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31. 发明授权

US07256243B2 Silicon compound 有权
标题翻译：硅化合物
公开(公告)号：US07256243B2
公开(公告)日：2007-08-14
申请号：US11121120
申请日：2005-05-04
申请人： Hisao Oikawa , Mikio Yamahiro , Kazuhiro Yoshida , Nobumasa Ootake , Kenichi Watanabe , Kohji Ohno , Yoshinobu Tsujii , Takeshi Fukuda
发明人： Hisao Oikawa , Mikio Yamahiro , Kazuhiro Yoshida , Nobumasa Ootake , Kenichi Watanabe , Kohji Ohno , Yoshinobu Tsujii , Takeshi Fukuda
IPC分类号： C08F4/16 , C08G77/442
CPC分类号： C07F7/21
摘要： The present invention provides a novel silicon compound represented by Formula (1) having a living radical polymerization initiating ability for addition-polymerizable monomers and a polymer obtained using the same. The above polymer can provide an organic-inorganic composite material having a distinct structure. wherein R1 is hydrogen, alkyl, aryl or arylalkyl; R2 and R3 are alkyl, phenyl or cyclohexyl; and A is a group having an ability to initiate polymerization of a monomer.
摘要翻译：本发明提供一种由加成聚合性单体具有活性自由基聚合引发能力的式（1）表示的新型硅化合物和使用该硅化合物的聚合物。上述聚合物可以提供具有不同结构的有机 - 无机复合材料。其中R 1是氢，烷基，芳基或芳基烷基; R 2和R 3是烷基，苯基或环己基; 而A是具有引发单体聚合能力的基团。

32. 发明授权

US07399819B2 Silicon compound 有权
标题翻译：硅化合物
公开(公告)号：US07399819B2
公开(公告)日：2008-07-15
申请号：US10528001
申请日：2003-09-17
申请人： Mikio Yamahiro , Hisao Oikawa , Kazuhiro Yoshida , Kenya Ito , Yasuhiro Yamamoto , Masami Tanaka , Nobumasa Ootake , Kenichi Watanabe , Kohji Ohno , Yoshinobu Tsujii , Takeshi Fukuda
发明人： Mikio Yamahiro , Hisao Oikawa , Kazuhiro Yoshida , Kenya Ito , Yasuhiro Yamamoto , Masami Tanaka , Nobumasa Ootake , Kenichi Watanabe , Kohji Ohno , Yoshinobu Tsujii , Takeshi Fukuda
IPC分类号： C08G77/24
CPC分类号： C08G77/442 , C07F7/21 , C08G77/045 , C08G77/38
摘要： A large part of conventional organic-inorganic composite materials is obtained by mechanical blending silsesquioxanes with organic polymers, and therefore it has been very difficult to control the structure thereof as the molecular aggregate of the composite materials. An object of the present invention is to provide a novel silicon compound having a living radical polymerization-initiating ability for an addition-polymerizable monomer and a polymer obtained using the same to thereby solve the problem described above regarding the conventional organic-inorganic composite materials. The present inventors have found that a novel silsesquioxane derivative to which a group having an ability to initiate polymerization of a monomer is useful as means for solving the problem described above. That is, the silsesquioxane derivative of the present invention is represented by Formula (1): wherein R1 is hydrogen, alkyl, aryl or arylalkyl; R2 and R3 are alkyl, phenyl or cyclohexyl; and A is a group having an ability to initiate polymerization of a monomer.
摘要翻译：通过将倍半硅氧烷与有机聚合物机械共混获得大部分常规有机 - 无机复合材料，因此非常难以控制其作为复合材料的分子骨料的结构。本发明的目的是提供一种具有可加聚单体的活性自由基聚合引发能力的新型硅化合物和使用该硅化合物获得的聚合物，从而解决了有关常规有机 - 无机复合材料的上述问题。本发明人已经发现，具有引发单体聚合能力的基团的新型倍半硅氧烷衍生物可用作解决上述问题的手段。也就是说，本发明的倍半硅氧烷衍生物由式（1）表示：其中R 1是氢，烷基，芳基或芳基烷基; R 2和R 3是烷基，苯基或环己基; 而A是具有引发单体聚合能力的基团。

