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31. 发明授权

US06872953B1 Two dimensional stationary beam profile and angular mapping 有权
标题翻译：二维静止波束剖面和角度映射
公开(公告)号：US06872953B1
公开(公告)日：2005-03-29
申请号：US10850298
申请日：2004-05-20
申请人： Victor M. Benveniste
发明人： Victor M. Benveniste
IPC分类号： H01J37/317
CPC分类号： H01J37/3171 , H01J2237/244 , H01J2237/24507 , H01J2237/24528 , H01J2237/304 , H01J2237/31703
摘要： An ion beam uniformity detector of the present invention includes a number of horizontal rods and a number of vertical rods placed on parallel planes and separated by a selected distance. Crossover measurement points are defined by intersections of the horizontal and vertical rods. By selectively and sequentially applying a pulse to the vertical rods and concurrently biasing horizontal rods, measurements can be obtained for the crossover measurement points, which can then be employed to determine ion beam shape and ion beam intensity at the crossover measurement points. Based on these measurements, adjustments can be made to a continuing ion implantation process in order to increase uniformity with respect to intensity as well as to provide a desired beam shape. Additionally, pairs of vertical and horizontal rods can be employed to also obtain measurements that indicate angle of incidence in two dimensions at the various crossover points.
摘要翻译：本发明的离子束均匀性检测器包括多个水平杆和多个垂直杆，放置在平行平面上并分开一定距离。交叉测量点由水平杆和垂直杆的交点定义。通过选择性地并且顺序地向垂直杆施加脉冲并且同时偏置水平杆，可以获得交叉测量点的测量值，然后可以采用该测量点来确定交叉测量点处的离子束形状和离子束强度。基于这些测量，可以进行连续离子注入工艺的调整，以便增加相对于强度的均匀性以及提供期望的光束形状。此外，可以使用成对的垂直杆和水平杆来获得在各个交叉点处二维指示入射角的测量。

32. 发明授权

US06835930B2 High mass resolution magnet for ribbon beam ion implanters 有权
公开(公告)号：US06835930B2
公开(公告)日：2004-12-28
申请号：US10753731
申请日：2004-01-08
申请人： Victor M. Benveniste , Yongzhang Huang
发明人： Victor M. Benveniste , Yongzhang Huang
IPC分类号： H01J4930
CPC分类号： H01J37/32082 , H01J37/05 , H01J37/3171 , H01J37/3266 , H01J2237/0041
摘要： A mass analyzer for a ribbon shaped ion beam is disclosed. The mass analyzer comprises a pair of coils that define an entrance end and an exit end of the analyzer. Field clamps are employed at or proximate to one or more of the entrance and exit ends of the mass analyzer. The field clamps operate to terminate fringing fields close to the entrance and exit ends of the mass analyzer, thereby reducing the impact of such fringing fields on the ribbon beam and improving beam uniformity.

33. 发明授权

US06833710B2 Probe assembly for detecting an ion in a plasma generated in an ion source 失效
标题翻译：用于检测在离子源中产生的等离子体中的离子的探针组件
公开(公告)号：US06833710B2
公开(公告)日：2004-12-21
申请号：US09966604
申请日：2001-09-27
申请人： Victor M. Benveniste
发明人： Victor M. Benveniste
IPC分类号： G01N2762
CPC分类号： H01J37/32935
摘要： A method and apparatus relating to an ion implantation system that employs an ion source for generating a plasma having an ion, and a probe assembly for detecting the ion of the plasma is provided. The probe assembly includes a probe body and a focusing device for extracting the ion from the plasma, and a filter for filtering ions extracted from the plasma.
摘要翻译：提供了一种与使用离子源产生具有离子的等离子体的离子注入系统有关的方法和装置，以及用于检测等离子体离子的探针组件。探针组件包括用于从等离子体提取离子的探针体和聚焦装置，以及用于过滤从等离子体提取的离子的过滤器。

34. 发明授权

US06774377B1 Electrostatic parallelizing lens for ion beams 有权
标题翻译：离子束静电平行化透镜
公开(公告)号：US06774377B1
公开(公告)日：2004-08-10
申请号：US10607239
申请日：2003-06-26
申请人： Robert D. Rathmell , Victor M. Benveniste
发明人： Robert D. Rathmell , Victor M. Benveniste
IPC分类号： H01J37317
CPC分类号： H01J37/3171 , H01J37/12
摘要： A lens structure for use with an ion beam implanter. The lens structure includes first and second electrodes spaced apart along a direction of ion movement. The lens structure extends on opposite sides of a beam path across a width of the ion beam for deflecting ions entering the lens structure. The lens structure include a first electrode for decelerating ions and a second electrode for accelerating the ions to cause ions entering the lens structure to exit said lens structure with approximately the same exit trajectory regardless of the trajectory ions enter the lens structure. In an alternate construction the lens structure can include a first electrode for accelerating ions and a second electrode for decelerating ions.
摘要翻译：用于离子束注入机的透镜结构。透镜结构包括沿离子运动方向间隔开的第一和第二电极。透镜结构在离子束的宽度上的光束路径的相对侧上延伸，用于偏转进入透镜结构。透镜结构包括用于减速离子的第一电极和用于加速离子的第二电极，使离子进入透镜结构以离开所述透镜结构以大致相同的出射轨迹，而与轨迹离子进入透镜结构无关。在替代结构中，透镜结构可以包括用于加速离子的第一电极和用于减速离子的第二电极。

