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31. 发明授权

US06858379B2 Photoresist compositions for short wavelength imaging 有权
标题翻译：用于短波长成像的光刻胶组合物
公开(公告)号：US06858379B2
公开(公告)日：2005-02-22
申请号：US10101768
申请日：2002-03-20
申请人： Anthony Zampini , Charles R. Szmanda , Gary N. Taylor , James F. Cameron , Gerhard Pohlers
发明人： Anthony Zampini , Charles R. Szmanda , Gary N. Taylor , James F. Cameron , Gerhard Pohlers
IPC分类号： G03F7/004 , G03F7/039 , H01L21/027 , G03C5/00
CPC分类号： G03F7/0392 , G03F7/0045 , G03F7/0046 , G03F7/0395 , Y10S430/108
摘要： New photoresists are provided that are suitable for short wavelength imaging, including sub-200 nm such as 157 nm. In one aspect, resists of the invention comprise a fluorine-containing polymer, a photoactive component, and one or more additional components of an amine or other basic composition, a dissolution inhibitor compound, a surfactant or leveling agent, or a plasticizer material. In another aspect, resists of the invention contain a fluorine-containing resin and one or more photoacid generator compounds, particularly non-aromatic onium salts and imidosulfonates, and other non-ionic photoacid generator compounds.
摘要翻译：提供了适用于短波长成像的新型光致抗蚀剂，包括亚200nm，例如157nm。一方面，本发明的抗蚀剂包含含氟聚合物，光活性组分和胺或其它碱性组合物的一种或多种另外的组分，溶解抑制剂化合物，表面活性剂或流平剂或增塑剂材料。在另一方面，本发明的抗蚀剂含有含氟树脂和一种或多种光酸产生剂化合物，特别是非芳族鎓盐和亚氨磺酸盐，以及其它非离子光酸产生剂化合物。

32. 发明授权

US06645695B2 Photoresist composition 失效
公开(公告)号：US06645695B2
公开(公告)日：2003-11-11
申请号：US09948528
申请日：2001-09-07
申请人： Anthony Zampini
发明人： Anthony Zampini
IPC分类号： G03F7004
CPC分类号： G03F7/0382 , G03F7/0045 , G03F7/0392 , Y10T428/2989
摘要： Disclosed are new photoresist compositions including polymeric particles as binders and a photoactive component. Also disclosed are methods of forming relief images using these photoresist compositions.

33. 发明授权

US06596405B2 Antireflective porogens 有权
标题翻译：抗反射致孔剂
公开(公告)号：US06596405B2
公开(公告)日：2003-07-22
申请号：US10192893
申请日：2002-07-11
申请人： Anthony Zampini , Michael K. Gallagher
发明人： Anthony Zampini , Michael K. Gallagher
IPC分类号： C08J902
CPC分类号： H01L21/31695 , C08G77/16 , C08G77/18 , C08G77/20 , C08G77/70 , C08L83/04 , C09D183/04 , H01L21/02126 , H01L21/02203 , H01L21/02216 , H01L21/02282 , H05K1/0313 , H05K3/0011 , Y10T428/249958 , Y10T428/31663 , C08L2666/04 , C08L2666/28
摘要： Disclosed are organo polysilica dielectric materials having low dielectric constants useful in electronic component manufacture are disclosed along with methods of preparing the porous organo polysilica dielectric materials. Also disclosed are methods of forming electronic devices containing such porous organo polysilica dielectric materials without the use of antiretlective coatings.
摘要翻译：公开了具有用于电子部件制造的低介电常数的有机聚硅氧烷介电材料以及制备多孔有机聚硅氧烷介电材料的方法。还公开了形成含有这种多孔有机聚硅氧烷介电材料的电子器件的方法，而不使用抗反射涂层。

