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    • 31. 发明申请
    • Fiber optical illumination system
    • 光纤照明系统
    • US20050180707A1
    • 2005-08-18
    • US11096873
    • 2005-04-01
    • Dov FurmanGad NeumannNoam Dotan
    • Dov FurmanGad NeumannNoam Dotan
    • G01N21/95G02B6/04G02B6/42G02B27/48
    • G02B6/4298G01N21/9501G01N2021/479G02B6/04G02B6/4206G02B27/48
    • A fiber optical illumination delivery system, which is effective in reducing the effects of source coherence. The system preferably utilizes either a single bundle of optical fibers, or serial bundles of optical fibers. In the single bundle embodiment, the differences in optical lengths between different fibers of the bundle is preferably made to be equal to even less than the coherence length of the source illumination. In the serial bundle embodiment, the fibers in the other bundle are arranged as groups of fibers of the same length, and it is the difference in lengths of these groups which is made equal to, or even more preferably, less than the overall difference in length between the shortest and the longest fibers in the other bundle. Both of these fiber systems enable construction of illumination systems delivering a higher level of illumination, but without greatly affecting the coherence breaking abilities of the system, thus enabling a generally more applicable system to be constructed.
    • 一种光纤照明传输系统,可有效减少源相干的影响。 系统优选地使用单束光纤或串联的光纤束。 在单束实施例中,束的不同光纤之间的光学长度差异优选地等于甚至小于源照明的相干长度。 在串联捆绑实施例中,另一束中的纤维被布置成具有相同长度的纤维组,并且这些组的长度差异等于或甚至更优选地小于总体差异 另一束中最短和最长纤维之间的长度。 这两种光纤系统能够实现提供更高水平的照明的照明系统的构造,但是不会非常影响系统的相干断裂能力,从而能够构建一般更适用的系统。
    • 33. 发明授权
    • Focusing method and system
    • 聚焦方法和系统
    • US06521891B1
    • 2003-02-18
    • US09390542
    • 1999-09-03
    • Noam DotanAsher Pearl
    • Noam DotanAsher Pearl
    • H01J3721
    • H01J37/21H01J2237/216
    • According to one aspect of the present invention, there is provided a method for controlling of charged particle beam to compensate for a potential being present on a specimen, the method comprising the steps of: moving a charged particle beam over the specimen; measuring at least one secondary product and/or backscattered particles coming from the specimen to produce an image signal; scoring the image signal; changing the beam energy; analyzing the scores achieved with different beam energies; and adjusting the beam energy based on the analysis, to compensate for the potential being present on the specimen.
    • 根据本发明的一个方面,提供了一种用于控制带电粒子束以补偿存在于试样上的电位的方法,所述方法包括以下步骤:将带电粒子束移动到样本上; 测量来自所述样本的至少一个次要产品和/或背散射粒子以产生图像信号; 评分图像信号; 改变光束能量; 分析用不同光束能量获得的分数; 并根据分析调整光束能量,以补偿样品上存在的电位。
    • 34. 发明授权
    • System and method for automatic analysis of defect material on semiconductors
    • 半导体缺陷材料自动分析系统及方法
    • US06407386B1
    • 2002-06-18
    • US09255495
    • 1999-02-23
    • Noam DotanAlexander Kadyshevitch
    • Noam DotanAlexander Kadyshevitch
    • G01N2300
    • G01N23/20H01J2237/2561
    • A method and system for automatic EDX analysis of defects quantitatively take into consideration x-ray signals attributable to the background. The method and system are capable of automatically identifying suitable locations for background and defect x-ray sampling. The method and system are also capable of effectively and quantitatively, rather than qualitatively, removing signals attributable to the background and not the defect. One advantageous feature that enables the method and system to have a high throughput is termed “trace element analysis.” The method and system are particularly beneficial for analysis of defects on semiconductor wafers and, due to automation, are suitable for in-line inspection of wafers in the fabrication plant.
    • 自动EDX分析缺陷的方法和系统定量考虑了归因于背景的X射线信号。 该方法和系统能够自动识别背景和缺陷x射线采样的合适位置。 该方法和系统还能够有效和定量地而不是定性地去除归因于背景而不是缺陷的信号。 使方法和系统具有高通量的一个有利特征称为“微量元素分析”。 该方法和系统特别有利于分析半导体晶片上的缺陷,并且由于自动化,适用于制造工厂中的晶片的在线检查。
    • 35. 发明授权
    • Apparatus and method for reviewing defects on an object
    • 检查物体上的缺陷的装置和方法
    • US06407373B1
    • 2002-06-18
    • US09334115
    • 1999-06-15
    • Noam Dotan
    • Noam Dotan
    • G02B2740
    • H01L29/6659G01N21/9501G01R31/307G01R31/311H01J37/21H01J2237/2817H01L29/6656H01L29/66628H01L29/7834Y10S257/90Y10S977/869Y10S977/881Y10S977/901Y10S977/954
    • An apparatus and method are disclosed for reviewing defects on an object. The apparatus includes a stage for receiving the object thereon, and both an optical microscope and a scanning electron microscope (SEM). The optical microscope is used to redetect previously mapped defects on the object surface, and includes an illumination source that directs a beam of light toward a selected portion of the object surface. The optical microscope is configured to generate either, or both, bright field and dark field illumination. Once the defect has been redetected, a translation system moves the stage a predetermined displacement such that the defect is positioned for review by the SEM. The apparatus can be configured to automatically focus the defect for viewing by the SEM, and rotate the stage to obtain varying perspectives of the defect.
    • 公开了一种用于检查物体上的缺陷的装置和方法。 该装置包括用于在其上接收物体的台,以及光学显微镜和扫描电子显微镜(SEM)。 光学显微镜用于重新检测物体表面上先前映射的缺陷,并且包括将光束引向物体表面的选定部分的照明源。 光学显微镜被配置为产生明场和暗场照明中的任一者或两者。 一旦重新检测到缺陷,翻译系统将阶段移动到预定位移,使得缺陷被定位以供SEM审查。 该装置可以被配置为自动聚焦通过SEM观察的缺陷,并且旋转台以获得不同的缺陷视角。