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31. 发明申请

US20050251990A1 Plasma uniformity control by gas diffuser hole design 有权
标题翻译：通过气体扩散器孔设计的等离子体均匀性控制
公开(公告)号：US20050251990A1
公开(公告)日：2005-11-17
申请号：US10889683
申请日：2004-07-12
申请人： Soo Young Choi , John White , Qunhua Wang , Li Hou , Ki Kim , Shinichi Kurita , Tae Won , Suhail Anwar , Beom Park , Robin Tiner
发明人： Soo Young Choi , John White , Qunhua Wang , Li Hou , Ki Kim , Shinichi Kurita , Tae Won , Suhail Anwar , Beom Park , Robin Tiner
IPC分类号： H01L21/02 , C23C16/00 , C23C16/34 , C23C16/44 , C23C16/455 , C23C16/505 , C23C16/509 , C23F1/00 , H01J37/32 , H01L21/205
CPC分类号： H01J37/3244 , C23C16/345 , C23C16/455 , C23C16/45565 , C23C16/5096 , H01J37/32082 , H01J37/32091 , H01J37/32541 , H01J37/32596 , H01J2237/327 , H01J2237/3321 , H01J2237/3323 , H01J2237/3325 , Y10T29/49885 , Y10T29/49996
摘要： Embodiments of a gas diffuser plate for distributing gas in a processing chamber are provided. The gas distribution plate includes a diffuser plate having an upstream side and a downstream side, and a plurality of gas passages passing between the upstream and downstream sides of the diffuser plate. The gas passages include hollow cathode cavities at the downstream side to enhance plasma ionization. The depths, the diameters, the surface area and density of hollow cathode cavities of the gas passages that extend to the downstream end can be gradually increased from the center to the edge of the diffuser plate to improve the film thickness and property uniformity across the substrate. The increasing diameters, depths and surface areas from the center to the edge of the diffuser plate can be created by bending the diffuser plate toward downstream side, followed by machining out the convex downstream side. Bending the diffuser plate can be accomplished by a thermal process or a vacuum process. The increasing diameters, depths and surface areas from the center to the edge of the diffuser plate can also be created computer numerically controlled machining. Diffuser plates with gradually increasing diameters, depths and surface areas of the hollow cathode cavities from the center to the edge of the diffuser plate have been shown to produce improved uniformities of film thickness and film properties.
摘要翻译：提供了用于在处理室中分配气体的气体扩散板的实施例。气体分配板包括具有上游侧和下游侧的扩散板，以及在扩散板的上游侧和下游侧之间通过的多个气体通路。气体通道包括在下游侧的中空阴极腔，以增强等离子体电离。延伸到下游端的气体通道的空心阴极腔的深度，直径，表面积和密度可以从扩散板的中心到边缘逐渐增加，以改善衬底上的膜厚度和性能均匀性。从扩散板的中心到边缘的直径，深度和表面积的增加可以通过向下游侧弯曲扩散板，然后在凸出的下游侧加工出来。扩散板的弯曲可以通过热处理或真空工艺来实现。从扩散板的中心到边缘的直径，深度和表面积的增加也可以用计算机数字控制加工。具有从扩散板的中心到边缘的中空阴极腔的直径逐渐增加，深度和表面积逐渐增大的扩散板已被证明可以产生改善的膜厚度和膜性质的均匀性。

32. 发明申请

US20070281090A1 SYSTEM ARCHITECTURE AND METHOD FOR SOLAR PANEL FORMATION 审中-公开
标题翻译：太阳能电池板的系统结构与方法
公开(公告)号：US20070281090A1
公开(公告)日：2007-12-06
申请号：US11733906
申请日：2007-04-11
申请人： Shinichi Kurita , Takako Takehara , Suhail Anwar
发明人： Shinichi Kurita , Takako Takehara , Suhail Anwar
IPC分类号： C23C16/24 , C23C16/54
CPC分类号： H01L31/206 , H01L21/67155 , H01L21/67161 , H01L21/67167 , H01L21/67184 , H01L21/67207 , H01L21/67236 , Y02E10/50 , Y02P70/521
摘要： A method and apparatus for forming solar panels from n-doped silicon, p-doped silicon, intrinsic amorphous silicon, and intrinsic microcrystalline silicon using a cluster tool is disclosed. The cluster tool comprises at least one load lock chamber and at least one transfer chamber. When multiple clusters are used, at least one buffer chamber may be present between the clusters. A plurality of processing chambers are attached to the transfer chamber. As few as five and as many as thirteen processing chambers can be present.
摘要翻译：公开了一种使用簇工具从n掺杂硅，p掺杂硅，本征非晶硅和本征微晶硅形成太阳能电池板的方法和装置。集群工具包括至少一个装载锁定室和至少一个传送室。当使用多个簇时，可以在簇之间存在至少一个缓冲室。多个处理室附接到传送室。只有五个和多达十三个处理室可以存在。

