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31. 发明授权

US5698039A Process for cleaning a substrate using a barrier discharge 失效
标题翻译：使用阻挡放电来清洗基板的工艺
公开(公告)号：US5698039A
公开(公告)日：1997-12-16
申请号：US587470
申请日：1996-01-17
申请人： Ulrich Patz , Michael Scherer , Willi Neff , Klaus Pochner
发明人： Ulrich Patz , Michael Scherer , Willi Neff , Klaus Pochner
IPC分类号： B01J19/12 , B08B6/00 , B08B7/00 , C23C14/02 , H01J37/32 , C23C14/00
CPC分类号： H01J37/32348 , B01J19/123 , B08B6/00 , B08B7/0057 , C23C14/022 , H01J37/32009 , H01J2237/335
摘要： A barrier discharge device (4a, 4b, 4c) installed in a vacuum chamber (1) consists essentially of at least two facing electrodes (20, 22); a dielectric (22) situated between the electrodes (20, 22) and in the immediate proximity of one of these electrodes (20); and a power source (26), which is connected electrically to the electrodes (20, 22). The plasma particles and UV radiation generated during the electrical discharge between the electrodes (20, 22) pass through the electrode (22), which is permeable to UV radiation and plasma particles, and thus emerge from the discharge space. On the surfaces (5a, 5b), the UV radiation induces a photochemical cleaning process, and the impinging plasma particles induce a plasma-chemical cleaning process. The cleaning process is essentially independent of pressure and can be used at pressures of up to 10 bars, which means that the cleaning process can be operated in particular during the time in which the vacuum chamber (1) is being pumped out.
摘要翻译：安装在真空室（1）中的阻挡物排出装置（4a，4b，4c）基本上由至少两个面向电极（20,22）组成; 位于电极（20,22）之间并且紧邻这些电极（20）之一的电介质（22）; 和与电极（20,22）电连接的电源（26）。在电极（20,22）之间的放电期间产生的等离子体颗粒和UV辐射穿过可透过UV辐射和等离子体颗粒的电极（22），从而从放电空间出射。在表面（5a，5b）上，UV辐射引起光化学清洗过程，并且冲击等离子体颗粒引起等离子体化学清洗过程。清洁过程基本上与压力无关，并且可以在高达10巴的压力下使用，这意味着清洁过程可以在真空室（1）被抽出的时间内特别地操作。

32. 发明授权

US4596030A Apparatus for generating a source of plasma with high radiation intensity in the X-ray region 失效
标题翻译：用于在X射线区域中产生具有高辐射强度的等离子体源的装置
公开(公告)号：US4596030A
公开(公告)日：1986-06-17
申请号：US648298
申请日：1984-09-07
申请人： Gerd Herziger , Willi Neff
发明人： Gerd Herziger , Willi Neff
IPC分类号： H01J35/22 , H05G2/00 , H05H1/24 , H01J35/00 , G21B1/00 , G21K5/00 , G21K7/00
CPC分类号： H05G2/003 , H05H1/52
摘要： A virtually punctiform plasma source of high-intensity radiation in the X-ray region is produced at the open downstream end of a gas-filled discharge space defined by and between concentric cylindrical inner and outer electrodes. At the closed upstream end, the electrodes which define this discharge space are directly connected to a low-inductance high-power switch which serves for momentarily connecting the electrodes to a source of stored electric energy. At the closed end of the discharge space, the inner electrode is concentrically surrounded by an insulator which has a high coefficient of secondary-electron emission. In closely opposed adjacency to the insulator region of the inner electrode is an annular emission electrode which is at the potential of the outer electrode, the emission electrode being positioned at close radial offset from the insulator, and the offset being less than the mean free path in the gas of the discharge space.A gas discharge is produced in the discharge space at a well-defined distance downstream from the emitter electrode, and the discharge in a homogeneous plasma layer, which moves toward the open downstream end of the discharge space and there forms a plasma focus of extremely high particle density and small diameter, which focus provides the plasma source of X-radiation.
摘要翻译：在由同心圆筒形的内外电极之间和之间由气体填充的放电空间的开放的下游端产生X射线区域中的高强度辐射的基本点状等离子体源。在闭合的上游端，限定该放电空间的电极直接连接到低电感大功率开关，其用于将电极短暂地连接到存储的电能源。在放电空间的封闭端，内部电极由具有高二次电子发射系数的绝缘体同心地围绕。在与内部电极的绝缘体区域紧密相邻的位置处是位于外部电极的电位的环形发射电极，发射电极位于距离绝缘体较近的径向偏移处，并且偏移小于平均自由程在放电空间的气体中。在放电空间中，在发射电极下游的明确距离处产生气体放电，并且均匀等离子体层中的放电朝向放电空间的开放的下游端移动，并且形成极高的等离子体焦点颗粒密度和小直径，其焦点提供等离子体的X射线源。

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