35. 发明授权

US06770888B1 High mass resolution magnet for ribbon beam ion implanters 有权
标题翻译：用于带状束离子注入机的高质量分辨率磁体
公开(公告)号：US06770888B1
公开(公告)日：2004-08-03
申请号：US10606087
申请日：2003-06-25
申请人： Victor M. Benveniste , Yongzhang Huang
发明人： Victor M. Benveniste , Yongzhang Huang
IPC分类号： H01J37147
CPC分类号： H01J37/32082 , H01J37/05 , H01J37/3171 , H01J37/3266 , H01J2237/0041
摘要： A mass analyzer for a ribbon shaped ion beam is disclosed. The mass analyzer comprises a pair of coils that define an entrance end and an exit end of the analyzer. Field clamps are employed at or proximate to one or more of the entrance and exit ends of the mass analyzer. The field clamps operate to terminate fringing fields close to the entrance and exit ends of the mass analyzer, thereby reducing the impact of such fringing fields on the ribbon beam and improving beam uniformity.
摘要翻译：公开了一种用于带状离子束的质量分析器。质量分析器包括限定分析器的入口端和出口端的一对线圈。场夹具用于质量分析器的入口和出口端中的一个或多个处或其附近。场夹具用于终止接近质量分析器入口和出口端的边缘场，从而减少这种边缘场对带状束的影响，并提高光束的均匀性。

36. 发明授权

US06703628B2 Method and system for ion beam containment in an ion beam guide 有权
标题翻译：离子束导管中离子束收容的方法和系统
公开(公告)号：US06703628B2
公开(公告)日：2004-03-09
申请号：US10444413
申请日：2003-05-23
申请人： John Zheng Ye , Victor M. Benveniste , Michael Paul Cristoforo
发明人： John Zheng Ye , Victor M. Benveniste , Michael Paul Cristoforo
IPC分类号： H01J37317
CPC分类号： H01J37/05 , H01J37/147 , H01J37/3171 , H01J37/32623 , H01J37/32678 , H01J2237/1508
摘要： Ion implantation systems and beamline assemblies therefor are provided, in which multi-cusped magnetic fields are provided in a beamguide and the beamguide is energized to provide microwave electric fields in a traveling wave along the beamguide passageway. The magnetic and electric fields interact to provide an electron-cyclotron resonance condition for beam containment in the beamguide passageway.
摘要翻译：提供了离子注入系统和其束线组件，其中在光束导向器中设置多通道磁场，并且通过激光束导向沿着光束通道在行波中提供微波电场。磁场和电场相互作用，为光束通道中的光束收容提供电子回旋共振条件。

37. 发明授权

US5780863A Accelerator-decelerator electrostatic lens for variably focusing and mass resolving an ion beam in an ion implanter 失效
公开(公告)号：US5780863A
公开(公告)日：1998-07-14
申请号：US841725
申请日：1997-04-29
申请人： Victor M. Benveniste , Peter L. Kellerman
发明人： Victor M. Benveniste , Peter L. Kellerman
IPC分类号： C23C14/48 , H01J37/12 , H01J37/30 , H01J37/317 , H01L21/265 , H01J37/10
CPC分类号： H01J37/3171 , H01J37/3007 , H01J2237/047 , H01J2237/1207
摘要： An electrostatic triode lens (36) is provided for use in an ion implantation system (10). The lens includes a terminal electrode (37) and an adjustable lens subassembly (40) comprising a suppression electrode (38) and a resolving electrode (39), each having matched curved surfaces (108, 110). The lens subassembly is positioned near the terminal electrode where the beam has a minimal waist in a first (dispersive) plane. Such positioning minimizes the required gaps between electrodes, and thus, helps minimize beam blow-up and the electron depletion region in the deceleration mode of operation. The suppression and resolving electrodes each have first and second portions (38A and 38B, 39A and 39B) separated by a gap (d38, d39). A movement mechanism (60, 62) simultaneously moves the first portions of the suppression and resolving electrodes (38A, 39A) toward and away from the second portions of the suppression and resolving electrodes (38B, 39B), respectively, to adjust the gaps (d38, d39) therebetween. The adjustable lens subassembly (40) conditions the beam output by the terminal electrode (37) by (i) variably focusing the beam in mutually orthogonal (dispersive and non-dispersive) planes in a deceleration mode of operation (where mass resolution is less critical), while (ii) permitting variable mass resolution in the dispersive plane in an acceleration mode of operation (where focusing is less critical). Generally, the gap (d39) between the resolving electrode pair (39) is adjusted to permit adjustable mass resolution in the dispersive plane in the acceleration mode of operation. In the deceleration mode of operation, adjustment of the gap (d39) provides adjustable dispersive plane focusing, while the voltage on suppression electrode (38) is adjusted to permit adjustable non-dispersive plane beam focusing.