33. 发明申请

US20060287454A1 Silicon compounds 有权
标题翻译：硅化合物
公开(公告)号：US20060287454A1
公开(公告)日：2006-12-21
申请号：US10548365
申请日：2004-03-05
申请人： Mikio Yamahiro , Hisao Oikawa , Kenya Ito , Yasuhiro Yamamoto , Masami Tanaka , Nobumasa Ootake , Kenichi Watanabe , Kohji Ohno , Yoshinobu Tsujii , Takeshi Fukuda
发明人： Mikio Yamahiro , Hisao Oikawa , Kenya Ito , Yasuhiro Yamamoto , Masami Tanaka , Nobumasa Ootake , Kenichi Watanabe , Kohji Ohno , Yoshinobu Tsujii , Takeshi Fukuda
IPC分类号： C08F230/08 , C07F7/04
CPC分类号： C08G77/04 , C07F7/21 , C08F10/00 , C08F30/08 , C08F2500/03
摘要： The present invention provides a silicon compound represented by Formula (1) and a polymer obtained by using the same, and this makes it possible not only to obtain an organic-inorganic composite material having a distinct structure but also to control the structure of the above polymer as a molecular aggregate. wherein R1 is a group independently selected from hydrogen, alkyl having a carbon atom number of 1 to 40, substituted or non-substituted aryl and substituted or non-substituted arylalkyl; in this alkyl having a carbon atom number of 1 to 40, optional hydrogens may be substituted with fluorine, and optional —CH2— may be substituted with —O—, —CH═CH—, cycloalkylene or cycloalkenylene; in alkylene in this arylalkyl, optional hydrogens may be substituted with fluorine, and optional —CH2— may be substituted with —O— or —CH═CH—; and A1 is a group having an α-haloester bond.
摘要翻译：本发明提供由式（1）表示的硅化合物和使用它的聚合物，不仅可以获得具有不同结构的有机 - 无机复合材料，而且可以控制上述结构聚合物作为分子聚集体。其中R 1是独立地选自氢，碳原子数为1至40的烷基，取代或未取代的芳基和取代或未取代的芳基烷基的基团; 在该碳原子数为1至40的烷基中，任选的氢可被氟取代，并且任选的-CH 2 - 可以被-O-，-CH-CH-，亚环烷基或环亚烯基在该芳烷基中的亚烷基中，任选的氢可以被氟取代，任选的-CH 2 - 可以被-O-或-CH-CH-取代; 且A 1是具有α-卤代酯键的基团。

34. 发明授权

US09050707B2 Method for manufacturing polishing pad 有权
标题翻译：抛光垫的制造方法
公开(公告)号：US09050707B2
公开(公告)日：2015-06-09
申请号：US13918341
申请日：2013-06-14
申请人： Takeshi Fukuda , Tsuguo Watanabe , Junji Hirose , Kenji Nakamura , Masato Doura
发明人： Takeshi Fukuda , Tsuguo Watanabe , Junji Hirose , Kenji Nakamura , Masato Doura
IPC分类号： B29C44/24 , B29C44/32 , B24B37/22 , B24B37/24 , B24B37/26 , B24D11/00 , B29C44/30 , B24B37/20 , B24D3/32 , B24D18/00 , B29C44/56 , C08J9/30
CPC分类号： B24D11/003 , B24B37/205 , B24B37/22 , B24B37/24 , B24B37/26 , B24D3/32 , B24D18/00 , B29C44/24 , B29C44/308 , B29C44/32 , B29C44/322 , B29C44/326 , B29C44/5654 , C08J9/30 , C08J2375/08 , Y10T156/1052 , Y10T156/1059
摘要： A method for manufacturing a polishing pad, which may be laminated, with a small number of manufacturing steps, high productivity and no peeling between a polishing layer and a cushion layer includes preparing a cell-dispersed urethane composition by a mechanical foaming method; continuously discharging the cell-dispersed urethane composition onto a face material, while feeding the face material; laminating another face material on the cell-dispersed urethane composition; curing the cell-dispersed urethane composition, while controlling its thickness to be uniform, so that a polishing layer including a polyurethane foam is formed; cutting the polishing layer parallel to the face into two pieces so that two long polishing layers each including the polishing layer and the face material are simultaneously formed; and cutting the long polishing layers to produce the polishing pad.
摘要翻译：可以通过少量制造步骤制造抛光垫的方法，抛光层和缓冲层之间的高生产率和无剥离的方法包括通过机械发泡法制备细胞分散的聚氨酯组合物; 在将表面材料供给的同时，将细胞分散的尿烷组合物连续排出到面材上; 在细胞分散的氨基甲酸酯组合物上层压另一种面材; 固化细胞分散的聚氨酯组合物，同时控制其厚度均匀，从而形成包括聚氨酯泡沫的抛光层; 将平行于表面的抛光层切割成两片，使得同时形成各自包括抛光层和面材的两个长抛光层; 并切割长抛光层以产生抛光垫。

