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    • 32. 发明授权
    • Reinforcement element for absorbing forces in concrete elements which are supported by support elements
    • 用于吸收由支撑元件支撑的混凝土元件中的力的加强元件
    • US08516757B2
    • 2013-08-27
    • US13364377
    • 2012-02-02
    • Thomas Keller
    • Thomas Keller
    • E04C5/08
    • E04B5/43E04C5/0645E04C5/07E04G23/0218E04G2023/0251
    • A reinforcement element for absorbing forces in concrete elements that are supported by support elements includes a longitudinally stable, flexible longitudinal element. This element is placed in recesses in the concrete element which are disposed in such a way that in the region of the support element the reinforcement element runs in the area of the concrete element remote from the support element. The end regions of the reinforcement element each run at an acute angle toward the surface of the concrete element turned toward the support element, and exit from the concrete element. Both end regions of the longitudinally stable, flexible longitudinal element are diverted around the respective exit edge of the recesses, are led into a tensioning device, are held therein, and can be tensioned with respect to one another. The reinforcement element thereby forms a closed loop; the arising forces can be absorbed in an optimal way.
    • 用于吸收由支撑元件支撑的混凝土元件中的力的加强元件包括纵向稳定的柔性纵向元件。 该元件被放置在混凝土元件中的凹部中,所述凹部以这样的方式设置,使得在支撑元件的区域中,加强元件在远离支撑元件的混凝土元件的区域中延伸。 加固元件的端部区域各自朝向混凝土构件的表面以锐角方向朝向支撑元件转动,并从混凝土元件出来。 纵向稳定的柔性纵向元件的两个端部区域围绕凹槽的相应出口边缘转向,被引导到张紧装置中,并被保持在其中并且可以相对于彼此张紧。 加强元件由此形成闭环; 所产生的力量可以以最佳的方式被吸收。
    • 34. 发明申请
    • Method for quantitatively determing a number of analytes
    • 定量测定多种分析物的方法
    • US20060246435A1
    • 2006-11-02
    • US10508113
    • 2003-03-07
    • Uwe KempinThomas Keller
    • Uwe KempinThomas Keller
    • C12Q1/68G01N33/574
    • G01N33/543G01N33/536G01N33/557G01N33/574G01N2333/59G01N2333/9123
    • A method for the quantitative assay of n different analytes, where n is at least 2, is provided. The method consists of the following steps: (a) At least one labeled detector-binding partner is added to a test sample containing the analytes. This leads to the formation of detector-analyte complexes, each of which consists of one analyte molecule and one detector molecule. The number of detector binding partners x equals n−1. Each detector-binding partner binds to at least one analyte. At least one of the detector-binding partners can bind to at least two analytes. (b) The detector-analyte complexes formed in step (a) bind to capture-binding partners and form detector-analyte-capture complexes. The number of capture-binding partners y equals the number n of the analytes. Each capture-binding partner is specific for at least one detector-analyte complex. (c) The time-resolved formation of the detector-analyte-capture complexes is measured.
    • 提供了n种不同分析物的定量测定方法,其中n至少为2。 该方法包括以下步骤:(a)将至少一个标记的检测器结合配偶体添加到含有分析物的测试样品中。 这导致检测器 - 分析物复合物的形成,每个复合物由一个分析物分子和一个检测器分子组成。 检测器结合伙伴数x等于n-1。 每个检测器结合配偶体与至少一种分析物结合。 至少一个检测器结合配偶体可以结合至少两种分析物。 (b)步骤(a)中形成的检测器 - 分析物复合物与捕获结合配偶体结合并形成检测器 - 分析物捕获复合物。 捕获结合伙伴数y等于分析物的数量n。 每个捕获结合配偶体对于至少一个检测器 - 分析物复合物是特异性的。 (c)测量检测器 - 分析物捕获复合物的时间分辨的形成。
    • 36. 发明申请
    • Method and device for the chemical mechanical polishing of workpieces
    • 工件化学机械抛光的方法和装置
    • US20050242063A1
    • 2005-11-03
    • US10511651
    • 2003-03-11
    • Ulrich IsingMarc ReichmannThomas Keller
    • Ulrich IsingMarc ReichmannThomas Keller
    • B24B37/34H01L21/304B44C1/22C23F1/00H01L21/306
    • B24B37/345
    • Method for transporting, chemical-mechanical polishing and drying of workpieces, in particular silicon wafers in a sealed clean room with the following steps: the workpieces are removed by at least one transfer device from a loading and unloading station and transferred onto an intermediate station the workpieces are received by at least one polishing head of a polishing device of the intermediate station, transported to a polishing plate of the polishing device and held under rotation of the polishing head against the rotating polishing plate after polishing, the workpieces are transported back by the polishing head to the intermediate station, released from the polishing head and cleaned and/or chemically treated in the intermediate station the cleaned and/or chemically treated workpieces are transported from the intermediate station optionally to a second polishing device or to a washing or drying device and washed and dried therein the washed and dried workpieces are transported back by the transfer device to the loading and unloading station the polishing head is cleaned before each workpiece is received.