33. 发明授权

US06824343B2 Substrate support 有权
标题翻译：基材支持
公开(公告)号：US06824343B2
公开(公告)日：2004-11-30
申请号：US10084762
申请日：2002-02-22
申请人： Shinichi Kurita , Wendell T. Blonigan , Suhail Anwar , Toshio Kiyotake , Hung T. Nguyen
发明人： Shinichi Kurita , Wendell T. Blonigan , Suhail Anwar , Toshio Kiyotake , Hung T. Nguyen
IPC分类号： B65G4724
CPC分类号： H01L21/68 , H01L21/68728 , H01L21/68778 , H01L21/68792 , Y10S414/136 , Y10S414/139 , Y10S414/141
摘要： A method and apparatus for supporting a substrate is generally provided. In one aspect, an apparatus for supporting a substrate includes a support plate having a first body disposed proximate thereto. A first pushing member is radially coupled to the first body and adapted to urge the substrate in a first direction parallel to the support plate when the first body rotates. In another aspect, a load lock chamber having a substrate support that supports a substrate placed thereon includes a cooling plate that is moved to actuate at least one alignment mechanism. The alignment mechanism includes a pushing member that urges the substrate in a first direction towards a center of the support. The pushing member may additionally rotate about an axis perpendicular to the first direction.
摘要翻译：通常提供用于支撑衬底的方法和装置。在一个方面，一种用于支撑衬底的装置包括具有靠近其设置的第一主体的支撑板。第一推动构件径向耦合到第一主体并且适于在第一主体旋转时沿平行于支撑板的第一方向推动基板。在另一方面，具有支撑其上放置的基板的基板支撑件的装载锁定室包括移动以致动至少一个对准机构的冷却板。对准机构包括推动构件，其沿朝向支撑件的中心的第一方向推动基板。推动构件可以另外围绕垂直于第一方向的轴旋转。

34. 发明授权

US09691650B2 Substrate transfer robot with chamber and substrate monitoring capability 有权
公开(公告)号：US09691650B2
公开(公告)日：2017-06-27
申请号：US12890281
申请日：2010-09-24
申请人： Shinichi Kurita , Takayuki Matsumoto , Suhail Anwar , Makoto Inagawa
发明人： Shinichi Kurita , Takayuki Matsumoto , Suhail Anwar , Makoto Inagawa
IPC分类号： H01L21/677 , H01L21/67
CPC分类号： H01L21/67742 , H01L21/67259
摘要： A method and apparatus for a transfer robot that having at least one image sensor disposed thereon is provided. The transfer robot includes a lift assembly having a first drive assembly for moving a first platform relative to a second platform in a first linear direction, an end effector assembly disposed on the second platform and movable in a second linear direction by a second drive assembly, the second linear direction being orthogonal to the first linear direction, at least one image sensor, and a lighting device associated with the at least one image sensor.

35. 发明申请

US20050220604A1 Substrate support bushing 有权
标题翻译：基板支撑衬套
公开(公告)号：US20050220604A1
公开(公告)日：2005-10-06
申请号：US11044245
申请日：2005-01-27
申请人： Shinichi Kurita , Suhail Anwar , Toshio Kiyotake
发明人： Shinichi Kurita , Suhail Anwar , Toshio Kiyotake
IPC分类号： H01L21/68 , B65G49/06 , C03C17/00 , C23C16/458 , F16C29/00 , F16C29/04 , H01L21/00 , H01L21/205 , H01L21/683 , G01V8/00
CPC分类号： F16C29/046 , B65G49/061 , B65G2249/02 , C03C17/002 , C23C16/4584 , F16C29/045 , H01L21/00
摘要： An apparatus for supporting a substrate within a processing chamber is provided. In one aspect, a substrate support member is provided comprising a housing having a bore formed therethrough, a support pin at least partially disposed within the bore, and a plurality of bearing elements disposed about the housing. In one aspect, the bearing elements comprise a roller having a central bore formed therethrough, a contoured outer surface, and a shaft at least partially disposed through the central bore. In another aspect, the bearing elements comprise a ball assembly comprising a larger spherical member and four smaller spherical members arranged about the larger spherical member.
摘要翻译：提供了一种用于在处理室内支撑衬底的装置。在一个方面，提供了一种基板支撑构件，其包括具有穿过其中形成的孔的壳体，至少部分地设置在孔内的支撑销和围绕壳体设置的多个轴承元件。在一个方面，轴承元件包括具有穿过其形成的中心孔的辊，外形轮廓和至少部分地设置穿过中心孔的轴。在另一方面，轴承元件包括球组件，该球组件包括较大球形构件和围绕较大球形构件布置的四个较小球形构件。

