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31. 发明申请

US20090170037A1 COMPOSITION FOR REMOVING PHOTORESIST AND METHOD OF MANUFACTURING AN ARRAY SUBSTRATE USING THE SAME 有权
标题翻译：用于去除光电元件的组合物和使用其制造阵列基板的方法
公开(公告)号：US20090170037A1
公开(公告)日：2009-07-02
申请号：US12323649
申请日：2008-11-26
申请人： Jong-Hyun CHOUNG , Hong-Sick Park , Sun-Young Hong , Bong-Kyun Kim , Byeoung-Jin Lee , Byung-Uk Kim , Jong-Hyun Jeong , Suk-Il Yoon , Sung-Gun Shin , Soon-Beom Huh , Se-Hwan Jung , Doo-Young Jang
发明人： Jong-Hyun CHOUNG , Hong-Sick Park , Sun-Young Hong , Bong-Kyun Kim , Byeoung-Jin Lee , Byung-Uk Kim , Jong-Hyun Jeong , Suk-Il Yoon , Sung-Gun Shin , Soon-Beom Huh , Se-Hwan Jung , Doo-Young Jang
IPC分类号： G03F7/20 , G03F7/42
CPC分类号： G03F7/425
摘要： A composition for removing a photoresist includes a) an amine compound having a cyclic amine and/or a diamine, b) a glycol ether compound, c) a corrosion inhibitor and d) a polar solvent. The composition further includes a stripping promoter. Further disclosed is a method of manufacturing an array substrate using the composition for removing a photoresist.
摘要翻译：用于除去光致抗蚀剂的组合物包括a）具有环胺和/或二胺的胺化合物，b）二醇醚化合物，c）缓蚀剂和d）极性溶剂。组合物还包括剥离促进剂。进一步公开了使用除去光致抗蚀剂的组合物制造阵列基板的方法。

32. 发明授权

US08865528B2 Thin film transistor substrate and the method thereof 有权
标题翻译：薄膜晶体管基板及其制造方法
公开(公告)号：US08865528B2
公开(公告)日：2014-10-21
申请号：US12844356
申请日：2010-07-27
申请人： Jean-Ho Song , Shin-Il Choi , Sun-Young Hong , Shi-Yul Kim , Ki-Yeup Lee , Jae-Hyoung Youn , Sung-Ryul Kim , O-Sung Seo , Yang-Ho Bae , Jong-Hyun Choung , Dong-Ju Yang , Bong-Kyun Kim , Hwa-Yeul Oh , Pil-Soon Hong , Byeong-Beom Kim , Je-Hyeong Park , Yu-Gwang Jeong , Jong-In Kim , Nam-Seok Suh
发明人： Jean-Ho Song , Shin-Il Choi , Sun-Young Hong , Shi-Yul Kim , Ki-Yeup Lee , Jae-Hyoung Youn , Sung-Ryul Kim , O-Sung Seo , Yang-Ho Bae , Jong-Hyun Choung , Dong-Ju Yang , Bong-Kyun Kim , Hwa-Yeul Oh , Pil-Soon Hong , Byeong-Beom Kim , Je-Hyeong Park , Yu-Gwang Jeong , Jong-In Kim , Nam-Seok Suh
IPC分类号： H01L21/84 , H01L27/12
CPC分类号： H01L27/124 , H01L27/12 , H01L27/1214 , H01L27/1288 , H01L29/42368 , H01L29/458 , H01L29/78669
摘要： A thin film transistor array panel includes a gate line, a gate insulating layer that covers the gate line, a semiconductor layer that is disposed on the gate insulating layer, a data line and drain electrode that are disposed on the semiconductor layer, a passivation layer that covers the data line and drain electrode and has a contact hole that exposes a portion of the drain electrode, and a pixel electrode that is electrically connected to the drain electrode through the contact hole. The data line and drain electrode each have a double layer that includes a lower layer of titanium and an upper layer of copper, and the lower layer is wider than the upper layer, and the lower layer has a region that is exposed. The gate insulating layer may have a step shape.
摘要翻译：薄膜晶体管阵列面板包括栅极线，覆盖栅极线的栅极绝缘层，设置在栅极绝缘层上的半导体层，设置在半导体层上的数据线和漏极，钝化层覆盖数据线和漏电极，并且具有露出漏电极的一部分的接触孔，以及通过接触孔与漏电极电连接的像素电极。数据线和漏极各自具有包括钛的下层和铜的上层的双层，下层比上层宽，下层具有暴露的区域。栅极绝缘层可以具有台阶形状。

