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    • 31. 发明授权
    • Method for producing a Gag-Env fusion protein
    • 生产Gag-Env融合蛋白的方法
    • US5834267A
    • 1998-11-10
    • US487657
    • 1995-06-07
    • Atsushi SaitoHideo SinagawaAtsuo Nakata
    • Atsushi SaitoHideo SinagawaAtsuo Nakata
    • A61K39/00C07K14/16C12N15/49C12N15/00C12N15/09C12N15/63C12N15/70
    • C07K14/005A61K39/00C07K2319/00C07K2319/40C12N2740/16122C12N2740/16222C12N2740/16322Y10S435/974
    • Disclosed is a substantially pure HIV antigen comprising a Gag-Env fusion otein consisting of a Gag peptide fused at its C-terminus to an Env peptide, wherein the Gag peptide comprises a contiguous sequence of at least ten amino acids of the amino acid sequence represented by Gag (308-437) and the Env peptide comprises a contiguous sequence of at least a part of the amino acid sequence represented by Env (512-699), the part containing at least one epitope which is reactive to an HIV antibody. The gag-env fusion DNA corresponding to the HIV antigen of the present invention allows the production of the desired high antigenicity HIV antigen in high yield. Therefore, the HIV antigen of the present invention can be advantageously used as an active component for a diagnostic reagent, a vaccine, an antibody preparation and a therapeutic reagent for AIDS. Also disclosed is a substantially pure HIV antigen comprising a Gag protein SEQ ID No.:1 coded for by the entire gag gene.
    • 公开了一种基本上纯的HIV抗原,其包含由其C-末端融合到Env肽的Gag肽组成的Gag-Env融合蛋白,其中Gag肽包含表示的氨基酸序列的至少十个氨基酸的连续序列 通过Gag(308-437),并且Env肽包含由Env(512-699)表示的至少一部分氨基酸序列的连续序列,该部分含有至少一个对HIV抗体具有反应性的表位。 对应于本发明的HIV抗原的gag-env融合DNA允许以高产率产生所需的高抗原性HIV抗原。 因此,本发明的HIV抗原可以有利地用作诊断试剂,疫苗,抗体制剂和用于AIDS的治疗试剂的活性成分。 还公开了包含由整个gag基因编码的Gag蛋白质SEQ ID No.1的基本上纯的HIV抗原。
    • 32. 发明授权
    • Charged particle beam exposure method and charged particle beam exposure
apparatus
    • 带电粒子束曝光方法和带电粒子束曝光装置
    • US5808313A
    • 1998-09-15
    • US892976
    • 1997-07-15
    • Akio YamadaHiroshi YasudaHidefumi YabaraAtsushi Saito
    • Akio YamadaHiroshi YasudaHidefumi YabaraAtsushi Saito
    • H01L21/027H01J37/304H01J37/317H01J37/00
    • B82Y10/00B82Y40/00H01J37/304H01J37/3174
    • The object of the present invention is to ensure a correct exposure even when a single exposure apparatus is used to expose a predetermined pattern, and an exposure apparatus therefor. According to the present invention, a charged particle beam exposure method, wherein a charged particle beam having a predetermined shape is irradiated to a sample to have the surface of the sample be exposed, comprises the steps of: storing a record of a first quantity of reflected electrons or a first sample current, which is detected in accordance with the charged particle beam irradiatd to the sample when a first exposure pattern is formed in a first area of the sample; and comparing a second quantity of reflected electrons or a second sample current, which is detected in accordance with the charged particle beam irradiated to the sample when the first exposure pattern is formed in a second area of the sample, with the first quantity of the reflected electrons or the first sample current which is stored when the first area is exposed, and generating a matched or unmatched signal therefor.
    • 本发明的目的在于即使使用单一的曝光装置来曝光预定图案也能确保正确的曝光及其曝光装置。 根据本发明,一种带电粒子束曝光方法,其中对样品照射具有预定形状的带电粒子束以暴露样品的表面,包括以下步骤:将第一量的 反射电子或第一样品电流,当在样品的第一区域中形成第一曝光图案时,其根据被照射到样品的带电粒子束来检测; 并且比较第二量的反射电子或第二样品电流,其在样品的第二区域中形成第一曝光图案时根据照射到样品的带电粒子束检测到的第一数量的反射电子或第二样品电流, 电子或第一采样电流,其在第一区域被暴露时存储,并且产生匹配或不匹配的信号。
    • 37. 发明授权
    • Apparatus and method for wiping an ink jet recording head with control
of relative speed between wiper and head
    • 用于通过控制擦拭器和头部之间的相对速度来擦拭喷墨记录头的装置和方法
    • US5548309A
    • 1996-08-20
    • US737657
    • 1991-07-30
    • Akio OkuboAtsushi SaitoFumihiko Watanabe
    • Akio OkuboAtsushi SaitoFumihiko Watanabe
    • B41J2/165
    • B41J2/16508B41J2/16588
    • A wiping apparatus for a recording head of an ink jet recording apparatus, which has a recording head including an ink ejection portion, includes a wiping member, and a rotation device for rotating the recording head and/or the wiping member so that the wiping member slides on the ink ejection portion. The apparatus prevents the splash of ink caused when the wiping member leaves the ink ejection portion by using one of the following techniques: First, a wiping speed is decreased at the end of wiping; second, an angle between the wiping member and the ink ejection portion is declined as the wiping proceeds; third, the first and second techniques are combined; and fourth, an approach amount of the wiping member to the ink ejection portion is reduced at least just before the wiping member leaves the ink ejection portion. Using one of these technique enables the wiping member to leave softly the ink ejection portion by weakening the restoring force of the wiping member, thereby preventing ink from splashing into the surroundings during the wiping operation.