38. 发明授权

US5531420A Ion beam electron neutralizer 失效
标题翻译：离子束电子中和剂
公开(公告)号：US5531420A
公开(公告)日：1996-07-02
申请号：US270022
申请日：1994-07-01
申请人： Victor M. Benveniste
发明人： Victor M. Benveniste
IPC分类号： C23C14/48 , H01J37/02 , H01J37/317 , H01L21/265 , H05H3/00
CPC分类号： H01J37/3171 , H01J37/026 , H01J2237/0044
摘要： An ion beam neutralizer has an electron source and an electron deflector for directing electrons from the source into an ion beam. A power supply biases an acceleration grid to a potential suitable for accelerating electrons away from a filament that produces electrons. A second grid defines an electric field through which the electrons move. Electrons pass through the second grid and are deflected by a field between the second grid and a parabolic shaped metal deflector.
摘要翻译：离子束中和器具有电子源和用于将电子从源引导到离子束中的电子偏转器。电源将加速度网格偏置到适于加速电子的电位远离产生电子的细丝。第二个栅格定义电子通过其移动的电场。电子通过第二格栅并被第二格栅和抛物线形金属偏转器之间的场偏转。

39. 发明授权

US5026997A Elliptical ion beam distribution method and apparatus 失效
标题翻译：椭圆离子束分布方法及装置
公开(公告)号：US5026997A
公开(公告)日：1991-06-25
申请号：US436296
申请日：1989-11-13
申请人： Victor M. Benveniste
发明人： Victor M. Benveniste
IPC分类号： H01J27/08 , H01J27/20 , H01J37/08 , H01J37/317 , H01L21/265
CPC分类号： H01J37/08 , H01J27/20 , H01J37/3171
摘要： An ion source for creating an ion beam. The source includes an ionization chamber having one wall that defines a generally elliptical opening for allowing ions to exit the ionization chamber. Use of an elliptical (in section) ion beam has advantages over a rectangular ion beam which allow the integrity of a relatively high current ion beam to be maintained as ions travel to a beam treatment workstation. A dual configuration extraction electrode assembly also provides for a range of extraction energies from a single source.

40. 发明申请

US20130015053A1 INDUCTIVELY COUPLED RF PLASMA SOURCE WITH MAGNETIC CONFINEMENT AND FARADAY SHIELDING 审中-公开
标题翻译：感应耦合RF等离子体源与磁性限制和法拉第屏蔽
公开(公告)号：US20130015053A1
公开(公告)日：2013-01-17
申请号：US13181210
申请日：2011-07-12
申请人： Victor M. Benveniste , Svetlana Rdovanov , Costel Biloiu
发明人： Victor M. Benveniste , Svetlana Rdovanov , Costel Biloiu
IPC分类号： H05H1/46 , H01L21/3065 , C23C16/505
CPC分类号： H01J37/32807 , H01J37/321 , H01J37/3211 , H01J37/32119 , H01J37/32651 , H01J37/32669 , H01J37/32688 , H01J2237/332 , H01J2237/334 , H01L21/3065
摘要： Disclosed is an inductively coupled RF plasma source that provides both magnetic confinement to reduce plasma losses and Faraday shielding to suppress parasitic capacitive components. The inductively coupled RF plasma system comprises an RF power source, plasma chamber, an array of permanent magnets, and an antenna array. The plasma chamber is comprised of walls and a dielectric window having an inner and outer surface wherein the inner surface forms a wall of the plasma chamber. The array of parallel conductive permanent magnets is electrically interconnected and embedded within the dielectric window walls proximate to the inner surface and coupled to ground on one end. The permanent magnet array elements are alternately magnetized toward and away from plasma in the plasma chamber to form a multi-cusp magnetic field. The antenna array may be comprised of parallel tubes through which an RF current is circulated. The antenna array is oriented perpendicular to the permanent magnet array.
摘要翻译：公开了电感耦合RF等离子体源，其提供磁约束以减少等离子体损耗和法拉第屏蔽以抑制寄生电容性部件。电感耦合RF等离子体系统包括RF电源，等离子体室，永磁体阵列和天线阵列。等离子体室由壁和具有内表面和外表面的电介质窗构成，其中内表面形成等离子体室的壁。平行导电永磁体的阵列电互连并且嵌入介于靠近内表面的电介质窗壁内，并在一端接地。永磁体阵列元件在等离子体室中等离子体交替地被磁化，以形成多尖点磁场。天线阵列可以由平行管组成，RF电流通过该平行管循环。天线阵列垂直于永磁体阵列定向。

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