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31. 发明授权

US08587766B2 Lithographic apparatus and device manufacturing method 有权
公开(公告)号：US08587766B2
公开(公告)日：2013-11-19
申请号：US12406222
申请日：2009-03-18
申请人： Heine Melle Mulder , Markus Franciscus Antonius Eurlings
发明人： Heine Melle Mulder , Markus Franciscus Antonius Eurlings
IPC分类号： G03B27/72 , G03B27/54 , G03B27/42 , G03F7/20
CPC分类号： G03F7/70191 , G03F7/70116 , G03F7/702 , G03F7/70566
摘要： A lithographic projection system has an illumination system with a polarization member. A plurality of directing elements reflect different sub-beams of an incident beam into adjustable, individually controllable directions. By means of re-directing optics any desired polarized spatial intensity distribution of the beam can be produced in its cross-sectional plane.

32. 发明授权

US08194231B2 Lithographic apparatus and method 有权
标题翻译：平版印刷设备和方法
公开(公告)号：US08194231B2
公开(公告)日：2012-06-05
申请号：US12241790
申请日：2008-09-30
申请人： Heine Melle Mulder , Joost Cyrillus Lambert Hageman , Roland Johannes Wilhelmus Stas
发明人： Heine Melle Mulder , Joost Cyrillus Lambert Hageman , Roland Johannes Wilhelmus Stas
IPC分类号： G03B27/54 , G03B27/68 , G03B27/42
CPC分类号： G03F7/70108 , G03F7/70058
摘要： A lithographic apparatus includes an illumination system configured to condition a beam of radiation, a support structure configured to hold a reticle, a substrate table configured to hold a substrate, and a projection system configured to project a beam onto the substrate table. The numerical aperture of the illumination system is larger than the numerical aperture of the projection system. The apparatus also includes a radiation redirection device configured to re-direct σ>1 components of the beam of radiation to within the numerical aperture of the projection system.
摘要翻译：光刻设备包括配置成调节辐射束的照明系统，被配置为保持掩模版的支撑结构，被配置为保持基板的基板台，以及配置成将光束投影到基板台上的投影系统。照明系统的数值孔径大于投影系统的数值孔径。该装置还包括辐射重定向装置，其被配置为将辐射束的大于1个分量重新引导到投影系统的数值孔径内。

33. 发明授权

US08059266B2 Radiometric Kirk test 有权
标题翻译：辐射Kirk测试
公开(公告)号：US08059266B2
公开(公告)日：2011-11-15
申请号：US12236050
申请日：2008-09-23
申请人： David A. Hult , Heine Melle Mulder , Minne Cuperus
发明人： David A. Hult , Heine Melle Mulder , Minne Cuperus
IPC分类号： G01J1/00 , G03B27/42 , G03B27/32
CPC分类号： G01J1/04 , G01J1/0437 , G03B27/42 , G03F7/7085 , G03F7/70941
摘要： Systems and methods for measuring stray light in a lithographic apparatus are described using Radiometric Kirk Test (also known as Scanning SAMOS Test). The Radiometric Kirk Test of the present invention involves a test pattern having an isolated dark area within a much larger bright field. The radiometric Kirk test includes at least two continuous or stepped scans of an aperture of a detector in an image plane of a lithographic system. During a dark area measurement, the aperture of the detector is positioned such that at least at one point the aperture of the detector is centered within an image of the dark area. During a bright area measurement, the aperture of the detector is positioned within the image of the bright field. The integrated detector signal is correspondingly computed for the dark area measurement and the bright area measurement. The ratio of the integrated dark area measurement result and integrated bright area measurement result is a measure of stray light present in the lithographic apparatus.
摘要翻译：使用辐射式Kirk测试（也称为扫描SAMOS测试）描述光刻设备中测量杂散光的系统和方法。本发明的辐射Kirk测试涉及在更大的明亮场内具有孤立暗区的测试图案。辐射Kirk测试包括在光刻系统的图像平面中的检测器的孔的至少两次连续或阶梯式扫描。在黑暗区域测量期间，检测器的孔径被定位成使得至少在一个点处，探测器的孔径在黑暗区域的图像内居中。在亮区测量中，探测器的孔径位于明场的图像内。对于暗区测量和亮区测量，相应地计算积分检测器信号。积分暗区测量结果与集成亮区测量结果的比值是光刻设备中存在的杂散光的量度。

