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    • 31. 发明申请
    • SiGe PHOTODIODE
    • SiGe光电
    • US20110012221A1
    • 2011-01-20
    • US12919638
    • 2009-03-09
    • Junichi FujikataToru TatsumiAkihito TanabeJun UshidaDaisuke OkamotoKenichi Nishi
    • Junichi FujikataToru TatsumiAkihito TanabeJun UshidaDaisuke OkamotoKenichi Nishi
    • H01L31/105
    • H01L31/105G02B6/12004G02B6/4204G02B6/4214H01L31/022408H01L31/028H01L31/03529Y02E10/547
    • The lattice mismatching between a Ge layer and a Si layer is as large as about 4%. Thus, when the Ge layer is grown on the Si layer, penetration dislocation is introduced to cause leakage current at the p-i-n junction. Thereby, the photo-detection sensitivity is reduced, and the reliability of the element is also lowered. Further, in the connection with a Si waveguide, there are also problems of the reflection loss due to the difference in refractive index between Si and Ge, and of the absorption loss caused by a metal electrode. In order to solve said problems, according to the present invention, there is provided a vertical type pin-SiGe photodiode having a structure which is embedded in a groove formed in a part of a Si layer, in which a p-type or n-type doped layer is formed in a lower section of the groove, and in which a i-SiGe layer having a rectangular shape or a reverse tapered shape is formed on a layered structure formed by laminating a i-Si layer and a SiGe buffer layer on the lower section and the side wall of the groove. Further, in an optical connection section with a Si waveguide, impedance matching is effected by the layered structure composed of the i-Si layer and the SiGe buffer layer, and an upper metal layer is separated therefrom so that a poly-Si bridge structure is employed to electrically connect the upper metal layer therewith.
    • Ge层与Si层之间的晶格失配大至4%左右。 因此,当Ge层在Si层上生长时,引入穿透位错以在p-i-n结处引起漏电流。 因此,光检测灵敏度降低,并且元件的可靠性也降低。 此外,在与Si波导的连接中,还存在由于Si和Ge之间的折射率的差异以及由金属电极引起的吸收损耗的反射损耗的问题。 为了解决所述问题,根据本发明,提供了一种垂直型pin-SiGe光电二极管,其具有嵌入到形成在Si层的一部分中的凹槽中的结构,其中p型或n- 在沟槽的下部形成有型掺杂层,其中在通过层叠i-Si层和SiGe缓冲层而形成的层叠结构上形成具有矩形或倒锥形的i-SiGe层 凹槽的下部和侧壁。 此外,在具有Si波导的光学连接部中,通过由i-Si层和SiGe缓冲层构成的层叠结构实现阻抗匹配,并且将上部金属层与其分离,使得多Si桥结构 用于将上部金属层电连接到其上。
    • 33. 发明申请
    • OPTICAL WAVEGUIDE, OPTICAL DEVICE, AND OPTICAL COMMUNICATION DEVICE
    • 光学波导,光学设备和光通信设备
    • US20090285522A1
    • 2009-11-19
    • US11813417
    • 2006-01-06
    • Akiko GomiyouJun UshidaHirohito Yamada
    • Akiko GomiyouJun UshidaHirohito Yamada
    • G02B6/12G02B6/10
    • G02B6/1225B82Y20/00G02B6/126
    • There is provided an optical device and an optical waveguide composed of a photonic crystal in which two optical waveguide modes that are orthogonal to a light propagation direction can be used, whereby design latitude is increased.In the optical waveguide device composed of a photonic crystal, in a dispersion relationship of the photonic crystal, light is propagated using a refractive index guide mode that is a minimum frequency optical waveguide mode. Alternatively, two optical waveguide modes that are orthogonal to light propagation direction are used, a linear defect waveguide mode is used for the first optical waveguide mode; and light is propagated in the second light guide mode by using a refractive index guide mode that is a minimum frequency optical waveguide mode in a dispersion relationship of the photonic crystal. Alternatively, in a dispersion relationship of the photonic crystal, light is propagated in two optical waveguide modes that are orthogonal to a light propagation direction using a refractive index guide mode that is a minimum frequency optical waveguide mode.
    • 提供一种光学器件和由光子晶体组成的光波导,其中可以使用与光传播方向正交的两个光波导模式,从而增加设计的纬度。 在由光子晶体构成的光波导装置中,以光子晶体的色散关系,使用作为最小频率光波导模式的折射率引导模式传播光。 或者,使用与光传播方向正交的两个光波导模式,对于第一光波导模式使用线性缺陷波导模式; 并且通过使用作为光子晶体的色散关系中的最小频率光波导模式的折射率引导模式,以第二导光模式传播光。 或者,在光子晶体的色散关系中,使用作为最小频率光波导模式的折射率引导模式,在与光传播方向正交的两个光波导模式中传播光。