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31. 发明授权

US09064538B2 Method and system for generating at least one of: comic strips and storyboards from videos 有权
标题翻译：用于从视频中生成漫画和故事板中的至少一个的方法和系统
公开(公告)号：US09064538B2
公开(公告)日：2015-06-23
申请号：US13311795
申请日：2011-12-06
申请人： Puneet Gupta , Akshay Darbari , Karthik Gopalakrishnan Vinmani , Venkat Kumar Sivaramamurthy
发明人： Puneet Gupta , Akshay Darbari , Karthik Gopalakrishnan Vinmani , Venkat Kumar Sivaramamurthy
IPC分类号： H04N5/93 , G11B27/034 , G11B27/10 , G11B27/28 , G11B27/34
CPC分类号： G11B27/034 , G11B27/105 , G11B27/28 , G11B27/34
摘要： A method, a system, and a computer program product code for generating a series of still images from an input video file are provided. The series of still images may include, but are not limited to, a comic strip and a storyboard. The method includes extracting audio and visual frames from the video file. Thereafter, basic units of the video file are identified. The basic units are exposition (beginning), conflict (middle), and resolution (end). Thereafter, key frames are extracted from the basic units based on at least one of audio frames, visual frames, and a combination of the visual frames and the audio frames. Then, the extracted key frames are manipulated to output a series of still images. Subsequently, narration in the form of audio or text is attached to the still images to generate at least one of comic strips and storyboards.
摘要翻译：提供了一种用于从输入视频文件生成一系列静止图像的方法，系统和计算机程序产品代码。一系列静止图像可以包括但不限于漫画和故事板。该方法包括从视频文件中提取音视频帧。此后，识别视频文件的基本单元。基本单位是博览会（开始），冲突（中间）和分辨率（结束）。此后，基于音频帧，视觉帧以及视觉帧和音频帧的组合中的至少一个，从基本单元提取关键帧。然后，操作所提取的关键帧以输出一系列静止图像。随后，将音频或文本形式的叙述附加到静止图像以产生漫画和故事板中的至少一个。

32. 发明授权

US08949768B2 Standard cells having transistors annotated for gate-length biasing 有权
标题翻译：具有用于栅极长度偏置的晶体管的标准单元
公开(公告)号：US08949768B2
公开(公告)日：2015-02-03
申请号：US13620669
申请日：2012-09-14
申请人： Puneet Gupta , Andrew B. Kahng
发明人： Puneet Gupta , Andrew B. Kahng
IPC分类号： G06F17/50 , G06F9/455
CPC分类号： G06F17/5081 , G06F17/5063 , G06F17/5068 , G06F2217/78
摘要： A standard cell library is disclosed. The standard cell library contains cells wherein at least one transistor in at least one cell is annotated for gate length biasing. Gate length biasing includes the modification of the gate length, so as to change the speed or power consumption of the modified gate length. The standard cell library is one used in the manufacturing of semiconductor devices (e.g., that result as semiconductor chips), by way of fabricating features defined on one or more layouts of geometric shapes. The annotations serve to identify which ones of the transistor gate features are to be modified before using the geometric shapes for manufacturing the semiconductor device.
摘要翻译：公开了一种标准细胞库。标准单元库包含其中注释至少一个单元中的至少一个晶体管用于栅长度偏置的单元。栅极长度偏置包括栅极长度的修改，以便改变修改的栅极长度的速度或功率消耗。标准单元库是用于制造半导体器件（例如，作为半导体芯片的结果）的方法，通过制造在几何形状的一个或多个布局上限定的特征。注释用于在使用用于制造半导体器件的几何形状之前识别哪些晶体管栅极特征将被修改。