34. 发明申请

US20110228247A1 ILLUMINATION SYSTEM AND LITHOGRAPHIC APPARATUS 有权
标题翻译：照明系统和平面设备
公开(公告)号：US20110228247A1
公开(公告)日：2011-09-22
申请号：US13051384
申请日：2011-03-18
申请人： Heine Melle Mulder , Steven George Hansen , Johannes Catharinus Hubertus Mulkens , Markus Deguenther
发明人： Heine Melle Mulder , Steven George Hansen , Johannes Catharinus Hubertus Mulkens , Markus Deguenther
IPC分类号： G03B27/72
CPC分类号： G03F7/70566 , G03F7/70091 , G03F7/70116
摘要： An illumination system is disclosed having a polarization member that includes first and second polarization modifiers movable into at least partial intersection with a radiation beam such that the respective polarization modifier applies a modified polarization to at least part of the beam. The illumination system further includes an array of individually controllable reflective elements positioned to receive the radiation beam after it has passed the polarization member, and a controller configured to control movement of the first and second polarization modifiers such that the first and second polarization modifiers intersect with different portions of the radiation beam.
摘要翻译：公开了一种照明系统，其具有偏振构件，该偏振构件包括可移动到与辐射束至少部分交叉的第一和第二偏振修正器，使得各个偏振修正器将修改的偏振应用于至少部分光束。所述照明系统还包括可独立控制的反射元件的阵列，其定位成在辐射束已经通过所述偏振构件之后接收所述辐射束;以及控制器，被配置为控制所述第一和第二偏振调节剂的运动，使得所述第一和第二偏振调节剂与辐射束的不同部分。

35. 发明申请

US20110216297A1 Lithographic Apparatus and Method 有权
标题翻译：平版印刷设备和方法
公开(公告)号：US20110216297A1
公开(公告)日：2011-09-08
申请号：US12966448
申请日：2010-12-13
申请人： Johannes Jacobus Matheus BASELMANS , Francis Fahrni , Gerardus Johannes Joseph Keijsers , Heine Melle Mulder , Willem Richard Pongers , Joost Cyrillus Lambert Hageman , Mattheus Johannes Van Bruggen , Johannes Franciscus Roosekrans , David James Butler , Patrick Marcel Maria Thomassen , Gabriela Vesselinova Paeva
发明人： Johannes Jacobus Matheus BASELMANS , Francis Fahrni , Gerardus Johannes Joseph Keijsers , Heine Melle Mulder , Willem Richard Pongers , Joost Cyrillus Lambert Hageman , Mattheus Johannes Van Bruggen , Johannes Franciscus Roosekrans , David James Butler , Patrick Marcel Maria Thomassen , Gabriela Vesselinova Paeva
IPC分类号： G03B27/54
CPC分类号： G03B27/54 , G03F7/70066 , G03F7/70208
摘要： A lithographic apparatus includes an illumination system configured to provide a first beam of radiation, which forms a first mask illumination region, and configured to substantially simultaneously provide a second beam of radiation, which forms a second mask illumination region. The first and second illumination regions being configured to substantially simultaneously illuminate a same mask. The lithographic apparatus also includes a projection system configured to project the first radiation beam such that it forms a first substrate illumination region and configured to simultaneously project the second radiation beam such that it forms a second substrate illumination region.
摘要翻译：光刻设备包括被配置为提供第一辐射束的照明系统，其形成第一掩模照射区域，并且被配置为基本上同时提供第二辐射束，其形成第二掩模照射区域。第一和第二照明区域被配置为基本上同时照射相同的掩模。光刻设备还包括投影系统，该投影系统配置成投射第一辐射束，使得其形成第一基板照明区域并且被配置为同时投射第二辐射束，使得其形成第二基板照明区域。