33. 发明授权

US08557621B2 Method for manufacturing thin film transistor array panel 有权
标题翻译：制造薄膜晶体管阵列面板的方法
公开(公告)号：US08557621B2
公开(公告)日：2013-10-15
申请号：US13157806
申请日：2011-06-10
申请人： Jong-Hyun Choung , Yang Ho Bae , Jean Ho Song , O Sung Seo , Sun-Young Hong , Hwa Yeul Oh , Bong-Kyun Kim , Nam Seok Suh , Dong-Ju Yang , Wang Woo Lee
发明人： Jong-Hyun Choung , Yang Ho Bae , Jean Ho Song , O Sung Seo , Sun-Young Hong , Hwa Yeul Oh , Bong-Kyun Kim , Nam Seok Suh , Dong-Ju Yang , Wang Woo Lee
IPC分类号： H01L21/00
CPC分类号： H01L21/32134 , G02F1/136227 , H01L27/1288 , H01L29/41733
摘要： A method for manufacturing a thin film transistor array panel, including: sequentially forming a first silicon layer, a second silicon layer, a lower metal layer, and an upper metal layer on a gate insulating layer and a gate line; forming a first film pattern on the upper metal layer; forming a first lower metal pattern and a first upper metal pattern that includes a protrusion, by etching the upper metal layer and the lower metal layer; forming first and second silicon patterns by etching the first and second silicon layers; forming a second film pattern by ashing the first film pattern; forming a second upper metal pattern by etching the first upper metal pattern; forming a data line and a thin film transistor by etching the first lower metal pattern and the first and second silicon patterns; and forming a passivation layer and a pixel electrode on the resultant.
摘要翻译：一种制造薄膜晶体管阵列面板的方法，包括：在栅绝缘层和栅极线上依次形成第一硅层，第二硅层，下金属层和上金属层; 在上金属层上形成第一膜图案; 通过蚀刻上金属层和下金属层，形成第一下金属图案和包括突起的第一上金属图案; 通过蚀刻第一和第二硅层形成第一和第二硅图案; 通过灰化第一膜图案形成第二膜图案; 通过蚀刻第一上金属图案形成第二上金属图案; 通过蚀刻第一下金属图案和第一和第二硅图案来形成数据线和薄膜晶体管; 并在所得物上形成钝化层和像素电极。

34. 发明申请

US20110133193A1 THIN FILM TRANSISTOR SUBSTRATE AND THE METHOD THEREOF 有权
标题翻译：薄膜晶体管基板及其方法
公开(公告)号：US20110133193A1
公开(公告)日：2011-06-09
申请号：US12844356
申请日：2010-07-27
申请人： Jean-Ho SONG , Shin-Il Choi , Sun-Young Hong , Shi-Yul Kim , Ki-Yeup Lee , Jae-Hyoung Youn , Sung-Ryul Kim , O-Sung Seo , Yang-Ho Bae , Jong-Hyun Choung , Dong-Ju Yang , Bong-Kyun Kim , Hwa-Yeul Oh , Pil-Soon Hong , Byeong-Beom Kim , Je-Hyeong Park , Yu-Gwang Jeong , Jong-In Kim , Nam-Seok Suh
发明人： Jean-Ho SONG , Shin-Il Choi , Sun-Young Hong , Shi-Yul Kim , Ki-Yeup Lee , Jae-Hyoung Youn , Sung-Ryul Kim , O-Sung Seo , Yang-Ho Bae , Jong-Hyun Choung , Dong-Ju Yang , Bong-Kyun Kim , Hwa-Yeul Oh , Pil-Soon Hong , Byeong-Beom Kim , Je-Hyeong Park , Yu-Gwang Jeong , Jong-In Kim , Nam-Seok Suh
IPC分类号： H01L27/12 , H01L29/786 , H01L21/336
CPC分类号： H01L27/124 , H01L27/12 , H01L27/1214 , H01L27/1288 , H01L29/42368 , H01L29/458 , H01L29/78669
摘要： A thin film transistor array panel includes a gate line, a gate insulating layer that covers the gate line, a semiconductor layer that is disposed on the gate insulating layer, a data line and drain electrode that are disposed on the semiconductor layer, a passivation layer that covers the data line and drain electrode and has a contact hole that exposes a portion of the drain electrode, and a pixel electrode that is electrically connected to the drain electrode through the contact hole. The data line and drain electrode each have a double layer that includes a lower layer of titanium and an upper layer of copper, and the lower layer is wider than the upper layer, and the lower layer has a region that is exposed. The gate insulating layer may have a step shape.
摘要翻译：薄膜晶体管阵列面板包括栅极线，覆盖栅极线的栅极绝缘层，设置在栅极绝缘层上的半导体层，设置在半导体层上的数据线和漏极，钝化层覆盖数据线和漏电极，并且具有露出漏电极的一部分的接触孔，以及通过接触孔与漏电极电连接的像素电极。数据线和漏极各自具有包括钛的下层和铜的上层的双层，下层比上层宽，下层具有暴露的区域。栅极绝缘层可以具有台阶形状。