33. 发明授权

US08490043B2 Standard cells having transistors annotated for gate-length biasing 失效
公开(公告)号：US08490043B2
公开(公告)日：2013-07-16
申请号：US12717887
申请日：2010-03-04
申请人： Puneet Gupta , Andrew B. Kahng
发明人： Puneet Gupta , Andrew B. Kahng
IPC分类号： G06F17/50
CPC分类号： G06F17/5081 , G06F17/5063 , G06F17/5068 , G06F2217/78
摘要： A standard cell library is disclosed. The standard cell library contains cells wherein at least one transistor in at least one cell is annotated for gate length biasing. Gate length biasing includes the modification of the gate length, so as to change the speed or power consumption of the modified gate length. The standard cell library is one used in the manufacturing of semiconductor devices (e.g., that result as semiconductor chips), by way of fabricating features defined on one or more layouts of geometric shapes. The annotations serve to identify which ones of the transistor gate features are to be modified before using the geometric shapes for manufacturing the semiconductor device.

34. 发明申请

US20130104113A1 SYSTEM AND METHOD FOR DYNAMICALLY GENERATING A USER PERSONALIZED DOWNLOADABLE EXECUTABLE FILE 有权
标题翻译：动态生成用户个性化可下载的可执行文件的系统和方法
公开(公告)号：US20130104113A1
公开(公告)日：2013-04-25
申请号：US13421778
申请日：2012-03-15
申请人： Puneet Gupta , Akshay Darbari , Venkat Kumar Sivaramamurthy , Sudhakar Vusirika
发明人： Puneet Gupta , Akshay Darbari , Venkat Kumar Sivaramamurthy , Sudhakar Vusirika
IPC分类号： G06F9/44
CPC分类号： G06F8/61 , G06F9/4451
摘要： In an aspect, a system, non-transitory machine readable medium and method for providing a personalized executable file to a client device is disclosed. A request sent from a client device to obtain a software application is received. The request is processed to identify the client device and a user associated with the client device. The client device profile information associated with the identified client device as well as user profile information associated with the identified user is determined. One or more configuration/core library files are selected from a file database based on the user profile information and the client device profile information. A personalized executable file is generated for the requested software application, wherein the personalized executable file comprises selected core library files and the selected configuration files. The personalized executable file of the requested software application is then sent to the client device.
摘要翻译：在一方面，公开了一种用于向客户端设备提供个性化可执行文件的系统，非暂时机器可读介质和方法。接收到从客户端发送的用于获取软件应用程序的请求。处理该请求以识别客户端设备和与客户端设备相关联的用户。确定与所识别的客户端设备相关联的客户端设备简档信息以及与所标识的用户相关联的用户简档信息。基于用户简档信息和客户端设备简档信息，从文件数据库中选择一个或多个配置/核心库文件。为所请求的软件应用程序生成个性化可执行文件，其中个性化可执行文件包括所选择的核心库文件和所选择的配置文件。然后将所请求的软件应用的个性化可执行文件发送到客户端设备。

35. 发明授权

US08415089B1 Single-mask double-patterning lithography 有权
标题翻译：单掩模双图案平版印刷
公开(公告)号：US08415089B1
公开(公告)日：2013-04-09
申请号：US12723798
申请日：2010-03-15
申请人： Puneet Gupta , Rani S. Ghaida
发明人： Puneet Gupta , Rani S. Ghaida
IPC分类号： G03F7/00 , G03C5/00
CPC分类号： G03F7/70466
摘要： A method of printing a final layout on a wafer comprises printing a first pattern from a first mask located at a first position onto the wafer, shifting the first mask by a predetermined distance to a second position, printing the first pattern from the first mask located at the second position onto the wafer, and applying a trim mask to the wafer.
摘要翻译：在晶片上印刷最终布局的方法包括将位于第一位置的第一掩模的第一图案打印到晶片上，将第一掩模移动预定距离到第二位置，将第一图案从位于第一掩模在晶片上的第二位置处，并且向晶片施加修剪掩模。

