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    • 33. 发明申请
    • Light-Emitting Diode With Non-Metallic Reflector
    • 具有非金属反射器的发光二极管
    • US20100038661A1
    • 2010-02-18
    • US12269497
    • 2008-11-12
    • Ding-Yuan ChenWen-Chih ChiouChen-Hua Yu
    • Ding-Yuan ChenWen-Chih ChiouChen-Hua Yu
    • H01L33/00H01L21/00
    • H01L33/16H01L33/0079H01L33/10
    • A light-emitting diode (LED) device is provided. The LED device has a substrate, a reflective structure over the substrate, and an LED structure over the reflective structure. The reflective structure is formed of non-metallic materials. In one embodiment, the reflective structure is formed of alternating layers of different non-metallic materials having different refractive indices. In another embodiment, the reflective structure is formed of alternating layers of high-porosity silicon and low-porosity silicon. In yet another embodiment, the reflective structure is formed of silicon dioxide, which may allow the use of fewer layers. The reflective structure may be formed directly on the same substrate as the LED structure or formed on a separate substrate and then bonded to the LED structure.
    • 提供了一种发光二极管(LED)装置。 LED器件具有衬底,衬底上的反射结构以及反射结构上的LED结构。 反射结构由非金属材料形成。 在一个实施例中,反射结构由具有不同折射率的不同非金属材料的交替层形成。 在另一个实施例中,反射结构由高孔隙率硅和低孔隙率硅的交替层形成。 在另一个实施例中,反射结构由二氧化硅形成,其可以允许使用更少的层。 反射结构可以直接形成在与LED结构相同的基板上,或者形成在单独的基板上,然后结合到LED结构。
    • 35. 发明授权
    • Light-emitting diode with non-metallic reflector
    • 具有非金属反射器的发光二极管
    • US08525200B2
    • 2013-09-03
    • US12269497
    • 2008-11-12
    • Ding-Yuan ChenWen-Chih ChiouChen-Hua Yu
    • Ding-Yuan ChenWen-Chih ChiouChen-Hua Yu
    • H01L33/00H01L21/00
    • H01L33/16H01L33/0079H01L33/10
    • A light-emitting diode (LED) device is provided. The LED device has a substrate, a reflective structure over the substrate, and an LED structure over the reflective structure. The reflective structure is formed of non-metallic materials. In one embodiment, the reflective structure is formed of alternating layers of different non-metallic materials having different refractive indices. In another embodiment, the reflective structure is formed of alternating layers of high-porosity silicon and low-porosity silicon. In yet another embodiment, the reflective structure is formed of silicon dioxide, which may allow the use of fewer layers. The reflective structure may be formed directly on the same substrate as the LED structure or formed on a separate substrate and then bonded to the LED structure.
    • 提供了一种发光二极管(LED)装置。 LED器件具有衬底,衬底上的反射结构以及反射结构上的LED结构。 反射结构由非金属材料形成。 在一个实施例中,反射结构由具有不同折射率的不同非金属材料的交替层形成。 在另一个实施例中,反射结构由高孔隙率硅和低孔隙率硅的交替层形成。 在另一个实施例中,反射结构由二氧化硅形成,其可以允许使用更少的层。 反射结构可以直接形成在与LED结构相同的基板上,或者形成在单独的基板上,然后结合到LED结构。
    • 39. 发明申请
    • Wafer Dicing Methods
    • 晶圆切片方法
    • US20100015782A1
    • 2010-01-21
    • US12175818
    • 2008-07-18
    • Chen-Hua YuWen-Chih ChiouDing-Yuan Chen
    • Chen-Hua YuWen-Chih ChiouDing-Yuan Chen
    • H01L21/00
    • H01L21/78H01L33/0095
    • Semiconductor wafer dicing methods are disclosed. These methods include forming etch patterns between adjacent semiconductor dice to be separated. Various etch processes can be used to form the etch patterns. The etch patterns generally reach a pre-determined depth into the wafer substrate significantly beyond the wafer top layer where pre-fabricated semiconductor dice are embedded. Semiconductor dice may be separated from a post-etch, large-sized, frangible wafer through wafer grinding, mechanical cleaving, and laser dicing approaches. Preferred embodiments result in reduced wafer-dicing related device damage and improved product yield.
    • 公开了半导体晶片切割方法。 这些方法包括在相邻半导体晶片之间形成待分离的蚀刻图案。 可以使用各种蚀刻工艺来形成蚀刻图案。 蚀刻图案通常达到晶片衬底的预定深度,显着超过嵌入预制半导体晶片的晶片顶层。 半导体晶片可以通过晶片研磨,机械切割和激光切割方法与后蚀刻,大尺寸的易碎晶片分离。 优选的实施例导致晶片切割相关装置损坏减少和产品产量提高。