36. 发明授权

US08216422B2 Substrate support bushing 有权
标题翻译：基板支撑衬套
公开(公告)号：US08216422B2
公开(公告)日：2012-07-10
申请号：US11044245
申请日：2005-01-27
申请人： Shinichi Kurita , Suhail Anwar , Toshio Kiyotake
发明人： Shinichi Kurita , Suhail Anwar , Toshio Kiyotake
IPC分类号： C23C16/00 , C23C16/458 , H01L21/3065 , G01V8/00
CPC分类号： F16C29/046 , B65G49/061 , B65G2249/02 , C03C17/002 , C23C16/4584 , F16C29/045 , H01L21/00
摘要： An apparatus for supporting a substrate within a processing chamber is provided. In one aspect, a substrate support member is provided comprising a housing having a bore formed therethrough, a support pin at least partially disposed within the bore, and a plurality of bearing elements disposed about the housing. In one aspect, the bearing elements comprise a roller having a central bore formed therethrough, a contoured outer surface, and a shaft at least partially disposed through the central bore. In another aspect, the bearing elements comprise a ball assembly comprising a larger spherical member and four smaller spherical members arranged about the larger spherical member.
摘要翻译：提供了一种用于在处理室内支撑衬底的装置。在一个方面，提供了一种基板支撑构件，其包括具有穿过其中形成的孔的壳体，至少部分地设置在孔内的支撑销和围绕壳体设置的多个轴承元件。在一个方面，轴承元件包括具有穿过其形成的中心孔的辊，外形轮廓和至少部分地设置穿过中心孔的轴。在另一方面，轴承元件包括球组件，该球组件包括较大球形构件和围绕较大球形构件布置的四个较小球形构件。

37. 发明申请

US20060236934A1 Plasma uniformity control by gas diffuser hole design 审中-公开
公开(公告)号：US20060236934A1
公开(公告)日：2006-10-26
申请号：US11473661
申请日：2006-06-22
申请人： Soo Choi , John White , Qunhua Wang , Li Hou , Ki Kim , Shinichi Kurita , Tae Won , Suhail Anwar , Beom Park , Robin Tiner
发明人： Soo Choi , John White , Qunhua Wang , Li Hou , Ki Kim , Shinichi Kurita , Tae Won , Suhail Anwar , Beom Park , Robin Tiner
IPC分类号： C23F1/00 , C23C16/00
CPC分类号： H01J37/3244 , C23C16/345 , C23C16/455 , C23C16/45565 , C23C16/5096 , H01J37/32082 , H01J37/32091 , H01J37/32541 , H01J37/32596 , H01J2237/327 , H01J2237/3321 , H01J2237/3323 , H01J2237/3325 , Y10T29/49885 , Y10T29/49996
摘要： Embodiments of a gas diffuser plate for distributing gas in a processing chamber are provided. The gas distribution plate includes a diffuser plate having an upstream side and a downstream side, and a plurality of gas passages passing between the upstream and downstream sides of the diffuser plate. The gas passages include hollow cathode cavities at the downstream side to enhance plasma ionization. The depths, the diameters, the surface area and density of hollow cathode cavities of the gas passages that extend to the downstream end can be gradually increased from the center to the edge of the diffuser plate to improve the film thickness and property uniformity across the substrate. The increasing diameters, depths and surface areas from the center to the edge of the diffuser plate can be created by bending the diffuser plate toward downstream side, followed by machining out the convex downstream side. Bending the diffuser plate can be accomplished by a thermal process or a vacuum process. The increasing diameters, depths and surface areas from the center to the edge of the diffuser plate can also be created computer numerically controlled machining. Diffuser plates with gradually increasing diameters, depths and surface areas of the hollow cathode cavities from the center to the edge of the diffuser plate have been shown to produce improved uniformities of film thickness and film properties.