36. 发明申请

US20130024766A1 SYSTEM AND METHOD OF CONTEXT AWARE ADAPTION OF CONTENT FOR A MOBILE DEVICE 有权
标题翻译：用于移动设备的内容的系统和方法
公开(公告)号：US20130024766A1
公开(公告)日：2013-01-24
申请号：US13344999
申请日：2012-01-06
申请人： Puneet Gupta , Venkat Kumar Sivaramamurthy , Karthik Gopalakrishnan Vinmani , Robin Pahwa , Akshay Darbari
发明人： Puneet Gupta , Venkat Kumar Sivaramamurthy , Karthik Gopalakrishnan Vinmani , Robin Pahwa , Akshay Darbari
IPC分类号： G06F17/00
CPC分类号： H04L67/2823 , G06F17/211
摘要： The invention relates to a system and method of context aware adaption of content for a mobile device. This involves identifying context parameters and associated values, selection of content layout based on context parameters. Content layout is selected from pre-configured content layouts based on context parameters. The content is retrieved from a content store. Content style is selected from pre-configured content styles based on context parameters. Rendering content on the device display based on the selected content layout, content style and at least one context parameter.
摘要翻译：本发明涉及用于移动设备的内容的上下文感知适配系统和方法。这涉及识别上下文参数和相关值，基于上下文参数选择内容布局。内容布局从基于上下文参数的预配置内容布局中选择。从内容商店检索内容。内容样式是根据上下文参数从预配置的内容样式中选择的。基于选择的内容布局，内容风格和至少一个上下文参数，在设备显示上呈现内容。

37. 发明申请

US20130014073A1 STANDARD CELLS HAVING TRANSISTORS ANNOTATED FOR GATE-LENGTH BIASING 失效
公开(公告)号：US20130014073A1
公开(公告)日：2013-01-10
申请号：US13620690
申请日：2012-09-14
申请人： Puneet Gupta , Andrew B. Kahng
发明人： Puneet Gupta , Andrew B. Kahng
IPC分类号： G06F17/50
CPC分类号： G06F17/5081 , G06F17/5063 , G06F17/5068 , G06F2217/78
摘要： A standard cell library is disclosed. The standard cell library contains cells wherein at least one transistor in at least one cell is annotated for gate length biasing. Gate length biasing includes the modification of the gate length, so as to change the speed or power consumption of the modified gate length. The standard cell library is one used in the manufacturing of semiconductor devices (e.g., that result as semiconductor chips), by way of fabricating features defined on one or more layouts of geometric shapes. The annotations serve to identify which ones of the transistor gate features are to be modified before using the geometric shapes for manufacturing the semiconductor device.

38. 发明授权

US08267745B2 Methods of grinding semiconductor wafers having improved nanotopology 有权
标题翻译：研磨具有改进的纳米拓扑学的半导体晶片的方法
公开(公告)号：US08267745B2
公开(公告)日：2012-09-18
申请号：US12899262
申请日：2010-10-06
申请人： Milind S. Bhagavat , Puneet Gupta , Roland R. Vandamme , Takuto Kazama , Noriyuki Tachi
发明人： Milind S. Bhagavat , Puneet Gupta , Roland R. Vandamme , Takuto Kazama , Noriyuki Tachi
IPC分类号： B24B1/00
CPC分类号： B24B7/228 , B24B7/17 , B24B37/08 , B24B37/28 , B24B41/061
摘要： Methods for holding a workpiece with a hydrostatic pad are disclosed herein. The pad includes hydrostatic pockets formed in a face of the body directly opposed to the wafer. The pockets are adapted for receiving fluid through the body and into the pockets to provide a barrier between the body face and the workpiece while still applying pressure to hold the workpiece during grinding. The hydrostatic pads allow the wafer to rotate relative to the pads about their common axis. The pockets are oriented to reduce hydrostatic bending moments that are produced in the wafer when the grinding wheels shift or tilt relative to the hydrostatic pads, helping prevent nanotopology degradation of surfaces of the wafer commonly caused by shift and tilt of the grinding wheels.
摘要翻译：本文公开了用静压垫保持工件的方法。衬垫包括形成在与晶片直接相对的身体的表面中的静水压凹坑。凹穴适于接收流体通过主体并进入凹穴，以在主体面和工件之间提供阻挡物，同时在研磨期间仍然施加压力以保持工件。静压垫允许晶片相对于垫围绕它们的公共轴线旋转。当砂轮相对于静液压垫移动或倾斜时，袋被定向成减小在晶片中产生的流体静力弯矩，有助于防止通常由砂轮的移动和倾斜引起的晶片表面的纳米拓扑降解。