    • 用于在密封的洁净室中运输,化学机械抛光和干燥工件,特别是硅晶片的方法,具有以下步骤:通过至少一个转运装置从装载和卸载站移除工件并将其转移到中间站上 工件被中间站的抛光装置的至少一个抛光头接收,被运送到抛光装置的抛光板,并且在抛光之后保持在抛光头旋转的旋转抛光板上,工件由 抛光头到中间站,从抛光头释放并在中间站中进行清洁和/或化学处理,清洁和/或化学处理的工件可选地从中间站输送到第二抛光装置或洗涤或干燥装置 并在其中洗涤干燥,洗涤和干燥的工件被运输 ck通过转移装置到装卸站,在每个工件被接收之前清洁头。
    • 37. 发明授权
    • Loading and unloading station for a device for the processing of circular flat work-pieces, especially semiconductor wafers
    • 用于处理圆形扁平工件,特别是半导体晶片的装置的装卸站
    • US06866468B2
    • 2005-03-15
    • US10098163
    • 2002-03-13
    • Helge MöllerThomas Keller
    • Helge MöllerThomas Keller
    • B25J11/00B65G49/07
    • H01L21/6838H01L21/68Y10S414/136Y10S414/141
    • The device comprises a carrier for a workpiece; the carrier can be moved along a vertical and a horizontal axis by use of a drive mechanism and has an approximately planar contact surface for the workpiece, whereby the workpiece can be held on the contact surface by a contact mechanism of the carrier, especially vacuum, a retaining ring on the carrier encircling the contact surface and projecting downwards beyond the contact surface and having an inner diameter which is slightly larger than the outer diameter of the workpiece. At least three centering cams are arranged on a circle, the centering cams can be moved synchronously and in a radial direction by use of a centering drive, the centering cams having a supporting surface oriented on the top. The supporting surface has an approximately vertical stop surface as well as a stop being radially outwards of the stop surface adapted to engage the outer side of the retaining ring, when the centering cams are radially moved towards each other and the carrier is set down until coming close to our onto the centering cams. A robot is provided so that a workpiece can be loaded on cams or removed from it, the outer diameter of the retaining ring and the position of the stop surface and of the stop being dimensioned such that the workpiece is arranged approximately in a centered way relative to the vertical axis of the carrier when the stops of the centering cams engage the retaining ring.
    • 该装置包括用于工件的载体; 载体可以通过使用驱动机构沿垂直和水平轴线移动,并且具有用于工件的近似平面的接触表面,由此通过载体的接触机构特别是真空将工件保持在接触表面上, 载体上的保持环环绕接触表面并向下突出超过接触表面并且具有稍微大于工件外径的内径。 至少三个定心凸轮布置在圆周上,定心凸轮可以通过使用定中心驱动器同步地和沿径向移动,定心凸轮具有定位在顶部的支撑表面。 支撑表面具有近似垂直的止动表面,以及当定心凸轮朝向彼此径向移动时适于接合保持环的外侧的止动表面的径向向外的止动件,并且载体被放下直到到达 靠近我们的定心凸轮。 设置机器人,使得工件可以装载在凸轮上或从其上移除,保持环的外径和止动表面和止动件的位置的尺寸被设计成使得工件大致以中心方式布置 当定心凸轮的止动件与保持环接合时,到托架的垂直轴线。
    • 38. 发明授权
    • Oscillator circuit connected to a voltage source providing a substantially constant supply voltage
    • 振荡器电路连接到提供基本上恒定的电源电压的电压源
    • US06788160B2
    • 2004-09-07
    • US10216601
    • 2002-08-09
    • Thomas Keller
    • Thomas Keller
    • H03B100
    • H03L7/10H03B5/1215H03B5/1231H03B5/1243H03B5/1293H03J3/185H03J3/20H03L7/099H03L2207/06
    • The invention relates to a voltage-controlled oscillator circuit including an oscillator circuit connected to a voltage source furnishing a substantially constant supply voltage, and comprising at least one varactor, and a control voltage generator circuit whose output is connected to the anode of the varactor, the frequency of the oscillation signal of the oscillator circuit being variable by changing the control voltage. A voltage converter circuit and an ON/OFF switch therefor is located between the voltage source and the oscillator circuit, the conversion factor of the voltage converter circuit being selected so that a wide tuning range of the varactor and thus a wide frequency range of the oscillation signal is available. The invention can be put to use, for example, in a phase-locked loop. The oscillator circuit may be powered by a fixed predefined battery voltage.
