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    • 32. 发明授权
    • Radiation-sensitive positive working composition and copying material
    • 辐射敏感积极的工作组合物和复制材料
    • US5068163A
    • 1991-11-26
    • US362688
    • 1989-06-07
    • Andreas ElsaesserWerner FrassDieter Mohr
    • Andreas ElsaesserWerner FrassDieter Mohr
    • G03F7/022G03F7/004G03F7/023G03F7/032G03F7/039H01L21/027H01L21/30
    • G03F7/0233G03F7/0045
    • The invention relates to a positive-working radiation-sensitive mixture and a copying material produced therefrom on a layer support. The mixture contains as essential constituents a 1,2-quinone diazide or a combination of:1) a compound forming strong acid when exposed to actinic radiation and2) a compound containing at least one acid-cleavable C--O--C bond,and a binder with repeating units of the general formula I ##STR1## wherein R.sub.1 denotes a hydrogen or halogen atom, or a cyanide or an alkyl group,R.sub.2, R.sub.3, R.sub.4 are identical or different and denote hydrogen, or alkyl or aryl groups,R.sub.5, R.sub.6 and optionally R.sub.7 are identical or different and denote hydrogen or halogen atoms, or alkyl, aryl or alkoxy groups, andX denotes the atoms necessary to complete a mononuclear or polynuclear carbocyclic aromatic ring system, andn is 1, 2 or 3.The mixture according to the invention yields lithographic printing plates with a high print run which can be thermally post-cured and have good resistance to chemicals, also photoresists with high heat resistance.
    • 本发明涉及一种正性辐射敏感混合物及其在层载体上由其制备的复印材料。 该混合物含有作为必要成分的1,2-醌二叠氮化物或其组合:1)当暴露于光化辐射时形成强酸的化合物和2)含有至少一个可酸切割的COC键的化合物和具有重复的粘合剂 其中R 1表示氢或卤素原子,或氰化物或烷基,R 2,R 3,R 4相同或不同,表示氢或烷基或芳基,R 5,R 6和 任选的R 7相同或不同,表示氢或卤素原子,或烷基,芳基或烷氧基,X表示完成单核或多核碳环芳环体系所必需的原子,n为1,2或3。 本发明产生具有高印刷速度的平版印刷版,其可以热后固化并且具有良好的耐化学品性,以及具有高耐热性的光致抗蚀剂。