38. 发明申请

US20050180737A1 Substrate support bushing 有权
公开(公告)号：US20050180737A1
公开(公告)日：2005-08-18
申请号：US10779130
申请日：2004-02-12
申请人： Shinichi Kurita , Suhail Anwar , Toshio Kiyotake
发明人： Shinichi Kurita , Suhail Anwar , Toshio Kiyotake
IPC分类号： H01L21/68 , B65G49/06 , C03C17/00 , C23C16/458 , F16C29/00 , F16C29/04 , H01L21/00 , H01L21/205 , H01L21/683 , F26B3/30
CPC分类号： F16C29/046 , B65G49/061 , B65G2249/02 , C03C17/002 , C23C16/4584 , F16C29/045 , H01L21/00
摘要： An apparatus for supporting a substrate within a processing chamber is provided. In one aspect, a substrate support member is provided comprising a housing having a bore formed therethrough, a support pin at least partially disposed within the bore, and a plurality of bearing elements disposed about the housing. In one aspect, the bearing elements comprise a roller having a central bore formed therethrough, a contoured outer surface, and a shaft at least partially disposed through the central bore. In another aspect, the bearing elements comprise a ball assembly comprising a larger spherical member and four smaller spherical members arranged about the larger spherical member.

39. 发明授权

US08272830B2 Scissor lift transfer robot 有权
标题翻译：剪式电梯传递机器人
公开(公告)号：US08272830B2
公开(公告)日：2012-09-25
申请号：US12247135
申请日：2008-10-07
申请人： Shinichi Kurita , Takayuki Matsumoto , Suhail Anwar
发明人： Shinichi Kurita , Takayuki Matsumoto , Suhail Anwar
IPC分类号： B25J18/02
CPC分类号： B25J15/0616 , B25J9/0096 , B25J11/00 , B66F7/065 , H01L21/68742 , H01L21/68785 , Y10T74/20305
摘要： A method and apparatus for a transfer robot that may be used in a vacuum environment is described. The transfer robot includes a lift assembly comprising a first platform and a second platform coupled to the first platform by a plurality of support members, the plurality of support members comprising a first pair of support members and a second pair of support members, a first drive assembly coupled to a portion of the plurality of support members, the first drive assembly providing a motive force to the plurality of support members to move the second platform in a first linear direction relative to the first platform, and an end effector disposed on the second platform and movable in a second linear direction by a second drive assembly, the second linear direction being orthogonal to the first linear direction.
摘要翻译：描述可用于真空环境中的传送机器人的方法和装置。传送机器人包括提升组件，其包括第一平台和通过多个支撑构件联接到第一平台的第二平台，所述多个支撑构件包括第一对支撑构件和第二对支撑构件，第一驱动组件联接到所述多个支撑构件的一部分，所述第一驱动组件为所述多个支撑构件提供动力以相对于所述第一平台在第一线性方向上移动所述第二平台，以及设置在所述第二平台上的末端执行器平台，并通过第二驱动组件在第二线性方向上移动，第二线性方向与第一线性方向正交。

40. 发明授权

US08033245B2 Substrate support bushing 有权
标题翻译：基板支撑衬套
公开(公告)号：US08033245B2
公开(公告)日：2011-10-11
申请号：US10779130
申请日：2004-02-12
申请人： Shinichi Kurita , Suhail Anwar , Toshio Kiyotake
发明人： Shinichi Kurita , Suhail Anwar , Toshio Kiyotake
IPC分类号： C23C16/50 , C23C16/503 , C23C16/505 , C23C16/458 , C23F1/00 , H01L21/306 , C23C16/06 , C23C16/22 , F16C29/02 , F16C19/00 , F16C19/50 , F16C43/06 , F16C33/38
CPC分类号： F16C29/046 , B65G49/061 , B65G2249/02 , C03C17/002 , C23C16/4584 , F16C29/045 , H01L21/00
摘要： An apparatus for supporting a substrate within a processing chamber is provided. In one aspect, a substrate support member is provided comprising a housing having a bore formed therethrough, a support pin at least partially disposed within the bore, and a plurality of bearing elements disposed about the housing. In one aspect, the bearing elements comprise a roller having a central bore formed therethrough, a contoured outer surface, and a shaft at least partially disposed through the central bore. In another aspect, the bearing elements comprise a ball assembly comprising a larger spherical member and four smaller spherical members arranged about the larger spherical member.
摘要翻译：提供了一种用于在处理室内支撑衬底的装置。在一个方面，提供了一种基板支撑构件，其包括具有穿过其中形成的孔的壳体，至少部分地设置在孔内的支撑销和围绕壳体设置的多个轴承元件。在一个方面，轴承元件包括具有穿过其形成的中心孔的辊，外形轮廓和至少部分地设置穿过中心孔的轴。在另一方面，轴承元件包括球组件，该球组件包括较大球形构件和围绕较大球形构件布置的四个较小球形构件。

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