    • 一种用于喷墨记录装置的记录头的擦拭装置,具有包括喷墨部分的记录头,包括擦拭部件和用于使记录头和/或擦拭部件旋转的旋转装置,使得擦拭部件 在喷墨部分上滑动。 该装置通过使用以下技术之一防止擦拭构件离开墨水喷射部时引起的墨水飞溅:首先,在擦拭结束时擦拭速度降低; 第二,随着擦拭的进行,擦拭部件和喷墨部分之间的角度下降; 第三,第一和第二技术相结合; 第四,至少恰好在擦拭构件离开墨水喷射部分之前,将擦拭构件到墨水喷射部分的接近量减少。 使用这些技术之一,通过削弱擦拭构件的恢复力,擦拭构件能够轻轻地离开墨水喷射部分,从而防止在擦拭操作期间墨水溅入周围环境。
    • 39. 发明授权
    • Recovery system and ink jet recording apparatus provided with said
recovery system
    • 具有所述回收系统的回收系统和喷墨记录装置
    • US5481283A
    • 1996-01-02
    • US409963
    • 1995-03-24
    • Fumihiko WatanabeAkio OkuboAtsushi SaitoYasuyuki Shinada
    • Fumihiko WatanabeAkio OkuboAtsushi SaitoYasuyuki Shinada
    • B41J2/165
    • B41J2/16511B41J2/16523B41J2/16585
    • A recovery system comprises a cap means for covering the discharging ports of a recording head to perform recording by discharging ink, and a wiper assembly for wiping the discharging port face of the recording head, the wiper assembly being a large-sized wiping member and a small-sized wiping member, wherein the small-sized wiping member is first in contact with the discharging port face of the recording head. A guide member guides the recording head and the cap at the time of mating and a holder holds the recording head and cap, which holder holds the recording head and said cap in such a manner that they can relatively be displaced in the direction crossing the contacting direction thereof. A cap unit with the cap and wiper assembly can be rotated within a rotational area of the recording head. Wiping by the wiper assembly is performed in such a manner that following the rotation of the recording head, the small-sized wiping member is first in contact therewith and subsequently, the large-sized wiping member is in contact therewith.
    • 回收系统包括用于覆盖记录头的排出口以通过排出墨水进行记录的盖装置和用于擦拭记录头的排出口面的擦拭器组件,刮水器组件是大尺寸的擦拭构件和 小型擦拭构件,其中小尺寸擦拭构件首先与记录头的排出口面接触。 引导构件在配合时引导记录头和盖,并且保持器保持记录头和盖,该保持器以这样的方式保持记录头和盖,使得它们可以在与接触的方向相对移位 方向。 具有盖和刮水器组件的盖单元可以在记录头的旋转区域内旋转。 通过擦拭器组件的擦拭以这样一种方式进行:在记录头的旋转之后,小尺寸的擦拭部件首先与其接触,随后大尺寸的擦拭部件与其接触。
    • 40. 发明授权
    • Nonradiative dielectric waveguide and manufacturing method thereof
    • 非辐射介质波导及其制造方法
    • US5473296A
    • 1995-12-05
    • US205905
    • 1994-03-03
    • Youhei IshikawaHiroshi NishidaAtsushi Saito
    • Youhei IshikawaHiroshi NishidaAtsushi Saito
    • H01P3/16H01P11/00
    • H01P3/165
    • A nonradiative dielectric waveguide which includes a first housing and a second housing. The first housing and the second housing respectively include first and second dielectric units and conductor electrodes. The first and second dielectric units are respectively integrally formed with first and second planar portions, and first and second dielectric strip line portions extending outwardly from said first and second planar portions and by a predetermined height, with abutting faces generally parallel with the conductor electrodes and being provided at top portions of said dielectric strip line portions. The conductor electrodes are respectively formed in close contact with faces of the first and second dielectric units remote from the abutting faces. The first and second housings are overlapped so as to make the abutting faces confront each other. The first and second dielectric strip lines portions cooperate to propagate electromagnetic waves. The disclosure is also directed to a manufacturing method of the above nonradiative dielectric waveguide.
    • 一种非辐射介质波导,包括第一壳体和第二壳体。 第一壳体和第二壳体分别包括第一和第二电介质单元和导体电极。 第一和第二电介质单元分别与第一和第二平面部分一体地形成,并且第一和第二介质条线部分从所述第一和第二平面部分向外延伸并且具有预定高度,其中接触面大致平行于导体电极, 设置在所述介质带状线部分的顶部。 导体电极分别形成为紧密接触第一和第二介质单元的远离邻接表面的表面。 第一和第二壳体重叠,以使邻接面彼此面对。 第一和第二介质条线部分协作以传播电磁波。 本发明还涉及上述非辐射电介质波导的制造方法。