35. 发明申请

US20050167184A1 Torque detector with reflector for electric power steering system 审中-公开
标题翻译：用于电动助力转向系统的扭矩检测器
公开(公告)号：US20050167184A1
公开(公告)日：2005-08-04
申请号：US10510412
申请日：2003-04-25
申请人： Sun-Young Hong , Kwang-Suck Boo
发明人： Sun-Young Hong , Kwang-Suck Boo
IPC分类号： B62D6/10 , G01L3/12 , G01L5/22 , B62D5/04
CPC分类号： G01L3/12 , B62D6/10 , G01L5/221
摘要： The present invention relates to a steering torque detecting apparatus of an electric power steering system which is capable of assisting a steering operation by accurately detecting a steering torque b providing a light incident groove having a reflections surface. In a steering system which includes an input shaft connected with a steering handle, an output shaft which is connected with vehicle wheels, an elastic member which connects the input shaft and output shaft to be rotatable in different directions at a certain angle, and a steering torque detector which is installed between the input shaft and the output shaft for thereby detecting a steering torque, there is provided a steering torque detector of a steering system which includes left and right reflections surfaces formed in one of the input shaft and output shaft, a light emitting element which is installed in a shaft corresponding to a shaft in which the reflection surface is formed, and left and right light receiving elements which are installed in left and right sides of the light emitting element and receive light of the light emitting element in accordance with a relative rotation of the input shaft and output haft.
摘要翻译：本发明涉及一种电动助力转向系统的转向转矩检测装置，其能够通过精确地检测提供具有反射表面的光入射槽的转向转矩b来辅助转向操作。在包括与转向手柄连接的输入轴的转向系统中，与车轮连接的输出轴，连接输入轴和输出轴的弹性构件能够以不同方向以一定角度旋转，以及转向设置在输入轴和输出轴之间的转矩检测器，由此检测转向转矩，设置有转向系统的转向转矩检测器，转向系统包括形成在输入轴和输出轴之一中的左右反射面，安装在与形成有反射面的轴对应的轴的发光元件以及安装在发光元件的左侧和右侧并且接收发光元件的光的左右光接收元件根据输入轴的相对旋转和输出轴。

36. 发明授权

US08462331B2 Laser processing method and laser processing apparatus 有权
标题翻译：激光加工方法和激光加工设备
公开(公告)号：US08462331B2
公开(公告)日：2013-06-11
申请号：US12914406
申请日：2010-10-28
申请人： Beng So Ryu , Hong-Jin Jung , Byong-Shik Lee , Bum-Joong Kim , Hyeon-Sam Jang , Hark-Yong Kim , Jong-Ho Kwak , Young-Yong Kim , Sun-Young Hong
发明人： Beng So Ryu , Hong-Jin Jung , Byong-Shik Lee , Bum-Joong Kim , Hyeon-Sam Jang , Hark-Yong Kim , Jong-Ho Kwak , Young-Yong Kim , Sun-Young Hong
IPC分类号： G01N21/00 , B23K26/38 , H01L21/66
CPC分类号： H01L21/68 , B23K26/048 , B23K26/0861 , B23K26/705 , H01L21/67092 , H01L22/12
摘要： The present disclosure relates to laser processing and a laser processing apparatus for processing materials using laser. Processing performed after loading a wafer on a work stage and a laser processing apparatus for implementing such processing, among others, are disclosed. The laser processing includes loading a wafer on a work stage; determining the number of chips formed on the wafer loaded on the work stage, performing chip defect inspection and aligning the wafer while moving the work stage; measuring a height of a surface of the wafer loaded on the work stage using a displacement sensor; monitoring output power of a processing laser using a power meter; and shifting the work stage while irradiating a laser beam on the wafer to process the wafer.
摘要翻译：本公开涉及激光加工和用于使用激光加工材料的激光加工装置。公开了在工作台上加载晶片之后进行的处理以及用于实现这种处理的激光加工装置等。激光加工包括将晶片装载在工作台上; 确定在载置在工作台上的晶片上形成的芯片的数量，执行芯片缺陷检查和对准晶片同时移动工作台; 使用位移传感器测量装载在工作台上的晶片的表面的高度; 使用功率计监测加工激光的输出功率; 并且在对晶片照射激光束的同时移动工作台以处理晶片。

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