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    • 33. 发明授权
    • Thin film transistor array panel
    • 薄膜晶体管阵列面板
    • US07276732B2
    • 2007-10-02
    • US11234470
    • 2005-09-23
    • Je Hun LeeYang Ho BaeBeom Seok ChoChang Oh Jeong
    • Je Hun LeeYang Ho BaeBeom Seok ChoChang Oh Jeong
    • H01L29/04
    • H01L29/458G02F1/1368H01L27/12H01L27/124H01L27/1288
    • A thin film transistor array panel includes a source electrode and a drain electrode composed of a Mo alloy layer and a Cu layer, and an alloying element of the Mo alloy layer forms a nitride layer as a diffusion barrier against the Cu layer. The nitride layer can be formed between the Mo alloy layer and the Cu layer, between the Mo alloy layer and the semiconductor layer or in the Mo alloy layer. A method of fabricating a thin film transistor array panel includes forming a data line having a first conductive layer and a second conductive layer, the first conductive layer containing a Mo alloy and the second conductive layer containing Cu, and performing a nitrogen treatment so that an alloying element in the first conductive layer forms a nitride layer. The nitrogen treatment can be performed before forming the first conductive layer, after forming the first conductive layer, or during forming the first conductive layer.
    • 薄膜晶体管阵列面板包括由Mo合金层和Cu层构成的源电极和漏电极,Mo合金层的合金元素形成氮化物层作为对Cu层的扩散阻挡层。 可以在Mo合金层和Cu层之间,Mo合金层和半导体层之间或Mo合金层中形成氮化物层。 制造薄膜晶体管阵列面板的方法包括:形成具有第一导电层和第二导电层的数据线,所述第一导电层含有Mo合金,所述第二导电层含有Cu,并进行氮处理,使得 第一导电层中的合金元素形成氮化物层。 在形成第一导电层之前,在形成第一导电层之后,或者在形成第一导电层期间,可以进行氮处理。
    • 36. 发明申请
    • TFT substrate and display device having the same
    • TFT基板和具有该TFT基板的显示装置
    • US20060205125A1
    • 2006-09-14
    • US11371057
    • 2006-03-08
    • Yang-Ho BaeChang-Oh JeongMin-Seok OhJe-Hun LeeBeom-Seok Cho
    • Yang-Ho BaeChang-Oh JeongMin-Seok OhJe-Hun LeeBeom-Seok Cho
    • H01L21/84H01L21/00
    • H01L29/4908H01L27/124H01L29/458
    • A TFT substrate includes a base substrate, a gate wiring formed on the base substrate, a gate insulation layer, an activation layer, an oxidation-blocking layer, a data wiring, a protection layer and a pixel electrode. The gate wiring includes a gate line and a gate electrode. The gate insulation layer is formed on the base substrate to cover the gate wiring. The activation layer is formed on the gate insulation layer. The oxidation-blocking layer is formed on the activation layer. The data wiring includes a data line, a source electrode and a drain electrode. The source and drain electrodes are disposed on the oxidation-blocking layer therefore lowering the on-current (“Ion”) for turning on the TFT and increasing the off-current (“Ioff”) for turning off the TFT due to the oxidation-blocking layer.
    • TFT基板包括基底基板,形成在基底基板上的栅极布线,栅极绝缘层,激活层,氧化阻挡层,数据布线,保护层和像素电极。 栅极布线包括栅极线和栅电极。 栅极绝缘层形成在基底基板上以覆盖栅极布线。 活化层形成在栅绝缘层上。 氧化阻挡层形成在活化层上。 数据线包括数据线,源电极和漏电极。 源电极和漏电极设置在氧化阻挡层上,因此降低导通电流(“I”上“),以便导通TFT并增加截止电流(”I“ “),用于关闭由于氧化阻挡层而导致的TFT。
    • 40. 发明申请
    • THIN-FILM TRANSISTOR AND METHOD OF MANUFACTURING THE SAME
    • 薄膜晶体管及其制造方法
    • US20120037913A1
    • 2012-02-16
    • US13167668
    • 2011-06-23
    • O-Sung SEOSeong-Hun KIMYang-Ho BAEJean-Ho SONG
    • O-Sung SEOSeong-Hun KIMYang-Ho BAEJean-Ho SONG
    • H01L29/786H01L21/336
    • H01L29/78618H01L29/458H01L29/66765
    • A thin-film transistor (TFT) and a method of manufacturing the same are disclosed herein. The TFT may include a gate electrode disposed on an insulating substrate, an insulating layer disposed on the insulating substrate and the gate electrode, an active layer pattern disposed on the insulating layer to overlap the gate electrode, a source electrode disposed on the insulating layer and at least part of which overlaps the active layer pattern, and a drain electrode which is separated from the source electrode and at least part of which overlaps the active layer pattern. A first ohmic contact layer pattern may be disposed between the active layer pattern and the source electrode and between the active layer pattern and the drain electrode. The first ohmic contact layer may have higher nitrogen content on its surface than in other portions of the first ohmic contact layer.
    • 本文公开了一种薄膜晶体管(TFT)及其制造方法。 TFT可以包括设置在绝缘基板上的栅电极,设置在绝缘基板上的绝缘层和栅电极,设置在绝缘层上的与栅电极重叠的有源层图案,设置在绝缘层上的源电极和 其至少一部分与有源层图案重叠,以及与源电极分离并且其至少一部分与有源层图案重叠的漏电极。 可以在有源层图案和源电极之间以及有源层图案和漏电极之间设置第一欧姆接触层图案。 第一欧姆接触层在其表面上可以具有比在第一欧姆接触层的其它部分更高的氮含量。