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    • 32. 发明申请
    • CMOS IMAGER PHOTODIODE WITH ENHANCED CAPACITANCE
    • 具有增强电容的CMOS IMAGER光电二极管
    • US20100084690A1
    • 2010-04-08
    • US12634898
    • 2009-12-10
    • James W. AdkissonJohn J. Ellis-MonaghanMark D. JaffeDale J. PearsonDennis L. Rogers
    • James W. AdkissonJohn J. Ellis-MonaghanMark D. JaffeDale J. PearsonDennis L. Rogers
    • H01L27/148H01L31/18
    • H01L27/14643H01L27/1463H01L27/14689H01L31/035281
    • A pixel sensor cell having a semiconductor substrate having a surface; a photosensitive element formed in a substrate having a non-laterally disposed charge collection region entirely isolated from a physical boundary including the substrate surface. The photosensitive element comprises a trench having sidewalls formed in the substrate of a first conductivity type material; a first doped layer of a second conductivity type material formed adjacent to at least one of the sidewalls; and a second doped layer of the first conductivity type material formed between the first doped layer and the at least one trench sidewall and formed at a surface of the substrate, the second doped layer isolating the first doped layer from the at least one trench sidewall and the substrate surface. In a further embodiment, an additional photosensitive element is provided that includes a laterally disposed charge collection region that contacts the non-laterally disposed charge collection region of the photosensitive element and underlies the doped layer formed at the substrate surface.
    • 一种像素传感器单元,具有具有表面的半导体衬底; 形成在具有与包括基板表面的物理边界完全隔离的非横向布置的电荷收集区域的基板中的感光元件。 感光元件包括具有形成在第一导电类型材料的衬底中的侧壁的沟槽; 与所述侧壁中的至少一个相邻形成的第二导电类型材料的第一掺杂层; 以及形成在所述第一掺杂层和所述至少一个沟槽侧壁之间且形成在所述衬底的表面处的所述第一导电类型材料的第二掺杂层,所述第二掺杂层将所述第一掺杂层与所述至少一个沟槽侧壁隔离, 基材表面。 在另一个实施例中,提供附加的光敏元件,其包括横向设置的电荷收集区域,其接触感光元件的非横向设置的电荷收集区域,并且位于在衬底表面形成的掺杂层的下方。