34. 发明授权

US5723254A Photoresist with photoactive compound mixtures 失效
标题翻译：光敏复合混合物
公开(公告)号：US5723254A
公开(公告)日：1998-03-03
申请号：US706096
申请日：1996-09-04
申请人： Anthony Zampini , Peter Trefonas, III , Pamela Turci , Catherine C. Meister , Gerald C. Vizvary
发明人： Anthony Zampini , Peter Trefonas, III , Pamela Turci , Catherine C. Meister , Gerald C. Vizvary
IPC分类号： C08G8/28 , G03F7/022 , G03F7/023 , H01L21/027
CPC分类号： G03F7/023 , C08G8/28 , G03F7/022 , G03F7/0236
摘要： The invention relates to a positive-acting photoresist composition containing a mixture of photoactive compounds. One component of the mixture is the esterification product of an o-quinonediazide sulfonyl compound with a phenolic resin. Another component of the mixture is the esterification product of an o-quinonediazide sulfonyl compound with a low molecular weight phenol having from one to three aryl groups and from one to three hydroxyl groups. A third photoactive component which may be present in the formulation is the esterification product of an o-quinonediazide sulfonyl compound with a relative high molecular weight, polyhydric, polynuclear phenol.
摘要翻译：本发明涉及含有光活性化合物混合物的正性光致抗蚀剂组合物。该混合物的一个组分是邻醌二叠氮化物磺酰化合物与酚醛树脂的酯化产物。该混合物的另一成分是邻醌二叠氮化物磺酰化合物与具有1至3个芳基和1至3个羟基的低分子量苯酚的酯化产物。可能存在于制剂中的第三种光活性组分是邻醌二叠氮化物磺酰化合物与相对高分子量的多羟基多酚苯酚的酯化产物。

35. 发明授权

US5130410A Alternating and block copolymer resins 失效
标题翻译：交替和嵌段共聚物树脂
公开(公告)号：US5130410A
公开(公告)日：1992-07-14
申请号：US661121
申请日：1991-02-27
申请人： Anthony Zampini
发明人： Anthony Zampini
IPC分类号： G03F7/004 , G03F7/022
CPC分类号： G03F7/0226 , G03F7/0048
摘要： This invention relates to alternating and block copolymer resins and methods for preparing the same. The alternating copolymer resins are formed from the reaction of a preformed bishydroxymethyl phenol and a reactive phenolic compound. The alternating copolymer may then be further reacted with a second reactive compound in the presence of an aldehyde to form the substantially block copolymer. The alternating and block copolymer resins are characterized by enhanced ortho-, ortho-coupling and low molecular weight distribution.
摘要翻译：本发明涉及交替和嵌段共聚物树脂及其制备方法。交替共聚物树脂由预制的双羟甲基苯酚和反应性酚类化合物的反应形成。然后可以在醛的存在下将交替共聚物与第二反应性化合物进一步反应以形成基本上嵌段共聚物。交替和嵌段共聚物树脂的特征在于增强的邻位，邻位偶联和低分子量分布。

36. 发明授权

US4654055A Asymmetric gas separation membranes 失效
标题翻译：不对称气体分离膜
公开(公告)号：US4654055A
公开(公告)日：1987-03-31
申请号：US509628
申请日：1983-06-30
申请人： Raymond F. Malon , Anthony Zampini
发明人： Raymond F. Malon , Anthony Zampini
IPC分类号： B01D67/00 , B01D53/22
CPC分类号： B01D67/0088
摘要： Asymmetric gas separation membranes of materials having selective permeation of at least one gas of a gaseous mixture over that of one or more remaining gases of the gaseous mixture, exhibit significantly improved permeation selectivities for the at least one gas when the asymmetric membrane is contacted on one or both surfaces with an effective amount of a Bronsted-Lowry base. The improved asymmetric gas separation membranes, process for producing the improved membrane, and processes utilizing such membranes for selectively separating at least one gas from a gaseous mixture by permeation are disclosed.
摘要翻译：具有气态混合物的至少一种气体的选择性渗透的气体混合物的气体混合物的一种或多种剩余气体的选择性渗透的材料的不对称气体分离膜当在一种气体混合物上接触不对称膜时显示出显着改善的至少一种气体的渗透选择性或具有有效量的Bronsted-Lowry碱的两个表面。公开了改进的不对称气体分离膜，用于生产改进膜的方法，以及利用这种膜通过渗透从气态混合物中选择性分离至少一种气体的方法。