36. 发明授权

US07671968B2 Lithographic apparatus having masking parts and device manufacturing method 有权
标题翻译：具有掩模部件和装置制造方法的平版印刷装置
公开(公告)号：US07671968B2
公开(公告)日：2010-03-02
申请号：US11486378
申请日：2006-07-14
申请人： Erik Roelof Loopstra , Arno Jan Bleeker , Heine Melle Mulder , Oscar Franciscus Jozephus Noordman , Timotheus Franciscus Sengers , Laurentius Catrinus Jorritsma , Mark Trentelman , Gerrit Streutker
发明人： Erik Roelof Loopstra , Arno Jan Bleeker , Heine Melle Mulder , Oscar Franciscus Jozephus Noordman , Timotheus Franciscus Sengers , Laurentius Catrinus Jorritsma , Mark Trentelman , Gerrit Streutker
IPC分类号： G03B27/72
CPC分类号： G03F7/70733 , G03F7/70208 , G03F7/70283 , G03F7/70466
摘要： A lithographic apparatus includes a masking device that includes a first masking part configured to obscure a first part of a first patterning device before the pattern of the first patterning device is impinged by a radiation beam, a second masking part having an adjustable length, the second masking part configured to obscure a second part of the first patterning device after the pattern of the first patterning device is impinged by the radiation beam and to obscure a first part of a second patterning device before the pattern of the second patterning device is impinged by the radiation beam, and a third masking part configured to obscure a second part of the second patterning device after the pattern of the second patterning device is impinged by the radiation beam.
摘要翻译：光刻设备包括掩模装置，该掩模装置包括第一掩蔽部分，其被配置为在第一图案形成装置的图案被辐射束撞击之前遮蔽第一图案形成装置的第一部分，第二掩模部分具有可调长度，第二掩模部分掩模部件被配置为在第一图案形成装置的图案被辐射束撞击之后遮蔽第一图案形成装置的第二部分，并且在第二图案形成装置的图案被第二图案形成装置的图案撞击之前使第二图案形成装置的第一部分模糊辐射束和第三掩模部分，其被配置为在第二图案形成装置的图案被辐射束撞击之后使第二图案形成装置的第二部分模糊。

37. 发明申请

US20090086179A1 Radiometric Kirk Test 有权
标题翻译：辐射Kirk测试
公开(公告)号：US20090086179A1
公开(公告)日：2009-04-02
申请号：US12236050
申请日：2008-09-23
申请人： David A. Hult , Heine Melle Mulder , Minne Cuperus
发明人： David A. Hult , Heine Melle Mulder , Minne Cuperus
IPC分类号： G01J1/00 , G03B27/42
CPC分类号： G01J1/04 , G01J1/0437 , G03B27/42 , G03F7/7085 , G03F7/70941
摘要： Systems and methods for measuring stray light in a lithographic apparatus are described using Radiometric Kirk Test (also known as Scanning SAMOS Test). The Radiometric Kirk Test of the present invention involves a test pattern having an isolated dark area within a much larger bright field. The radiometric Kirk test includes at least two continuous or stepped scans of an aperture of a detector in an image plane of a lithographic system. During a dark area measurement, the aperture of the detector is positioned such that at least at one point the aperture of the detector is centered within an image of the dark area. During a bright area measurement, the aperture of the detector is positioned within the image of the bright field. The integrated detector signal is correspondingly computed for the dark area measurement and the bright area measurement. The ratio of the integrated dark area measurement result and integrated bright area measurement result is a measure of stray light present in the lithographic apparatus.
摘要翻译：使用辐射式Kirk测试（也称为扫描SAMOS测试）描述光刻设备中测量杂散光的系统和方法。本发明的辐射Kirk测试涉及在更大的明亮场内具有孤立暗区的测试图案。辐射Kirk测试包括在光刻系统的图像平面中的检测器的孔的至少两次连续或阶梯式扫描。在黑暗区域测量期间，检测器的孔径被定位成使得至少在一个点处，探测器的孔径在黑暗区域的图像内居中。在亮区测量中，探测器的孔径位于明场的图像内。对于暗区测量和亮区测量，相应地计算积分检测器信号。积分暗区测量结果与集成亮区测量结果的比值是光刻设备中存在的杂散光的量度。