35. 发明授权

US08748654B2 Method for producing tolylene diisocyanate 有权
标题翻译：甲苯二异氰酸酯的制备方法
公开(公告)号：US08748654B2
公开(公告)日：2014-06-10
申请号：US14115852
申请日：2012-04-06
申请人： Koji Takamatsu , Kazuhiro Kosumi , Takeshi Fukuda , Masaaki Sasaki
发明人： Koji Takamatsu , Kazuhiro Kosumi , Takeshi Fukuda , Masaaki Sasaki
IPC分类号： C07C263/00 , C07C263/04 , C07C263/06 , C07C263/20
CPC分类号： C07C263/00 , C07C263/04 , C07C263/06 , C07C263/20 , C07C269/04 , C07C265/14 , C07C271/28
摘要： A method for producing tolylene diisocyanate includes: mixing a first diaminotoluene containing 2,4-diaminotoluene and 2,6-diaminotoluene at a first isomer ratio and a second diaminotoluene containing 2,4-diaminotoluene and/or 2,6-diaminotoluene at a second isomer ratio that is different from the first isomer ratio so as to prepare mixed diaminotoluene; producing tolylene dicarbamate by reaction of the mixed diaminotoluene, urea and/or N-unsubstituted carbamic acid ester and alcohol; and thermally decomposing the tolylene dicarbamate.
摘要翻译：一种制备甲苯二异氰酸酯的方法包括：以第一异构体比例混合含有2,4-二氨基甲苯和2,6-二氨基甲苯的第一二氨基甲苯和第二异构体含有2,4-二氨基甲苯和/或2,6-二氨基甲苯的第二二氨基甲苯异构体比例与第一异构体比例不同，以制备混合的二氨基甲苯; 通过混合的二氨基甲苯，脲和/或N-未取代的氨基甲酸酯和醇的反应制备甲苯二甲氨基甲酸酯; 并分解甲苯二氨基甲酸酯。

36. 发明授权

US08664420B2 Process for production of zinc toluenesulfonate, zinc toluenesulfonate, and process for production of carbamate 有权
标题翻译：甲苯磺酸锌，甲苯磺酸锌的生产方法和氨基甲酸酯的生产方法
公开(公告)号：US08664420B2
公开(公告)日：2014-03-04
申请号：US13517022
申请日：2011-01-07
申请人： Kazuhiro Kosumi , Takeshi Fukuda , Masaaki Sasaki
发明人： Kazuhiro Kosumi , Takeshi Fukuda , Masaaki Sasaki
IPC分类号： C07F3/06 , C07C269/00
CPC分类号： C07C271/28 , B01J31/0228 , B01J31/2252 , B01J31/2256 , B01J2531/26
摘要： A process for producing zinc toluenesulfonate comprising reacting a zinc compound comprising Zn(OH)2 with toluenesulfonic acid and/or a salt thereof in the presence of an alcohol having 1 to 20 carbon atoms in total at a temperature higher than 60° C.
摘要翻译：一种生产甲苯磺酸锌的方法，包括在高于60℃的温度下，在含有1至20个碳原子的醇的存在下使包含Zn（OH）2的锌化合物与甲苯磺酸和/或其盐反应。

37. 发明授权

US08500932B2 Method for manufacturing polishing pad 有权
公开(公告)号：US08500932B2
公开(公告)日：2013-08-06
申请号：US13294835
申请日：2011-11-11
申请人： Takeshi Fukuda , Tsuguo Watanabe , Junji Hirose , Kenji Nakamura , Masato Doura
发明人： Takeshi Fukuda , Tsuguo Watanabe , Junji Hirose , Kenji Nakamura , Masato Doura
IPC分类号： B29C39/18 , B32B37/15
CPC分类号： B24D11/003 , B24B37/205 , B24B37/22 , B24B37/24 , B24B37/26 , B24D3/32 , B24D18/00 , B29C44/24 , B29C44/308 , B29C44/32 , B29C44/322 , B29C44/326 , B29C44/5654 , C08J9/30 , C08J2375/08 , Y10T156/1052 , Y10T156/1059
摘要： A method for manufacturing a polishing pad, which may be laminated, with a small number of manufacturing steps, high productivity and no peeling between a polishing layer and a cushion layer includes preparing a cell-dispersed urethane composition by a mechanical foaming method; continuously discharging the cell-dispersed urethane composition onto a face material, while feeding the face material; laminating another face material on the cell-dispersed urethane composition; curing the cell-dispersed urethane composition, while controlling its thickness to be uniform, so that a polishing layer including a polyurethane foam is formed; cutting the polishing layer parallel to the face into two pieces so that two long polishing layers each including the polishing layer and the face material are simultaneously formed; and cutting the long polishing layers to produce the polishing pad.