37. 发明授权

US4472175A Asymmetric gas separation membranes 失效
标题翻译：不对称气体分离膜
公开(公告)号：US4472175A
公开(公告)日：1984-09-18
申请号：US509626
申请日：1983-06-30
申请人： Raymond F. Malon , Anthony Zampini
发明人： Raymond F. Malon , Anthony Zampini
IPC分类号： B01D53/22 , B01D67/00 , B01D69/12
CPC分类号： B01D67/0088
摘要： Asymmetric gas separation membranes of materials having selective permeation of at least one gas of a gaseous mixture over that of one or more remaining gases of the gaseous mixture, exhibit significantly improved permeation selectivities for the at least one gas when the asymmetric membrane is contacted on one or both surfaces with an effective amount of a Br nsted-Lowry acid. The improved asymmetric gas separation membranes, process for producing the improved membrane, and processes utilizing such membranes for selectively separating at least one gas from a gaseous mixture by permeation are disclosed.
摘要翻译：具有气态混合物的至少一种气体的选择性渗透的气体混合物的气体混合物的一种或多种剩余气体的选择性渗透的材料的不对称气体分离膜当在一种气体混合物上接触不对称膜时显示出显着改善的至少一种气体的渗透选择性或两个表面与有效量的Br nsted-Lowry酸。公开了改进的不对称气体分离膜，用于生产改进膜的方法，以及利用这种膜通过渗透从气态混合物中选择性分离至少一种气体的方法。

38. 发明授权

US4468503A Amino ketone cross-linked polyphenylene oxide 失效
标题翻译：氨基酮交联聚苯醚
公开(公告)号：US4468503A
公开(公告)日：1984-08-28
申请号：US509632
申请日：1983-06-30
申请人： Anthony Zampini , Raymond F. Malon
发明人： Anthony Zampini , Raymond F. Malon
IPC分类号： C08K5/17 , B01D53/22 , B01D67/00 , B01D71/52 , C08G65/48 , C08L71/00 , C08L71/12
CPC分类号： C08G65/485 , B01D71/52
摘要： Cross-linked polyphenylene oxide compositions comprise the reaction product of haloacylated polyphenylene oxide and ammonia. The polyphenylene oxide chains are cross-linked by amino ketone bonding. Such cross-linked polymers are useful as membranes, for instance gas separation membranes.
摘要翻译：交联聚苯醚组合物包含卤代酰化聚苯醚与氨的反应产物。聚苯醚链通过氨基酮键交联。这种交联聚合物可用作膜，例如气体分离膜。

39. 发明授权

US10365562B2 Coating compositions for use with an overcoated photoresist 有权
公开(公告)号：US10365562B2
公开(公告)日：2019-07-30
申请号：US13340989
申请日：2011-12-30
申请人： Owendi Ongayi , Vipul Jain , Suzanne Coley , Anthony Zampini
发明人： Owendi Ongayi , Vipul Jain , Suzanne Coley , Anthony Zampini
IPC分类号： G03F7/09 , G03F7/11 , G03F7/16
摘要： Organic coating compositions, particularly antireflective coating compositions, are provided that comprise that comprise a component that comprises one or more uracil moieties. Preferred compositions of the invention are useful to reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing, conformal or via-fill layer.

40. 发明授权

US08373241B2 Antireflective hard mask compositions 有权
公开(公告)号：US08373241B2
公开(公告)日：2013-02-12
申请号：US12582673
申请日：2009-10-20
申请人： Dana A. Gronbeck , Amy M. Kwok , Chi Q. Truong , Michael K. Gallagher , Anthony Zampini
发明人： Dana A. Gronbeck , Amy M. Kwok , Chi Q. Truong , Michael K. Gallagher , Anthony Zampini
IPC分类号： H01L21/76
CPC分类号： G03F7/0752 , G03F7/0757 , G03F7/091 , G03F7/11 , H01L21/0276 , H01L21/3081
摘要： The invention includes new organic-containing compositions that can function as an antireflective layer for an overcoated photoresist. Compositions of the invention also can serve effectively as a hard mask layer by exhibiting a sufficient plasma etch selectivity from an undercoated layer. Preferred compositions of the invention have a high Si content and comprise a blend of distinct resins.

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