39. 发明授权

US08111611B2 Bidirectional forwarding detection on multilink bundled interfaces 有权
标题翻译：在多链路捆绑接口上进行双向转发检测
公开(公告)号：US08111611B2
公开(公告)日：2012-02-07
申请号：US12164290
申请日：2008-06-30
申请人： Hitesh Kapoor , Puneet Gupta , Rajan Narayanan , David Delano Ward
发明人： Hitesh Kapoor , Puneet Gupta , Rajan Narayanan , David Delano Ward
IPC分类号： H04J3/14
CPC分类号： H04L41/0681 , H04L69/14 , Y02D50/30
摘要： Disclosed are, inter alia, methods, apparatus, computer-storage media, mechanisms, and means associated with Bidirectional Forwarding Detection (BFD) on multilink bundled interfaces. A packet switching device communicates with another packet switching device through a multilink bundled interface configured for communicating over a plurality of bundled communication links. A separate BFD session is conducted over each link of the multiple bundled communication links, and in response to a BFD-detected failure condition, the use of the one or more links or the entire bundled interface is removed from service.
摘要翻译：尤其涉及多链路捆绑接口上的双向转发检测（BFD）方法，装置，计算机存储介质，机制和装置。分组交换设备通过配置为通过多个捆绑的通信链路进行通信的多链路捆绑接口与另一个分组交换设备进行通信。在多个捆绑的通信链路的每个链路上进行单独的BFD会话，并且响应于BFD检测到的故障条件，将使用一个或多个链路或整个捆绑接口从服务中移除。

40. 发明授权

US08066553B2 Wafer clamping device for a double side grinder 有权
标题翻译：用于双面研磨机的晶片夹紧装置
公开(公告)号：US08066553B2
公开(公告)日：2011-11-29
申请号：US10598851
申请日：2005-01-20
申请人： Milind S. Bhagavat , Puneet Gupta , Roland Vandamme , Takuto Kazama , Noriyuki Tachi
发明人： Milind S. Bhagavat , Puneet Gupta , Roland Vandamme , Takuto Kazama , Noriyuki Tachi
IPC分类号： B24B41/06
CPC分类号： B24B7/228 , B24B7/17 , B24B37/08 , B24B37/28 , B24B41/061
摘要： A hydrostatic pad for use in holding a semiconductor wafer during grinding of the wafer by grinding wheels. The pad includes hydrostatic pockets formed in a face of the body directly opposed to the wafer. The pockets are adapted for receiving fluid through the body and into the pockets to provide a barrier between the body face and the workpiece while still applying pressure to hold the workpiece during grinding. The hydrostatic pads allow the wafer to rotate relative to the pads about their common axis. The pockets are oriented to reduce hydrostatic bending moments that are produced in the wafer when the grinding wheels shift or tilt relative to the hydrostatic pads, helping prevent nanotopology degradation of surfaces of the wafer commonly caused by shift and tilt of the grinding wheels.
摘要翻译：一种静压垫，用于在通过研磨轮磨削晶片时保持半导体晶片。衬垫包括形成在与晶片直接相对的身体的表面中的静水压凹坑。凹穴适于接收流体通过主体并进入凹穴，以在主体面和工件之间提供阻挡物，同时在研磨期间仍然施加压力以保持工件。静压垫允许晶片相对于垫围绕其公共轴线旋转。当砂轮相对于静液压垫移动或倾斜时，袋被定向成减小在晶片中产生的流体静力弯矩，有助于防止通常由砂轮的移动和倾斜引起的晶片表面的纳米拓扑降解。

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