)在薄膜上形成光致抗蚀剂膜; (c)根据导轨或格式化凹坑选择性地将光致抗蚀剂膜暴露于具有不同光强度的光; (d)通过显影来消除暴露于更强光的光致抗蚀剂膜,直到薄膜变成表面; (e)蚀刻暴露于更强烈的光并露出的薄膜; (f)消除光致抗蚀剂膜,直到暴露于不太强光的薄膜变成表面; (g)蚀刻掉暴露于更强光的薄膜,并露出,直到透明基板变成表面; 和(h)消除残余光致抗蚀剂。
    • 39. 发明授权
    • Optical recording medium having pit rows
    • 具有凹坑行的光记录介质
    • US06058100A
    • 2000-05-02
    • US928042
    • 1997-09-11
    • Michinobu MiedaJunji HirokaneAkira TakahashiKenji OhtaShigeo Terashima
    • Michinobu MiedaJunji HirokaneAkira TakahashiKenji OhtaShigeo Terashima
    • G11B7/24G11B7/00G11B7/005G11B7/007G11B7/013G11B7/09G11B7/26G11B11/10G11B11/105G11B27/10
    • G11B7/24085G11B11/10565G11B7/00718G11B7/0938G11B7/261
    • Grooves and lands are provided to a magneto-optical disk so as to be alternately arranged, and recording bit strings are formed on the grooves and lands respectively so that information is recorded. Moreover, pit rows are formed on boundary sections between the adjoining grooves and lands so that address information of a recording/reproducing track is recorded, and the pit rows are formed every other boundary section. When the grooves and the lands are scanned as the recording/reproducing track by a light, an address of the recording/reproducing track is read out from the pit rows, and successively, discrimination is made whether the recording/reproducing track which is scanned by an optical spot is the groove or the land. This prevents crosstalk which causes inclusion of address information in the next pit rows, thereby, making it possible to obtain accurate address information. Moreover, since a total number of formed pit rows can be decreased and accuracy in a shape of pits is relieved, an optical recording medium can be easily produced.
    • 将槽和焊盘提供给磁光盘以交替布置,并且分别在沟槽和焊盘上形成记录位串,以便记录信息。 此外,凹坑行形成在相邻的凹槽和平台之间的边界部分上,从而记录记录/再现轨迹的地址信息,并且每隔一个边界部分形成凹坑行。 当通过光将凹槽和平台作为记录/再现轨迹进行扫描时,从凹坑行读出记录/再现轨道的地址,并且依次区分是否由 一个光点是凹槽或土地。 这防止了在下一个凹坑行中包含地址信息的串扰,从而可以获得准确的地址信息。 此外,由于可以减少形成的凹坑排的总数,并且可以减轻凹坑形状的精度,因此可以容易地制造光学记录介质。