38. 发明申请

US20080239268A1 Lithographic apparatus and method 有权
标题翻译：平版印刷设备和方法
公开(公告)号：US20080239268A1
公开(公告)日：2008-10-02
申请号：US11729960
申请日：2007-03-30
申请人： Heine Melle Mulder , Johannes Jacobus Matheus Baselmans , Adrianus Franciscus Petrus Engelen , Markus Franciscus Antonius Eurlings , Hendrikus Robertus Marie Van Greevenbroek , Paul Van Der Veen
发明人： Heine Melle Mulder , Johannes Jacobus Matheus Baselmans , Adrianus Franciscus Petrus Engelen , Markus Franciscus Antonius Eurlings , Hendrikus Robertus Marie Van Greevenbroek , Paul Van Der Veen
IPC分类号： G03B27/52
CPC分类号： G03F7/70291 , G03F7/70116 , G03F7/702 , G03F7/70516
摘要： A device manufacturing method includes conditioning a beam of radiation using an illumination system. The conditioning includes controlling an array of individually controllable elements and associated optical components of the illumination system to convert the radiation beam into a desired illumination mode, the controlling including allocating different individually controllable elements to different parts of the illumination mode in accordance with an allocation scheme, the allocation scheme selected to provide a desired modification of one or more properties of the illumination mode, the radiation beam or both. The method also includes patterning the radiation beam with a pattern in its cross-section to form a patterned beam of radiation, and projecting the patterned radiation beam onto a target portion of a substrate.
摘要翻译：装置制造方法包括使用照明系统来调节辐射束。调节包括控制照明系统的独立可控元件阵列和相关联的光学部件，以将辐射束转换成期望的照明模式，该控制包括根据分配方案将不同的单独可控元件分配到照明模式的不同部分，所述分配方案被选择以提供照明模式，辐射束或两者的一个或多个属性的期望修改。该方法还包括以其横截面中的图案图案化辐射束以形成图案化的辐射束，并将图案化的辐射束投影到基板的目标部分上。

39. 发明申请

US20080158528A1 Lithographic apparatus, device manufacturing method and computer program product 有权
标题翻译：平版印刷设备，设备制造方法和计算机程序产品
公开(公告)号：US20080158528A1
公开(公告)日：2008-07-03
申请号：US11984837
申请日：2007-11-21
申请人： Judocus Marie Dominicus Stoeldraijer , Erik Roelof Loopstra , Heine Melle Mulder , Timotheus Franciscus Sengers , Freerk Adriaan Stoffels , Laurentius Catrinus Jorritsma , Reiner Maria Jungblut
发明人： Judocus Marie Dominicus Stoeldraijer , Erik Roelof Loopstra , Heine Melle Mulder , Timotheus Franciscus Sengers , Freerk Adriaan Stoffels , Laurentius Catrinus Jorritsma , Reiner Maria Jungblut
IPC分类号： G03B27/42 , G03B27/68
CPC分类号： G03F7/70891 , G03F7/70108 , G03F7/70158
摘要： In a lithographic apparatus, a corrective irradiation procedure is performed using an illumination mode arranged so as to heat a selected part of an element of the projection system near a pupil plane thereof that is relatively unheated during production exposure. The corrective irradiation procedure aims to improve uniformity of optical element heating of the projective system and/or to reduce a phase gradient.
摘要翻译：在光刻设备中，使用照射模式来执行校正照射程序，所述照明模式被布置成在生产曝光期间将相对不加热的瞳孔平面附近的投影系统的元件的选定部分加热。校正辐射程序旨在提高投影系统的光学元件加热的均匀性和/或降低相位梯度。

40. 发明授权

US07312850B2 Lithographic apparatus, illumination system, and optical element for rotating an intensity distribution 失效
标题翻译：光刻设备，照明系统和用于旋转强度分布的光学元件
公开(公告)号：US07312850B2
公开(公告)日：2007-12-25
申请号：US10816170
申请日：2004-04-02
申请人： Heine Melle Mulder , Hako Botma
发明人： Heine Melle Mulder , Hako Botma
IPC分类号： G03B27/54 , G03B27/42 , G03B27/32 , G02B5/08
CPC分类号： G03F7/70108
摘要： A lithographic projection apparatus includes an illumination system having a reflective integrator with a rectangular cross-section. An optical element is provided to redistribute an intensity distribution exiting the reflective integrator.
摘要翻译：光刻投影设备包括具有矩形横截面的反射积分器的照明系统。提供光学元件以重新分布离开反射积分器的强度分布。

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