38. 发明授权

US08409308B2 Process for manufacturing polishing pad 有权
标题翻译：制造抛光垫的工艺
公开(公告)号：US08409308B2
公开(公告)日：2013-04-02
申请号：US12601725
申请日：2008-05-15
申请人： Akinori Sato , Junji Hirose , Kenji Nakamura , Takeshi Fukuda , Masato Doura
发明人： Akinori Sato , Junji Hirose , Kenji Nakamura , Takeshi Fukuda , Masato Doura
IPC分类号： B24B1/00 , B24D11/00
CPC分类号： B24D18/00 , B24B37/205 , Y10T428/24322 , Y10T428/24331 , Y10T428/24364
摘要： A method for manufacturing a polishing pad that has a high level of optical detection accuracy and is prevented from causing slurry leak from between the polishing region and the light-transmitting region includes preparing a cell-dispersed urethane composition by a mechanical foaming method; placing a light-transmitting region at a predetermined position on a face material or a belt conveyor, continuously discharging the cell-dispersed urethane composition onto a part of the face material or the belt conveyor where the light-transmitting region is not placed; placing another face material or belt conveyor on the discharged cell-dispersed urethane composition; curing the cell-dispersed urethane composition to form a polishing region including a polyurethane foam, so that a polishing sheet is prepared; applying a coating composition containing an aliphatic and/or alicyclic polyisocyanate to one side of the polishing sheet and curing the coating composition to form a water-impermeable film; and cutting the polishing sheet.
摘要翻译：一种制造具有高水平的光学检测精度并且防止从抛光区域和透光区域之间的浆料泄漏的抛光垫的方法包括通过机械发泡法制备细胞分散的聚氨酯组合物; 在面材料或带式输送机上的预定位置放置透光区域，将细胞分散的聚氨酯组合物连续排出到未放置透光区域的面材或带式输送机的一部分上; 将另一种面材或带式输送机放置在排出的细胞分散的聚氨酯组合物上; 固化细胞分散的聚氨酯组合物以形成包括聚氨酯泡沫的抛光区域，从而制备抛光片; 将包含脂族和/或脂环族多异氰酸酯的涂料组合物施用到抛光片的一侧并固化涂料组合物以形成不透水膜; 并切割抛光片。

39. 发明申请

US20120279138A1 POLISHING PAD AND A METHOD FOR MANUFACTURING THE SAME 有权
标题翻译：抛光垫及其制造方法
公开(公告)号：US20120279138A1
公开(公告)日：2012-11-08
申请号：US13552346
申请日：2012-07-18
申请人： Takeshi Fukuda , Junji Hirose , Kenji Nakamura , Masato Doura , Akinori Sato
发明人： Takeshi Fukuda , Junji Hirose , Kenji Nakamura , Masato Doura , Akinori Sato
IPC分类号： B24B37/24
CPC分类号： B24B37/24 , B24D3/26 , B24D11/001
摘要： A polishing pad of excellent durability and adhesion between the polishing layer and the base material layer includes a polishing layer arranged on a base material layer, wherein the polishing layer includes a thermosetting polyurethane foam having roughly spherical interconnected cells having an average cell diameter of 20 to 300 μm The polyurethane foam includes an isocyanate component and an active hydrogen-containing compound as starting material components, and the active hydrogen-containing compound includes 30 to 85% by weight of a high-molecular-weight polyol having 2 to 4 functional groups and a hydroxyl value of 20 to 100 mg KOH/g.
摘要翻译：抛光层和基材层之间具有优异的耐久性和粘附性的抛光垫包括布置在基材层上的抛光层，其中抛光层包括热固性聚氨酯泡沫，其具有平均泡孔直径为20至 300μm聚氨酯泡沫包括异氰酸酯组分和含活性氢的化合物作为原料组分，活性氢化合物包括30至85重量％的具有2至4个官能团的高分子量多元醇和羟值为20〜100mg KOH / g。

40. 发明授权

US08167690B2 Polishing pad 有权
标题翻译：抛光垫
公开(公告)号：US08167690B2
公开(公告)日：2012-05-01
申请号：US12440003
申请日：2007-04-23
申请人： Takeshi Fukuda , Satoshi Maruyama , Junji Hirose , Kenji Nakamura , Masato Doura
发明人： Takeshi Fukuda , Satoshi Maruyama , Junji Hirose , Kenji Nakamura , Masato Doura
IPC分类号： B24D11/00
CPC分类号： B24D3/26 , B24B37/24
摘要： A polishing pad of excellent durability has a polishing layer is arranged on a base material layer, and the polishing layer comprises a thermosetting polyurethane foam having roughly spherical interconnected cells with an average cell diameter of 35 to 300 μm.
摘要翻译：具有优异耐久性的抛光垫在基材层上设置有抛光层，抛光层包括具有平均泡孔直径为35〜300μm的大致球形的互连电池的热固性聚氨酯泡沫。

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