    • 本发明涉及一种压控振荡器电路,其包括连接到提供基本上恒定的电源电压的电压源的振荡器电路,并且包括至少一个变容二极管,以及输出连接到变容二极管的阳极的控制电压发生器电路, 振荡电路的振荡信号的频率可通过改变控制电压而变化。 电压转换器电路及其ON / OFF开关位于电压源和振荡电路之间,电压转换器电路的转换因子被选择,使变容二极管的调谐范围变宽,从而振荡的宽频率范围 信号可用。 本发明可以在例如锁相环中使用。 振荡器电路可以由固定的预定电池电压供电。
    • 39. 发明授权
    • Apparatus and method for the chemical mechanical polishing of the surface of circular flat workpieces, in particular semi-conductor wafers
    • 用于对圆形扁平工件,特别是半导体晶片的表面的化学机械抛光的装置和方法
    • US06780083B2
    • 2004-08-24
    • US10125862
    • 2002-04-19
    • Ulrich IsingMarc ReichmannThomas Keller
    • Ulrich IsingMarc ReichmannThomas Keller
    • B24B5100
    • B24B37/345
    • An apparatus for the chemical-mechanical polishing of surfaces of circular flat workpieces, in particular semi-conductor wafers, comprising a loading and unloading station for the workpieces which includes a carrier which is supported for rotation about a vertical axis and is driven by a rotary driving means into a predetermined rotary position, at least two horizontal loading surfaces on the carrier means facing upwardly. With a transfer means the workpieces can be placed on the loading surfaces or removed therefrom. At least two polishing tables in corresponding polishing stations are provided which are located at the circumference of the carrier means and at least two chucks for the workpieces, the chucks being adapted to be moved along a vertical and a horizontal axis by moving means to align the chuck with a loading surface, to hold and discharge a workpiece and for the transfer of the workpiece as well to the associated polishing station and away therefrom and for the cooperation with the polishing table of the associated polishing station and a control means for the rotary driving means, the actuation means and the moving means.
    • 一种用于化学机械抛光圆形平坦工件,特别是半导体晶片的表面的装置,包括用于工件的装载和卸载工位,该装载和卸载工位包括载体,所述载体被支撑为围绕垂直轴线旋转并被旋转驱动 驱动装置进入预定的旋转位置,所述载体装置上的至少两个水平加载表面朝上。 使用传送装置,工件可以放置在装载表面上或从其上移除。 在相应的抛光站中至少设有两个抛光台,它们位于承载装置的圆周和至少两个用于工件的卡盘上,卡盘适于通过移动装置沿垂直轴和水平轴线移动, 具有装载表面的卡盘,以保持和排出工件以及用于将工件以及相关联的抛光站传送到相关联的抛光站并远离其并与用于相关联的抛光站的抛光台的配合以及用于旋转驱动的控制装置 装置,致动装置和移动装置。
    • 40. 发明授权
    • Holder for flat workpieces, particularly semiconductor wafers
    • 用于扁平工件,特别是半导体晶片的支架
    • US06709323B2
    • 2004-03-23
    • US10016920
    • 2001-12-13
    • Thomas Keller
    • Thomas Keller
    • B24B4702
    • B24B37/30B24B37/32
    • A holder for flat workpieces, particularly semiconductor wafers, particularly in an apparatus for chemico-mechanically polishing the semiconductor wafers, comprising a disk-like head which is adapted to be connected to a spindle adjustable in height at the upper surface and has a support plate at the lower side which, via a universal joint, is coupled to a carrier portion disposed above the support plate or the spindle and which has a number of vertical bores which extend to the underside of the support plate and can be optionally connected to a vacuum and/or a fluid source under pressure, where the support plate is guided to be movable in height in the carrier portion and displacing means are provided between the carrier portion and the support plate to displace the support plate with respect to the carrier portion and to exert a predetermined pressure on the workpiece, characterized in that a ring-shaped loading member of limited width is provided which is movably supported in an axially parallel way in the support plate near its border and is displaceable by a loading mechanism towards a workpiece retained by the support plate and is displaceable away therefrom to apply a predetermined pressure to the workpiece.
    • 一种用于平坦工件,特别是半导体晶片的保持器,特别是在用于化学机械抛光半导体晶片的设备中,包括适于连接到在上表面高度可调节的心轴的盘状头部,并具有支撑板 在其通过万向接头的下侧连接到设置在支撑板或主轴上方的载体部分,并且具有多个垂直孔,其延伸到支撑板的下侧,并且可以可选地连接到真空 和/或压力下的流体源,其中支撑板被引导为可在承载部分中高度移动,并且位移装置设置在承载部分和支撑板之间,以相对于承载部分移动支撑板,并且 对工件施加预定的压力,其特征在于,设置有限宽度的环形装载构件,其可移动地支撑在轴 在靠近其边界的支撑板中以平行的方式,通过装载机构朝向由支撑板保持的工件移动,并且可从其移位以向工件施加预定的压力。