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    • 31. 发明授权
    • Apparatus for measuring parameters of light spots with a moving
knife-edge mask
    • 用移动的刀刃掩模测量光斑参数的装置
    • US4663524A
    • 1987-05-05
    • US823017
    • 1986-01-27
    • Michael T. GaleHeinrich Meier
    • Michael T. GaleHeinrich Meier
    • G01J1/42H01J3/14
    • G01J1/4257
    • A two-dimensional knife edge mask comprised of an array of spaced periodic rectangular opaque regions (e.g., a chrome grating pattern layer deposited on one surface of a slide) separated by transparent different given spacing stripes between adjacent rectangular regions in each of the two orthogonal dimensions thereof, is linearly moved at a fixed velocity across an incident light spot, the direction of movement being oblique to the orthogonal dimensions of the rectangular regions and the distance of movement being sufficient to traverse at least one entire spacing strips in each of the two orthogonal dimensions. A photocell (which may be secured to the other side of the slide) senses the occulted light.
    • 二维刀刃掩模由两个间隔的周期性矩形不透明区域(例如,沉积在载玻片的一个表面上的镀铬光栅图案层)阵列组成,在两个正交的每一个中的相邻矩形区域之间分开的透明不同的给定间隔条纹 其尺寸以穿过入射光点的固定速度线性移动,移动方向与矩形区域的正交尺寸倾斜,并且移动距离足以穿过两者中的每一个中的至少一个整个间隔条 正交尺寸。 光电管(其可以固定到幻灯片的另一侧)感测到隐蔽的光。
    • 32. 发明授权
    • Optical line width measuring apparatus and method
    • 光线宽度测量装置及方法
    • US4330213A
    • 1982-05-18
    • US121529
    • 1980-02-14
    • Hans P. KleinknechtHeinrich Meier
    • Hans P. KleinknechtHeinrich Meier
    • G01B11/00G01B11/02G01B9/02
    • G01B11/02Y10T74/18936
    • Optical monitoring of the lateral dimensions of a pattern disposed on a substrate in the form of a wafer or mask is accomplished by testing for the lateral dimensions of a diffraction grating test pattern disposed adjacent the pattern. A beam of monochromatic light such as from a laser is diffracted by the test pattern and detectors determine the intensity of the diffracted beams. The detectors are disposed in a plane orthogonal to the plane of the test pattern and to the direction of the grating lines. The detectors are selectively spaced from each other according to the periodicity d of the grating and the width of the grating lines a is determined from a relationship of the detected intensities of the beams.
    • 以晶片或掩模的形式设置在基板上的图案的横向尺寸的光学监测通过测试邻近图案设置的衍射光栅测试图案的横向尺寸来实现。 来自激光的单色光束被测试图案衍射,检测器确定衍射光束的强度。 检测器设置在与测试图案的平面正交并且与光栅线的方向垂直的平面中。 检测器根据光栅的周期d选择性地间隔开,并且根据检测到的光束强度的关系确定光栅线a的宽度。